利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

23 条记录 (耗时 0.019 秒)

    Particulate photographic polymer
    4.
    发明授权
    Particulate photographic polymer 失效
    颗粒摄影聚合物

    公开(公告)号：US5795709A

    公开(公告)日：1998-08-18

    申请号：US821075

    申请日：1997-03-20

    申请人： Yutaka Adegawa ,  Kentaro Shiratsuchi

    发明人： Yutaka Adegawa ,  Kentaro Shiratsuchi

    IPC分类号： G03C1/32 ,  C08F290/00 ,  C08F299/00 ,  G03C1/95

    CPC分类号： G03C1/95 ,  G03C1/32 ,  G03C2001/7635 ,  G03C7/00 ,  Y10S430/151

    摘要： There is disclosed a particulate photographic polymer, which at least comprises a repeating unit of the formula (I): ##STR1## wherein R is an alkyl group, a phenyl group, or a hydrogen atom; L is a divalent organic binding group; A is a repeating unit derived from at least one ethylenically unsaturated monomer, or a repeating unit derived by ring opening polymerization of a nitrogen-containing heterocyclic compound, with --(A).sub.m -- being soluble in water or a hydrophilic organic liquid; m is from 2 to 200; and Y is a monovalent binding group. The polymer is excellent in dispersion stability in coating solutions, prevents settling and agglomeratingis and the formation of mat pinholes, and can improve granularity of images.

    摘要翻译： 公开了至少包含式（I）的重复单元的微粒照相聚合物：其中R是烷基，苯基或氢原子的式（I） L是二价有机结合基团; A是衍生自至少一种烯属不饱和单体的重复单元，或由含氮杂环化合物的开环聚合衍生的重复单元， - （A）m-可溶于水或亲水性有机液体; m为2〜200; Y是一价结合基团。 聚合物在涂布溶液中的分散稳定性优异，防止沉降和聚集，并形成垫针孔，并且可以提高图像的粒度。

    Insulating-film forming material and insulating film using the same
    5.
    发明授权
    Insulating-film forming material and insulating film using the same 失效
    绝缘膜形成材料和使用其的绝缘膜

    公开(公告)号：US07268201B2

    公开(公告)日：2007-09-11

    申请号：US10806450

    申请日：2004-03-23

    申请人： Yutaka Adegawa

    发明人： Yutaka Adegawa

    IPC分类号： C08G77/04 ,  C08G77/20 ,  C07F7/00 ,  C07F7/21

    CPC分类号： C09D183/04 ,  C08G77/04 ,  C08G77/50 ,  C09D183/14

    摘要： A polymer having a repeating unit represented by formula (I) is used for an insulating-film forming material and an insulating film. wherein R1 to R7 each are a monovalent hydrocarbon group, etc.; one of X, Y and Z is a specific siloxane group and the remaining two each are —O— or divalent silyl-containing group that bonds to (I) on the side of the oxygen atom of the group.

    摘要翻译： 将具有式（I）所示的重复单元的聚合物用于绝缘膜形成材料和绝缘膜。 其中R 1至R 7各自为一价烃基等; X，Y和Z中的一个是特定的硅氧烷基团，其余的两个是与基团的氧原子侧的（I）键合的-O-或二价含甲硅烷基的基团。

    Insulating-film forming material and insulating film using the same
    6.
    发明授权
    Insulating-film forming material and insulating film using the same 有权
    绝缘膜形成材料和使用其的绝缘膜

    公开(公告)号：US07144970B2

    公开(公告)日：2006-12-05

    申请号：US10805204

    申请日：2004-03-22

    申请人： Yutaka Adegawa

    发明人： Yutaka Adegawa

    IPC分类号： C08G79/02

    CPC分类号： C08J5/18 ,  C08G65/40 ,  C08J2371/00 ,  Y10T428/31504

    摘要： An insulating-film forming material comprising a resin (A) that has a structure represented by formula (I): wherein Y1, Y2, Ar1 and Ar2 are the same or different; each of Y1, Y2, Ar1 and Ar2represents an aromatic ring-containing divalent organic group; at least one of Y1 and Y2 is a divalent aromatic polycyclic group having a specific structure; m and n each indicates a molar percentage of the repeating units; and m falls between 0 and 100 with (m+n)=100.

