公开(公告)号：US09950553B2

公开(公告)日：2018-04-24

申请号：US15616600

申请日：2017-06-07

Applicant: Master Dynamic Limited

Inventor： Zhuonan Miao ,  Yingnan Wang ,  Ching Tom Kong

IPC: B41M3/14 ,  B42D25/328 ,  B42D25/435 ,  B23K26/00 ,  B41M5/26

CPC classification number: B42D25/328 ,  B23K26/53 ,  B41M5/24 ,  B41M5/262 ,  B41M5/267 ,  B42D25/333 ,  B42D25/41 ,  B42D25/435

Abstract: A process of forming an identification marking within article formed from an at least partially optically transparent material for identification and validation, said process including the steps of (i) forming an indicia with an at least partially optically transparent material by way of subsurface laser engraving (SSLE); and (ii) forming a plurality of defects within or adjacent indicia within said at least partially optically transparent material resultant of the step of forming the indicia and from localized heating and irregularities in said at least partially optically transparent material, wherein said plurality of defects forms said identification marking.

公开(公告)号：US10457089B2

公开(公告)日：2019-10-29

申请号：US15304843

申请日：2015-04-16

Applicant: Master Dynamic Limited

Inventor： Yingnan Wang ,  Ching Tom Kong

IPC: B44C1/22 ,  G03F7/00 ,  B28D5/00 ,  H01J37/32

Abstract: A method of forming a non-optically detectable identifiable mark at an outer surface of an article formed from a solid state material, said method including the steps of forming a plurality of recesses within a predetermined region of a photoresist 5 applied to an outer surface of an article formed from a solid state material, wherein said plurality of recesses is formed by two-photon absorption lithography and wherein said one or more recesses extend at least partially through the photoresist and from an outer surface of the photoresist and towards said outer surface of the article 10 formed from a solid state material; and applying an etching process such that at least a portion of the outer surface of said article is exposed and etched so as to form a plurality of etched portions extending into said article from the outer surface of the article and corresponding to said plurality of recesses; wherein said predetermined region of said photoresist defines an identifiable mark to be applied to the outer 15 surface of said article; wherein said plurality of etched portions forms the nonoptically identifiable mark on the outer surface of said article; and wherein the maximum width of the etched portions of is less than 200 nm such that the identifiable mark is non-optically detectable in the visible light spectrum.

公开(公告)号：US11247227B2

公开(公告)日：2022-02-15

申请号：US15185119

申请日：2016-06-17

Applicant: Master Dynamic Limited

Inventor： Yingnan Wang ,  Zhuonan Miao ,  Ching Tom Kong

IPC: C23C14/30 ,  B05D1/38 ,  B05D3/10 ,  C23C14/14 ,  C23C14/22 ,  C23C14/02 ,  A01N37/02 ,  A01N43/16 ,  A01N33/12 ,  C23C14/50 ,  C23C14/34 ,  C23C16/458 ,  C23C16/503 ,  C23C16/505 ,  C23C16/511 ,  C07C323/52 ,  C08J3/24 ,  C08J3/28 ,  C08J7/18 ,  C08L5/08 ,  C08L39/00 ,  B05D1/36 ,  B05D1/18

Abstract: An apparatus for coating at least a first plurality of articles each article thereof having at least a first surface to be coated is disclosed. The apparatus includes an emission source for directing emission elements towards the first surfaces of the plurality of articles, at least one support member for supporting the first plurality of articles, wherein support member supports the first plurality of articles such that the first surface is exposed to the path of emission from said emission source, and a drive assembly for moving the support member such that the first plurality of articles is moveable with respect to the path of emission from said emission source.

公开(公告)号：US10165836B2

公开(公告)日：2019-01-01

申请号：US15387518

申请日：2016-12-21

Applicant: Master Dynamic Limited

Inventor： Yingnan Wang ,  Ching Tom Kong ,  Zhuonan Miao

IPC: B32B3/00 ,  A44C27/00 ,  B21C51/00 ,  B22C9/22 ,  B22D19/00 ,  B22D23/00 ,  B44B5/02 ,  G02B5/18

Abstract: A mold for imparting a marking including a requisite optical element has two and a half dimensions (2.5D) to the outer surface of an article formed from a ductile material. The mold includes a marking surface for imparting the mark to an outer surface of the article. That imparting is done by localized plastic deformation of the material from which the article is formed upon the mold and the article being urged against each other. The marking surface includes a micro-structure formed by an arrangement plural micro meter sized recessed or protruded entities. The entities are arranged in a predetermined arrangement in relation to each other, and the entities are arranged as a micro-structure having two and a half dimensions (2.5D). The entities are arranged in an inverse arrangement compared to the optical element, and to provide the recesses extending from the marking surface into the mold.

公开(公告)号：US09625879B2

公开(公告)日：2017-04-18

申请号：US14283928

申请日：2014-05-21

Applicant: Master Dynamic Limited

Inventor： Ying Nan Wang ,  Ching Tom Kong

IPC: B05D5/06 ,  G04B19/26 ,  G04D3/00 ,  G04B19/12 ,  C23C14/35 ,  G03F7/20 ,  G03F7/26

CPC classification number: G04B19/268 ,  C23C14/35 ,  G03F7/20 ,  G03F7/26 ,  G04B19/12 ,  G04D3/0092

Abstract: A method of fabricating a component for use in a watch includes a step of depositing a first thin film on a wafer wherein the first thin film is adapted to allow light reflected away from the wafer to be indicative of a first color characteristic. The step of depositing the first thin film is performed by using a plasma-enhanced chemical vapor deposition process or a low pressure chemical vapor deposition process. The method may further include a step of fabricating a second color characteristic, including defining a pattern on the first thin film using photolithography, and, processing a region within a boundary of the pattern so that the region is adapted to allow light reflected away from the wafer to be indicative of the second color characteristic. The step of processing the region within the boundary of the pattern includes depositing a metal or a ceramic material within the boundary of the pattern which is indicative of the second color characteristic. The step of processing the region within the boundary of the pattern may also include depositing a second thin film within the region within the boundary of the pattern.