Edge phantom
    1.
    发明授权
    Edge phantom 有权
    边缘幻影

    公开(公告)号:US06811314B2

    公开(公告)日:2004-11-02

    申请号:US10441675

    申请日:2003-05-20

    申请人: Marc Cresens

    发明人: Marc Cresens

    IPC分类号: G01D1800

    CPC分类号: A61B6/583

    摘要: An edge phantom for assessing the sharpness response of a radiation image recording and detection system wherein the edge phantom is subjected to radiation emitted by a source of radiation to generate a radiation image and wherein the radiation image, recorded and detected by the system, is evaluated. The design of the edge phantom provides that any line outside a plane perpendicular to the edge phantom's top face, connecting the focus of the source of radiation with a point on a curved or flat lateral face of the phantom used for sharpness analysis coincides with a line part of that lateral face containing that point.

    摘要翻译: 用于评估辐射图像记录和检测系统的锐度响应的边缘体模,其中边缘体模受到由辐射源发射的辐射以产生辐射图像,并且其中评估由系统记录和检测的辐射图像 。 边缘模型的设计提供了垂直于边缘幻影顶面的平面外的任何线,将辐射源的焦点与用于清晰度分析的体模的弯曲或平坦侧面上的点连接在一起 包含该点的该侧面的一部分。

    Method and apparatus for scatter measurement using an occluded detector ring
    3.
    发明授权
    Method and apparatus for scatter measurement using an occluded detector ring 有权
    使用闭塞检测器环进行散射测量的方法和装置

    公开(公告)号:US06789943B2

    公开(公告)日:2004-09-14

    申请号:US10292985

    申请日:2002-11-12

    IPC分类号: G01D1800

    摘要: Certain embodiments include a system and method for scatter measurement and correction. The method includes performing a calibration scan using a phantom to measure a scatter signal ratio between scatter x-rays impacting a first detector ring and scatter x-rays impacting a second detector ring. The scatter signal ratio is used to determine a scatter scale factor. The method further includes positioning a collimator such that the first detector ring is occluded from a path of primary x-rays generated by a target. The method also includes executing a low exposure scan to obtain x-ray scatter data using the first detector ring and the second detector ring and applying the scatter scale factor to the scatter data to produce scaled scatter data. The method further includes obtaining image data using the first detector ring and/or the said second detector ring and adjusting the image data using the scaled scatter data.

    摘要翻译: 某些实施例包括用于散射测量和校正的系统和方法。 该方法包括使用体模执行校准扫描,以测量影响第一检测器环的散射x射线和散射影响第二检测器环的x射线之间的散射信号比。 散射信号比用于确定散射比例因子。 该方法还包括定位准直器,使得第一检测器环从目标产生的主要x射线的路径中被遮挡。 该方法还包括执行低曝光扫描以使用第一检测器环和第二检测器环来获得x射线散射数据,并将散射比例因子应用于散射数据以产生缩放的散射数据。 该方法还包括使用第一检测器环和/或所述第二检测器环获取图像数据,并使用缩放的散射数据调整图像数据。

    Method and system for estimating meteorological quantities
    4.
    发明授权
    Method and system for estimating meteorological quantities 失效
    估算气象量的方法和系统

    公开(公告)号:US06778929B2

    公开(公告)日:2004-08-17

    申请号:US10441094

    申请日:2003-05-20

    申请人: Masashi Egi

    发明人: Masashi Egi

    IPC分类号: G01D1800

    CPC分类号: G01W1/10 G01W1/00 G06Q40/00

    摘要: Estimation method for obtaining estimation results of meteorological quantities in a specified area during a specified future period, including steps of: provisionally creating a meteorological time-series model from historical data of the meteorological quantities observed in the specified area; adjusting parameters of the created time-series model on the basis of long-range weather forecast data for wider area, which contains future meteorological tendency relative to normal years, to adjust the created time-series model; and conducting simulation using the adjusted time-series model to obtain the estimation results.

    摘要翻译: 在指定的未来期间获取特定地区气象数量估算结果的估算方法,包括以下步骤:从指定区域观测到的气象数据的历史数据暂时创建气象时间序列模型; 根据较大面积的长距离天气预报数据调整创建的时间序列模型参数,其中包含未来相对于正常年份的气象趋势,调整创建的时间序列模型; 并使用调整后的时间序列模型进行模拟,得到估计结果。

    Test apparatus
    5.
    发明授权
    Test apparatus 有权
    测试仪器

    公开(公告)号:US06697755B2

    公开(公告)日:2004-02-24

    申请号:US10159146

    申请日:2002-05-31

    IPC分类号: G01D1800

    CPC分类号: G01R31/3193

    摘要: In an odd side storage circuit, logical values of a decision subject signal HCMP are stored in first and second FFs respectively at decision edges LH and HL generated from odd-numbered edges of a decision edge EH. Logical values of a delayed decision subject signal HCMP′ are stored in third and fourth FFs. According to a selection signal generated by a selection signal generation circuit based on outputs of the third and fourth FFs, a first selector selects an output of the first or second FF. An even side storage circuit operates similarly at even-numbered edges. A second selector selects the odd and even side storage circuits alternately. The FFs in the odd and even side storage circuits are reset by a decision edge LH′ of the even side and the decision edge HL of the odd side, respectively.

