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    Photomask blank, photomask, and method of manufacture
    2.
    发明授权
    Photomask blank, photomask, and method of manufacture 有权
    光掩模坯料，光掩模和制造方法

    公开(公告)号：US07736824B2

    公开(公告)日：2010-06-15

    申请号：US11952283

    申请日：2007-12-07

    申请人： Hiroki Yoshikawa ,  Yukio Inazuki ,  Noriyasu Fukushima ,  Hideo Kaneko ,  Satoshi Okazaki

    发明人： Hiroki Yoshikawa ,  Yukio Inazuki ,  Noriyasu Fukushima ,  Hideo Kaneko ,  Satoshi Okazaki

    IPC分类号： G03F1/00 ,  B32B17/10

    CPC分类号： C23C14/3492 ,  C23C14/0084 ,  C23C14/048 ,  C23C14/0676 ,  C23C14/0682 ,  C23C14/3464 ,  G03F1/32 ,  Y10T428/31616

    摘要： A photomask blank comprising a multilayer film including at least four layers of different compositions, wherein the interface between the layers is moderately graded in composition; a phase shift mask blank comprising a phase shift film of at least two layers including a surface layer of a composition based on a zirconium silicide compound and a substrate adjacent layer of a composition based on a molybdenum silicide compound, and a further layer between one layer and another layer of a different composition, the further layer having a composition moderately graded from that of the one layer to that of the other layer; a phase shift mask blank comprising a phase shift film including a plurality of layers containing a metal and silicon in different compositional ratios which are stacked in such order that a layer having a higher etching rate is on the substrate side and a layer having a lower etching rate is on the surface side. The invention provides a photomask blank, typically a phase shift mask blank, which satisfies optical properties such as transmittance, reflectance and refractive index at an exposure wavelength of interest, and has an etched pattern with a minimal line edge roughness, and a photomask, typically a phase shift mask obtained therefrom.

    摘要翻译： 一种光掩模坯料，其包括包含至少四层不同组成的多层膜，其中所述层之间的界面在组成上适度地分级; 相移掩模坯料，其包括至少两层的相移膜，所述相移膜包括基于硅化锆化合物的组合物的表面层和基于硅化钼化合物的组合物的基底相邻层，以及在层之间的另一层 和另一层不同的组成，所述另一层具有从所述一层到另一层的组成适度分级的组成; 相移掩模坯料，其包括相移膜，所述相移膜包括多个层，所述多个层包含不同组成比的金属和硅，所述多个层按照使得具有较高蚀刻速率的层位于基板侧上的顺序层叠，并且具有较低蚀刻 速率在表面。 本发明提供了一种光掩模坯料，通常是相移掩模坯料，其满足感兴趣的曝光波长下的透光率，反射率和折射率等光学特性，并且具有最小线边缘粗糙度的蚀刻图案，以及光掩模 从其获得的相移掩模。

    Photomask blank
    5.
    发明授权
    Photomask blank 有权
    光掩模空白

    公开(公告)号：US07790339B2

    公开(公告)日：2010-09-07

    申请号：US11785689

    申请日：2007-04-19

    申请人： Hiroki Yoshikawa ,  Yukio Inazuki ,  Satoshi Okazaki ,  Takashi Haraguchi ,  Tadashi Saga ,  Yuichi Fukushima

    发明人： Hiroki Yoshikawa ,  Yukio Inazuki ,  Satoshi Okazaki ,  Takashi Haraguchi ,  Tadashi Saga ,  Yuichi Fukushima

    IPC分类号： G03F1/00

    CPC分类号： G03F1/58 ,  G03F1/32 ,  Y10T428/31616

    摘要： A photomask blank has a light-shielding film composed of a single layer of a material containing a transition metal, silicon and nitrogen or a plurality of layers that include at least one layer made of a material containing a transition metal, silicon and nitrogen, and has one or more chrome-based material film. The high transition metal content ensures electrical conductivity, preventing charge-up in the photomask production process, and also provides sufficient chemical stability to cleaning in photomask production. The light-shielding film has a good resistance to dry etching of the chrome-based material film in the presence of chlorine and oxygen, thus ensuring a high processing accuracy.

    摘要翻译： 光掩模坯料具有由单层含有过渡金属，硅和氮的材料或多层构成的遮光膜，所述多层包括至少一层由含有过渡金属，硅和氮的材料制成的层，以及 具有一种或多种铬基材料膜。 高过渡金属含量确保电导率，防止光掩模生产过程中的充电，并且还为光掩模生产中的清洁提供足够的化学稳定性。 遮光膜在氯和氧的存在下对铬基材料膜的干蚀刻具有良好的耐蚀性，因此确保高的加工精度。

    Photomask blank and photomask
    7.
    发明授权
    Photomask blank and photomask 有权
    光掩模空白和光掩模

    公开(公告)号：US07691546B2

    公开(公告)日：2010-04-06

    申请号：US11662183

    申请日：2005-09-08

    申请人： Hiroki Yoshikawa ,  Yukio Inazuki ,  Satoshi Okazaki ,  Takashi Haraguchi ,  Masahide Iwakata ,  Mikio Takagi ,  Yuichi Fukushima ,  Tadashi Saga

    发明人： Hiroki Yoshikawa ,  Yukio Inazuki ,  Satoshi Okazaki ,  Takashi Haraguchi ,  Masahide Iwakata ,  Mikio Takagi ,  Yuichi Fukushima ,  Tadashi Saga

    IPC分类号： G03F1/00

    CPC分类号： G03F1/46 ,  G03F1/58 ,  G03F1/68

    摘要： A photomask blank to be used as a material for a photomask is provided with a mask pattern having a transparent area and an effectively opaque area to exposure light on a transparent substrate. On the transparent board, one or more layers of light shielding films are formed with or without other film (A) in between, at least one layer (B) which constitutes the light shielding film includes silicon and a transition metal as main component, and a molar ratio of silicon to the transition metal is silicon:metal=4-15:1 (atomic ratio). The photomask provided with the mask pattern having the transparent area and the effectively opaque area to exposure light on the transparent board is also provided.

