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    Method of marking a diamond, markings formed from such methods and diamonds marked according to such method
    1.
    发明授权
    Method of marking a diamond, markings formed from such methods and diamonds marked according to such method 有权

    公开(公告)号：US12030217B2

    公开(公告)日：2024-07-09

    申请号：US17624332

    申请日：2020-07-24

    Applicant: MASTER DYNAMIC LIMITED

    Inventor： Yau Chuen Yiu ,  Ka Wing Cheng ,  Koon Chung Hui

    IPC: B28D5/04 ,  B42D25/324 ,  B42D25/435

    CPC classification number: B28D5/04 ,  B42D25/324 ,  B42D25/435

    Abstract: A process of forming a non-optically detectable authentication marking (110), includes the step of: applying a marking at a surface of a diamond (200) using a focused ion beam (FIB) writing process so as to provide a non-optically detectable authentication marking (110) which is formed by alteration in the optical characteristics of a portion of the diamond material at the outer surface of the diamond to form a marked portion; wherein the marking is optically invisible, and wherein the marking is viewable by an imaging method which provides an observable contrast between the portion of the diamond having altered optical characteristics and the non-marked portion of the diamond. The marking process can assist in the prevention of the counterfeiting of precious articles, and be of assistance in the incident of theft. A marking, a diamond, a process of viewing a marking on a diamond are further disclosed.

    METHOD OF MARKING A SOLID-STATE MATERIAL, MARKINGS FORMED FROM SUCH METHODS AND SOLID-STATE MATERIALS MARKED ACCORDING TO SUCH A METHOD
    2.
    发明申请
    METHOD OF MARKING A SOLID-STATE MATERIAL, MARKINGS FORMED FROM SUCH METHODS AND SOLID-STATE MATERIALS MARKED ACCORDING TO SUCH A METHOD 有权

    公开(公告)号：US20220355416A1

    公开(公告)日：2022-11-10

    申请号：US17624325

    申请日：2020-07-24

    Applicant: MASTER DYNAMIC LIMITED

    Inventor： Yau Chuen YIU ,  Ka Wing CHENG ,  Koon Chung HUI

    IPC: B23K26/359 ,  G06V20/80 ,  B23K26/0622 ,  B23K26/06 ,  B23K26/082 ,  B23K26/08

    Abstract: A process of forming a non-optically detectable authentication marking (210,320, 410,535) in a diamond (200,300). Authentication marking (210,320,410,535) is formed adjacent the outer surface of an article formed from a diamond material having intrinsic optical centers. Method includes the step of applying an image of predesigned authentication marking(210,320,410,535) to a region (201,310,530) of a diamond (200,300) at or adjacent the surface of the diamond (200,300) by way of a direct laser writing; wherein the fluorescence background of the diamond material from intrinsic optical center is suppressed by authentication marking(210,320, 410, 535) under fluorescent imaging, such that the non-optically detectable identifiable authentication marking (210,320,410,535) is viewable against the fluorescence background at the region (201,310,530) of the diamond (200,300) where the authentication marking (210,320,410,535) is applied.

    METHOD OF MARKING A DIAMOND, MARKINGS FORMED FROM SUCH METHODS AND DIAMONDS MARKED ACCORDING TO SUCH METHOD
    3.
    发明申请
    METHOD OF MARKING A DIAMOND, MARKINGS FORMED FROM SUCH METHODS AND DIAMONDS MARKED ACCORDING TO SUCH METHOD 有权