    摘要翻译: 在奇数侧存储电路中,决策对象信号HCMP的逻辑值分别存储在从判定边缘EH的奇数边缘产生的判定边缘LH和HL处的第一和第二FF中。 延迟决定对象信号HCMP'的逻辑值存储在第三和第四FF中。 根据由选择信号发生电路基于第三和第四FF的输出产生的选择信号,第一选择器选择第一或第二FF的输出。 偶数侧存储电路在偶数边缘类似地工作。 第二选择器交替地选择奇数和偶数侧存储电路。 奇数侧和偶数侧存储电路中的FF分别由奇数侧的判定边缘LH'和奇数侧的判定边缘HL复位。

    Semiconductor calibration wafer with no charge effect
    6.
    发明授权
    Semiconductor calibration wafer with no charge effect 有权
    半导体校准晶片无电荷效应

    公开(公告)号:US06680474B2

    公开(公告)日:2004-01-20

    申请号:US10046806

    申请日:2002-01-14

    IPC分类号: G01D1800

    摘要: A semiconductor calibration wafer that has no charge effect is disclosed. The calibration wafer has a substrate layer and a conductive metal layer. The conductive metal layer completely covers the substrate layer, and has a critical dimension (CD) bar corresponding to a desired CD. The substrate layer may be an oxide layer or another type of substrate layer, whereas the conductive metal layer may be an aluminum layer, a copper layer, or another type of conductive metal layer. Where the calibration wafer is used in conjunction with a scanning electron microscope (SEM) to monitor the CD, the electrons ejected by the SEM do not remain on the semiconductor calibration wafer, but instead are carried away via the conductive metal layer. The calibration wafer is thus not vulnerable to the charge effect.

    摘要翻译: 公开了一种不具有电荷效应的半导体校准晶片。 校准晶片具有基底层和导电金属层。 导电金属层完全覆盖基底层,并且具有对应于所需CD的临界尺寸(CD)条。 衬底层可以是氧化物层或另一种类型的衬底层,而导电金属层可以是铝层,铜层或另一种类型的导电金属层。 在校准晶片与扫描电子显微镜(SEM)结合使用以监测CD的情况下,通过SEM喷射的电子不会保留在半导体校准晶片上,而是通过导电金属层被带走。 因此,校准晶片不容易受到电荷效应的影响。

    X-ray detector monitoring
    7.
    发明授权
    X-ray detector monitoring 有权
    X射线探测器监测

    公开(公告)号:US06663281B2

    公开(公告)日:2003-12-16

    申请号:US09682591

    申请日:2001-09-25

    IPC分类号: G01D1800

    摘要: An x-ray system (14) including a source of x-rays (15) and a detector (22) monitors the detector with a control (36) that calibrates the detector during a calibration phase of operation and powers the detector during use phases of operation occurring at different times. A processor (28, 36) reads the data created by the pixel elements, analyzes the data and identifies pixel elements corresponding to data indicating defective pixel elements during the calibration phase of operation and during a predetermined portion of a plurality of the use phases of operation.

    摘要翻译: 包括X射线源(15)和检测器(22)的X射线系统(14)利用控制器(36)对检测器进行监视,该控制器在校准操作阶段期间对检测器进行校准,并在使用阶段为检测器供电 的操作发生在不同的时间。 处理器(28,36)读取由像素元素创建的数据,分析数据并且在操作的校准阶段期间和在多个使用操作阶段的预定部分期间识别与指示缺陷像素元素的数据相对应的像素元素 。

    System for detecting a sensor error

    公开(公告)号:US06662129B2

    公开(公告)日:2003-12-09

    申请号:US10163580

    申请日:2002-06-07

    IPC分类号: G01D1800

    CPC分类号: G01D3/08

    摘要: If a difference between a value evaluated by prorating a sum of an average value of a signal outputted from a signal processing portion within a second predetermined time before a start of a pseudo drive and an average value of the signal outputted from the signal processing portion within a third predetermined time after an end of the pseudo drive, and an average value of the signal outputted from the signal processing portion within a first predetermined time from the start to the end of the pseudo drive does not fall within a predetermine value, the sensor error is determined.

    Systems and methods for calibrating integrated inspection tools

    公开(公告)号:US06654698B2

    公开(公告)日:2003-11-25

    申请号:US09881316

    申请日:2001-06-12

    申请人: Jaim Nulman

    发明人: Jaim Nulman

    IPC分类号: G01D1800

    CPC分类号: H01L21/67276

    摘要: Systems, methods and computer program products are provided for calibrating integrated the inspection tools of one or more processing tools. In a first aspect, a system is provided that includes (1) a processing tool adapted to process substrates; (2) an integrated inspection tool coupled to the processing tool; and (3) a controller adapted to communicate with the integrated inspection tool. The controller includes computer program code adapted to receive a first result generated by inspecting a production substrate with a stand-alone inspection tool, and to receive a second result generated by inspecting the production substrate with the integrated inspection tool. The computer controller further includes computer program code adapted to calibrate the integrated inspection tool based on the first and second results. Numerous other systems are provided, as are methods and computer program products.