    摘要翻译： 用作光掩模材料的光掩模坯料设置有对透明基板上的曝光光具有透明区域和有效不透明区域的掩模图案。 在透明板上，形成有一层或多层遮光膜，其中有或没有其它膜（A），构成遮光膜的至少一层（B）包括硅和过渡金属作为主要成分，以及 硅与过渡金属的摩尔比为硅：金属= 4-15:1（原子比）。 还提供了具有掩模图案的光掩模，该掩模图案具有透明区域和透明板上曝光光线的有效不透明区域。

    Photomask Blank and Photomask
    8.
    发明申请
    Photomask Blank and Photomask 有权
    光掩模空白和光掩模

    公开(公告)号：US20080063950A1

    公开(公告)日：2008-03-13

    申请号：US11662183

    申请日：2005-09-08

    申请人： Hiroki Yoshikawa ,  Yukio Inazuki ,  Satoshi Okazaki ,  Takashi Haraguchi ,  Masahide Iwakata ,  Mikio Takagi ,  Yuichi Fukushima ,  Tadashi Saga

    发明人： Hiroki Yoshikawa ,  Yukio Inazuki ,  Satoshi Okazaki ,  Takashi Haraguchi ,  Masahide Iwakata ,  Mikio Takagi ,  Yuichi Fukushima ,  Tadashi Saga

    IPC分类号： G03F1/00

    CPC分类号： G03F1/46 ,  G03F1/58 ,  G03F1/68

    摘要： A photomask blank to be used as a material for a photomask is provided with a mask pattern having a transparent area and an effectively opaque area to exposure light on a transparent substrate. On the transparent board, one or more layers of light shielding films are formed with or without other film (A) in between, at least one layer (B) which constitutes the light shielding film includes silicon and a transition metal as main component, and a molar ratio of silicon to the transition metal is silicon:metal=4-15:1 (atomic ratio). The photomask provided with the mask pattern having the transparent area and the effectively opaque area to exposure light on the transparent board is also provided.

    摘要翻译： 用作光掩模材料的光掩模坯料设置有对透明基板上的曝光光具有透明区域和有效不透明区域的掩模图案。 在透明板上，形成有一层或多层遮光膜，其中有或没有其它膜（A），构成遮光膜的至少一层（B）包括硅和过渡金属作为主要成分，以及 硅与过渡金属的摩尔比为硅：金属= 4-15:1（原子比）。 还提供了具有掩模图案的光掩模，该掩模图案具有透明区域和透明板上曝光光线的有效不透明区域。

    Photomask blank, photomask, and method of manufacture
    9.
    发明授权
    Photomask blank, photomask, and method of manufacture 有权
    光掩模坯料，光掩模和制造方法

    公开(公告)号：US07329474B2

    公开(公告)日：2008-02-12

    申请号：US10811924

    申请日：2004-03-30

    申请人： Hiroki Yoshikawa ,  Yukio Inazuki ,  Noriyasu Fukushima ,  Hideo Kaneko ,  Satoshi Okazaki

    发明人： Hiroki Yoshikawa ,  Yukio Inazuki ,  Noriyasu Fukushima ,  Hideo Kaneko ,  Satoshi Okazaki

    IPC分类号： G03F1/00 ,  B32B17/06

    CPC分类号： C23C14/3492 ,  C23C14/0084 ,  C23C14/048 ,  C23C14/0676 ,  C23C14/0682 ,  C23C14/3464 ,  G03F1/32 ,  Y10T428/31616

    摘要： A photomask blank comprising a multilayer film including at least four layers of different compositions, wherein the interface between the layers is moderately graded in composition; a phase shift mask blank comprising a phase shift film of at least two layers including a surface layer of a composition based on a zirconium silicide compound and a substrate adjacent layer of a composition based on a molybdenum silicide compound, and a further layer between one layer and another layer of a different composition, the further layer having a composition moderately graded from that of the one layer to that of the other layer; a phase shift mask blank comprising a phase shift film including a plurality of layers containing a metal and silicon in different compositional ratios which are stacked in such order that a layer having a higher etching rate is on the substrate side and a layer having a lower etching rate is on the surface side. The invention provides a photomask blank, typically a phase shift mask blank, which satisfies optical properties such as transmittance, reflectance and refractive index at an exposure wavelength of interest, and has an etched pattern with a minimal line edge roughness, and a photomask, typically a phase shift mask obtained therefrom.

    摘要翻译： 一种光掩模坯料，其包括包含至少四层不同组成的多层膜，其中所述层之间的界面在组成上适度地分级; 相移掩模坯料，其包括至少两层的相移膜，所述相移膜包括基于硅化锆化合物的组合物的表面层和基于硅化钼化合物的组合物的基底相邻层，以及在层之间的另一层 和另一层不同的组成，所述另一层具有从所述一层到另一层的组成适度分级的组成; 相移掩模坯料，其包括相移膜，所述相移膜包括多个层，所述多个层包含不同组成比的金属和硅，所述多个层按照使得具有较高蚀刻速率的层位于基板侧上的顺序层叠，并且具有较低蚀刻 速率在表面。 本发明提供了一种光掩模坯料，通常是相移掩模坯料，其满足感兴趣的曝光波长下的透光率，反射率和折射率等光学特性，并且具有最小线边缘粗糙度的蚀刻图案，以及光掩模 从其获得的相移掩模。