公开(公告)号：US06194036B1

公开(公告)日：2001-02-27

申请号：US09176046

申请日：1998-10-20

申请人： Steve E. Babayan ,  Gary S. Selwyn ,  Robert F. Hicks

发明人： Steve E. Babayan ,  Gary S. Selwyn ,  Robert F. Hicks

IPC分类号： C23C16513

CPC分类号： C23C16/513 ,  H05H1/42 ,  H05H2001/245 ,  H05H2001/4697

摘要： Deposition of coatings using an atmospheric pressure plasma jet. The use of a nonthermal source which is capable of operation at 760 torr is demonstrated. As an example of the application of the present invention, a helium/oxygen gas mixture is introduced into the annular region between two coaxial electrodes driven by a 13.56 MHz radio frequency (rf) source at between 40 and 500 W to produce a stable plasma jet. Silicon dioxide films are deposited by introducing tetraethoxysilane (TEOS) into the effluent stream. A deposition rate of 3020±250 Å/min. is achieved with an rf power of 400 W, 0.2 torr of TEOS, 11.1 torr of oxygen, 748.7 torr of helium, and a total gas flow rate of 41 L/min. The deposition rate depends on the oxygen partial pressure, the TEOS partial pressure, and the rf power to the 0.28, 0.47, and 1.41 powers, respectively. However, increasing the temperature decreases the deposition rate. The observed dielectric constants of the films decrease from 5.0±0.2 to 3.81±0.03 as the deposition temperature increases from 115 to 350° C. Infrared spectra of the deposited films at 350° C. show no carbon or hydroxyl ion contamination, indicating excellent material purity.

摘要翻译： 使用大气压等离子体射流沉积涂层。 证明了使用能够在760托下操作的非热源。 作为本发明的应用的一个实例，氦/氧气体混合物被引入在由13.56MHz射频（RF）源驱动的在40和500W之间的两个同轴电极之间的环形区域中，以产生稳定的等离子体射流 。 通过将四乙氧基硅烷（TEOS）引入流出物流中沉积二氧化硅膜。 沉积速率为3020±250 / min。 通过功率为400W，TEOS为0.2乇，氧气为11.1乇，氦气为748.7乇，总气体流量为41L / min。 沉积速率取决于氧气分压，TEOS分压，和功率分别为0.28,0.47和1.41的功率。 然而，增加温度降低了沉积速率。 观察到的介电常数随着沉积温度从115℃升高到350℃，从5.0±0.2降低到3.81±0.03。沉积膜在350℃下的红外光谱显示没有碳或羟基离子污染，表明优异的材料 纯度。

公开(公告)号：US06733678B2

公开(公告)日：2004-05-11

申请号：US10086950

申请日：2002-02-28

申请人： Tihiro Ohkawa

发明人： Tihiro Ohkawa

IPC分类号： C23C16513

CPC分类号： H01J37/32431 ,  H01J49/025 ,  H01J49/288

摘要： An apparatus for removing selected metal ions from a plasma includes a plasma chamber and at least one silica substrate mounted inside the chamber. More specifically, the substrate is exposed in the chamber so that when metal ions from the plasma contact the substrate they diffuse into the substrate to create a liquified layer. A receptacle is also provided to receive the liquid from the layer as it flows from the substrate.

摘要翻译： 用于从等离子体中去除所选择的金属离子的装置包括等离子体室和安装在室内的至少一个二氧化硅衬底。 更具体地说，衬底暴露在室中，使得当来自等离子体的金属离子与衬底接触时，它们扩散到衬底中以产生液化层。 还提供了一个容器，用于在从衬底流出时从层中接收液体。

公开(公告)号：US06287642B1

公开(公告)日：2001-09-11

申请号：US09424729

申请日：2000-03-14

申请人： Wolfgang Leutsch ,  Johannes Rauschnabel ,  Jeanne Forget ,  Johannes Voigt

发明人： Wolfgang Leutsch ,  Johannes Rauschnabel ,  Jeanne Forget ,  Johannes Voigt

IPC分类号： C23C16513

CPC分类号： C23C14/22 ,  B60S2001/3829 ,  C23C14/027 ,  C23C16/029 ,  C23C16/50

摘要： In the process for coating the elastomeric rubber wiper a vaporous coating material is generated and activated by a plasma and/or laser; a protective coating is formed on a rubber wiper surface by exposing it to the vaporous coating material by CVD and/or PVD methods and process parameters for the coating process are controlled so that the protective coating includes at least three coating layers and has a total thickness of from 200 nm to 2 &mgr;m. The coating layers include at least one thicker softer elastic coating layer with elastomeric properties similar to those of the rubber wiper and other thinner harder coating layers having wear-resistant properties. The other thinner harder coating layers have respective hardness increasing from an inner most one to an outermost one of the other thinner harder coating layers.

摘要翻译： 在用于涂覆弹性体橡胶擦拭器的过程中，通过等离子体和/或激光产生并激活蒸汽涂层材料; 通过用CVD和/或PVD方法将橡胶擦拭表面暴露于气态涂料上，形成保护涂层，并且控制用于涂覆过程的工艺参数，使得保护涂层包括至少三个涂层并具有总厚度 为200〜2μm。 涂层包括至少一个较软的较软的弹性涂层，其具有与橡胶擦拭器和具有耐磨性能的其它较薄的较硬的涂层相似的弹性体性质。 其他较薄的较硬的涂层具有相应的硬度从另一较薄的较硬的涂层中的最内层到最外层的硬度。