公开(公告)号：US11148448B2

公开(公告)日：2021-10-19

申请号：US16772242

申请日：2018-12-12

申请人： SHENZHEN EMPEROR TECHNOLOGY COMPANY LIMITED

发明人： Song Zheng ,  Xiaohong Tang ,  Xiaojun Jiang ,  Jiange Feng ,  Yongbing Hu

IPC分类号： B42D25/378 ,  B42D25/435 ,  B41M3/14 ,  B42D25/23 ,  B42D25/415 ,  B41M1/30 ,  B41M3/00 ,  B41M7/00 ,  B42D25/309

摘要： The disclosure relates to the technical field of secure identification document, specifically to a method for producing a color secure identification document and a color secure identification document thereof. The method comprises: etching identity information on the substrate of the data surface of document by laser, and the identity information comprises a black-and-white image and text information; printing a color image on the black-and-white image with color ink so that the color image and the black-and-white image are aligned and coincide with each other to form a personalized data surface; and printing a transparent protective layer on the upper surface of the personalized data surface with a transparent varnish, wherein the protective layer covers the color image.

公开(公告)号：US11059319B2

公开(公告)日：2021-07-13

申请号：US16093132

申请日：2017-04-19

申请人： DE LA RUE INTERNATIONAL LIMITED

发明人： Adam Lister

IPC分类号： B42D25/00 ,  B42D25/23 ,  B42D25/24 ,  B42D25/29 ,  B42D25/324 ,  B42D25/342 ,  B42D25/351 ,  B42D25/373 ,  B42D25/41 ,  B42D25/415 ,  B42D25/42 ,  B42D25/435 ,  B42D25/445 ,  B42D25/355

摘要： A method of manufacturing an image pattern for a security device includes providing a metallised substrate; applying a first photosensitive resist layer to a substrate first metal layer exposing the resist layer to radiation; exposing the resist layer to a first reactant substance; activating a cross linking agent in the resist layer; exposing first and second pattern elements of the resist layer to radiation of a wavelength to which the resist layer is responsive whereupon newly-exposed first pattern elements of the first photosensitive resist layer react, resulting in increased solubility by the second etchant substance, the second pattern elements remaining relatively insoluble by the second etchant substance; and applying first and second etchant substances to the substrate whereupon the first pattern elements of both the first resist layer and the first metal layer are dissolved, the remaining second pattern elements of the first metal layer forming an image pattern.

公开(公告)号：US20200369069A1

公开(公告)日：2020-11-26

申请号：US16988238

申请日：2020-08-07

申请人： ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL)

发明人： Nasser HEFYENE ,  Nicolas Grandjean

IPC分类号： B42D25/387 ,  C23C14/06 ,  C23C16/30 ,  G04B45/00 ,  B42D25/43 ,  C09K11/08 ,  B42D25/36 ,  C09K11/64 ,  C09K11/62 ,  B42D25/373 ,  B42D25/415 ,  B42D25/465 ,  C23C14/04 ,  C23C16/04

摘要： A method for marking a product (1) with a photoluminescent mark, said mark comprising a photoluminescent portion (10) which is transparent under normal light conditions and revealed by photoluminescence under UV illumination, said mark further comprising a non photoluminescent portion (9) which is transparent under normal light conditions as well s under UV illumination, said method comprising: deposing on said product a stack, said stack comprising alternatively layers (2,4) such as AIN, with a thickness of less than 1 micron and layers (3) of a second material, such as GaN with a thickness of less than 10 nm; raising the transparency of said non photoluminescent portion (10) with a deposition of transparent material (6) or incorporation of ions into said non photoluminescent portions.

