Abstract:
Disclosed are self-assembled structures formed from a self-assembling diblock copolymer of the formula (I): wherein R1-R4, n, and m are as described herein, which find use in preparing porous membranes. In an embodiment, the diblock copolymer is present in the self-assembled structures in a cylindrical morphology. Also disclosed is a method of preparing a self-assembled structure, which involves spin coating a polymer solution containing the diblock copolymer to obtain a thin film, followed by solvent annealing of the film.
Abstract:
Disclosed are self-assembling block copolymers including diblock copolymers of the formula (I): wherein R1 is —(CHR—CH2—O)p—R′, p=2-6, R is H or methyl, and R′ is H, a C1-C6 alkyl or C3-C11 cycloalkyl, R2 is C6-C20 aryl or heteroaryl, one of R3 and R4 is C6-C14 aryl and the other is C1-C22 alkoxy, and n and m are independently 2 to about 2000, which find use in preparing self-assembled structures and porous membranes. Embodiments of the self-assembled structures contain the block copolymer in a cylindrical morphology. Also disclosed is a method of preparing such copolymers.
Abstract:
Disclosed are self-assembling block copolymers including diblock copolymers of the formula (I): wherein R1 is C1-C22 alkyl, R2 is C6-C20 aryl or heteroaryl, one of R3 and R4 is C6-C14 aryl and the other is C1-C22 alkoxy, n and m are independently 2 to about 2000. The copolymers find use in preparing nanoporous membranes. Embodiments of the membranes contain the diblock copolymer in a self-assembled nanostructure of cylindrical morphology. Also disclosed is a method of preparing such copolymers.
Abstract:
Disclosed are self-assembling diblock copolymers of the formula (I): wherein R1 is —(CHR—CH2—O)p—R′, p=2-6, R is H or methyl, and R′ is H, C1-C6 alkyl, or C3-C11 cycloalkyl, R2 is C6-C20 aryl, one of R3 and R4 is C6-C14 aryl or heteroaryl, and the other is C1-C22 alkoxy, and n and m are independently 2 to about 2000, which find use in preparing self-assembled structures and porous membranes. Embodiments of the self-assembled structures contain the diblock copolymer in a cylindrical morphology. Also disclosed is a method of preparing such copolymers.
Abstract:
Disclosed are self-assembling block copolymers including diblock copolymers of the formula (I): wherein R1 is —(CHR—CH2—O)p—R′, p=2-6, R is H or methyl, and R′ is H, a C1-C6 alkyl or C3-C11 cycloalkyl, R2 is C6-C20 aryl or heteroaryl, one of R3 and R4 is C6-C14 aryl and the other is C1-C22 alkoxy, and n and m are independently 2 to about 2000, which find use in preparing self-assembled structures and porous membranes. Embodiments of the self-assembled structures contain the block copolymer in a cylindrical morphology. Also disclosed is a method of preparing such copolymers.
Abstract:
Disclosed are self-assembled structures prepared from block copolymers, for example, diblock copolymers of the formula (I): wherein R1-R4, n, and m are as described herein, which find use in preparing nanoporous membranes. In an embodiment, the block copolymer self-assembles into a cylindrical morphology. Also disclosed is a method of preparing such self-assembled structures which involves spin coating a polymer solution containing the block copolymer to obtain a thin film, followed by solvent annealing of the film. Further disclosed is a method of preparing porous membranes from the self-assembled structures.
Abstract:
Disclosed are membranes formed from self-assembling block copolymers, for example, a diblock copolymer of the formula (I): wherein R1-R4, n, and m are as described herein, which find use in preparing nanoporous membranes. Embodiments of the membranes contain the block copolymer that self-assembles into a cylindrical morphology. Also disclosed is a method of preparing such membrane which involves hybrid casting a polymer solution containing the block copolymer to obtain a thin film, followed by evaporation of some of the solvent from the thin film, and coagulating the resulting this film in a bath containing a nonsolvent or poor solvent for the block copolymer.
Abstract:
Disclosed are self-assembling diblock copolymers of the formula (I): wherein R1-R4, n, and m are as described herein, which find use in preparing porous membranes. Embodiments of the membranes contain the diblock copolymer self-assembled into a cylindrical morphology. Also disclosed is a method of preparing such copolymers.
Abstract:
Disclosed are self-assembled structures formed from self-assembling block copolymers, for example, a diblock copolymer of the formula (I): wherein R1-R4, n, and m are as described herein, which find use in preparing nanoporous membranes. In an embodiment, the block copolymer self-assembles into a cylindrical morphology. Also disclosed is a method of preparing such membrane which involves spin coating a polymer solution containing the block copolymer to obtain a thin film, followed by solvent annealing of the film. Further disclosed is a method of preparing porous membranes from the self-assembled structures.
Abstract:
Disclosed are self-assembling diblock copolymers of the formula (I): wherein R1-R4, n, and m are as described herein, which find use in preparing self-assembled structures and porous membranes. Embodiments of the self-assembled structures contain the diblock copolymer in a cylindrical morphology. Also disclosed is a method of preparing such copolymers.