公开(公告)号：US20040043690A1

公开(公告)日：2004-03-04

申请号：US10603354

申请日：2003-06-25

Applicant: OSRAM SYLVANIA INC.

Inventor： Gregory Zaslavsky ,  Richard Speer ,  Philip E. Moskowitz ,  Joseph V. Lima ,  Louise D. Cleary

IPC: H01J009/395

CPC classification number: H01J65/048

Abstract: Method for introducing a limited amount of mercury into a fluorescent lamp during manufacture thereof includes the steps of forming the lamp with an exhaust tubulation therein open at an end thereof, exhausting the interior of the lamp through the exhaust tubulation, placing a body of metal material not reactive with mercury in the exhaust tubulation open end, the body having a coating of metal which amalgams with mercury, over a selected surface area of the body, and having mercury on the coated area of the body, such that a limited amount of the mercury is retained by the metal coating, and sealing the open end of the exhaust tubulation, whereby the amount of mercury retained on the body and introduced into the lamp is limited by the surface area of the metal coating on the body.

Abstract translation: 在制造期间将有限数量的汞引入荧光灯的方法包括以下步骤：在其末端形成具有排气管的开口的步骤，通过排气管排出灯的内部，放置金属材料体 在排气开口端不与汞反应，身体具有在汞的选定表面区域上与水银汞合金的涂层，并且在身体的涂覆区域上具有汞，使得有限量的 汞被金属涂层保持，并且密封排气管的开口端，由此保留在主体上并被引入到灯中的汞的量受到身体上的金属涂层的表面积的限制。

公开(公告)号：US20020193034A1

公开(公告)日：2002-12-19

申请号：US10152827

申请日：2002-05-23

Inventor： Jiro Ota

IPC: H01J009/395 ,  H01J009/38 ,  H01L021/00

CPC classification number: C23C16/463 ,  C23C16/4401 ,  C23C16/54 ,  H01J9/025

Abstract: To attain an increase in production speed and suitable for mass production in a substrate processing operation such as film formation requiring a hermetic atmosphere. A substrate processing method for performing a predetermined processing on a substrate is provided, which includes the steps of: arranging a surface of the substrate to be processed in a hermetic atmosphere; evacuating said hermetic atmosphere; and performing a predetermined processing on the substrate, in which the processing step is conducted after moving the evacuated hermetic atmosphere from the station for evacuation to a ifferent station.

Abstract translation: 为了获得生产速度的提高并且适合于在需要密封气氛的成膜等基板加工操作中适合批量生产。 提供了一种用于在基板上执行预定处理的基板处理方法，其包括以下步骤：在密封气氛中布置待处理的基板的表面; 疏散所述气密的气氛; 对基板进行预定的处理，其中在将撤离的密闭气氛从撤离站撤回到不同的站之后进行处理步骤。