公开(公告)号：US10280506B2

公开(公告)日：2019-05-07

申请号：US15126310

申请日：2015-03-18

申请人： 3D-Oxides

发明人： Giacomo Benvenuti ,  Estelle Wagner ,  Cosmin Sandu

IPC分类号： C23C16/04 ,  B65C9/00 ,  C23C16/40 ,  C23C16/46 ,  C23C16/52 ,  G09F3/00 ,  B42D25/41 ,  B42D25/415 ,  B65D79/00

摘要： A chemical gas phase deposition process comprises steps of providing a high vacuum chamber, and inside the high vacuum chamber: positioning a substrate surface; positioning a mask parallel to the substrate surface, whereby the mask comprises one or more openings; adjusting a gap of determined dimension between the substrate surface and the mask; and orienting a plurality of chemical precursor beams of at least one precursor species towards the mask with line of sight propagation, each of the plurality of chemical precursor beams being emitted from an independent punctual source, and molecules of the chemical precursor pass through the one or more mask openings to impinge onto the substrate surface for deposition thereon. At least a part of the chemical precursor molecules decompose on the substrate surface at a decomposition temperature. The process further comprises adjusting a temperature of the substrate surface greater or equal to the chemical precursor molecule decomposition temperature, thereby remaining greater than a mask temperature, and maintaining the mask temperature below the decomposition temperature, thereby causing a decomposition of the chemical precursor and a growth of a film on the substrate surface, but not on the mask; and heating the substrate surface using a heating device.

公开(公告)号：US09956807B2

公开(公告)日：2018-05-01

申请号：US15038874

申请日：2014-11-28

申请人： LEONHARD KURZ Stiftung & Co. KG ,  OVD Kinegram AG

发明人： Rene Staub ,  Ludwig Brehm ,  Patrick Kramer ,  Rouven Spiess ,  Karin Forster

IPC分类号： B42D25/445 ,  B42D25/29 ,  B42D25/405 ,  B42D25/415 ,  B42D25/43 ,  B42D25/45 ,  B42D25/324 ,  B42D25/328 ,  B42D25/364 ,  B42D25/373 ,  B42D25/378

CPC分类号： B42D25/445 ,  B42D25/29 ,  B42D25/324 ,  B42D25/328 ,  B42D25/364 ,  B42D25/373 ,  B42D25/378 ,  B42D25/405 ,  B42D25/415 ,  B42D25/43 ,  B42D25/45

摘要： The invention relates to a method for producing a multi-layer body, in particular a security element, in which a partial first layer or partial first layer system is produced on a substrate, wherein the partial first layer or partial first layer system is present in a first partial area and not in a second partial area. Subsequently, a partial second layer or partial second layer system is produced, wherein the partial second layer or partial second layer system is present in a third partial area and not in a fourth partial area, and wherein the third partial area overlaps with the first and second partial areas. Finally, the partial first layer or partial first layer system is structured as a mask using the partial second layer or partial second layer system.

公开(公告)号：US20220097440A1

公开(公告)日：2022-03-31

申请号：US17426928

申请日：2019-01-30

申请人： KBA-Notasys SA

发明人： Michael Blesovsky ,  Johannes Schaede ,  Robert Stewart

IPC分类号： B42D25/415 ,  B42D25/378

摘要： There is described a method of manufacturing a security article, said method comprising the steps of: introducing into an offset printing device a transparent film comprising a non-fibrous substrate layer of regenerated cellulose; and disposing printed information on at least a portion of said transparent film by an offset printing step, wherein said transparent film introduced into said offset printing device further comprises an ink-receptive layer on at least one surface of said substrate layer.

公开(公告)号：US10850551B2

公开(公告)日：2020-12-01

申请号：US15944262

申请日：2018-04-03

申请人： LEONHARD KURZ Stiftung & Co. KG ,  OVD Kinegram AG

发明人： Rene Staub ,  Ludwig Brehm ,  Patrick Kramer ,  Rouven Spiess ,  Karin Forster

IPC分类号： B42D25/445 ,  B41M1/18 ,  B42D25/405 ,  B42D25/415 ,  B42D25/43 ,  B42D25/29 ,  B42D25/45 ,  B42D25/324 ,  B42D25/328 ,  B42D25/364 ,  B42D25/373 ,  B42D25/378

摘要： A method for producing a multi-layer body, in particular a security element, in which a partial first layer or partial first layer system is produced on a substrate, wherein the partial first layer or partial first layer system is present in a first partial area and not in a second partial area. Subsequently, a partial second layer or partial second layer system is produced, wherein the partial second layer or partial second layer system is present in a third partial area and not in a fourth partial area, and wherein the third partial area overlaps with the first and second partial areas. Finally, the partial first layer or partial first layer system is structured as a mask using the partial second layer or partial second layer system.