    摘要翻译： 一种绝缘膜形成材料，其包含具有由式（I）表示的结构的树脂（A）：其中Y 1，Y 2，Ar 1， / SUB＆gt;和Ar 2 2相同或不同; Y 1，Y 2，Ar 1和Ar 2中的每一个表示含芳环的二价有机基团 ; Y 1和Y 2 2中的至少一个是具有特定结构的二价芳族多环基团; m和n各自表示重复单元的摩尔百分数; （m + n）= 100时，m在0和100之间。

    Electron beam or X-ray negative-working resist composition
    7.
    发明授权
    Electron beam or X-ray negative-working resist composition 有权
    电子束或X射线负极抗蚀剂组合物

    公开(公告)号：US06824948B1

    公开(公告)日：2004-11-30

    申请号：US09759362

    申请日：2001-01-16

    申请人： Toshiaki Aoai ,  Yutaka Adegawa ,  Morio Yagihara

    发明人： Toshiaki Aoai ,  Yutaka Adegawa ,  Morio Yagihara

    IPC分类号： G03F7004

    CPC分类号： G03F7/0045 ,  G03F7/038

    摘要： A negative-working resist composition for electron beams or X-rays comprising (A) a compound generating an acid and/or radical species by the irradiation of electron beams or X-rays, (B) a resin which is insoluble in water and soluble in an alkali aqueous solution, (C) a crosslinking agent causing crosslinking with the resin of component (B) by the action of an acid, and (D) a compound having at least one unsaturated bond capable of being polymerized by an acid and/or a radical, and a negative-working resist composition for electron beams or X-rays comprising (A) a compound generating an acid and/or radical species by the irradiation of electron beams or X-rays, (B′) a resin having at least one unsaturated bond polymerizable by an acid and/or an alkali, which is insoluble in water but soluble in an alkali aqueous solution, and (C) a crosslinking agent causing crosslinking with the resin (B′) by the action of an acid are disclosed.

    摘要翻译： 一种用于电子束或X射线的负性抗蚀剂组合物，包括（A）通过电子束或X射线的照射产生酸和/或自由基的化合物，（B）不溶于水和可溶的树脂 在碱性水溶液中，（C）通过酸的作用与成分（B）的树脂交联的交联剂，（D）具有至少一个能够被酸和/ 或用于电子束或X射线的负性抗蚀剂组合物，其包含（A）通过照射电子束或X射线产生酸和/或自由基的化合物，（B'）具有 至少一个不溶于水但可溶于碱性水溶液的酸和/或碱可聚合的不饱和键，和（C）通过酸的作用与树脂（B'）交联的交联剂 被披露。

    Insulating film, process for producing the same and electronic device using the same
    8.
    发明申请
    Insulating film, process for producing the same and electronic device using the same 审中-公开
    绝缘膜，其制造方法和使用其的电子器件

    公开(公告)号：US20060204664A1

    公开(公告)日：2006-09-14

    申请号：US11374164

    申请日：2006-03-14

    申请人： Yutaka Adegawa

    发明人： Yutaka Adegawa

    IPC分类号： B05D3/02

    CPC分类号： H01L21/02282 ,  H01L21/02118 ,  H01L21/3121 ,  H05K3/287 ,  H05K3/4676

    摘要： An insulating film formed by a method comprising: coating a film-forming composition containing a compound having a cage structure; and drying the coated composition, wherein the coated composition is irradiated with a light having a wavelength of 200 nm or less in at least one of during the drying and after the drying; a process for producing the same; and an electronic device having the same.

    摘要翻译： 一种绝缘膜，其通过以下方法形成：包括含有具有笼结构的化合物的成膜组合物; 并干燥涂布的组合物，其中在干燥和干燥之中的至少一个中，用波长为200nm或更小的光照射涂覆的组合物; 其制造方法; 和具有该电子设备的电子设备。

    Negative-working resist composition
    10.
    发明授权
    Negative-working resist composition 有权
    负性抗蚀剂组成

    公开(公告)号：US06673512B1

    公开(公告)日：2004-01-06

    申请号：US09760806

    申请日：2001-01-17

    申请人： Kazuya Uenishi ,  Yutaka Adegawa ,  Koji Shirakawa

    发明人： Kazuya Uenishi ,  Yutaka Adegawa ,  Koji Shirakawa

    IPC分类号： G03F7003

    CPC分类号： G03F7/0045 ,  G03F7/038 ,  Y10S430/168

    摘要： A chemical amplification system negative-working resist composition for an electron beam and/or an X-ray, which is excellent in sensitivity and resolution and has a rectangular profile, comprising an alkali-soluble resin having structural units represented by the following general formula (a), a compound generating an acid by irradiation of the electron beam or the X-ray, and a crosslinking agent which initiates crosslinking by the acid:

    摘要翻译： 一种用于电子束和/或X射线的化学放大系统负性抗蚀剂组合物，其灵敏度和分辨率优异并且具有矩形轮廓，包括具有由以下通式表示的结构单元的碱溶性树脂（ a），通过照射电子束或X射线产生酸的化合物和引发酸的交联的交联剂：