    公开(公告)号：US20220274291A1

    公开(公告)日：2022-09-01

    申请号：US17624332

    申请日：2020-07-24

    Applicant: MASTER DYNAMIC LIMITED

    Inventor： Yau Chuen YIU ,  Ka Wing CHENG ,  Koon Chung HUI

    IPC: B28D5/04 ,  B42D25/435 ,  B42D25/324

    Abstract: A process of forming a non-optically detectable authentication marking (110), includes the step of: applying a marking at a surface of a diamond (200) using a focused ion beam (FIB) writing process so as to provide a non-optically detectable authentication marking (110) which is formed by alteration in the optical characteristics of a portion of the diamond material at the outer surface of the diamond to form a marked portion; wherein the marking is optically invisible, and wherein the marking is viewable by an imaging method which provides an observable contrast between the portion of the diamond having altered optical characteristics and the non-marked portion of the diamond. The marking process can assist in the prevention of the counterfeiting of precious articles, and be of assistance in the incident of theft. A marking, a diamond, a process of viewing a marking on a diamond are further disclosed.

    STRESS-RELIEF ELASTIC STRUCTURE OF HAIRSPRING COLLET
    6.
    发明申请
    STRESS-RELIEF ELASTIC STRUCTURE OF HAIRSPRING COLLET 有权
    应力消除弹性弹性结构

    公开(公告)号：US20140198627A1

    公开(公告)日：2014-07-17

    申请号：US14154055

    申请日：2014-01-13

    Applicant: Master Dynamic Limited

    Inventor： Siu Kay CHU ,  Ho CHING ,  Pui Hang KO

    IPC: G04B17/34

    CPC classification number: G04B17/345

    Abstract: A hairspring collet for a hairspring for interference engagement and an interference fit with the cylindrical outer surface of the staff of a balance wheel for a timepiece movement, said hairspring collet portion comprising a plurality of circumferentially extending elastically deformable interconnected arm portions, the arm portions forming an annulus having a central axis and providing an aperture therebetween, wherein each arm portion including a curved concave engagement portion for engagement with the outer surface of a staff of a balance wheel, wherein each engagement portion has substantially the same radius of curvature as each other and are equally spaced from said central axis at a first distance and wherein said first distance is less than the radius of the staff of the balance wheel; said engagement portions have a radius of curvature such that upon deformation of the arm portions and engagement with the outer surface of said staff the engagement portions substantially conform with the outer surface of said staff and an interference fit is formed therebetween, wherein stress induced from said interference fit is transferred and distributed from along the engagement portions to the arm portions adjacent the engagement portions and distributed therein; and wherein the interference fit of the engagement portions with the staff substantially prevents relative movement between the hairspring collet and the staff of the balance wheel upon application of load from a hairspring in use in a timepiece movement.

    Abstract translation: 一种用于干扰接合的游丝的游丝夹头和与用于钟表运动的摆轮的工作人员的圆柱形外表面的过盈配合，所述游丝夹头部分包括多个周向延伸的可弹性变形的互连臂部分，所述臂部分形成 具有中心轴线并在其间提供孔的环形空间，其中每个臂部分包括用于与摆轮的工作人员的外表面接合的弯曲凹形接合部分，其中每个接合部分具有彼此基本相同的曲率半径 并且在第一距离处与所述中心轴线等距间隔，并且其中所述第一距离小于所述摆轮的所述人员的半径; 所述接合部分具有曲率半径，使得当所述臂部分变形并且与所述人员的外表面接合时，所述接合部分基本上与所述人员的外表面一致，并且在其间形成过盈配合，其中由所述 过盈配合从接合部分转移并分配到邻近接合部分的臂部分并分布在其中; 并且其中，当在手表运动中施加来自使用中的游丝的负载时，接合部分与工作人员的过盈配合基本上防止了游丝夹头和摆轮的工作人员之间的相对运动。

    METHOD OF MARKING A SOLID-STATE MATERIAL, MARKINGS FORMED FROM SUCH METHODS AND SOLID-STATE MATERIALS MARKED ACCORDING TO SUCH A METHOD
    7.
    发明申请
    METHOD OF MARKING A SOLID-STATE MATERIAL, MARKINGS FORMED FROM SUCH METHODS AND SOLID-STATE MATERIALS MARKED ACCORDING TO SUCH A METHOD 有权

