公开(公告)号：US06548811B1

公开(公告)日：2003-04-15

申请号：US09504044

申请日：2000-02-14

申请人： Kuniyasu Nakamura ,  Hiroshi Kakibayashi

发明人： Kuniyasu Nakamura ,  Hiroshi Kakibayashi

IPC分类号： H01J3704

CPC分类号： H01J37/26 ,  H01J37/295 ,  H01J2237/1506

摘要： In order to detect automatically at a high speed and a high probability rate the crystal defects and shape abnormalities in a specimen over a wide area of said specimen, a transmission electron microscope apparatus is employed which has an electron source, a first electrostatic lens, a second electrostatic lens, a third electrostatic lens, a first condenser lens, a second condenser lens, a pre-field objective lens, a deflection coil, a first projection lens, a second projection lens, a third projection lens, a first image shift coil, a second image shift coil, and an image acquisition apparatus, etc. The detection of crystal defects is made definite by observing the specimen image at the same location by multiple variations of the electron beam incidence direction using the deflection coil. In addition, the crystal defects are detected at a high speed by linking the deflection ratios of the deflection coil and of the first image shift coil and the second image shift coil, and carrying out compensation so that image shifts on the image acquisition apparatus due to the multiple electron beam incidence directions are mutually cancelled.

摘要翻译： 为了在所述样本的广泛区域上以高速度和高概率率自动检测样品中的晶体缺陷和形状异常，使用透射型电子显微镜装置，其具有电子源，第一静电透镜， 第二静电透镜，第三静电透镜，第一聚光透镜，第二聚光透镜，预场物镜，偏转线圈，第一投影透镜，第二投影透镜，第三投影透镜，第一图像移动线圈 ，第二图像移位线圈和图像采集装置等。通过使用偏转线圈通过电子束入射方向的多个变化在相同位置观察样本图像来确定晶体缺陷的检测。 此外，通过连接偏转线圈和第一图像移位线圈与第二图像移位线圈的偏转比，高速检测晶体缺陷，并执行补偿，使得图像在图像采集装置上的偏移由于 多个电子束入射方向相互抵消。

公开(公告)号：US06822233B2

公开(公告)日：2004-11-23

申请号：US10346138

申请日：2003-01-17

申请人： Kuniyasu Nakamura ,  Hiroshi Kakibayashi ,  Mikio Ichihashi ,  Shigeto Isakozawa ,  Yuji Sato ,  Takahito Hashimoto

发明人： Kuniyasu Nakamura ,  Hiroshi Kakibayashi ,  Mikio Ichihashi ,  Shigeto Isakozawa ,  Yuji Sato ,  Takahito Hashimoto

IPC分类号： H01J3704

CPC分类号： H01J37/1471 ,  H01J37/28 ,  H01J2237/2802

摘要： A scanning transmission electron microscope (STEM) has an electron source for generating a primary electron beam and an electron illuminating lens system for converging the primary electron beam from the electron source onto a specimen for illumination. An electron deflecting system is provided for scanning the specimen with the primary electron beam. The STEM also has a scattered electron detector for detecting scattered electrons transmitted through the specimen. A projection lens system projects the scattered electrons onto a detection surface of the scattered electron detector. An image displaying device displays the scanning transmission electron microscope image of the specimen using a detection signal from the scattered electron detector. A detection angle changing device for establishes the range of the scattering angle of the scattered electrons detected by the scattered electron detector. This structure enhances the contrast of a desired portion of the specimen under observation for a scanning transmitted image by selective establishment of detection angle ranges for the scattered electron detector.

摘要翻译： 扫描透射电子显微镜（STEM）具有用于产生一次电子束的电子源和用于将来自电子源的一次电子束聚焦到用于照明的样本上的电子照明透镜系统。 提供电子偏转系统用于用一次电子束扫描样本。 STEM还具有散射电子检测器，用于检测通过样品传播的散射电子。 投影透镜系统将散射的电子投射到散射电子检测器的检测表面上。 图像显示装置使用来自散射电子检测器的检测信号来显示样本的扫描透射电子显微镜图像。 一种用于确定由散射电子检测器检测的散射电子的散射角的范围的检测角度改变装置。 该结构通过选择性地建立散射电子检测器的检测角度范围，增强了扫描透射图像观察下的样本的期望部分的对比度。

公开(公告)号：US06576914B2

公开(公告)日：2003-06-10

申请号：US09364840

申请日：1999-07-30

申请人： Timothy A. Brunner

发明人： Timothy A. Brunner

IPC分类号： H01J3704

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31794

摘要： A stencil-scattering mask for e-beam lithography includes four complementary sub-field reticles, each of which is exposed with one fourth of the total dose. “Doughnut” stencil shapes have four different patterns of struts, so that an area that is blocked by a strut in one shape is exposed in three other shapes.

摘要翻译： 用于电子束光刻的模板散射掩模包括四个互补子场标线，其中每个掩模版以总剂量的四分之一暴露。 “甜甜圈”模板形状具有四种不同的支柱图案，使得由一个形状的支柱阻挡的区域以三种其他形状暴露。

公开(公告)号：US06552353B1

公开(公告)日：2003-04-22

申请号：US09217941

申请日：1998-12-22

申请人： Masato Muraki

发明人： Masato Muraki

IPC分类号： H01J3704

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31764 ,  H01J2237/31774

摘要： A method of simultaneously drawing patterns in a plurality of areas on a surface to be exposed by using a plurality of electron beams is characterized in that drawing patterns are classified into a plurality of groups on the basis of the design rules, and patterns are drawn while the minimum deflection width is changed in units of groups. Pattern groups are sequentially drawn area by area. The diameter of each electron beam or the settling time therefor is changed in accordance with switching of the minimum deflection width.

摘要翻译： 通过使用多个电子束在要暴露的表面上的多个区域中同时绘制图案的方法的特征在于，基于设计规则将绘制图案分为多个组，并且绘制图案，同时 最小偏移宽度以组为单位改变。 按区域顺序绘制图案组。 每个电子束的直径或其稳定时间根据最小偏转宽度的切换而改变。