BLACK CURABLE COMPOSITION, LIGHT-SHIELDING COLOR FILTER FOR A SOLID-STATE IMAGING DEVICE AND METHOD OF PRODUCING THE SAME, SOLID-STATE IMAGING DEVICE, WAFER LEVEL LENS, AND CAMERA MODULE
    1.
    发明申请
    BLACK CURABLE COMPOSITION, LIGHT-SHIELDING COLOR FILTER FOR A SOLID-STATE IMAGING DEVICE AND METHOD OF PRODUCING THE SAME, SOLID-STATE IMAGING DEVICE, WAFER LEVEL LENS, AND CAMERA MODULE 有权
    黑色可​​固化组合物,用于固态成像装置的遮光颜色过滤器及其制造方法,固态成像装置,水平镜片和相机模块

    公开(公告)号:US20130028587A1

    公开(公告)日:2013-01-31

    申请号:US13583858

    申请日:2011-03-24

    摘要: A black curable composition for forming a light-shielding color filter of solid-state imaging device is provided, which is capable of forming a pattern at low exposure dose even when containing a high concentration of an inorganic pigment, and preventing pattern defects. Also, a black curable composition for a wafer level lens is provided, which is capable of forming a cured film having excellent light shieldability and excellent in co-formability of both a large pattern and a fine pattern. The composition includes: an inorganic pigment; a copolymer containing a monomer having at least one of an amino group and a nitrogen-containing heterocyclic group, a monomer having at least one group of a carboxyl group, a phosphate group and a sulfonate group, and a macromonomer having a weight average molecular weight from 1,000 to 50,000; a polymerization initiator; a polymerizable compound; and an alkali-soluble resin having an unsaturated double bond.

    摘要翻译: 提供一种用于形成固态成像装置的遮光滤色器的黑色可固化组合物,其即使在含有高浓度的无机颜料时也能以低曝光量形成图案,并且防止图案缺陷。 此外,提供了一种用于晶片级透镜的黑色可固化组合物,其能够形成具有优异的遮光性并且具有优异的图案和精细图案的共同成型性优异的固化膜。 该组合物包括:无机颜料; 含有具有氨基和含氮杂环基中的至少一个的单体的共聚物,具有至少一个羧基,磷酸酯基和磺酸酯基的基团的单体和具有重均分子量的大分子单体 从1000到50,000; 聚合引发剂; 可聚合化合物; 和具有不饱和双键的碱溶性树脂。

    Black curable composition, light-shielding color filter for a solid-state imaging device and method of producing the same, solid-state imaging device, wafer level lens, and camera module
    3.
    发明授权
    Black curable composition, light-shielding color filter for a solid-state imaging device and method of producing the same, solid-state imaging device, wafer level lens, and camera module 有权
    用于固态成像装置的黑色可固化组合物,遮光滤色器及其制造方法,固态成像装置,晶片级透镜和相机模块

    公开(公告)号:US08828629B2

    公开(公告)日:2014-09-09

    申请号:US13583858

    申请日:2011-03-24

    IPC分类号: G02B5/20 G03F7/004 H01L27/14

    摘要: A black curable composition for forming a light-shielding color filter of solid-state imaging device is provided, which is capable of forming a pattern at low exposure dose even when containing a high concentration of an inorganic pigment, and preventing pattern defects. Also, a black curable composition for a wafer level lens is provided, which is capable of forming a cured film having excellent light shieldability and excellent in co-formability of both a large pattern and a fine pattern. The composition includes: an inorganic pigment; a copolymer containing a monomer having at least one of an amino group and a nitrogen-containing heterocyclic group, a monomer having at least one group of a carboxyl group, a phosphate group and a sulfonate group, and a macromonomer having a weight average molecular weight from 1,000 to 50,000; a polymerization initiator; a polymerizable compound; and an alkali-soluble resin having an unsaturated double bond.

    摘要翻译: 提供一种用于形成固态成像装置的遮光滤色器的黑色可固化组合物,即使在含有高浓度的无机颜料时也能以低曝光量形成图案,并且防止图案缺陷。 此外,提供了一种用于晶片级透镜的黑色可固化组合物,其能够形成具有优异的遮光性并且具有优异的图案和精细图案的共同成型性优异的固化膜。 该组合物包括:无机颜料; 含有具有氨基和含氮杂环基中的至少一个的单体的共聚物,具有至少一个羧基,磷酸酯基和磺酸酯基的基团的单体和具有重均分子量的大分子单体 从1000到50,000; 聚合引发剂; 可聚合化合物; 和具有不饱和双键的碱溶性树脂。