公开(公告)号：US10752043B2

公开(公告)日：2020-08-25

申请号：US15758281

申请日：2015-11-23

申请人： ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL)

发明人： Nasser Hefyene ,  Nicolas Grandjean

IPC分类号： B42D25/387 ,  C23C14/06 ,  C23C16/30 ,  G04B45/00 ,  B42D25/43 ,  C09K11/08 ,  B42D25/36 ,  C09K11/64 ,  C09K11/62 ,  B42D25/373 ,  B42D25/415 ,  B42D25/465 ,  C23C14/04 ,  C23C16/04

摘要： A method for marking a product (1) with a photoluminescent mark, said mark comprising a photoluminescent portion (10) which is transparent under normal light conditions and revealed by photoluminescence under UV illumination, said mark further comprising a non photoluminescent portion (9) which is transparent under normal light conditions as well as under UV illumination, said method comprising: deposing on said product a stack, said stack comprising alternatively layers (2, 4), such as AlN, with a thickness of less than 1 micron and layers (3) of a second material, such as GaN, with a thickness of less than 10 nm; raising the transparency of said non photoluminescent portion (10) with a deposition of transparent material (6) or incorporation of ions into said non photoluminescent portions.

公开(公告)号：US10328739B2

公开(公告)日：2019-06-25

申请号：US15572386

申请日：2016-05-31

申请人： SICPA HOLDING SA

发明人： Evgeny Loginov ,  Mathieu Schmid ,  Claude-Alain Despland ,  Pierre Degott

IPC分类号： B42D25/369 ,  B41M3/14 ,  G03F7/00 ,  G03F7/105 ,  G03F7/20 ,  G07D7/00 ,  B42D25/29 ,  B42D25/364 ,  B42D25/387 ,  B42D25/415 ,  G03F7/031 ,  B42D25/42 ,  H01F41/16 ,  B42D25/324 ,  B42D25/425 ,  G06Q30/00

摘要： The invention relates to the field of the protection of security documents such as for example banknotes and identity documents against counterfeit and illegal reproduction. In particular, the invention relates to processes for producing optical effect layers (OELs) comprising a motif made of at least two areas made of a single hardened layer on a substrate comprising a photomask.

公开(公告)号：US20180290480A1

公开(公告)日：2018-10-11

申请号：US15944262

申请日：2018-04-03

申请人： LEONHARD KURZ Stiftung & Co. KG ,  OVD Kinegram AG

发明人： Rene Staub ,  Ludwig Brehm ,  Patrick Kramer ,  Rouven Spiess ,  Karin Forster

IPC分类号： B42D25/445 ,  B42D25/324 ,  B42D25/378 ,  B42D25/373 ,  B42D25/364 ,  B42D25/328 ,  B42D25/405 ,  B42D25/45 ,  B42D25/29 ,  B42D25/43 ,  B42D25/415

摘要： A method for producing a multi-layer body, in particular a security element, in which a partial first layer or partial first layer system is produced on a substrate, wherein the partial first layer or partial first layer system is present in a first partial area and not in a second partial area. Subsequently, a partial second layer or partial second layer system is produced, wherein the partial second layer or partial second layer system is present in a third partial area and not in a fourth partial area, and wherein the third partial area overlaps with the first and second partial areas. Finally, the partial first layer or partial first layer system is structured as a mask using the partial second layer or partial second layer system.