    公开(公告)号：US20240383074A1

    公开(公告)日：2024-11-21

    申请号：US18417804

    申请日：2024-01-19

    Applicant: Master Dynamic Limited

    Inventor： Yau Chuen YIU ,  Ka Wing Cheng ,  Koon Chung Hui

    IPC: B23K26/359 ,  B23K26/06 ,  B23K26/0622 ,  B23K26/08 ,  B23K26/082 ,  G06V20/80

    Abstract: A process of forming a non-optically detectable authentication marking (210,320, 410,535) in a diamond (200,300). Authentication marking (210,320,410,535) is formed adjacent the outer surface of an article formed from a diamond material having intrinsic optical centers. Method includes the step of applying an image of predesigned authentication marking (210,320,410,535) to a region (201,310,530) of a diamond (200,300) at or adjacent the surface of the diamond (200,300) by way of a direct laser writing; wherein the fluorescence background of the diamond material from intrinsic optical center is suppressed by authentication marking (210,320, 410, 535) under fluorescent imaging, such that the non-optically detectable identifiable authentication marking (210,320,410,535) is viewable against the fluorescence background at the region (201,310,530) of the diamond (200,300) where the authentication marking (210,320,410,535) is applied.

    IMAGING PROCESS AND SYSTEM
    8.
    发明公开
    IMAGING PROCESS AND SYSTEM 审中-公开

    公开(公告)号：US20230168238A1

    公开(公告)日：2023-06-01

    申请号：US17919406

    申请日：2021-04-16

    Applicant: MASTER DYNAMIC LIMITED

    Inventor： Yau Chuen YIU ,  Koon Chung HUI ,  Yan Yan MOK

    IPC: G01N33/38 ,  G01N23/046 ,  G01N23/20025

    CPC classification number: G01N33/381 ,  G01N23/046 ,  G01N23/20025

    Abstract: A system (300) for providing a three-dimensional computer tomography image of a gemstone, the system (300) comprising an X-ray source (330) for providing an X-ray towards a gemstone (320); an X-ray detector system for detecting X-rays transmitted through or diffracted by the gemstone (320). The X-ray detector system surrounds the gemstone (320) and detects a three-dimensional multi-angle X-ray diffraction pattern from the gemstone (320) upon rotation of the gemstone (320) within the X-ray field, and provides an output signal therefrom, wherein the output signal provides for invasive three-dimension multiangle X-ray diffraction reconstructed computed tomography from the three-dimension multiangle X-ray diffraction pattern.

    Method of marking a solid state material, and solid state materials marked according to such a method
    10.
    发明授权
    Method of marking a solid state material, and solid state materials marked according to such a method 有权

    公开(公告)号：US10457089B2

    公开(公告)日：2019-10-29

    申请号：US15304843

    申请日：2015-04-16

    Applicant: Master Dynamic Limited

    Inventor： Yingnan Wang ,  Ching Tom Kong

    IPC: B44C1/22 ,  G03F7/00 ,  B28D5/00 ,  H01J37/32

    Abstract: A method of forming a non-optically detectable identifiable mark at an outer surface of an article formed from a solid state material, said method including the steps of forming a plurality of recesses within a predetermined region of a photoresist 5 applied to an outer surface of an article formed from a solid state material, wherein said plurality of recesses is formed by two-photon absorption lithography and wherein said one or more recesses extend at least partially through the photoresist and from an outer surface of the photoresist and towards said outer surface of the article 10 formed from a solid state material; and applying an etching process such that at least a portion of the outer surface of said article is exposed and etched so as to form a plurality of etched portions extending into said article from the outer surface of the article and corresponding to said plurality of recesses; wherein said predetermined region of said photoresist defines an identifiable mark to be applied to the outer 15 surface of said article; wherein said plurality of etched portions forms the nonoptically identifiable mark on the outer surface of said article; and wherein the maximum width of the etched portions of is less than 200 nm such that the identifiable mark is non-optically detectable in the visible light spectrum.

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