    LIGHT-SHIELDING CURABLE COMPOSITION, WAFER LEVEL LENS AND LIGHT-SHIELDING COLOR FILTER
    5.
    发明申请
    LIGHT-SHIELDING CURABLE COMPOSITION, WAFER LEVEL LENS AND LIGHT-SHIELDING COLOR FILTER 审中-公开
    光屏蔽可固化组合物,水平透镜和遮光颜色过滤器

    公开(公告)号:US20120250166A1

    公开(公告)日:2012-10-04

    申请号:US13516596

    申请日:2010-12-16

    IPC分类号: G02B5/23 G02B5/22 G02B3/00

    摘要: A light-shielding curable composition is provided which exhibits excellent dispersion property, excellent storage stability, and excellent pattern edge formability, and a wafer level lens and a light-shielding color filter which have a light-shielding section produced using the curable composition are provided. The light-shielding curable composition includes (A) an inorganic pigment; (B) a dispersant having a polyester structure; (C) a polymerizable compound having a polyester structure; (D) a polymerization initiator; and (E) a solvent.

    摘要翻译: 提供了具有优异的分散性,优异的储存稳定性和优异的图案边缘成型性的遮光可固化组合物,并且提供了具有使用该可固化组合物制造的遮光部分的晶片级透镜和遮光滤色器 。 遮光性固化性组合物包含(A)无机颜料; (B)具有聚酯结构的分散剂; (C)具有聚酯结构的聚合性化合物; (D)聚合引发剂; 和(E)溶剂。

    PHOTOSENSITIVE RESIN COMPOSITION, LIGHT-SHIELDING COLOR FILTER AND PRODUCTION PROCESS THEREFOR, AND IMAGE SENSOR
    6.
    发明申请
    PHOTOSENSITIVE RESIN COMPOSITION, LIGHT-SHIELDING COLOR FILTER AND PRODUCTION PROCESS THEREFOR, AND IMAGE SENSOR 有权
    光敏树脂组合物,遮光颜料过滤器及其生产工艺及图像传感器

    公开(公告)号:US20090246651A1

    公开(公告)日:2009-10-01

    申请号:US12411457

    申请日:2009-03-26

    IPC分类号: G03F1/00 G03F7/004

    CPC分类号: G03F7/0007 G03F7/031

    摘要: A photosensitive resin composition is provided that includes at least (A) titanium black, (B) a polymerizable compound, (C) a photopolymerization initiator (D) a resin, and (E) an organic solvent, the photopolymerization initiator (C) using in combination two or more types of photopolymerization initiators including at least one type of oxime-based photopolymerization initiator. There are also provided a light-shielding color filter having a pattern formed by using the photosensitive resin composition, a process for producing a light-shielding color filter that includes a step of coating a substrate with the photosensitive resin composition, a step of imagewise exposing, and a step of developing to form a pattern, and an image sensor having the light-shielding color filter.

    摘要翻译: 提供至少包含(A)钛黑,(B)可聚合化合物,(C)光聚合引发剂(D)和树脂)和(E)有机溶剂的光敏树脂组合物,所述光聚合引发剂(C)使用 组合两种或更多种类型的光聚合引发剂,其包括至少一种类型的肟基光聚合引发剂。 还提供了一种具有通过使用感光性树脂组合物形成的图案的遮光滤色器,制造遮光滤色器的方法,该遮光滤色器包括用感光性树脂组合物涂布基板的步骤,成像曝光步骤 ,以及形成图案的步骤,以及具有遮光滤色器的图像传感器。

    Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor
    7.
    发明授权
    Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor 有权
    光敏树脂组合物,遮光滤色片及其制作方法及图像传感器

    公开(公告)号:US08110324B2

    公开(公告)日:2012-02-07

    申请号:US12407935

    申请日:2009-03-20

    IPC分类号: G02B5/20

    CPC分类号: G03F7/0007

    摘要: A photosensitive resin composition is provided that includes at least (A) titanium black, (B) two or more types of polymerizable compounds, (C) a resin, (D) a photopolymerization initiator, and (E) an organic solvent. There are also provided a light-shielding color filter formed by using the photosensitive resin composition, and a process for producing a light-shielding color filter, the process including a step of coating a substrate with the photosensitive resin composition, a step of imagewise exposing, and a step of developing to form a pattern. Furthermore, there is provided an image sensor that includes the light-shielding color filter.

    摘要翻译: 提供至少包含(A)钛黑,(B)两种或更多种可聚合化合物,(C)树脂,(D)光聚合引发剂和(E)有机溶剂)的感光性树脂组合物。 还提供了使用感光性树脂组合物形成的遮光性滤色器,以及遮光性滤色片的制造方法,其特征在于,包括使用所述感光性树脂组合物涂布基材的工序,成像曝光工序 ,以及形成图案的步骤。 此外,提供了包括遮光滤色器的图像传感器。