公开(公告)号：US5895550A

公开(公告)日：1999-04-20

申请号：US767163

申请日：1996-12-16

申请人： Michael T. Andreas

发明人： Michael T. Andreas

IPC分类号： B24B37/04 ,  B24B57/02 ,  C23F3/00 ,  H01L21/3105 ,  C23F3/16 ,  B44C1/22

CPC分类号： H01L21/31053 ,  B24B37/04 ,  B24B57/02 ,  C23F3/00 ,  Y10S438/959

摘要： The above objects and others are accomplished by a chemical mechanical polishing method and apparatus in accordance with the present invention. The apparatus includes a polishing pad having a polishing surface, and a wafer carrier for supporting a wafer disposed opposite to the polishing pad. The wafer carrier is positionable in a plane that is substantially parallel with the polishing surface, such that a surface of the wafer can be polished by contacting the polishing pad. The polishing surface and the wafer carrier are moved in parallel relative motion to mechanically abrade the wafer surface against the polishing surface in the presence of a polishing slurry. A slurry source containing the polishing slurry is connected to a slurry dispense line to dispense the slurry onto the polishing surface of the polishing pad. An acoustic energy source is positioned relative to transmit acoustic energy into the slurry to break up agglomerated particles in the slurry before the polishing slurry contacts the wafer surface. In a preferred embodiment, ultrasonic transducers are connected inline with the dispense line to provide the acoustic energy necessary to break apart the agglomerated particles in the slurry. Also the wafer carrier and the polishing pad are aligned along noncoincident parallel axes and are both rotated or translated in parallel planes to mechanically abrade the wafer surface against the polishing pad. In the practice of the invention, an acoustic energy source is positioned relative to, and preferably inline with, the dispense line and acoustic energy is generated to break up agglomerated particles in the polishing slurry, as the slurry flows through the dispense line before being dispensed onto the polishing pad.

公开(公告)号：US07186320B1

公开(公告)日：2007-03-06

申请号：US10632056

申请日：2003-07-31

申请人： Richard E. Staerzl ,  Christopher J. Misorski

发明人： Richard E. Staerzl ,  Christopher J. Misorski

IPC分类号： C23F3/10 ,  C23F3/12 ,  C23F3/08 ,  C23F3/16

CPC分类号： C23F13/10 ,  C23F13/06 ,  C23F2213/31

摘要： An anode for a cathodic protection system comprises a base portion or support structure which is shaped to receive a conductive element, or insert, within a cavity of the support structure. The conductive element is made of a polymer material, such as vinyl ester, with a conductive filler, such as graphite powder. The base is attachable to a marine vessel or other submersible component that is being protected by a cathodic protection system. The anode allows the use of a relatively inexpensive resin material with a graphite filler in place of a much more expensive platinum coated titanium element.

摘要翻译： 用于阴极保护系统的阳极包括基部或支撑结构，其被成形为在支撑结构的空腔内容纳导电元件或插入件。 导电元件由诸如乙烯基酯的聚合物材料与导电填料如石墨粉末制成。 底座可附接到正在被阴极保护系统保护的船舶或其他潜水部件。 阳极允许使用具有石墨填料的相对便宜的树脂材料代替更昂贵的铂涂覆的钛元素。