公开(公告)号：US06787780B2

公开(公告)日：2004-09-07

申请号：US09824880

申请日：2001-04-04

申请人： Shinichi Hamaguchi ,  Takeshi Haraguchi ,  Hiroshi Yasuda

发明人： Shinichi Hamaguchi ,  Takeshi Haraguchi ,  Hiroshi Yasuda

IPC分类号： H01J3712

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/0635 ,  H01J2237/1205

摘要： An electron beam exposure apparatus for exposing a wafer includes: a multi-axis electron lens operable to converge a plurality of electron beams independently of each other; and a lens-intensity adjuster including a substrate provided to be substantially parallel to the multi-axis electron lens, and a lens-intensity adjusting unit operable to adjust the lens intensity of the multi-axis electron lens applied to the electron beams passing through the lens openings, respectively.

摘要翻译： 用于曝光晶片的电子束曝光装置包括：可操作以彼此独立地会聚多个电子束的多轴电子透镜; 以及透镜强度调节器，其包括设置为基本上平行于所述多轴电子透镜的基板，以及透镜强度调节单元，其可操作以调节施加到通过所述多轴电子透镜的电子束的多轴电子透镜的透镜强度 镜头开口。

公开(公告)号：US06797951B1

公开(公告)日：2004-09-28

申请号：US10291455

申请日：2002-11-12

申请人： Carl L. Enloe

发明人： Carl L. Enloe

IPC分类号： H01J3712

CPC分类号： H01J49/44 ,  H01J2237/24485

摘要： A charged particle analyzer electrode assembly of miniaturized physical size and photolithographic process element fabrication capability. The provided electrode assembly is made of conductive materials including semiconductor materials and metal materials. Individual electrodes in the assembly are made of for example plural layers of semiconductor or metal held in place by discrete insulator layers. Bandpass particle energy selection characteristics are achieved in the analyzer through a combination of analyzer particle path geometry configuration and the particle acceleration electrical potential selection. Selected particles are allowed to pass through the analyzer under these influences and non selected particles are excluded. Assembly of individual analyzer electrode assemblies into a multiple element analyzer array usable for example on an aircraft or spacecraft is included. Both millimeter sized and micrometer sized arrangements of the invention are contemplated.

摘要翻译： 一种小型物理尺寸和光刻工艺元件制造能力的带电粒子分析仪电极组件。 所提供的电极组件由包括半导体材料和金属材料的导电材料制成。 组件中的单个电极由例如由分立的绝缘体层保持就位的多层半导体或金属制成。 通过分析器粒子路径几何结构和粒子加速电位选择的组合，在分析仪中实现带通粒子能量选择特性。 在这些影响下允许选定的颗粒通过分析仪，并排除未选择的颗粒。 包括将各个分析器电极组件组装成可用于例如在飞机或航天器上的多元分析器阵列。 考虑了本发明的毫米尺寸和千分尺尺寸的布置。

公开(公告)号：US06630677B1

公开(公告)日：2003-10-07

申请号：US09943570

申请日：2001-08-29

申请人： Zhiyong Zhao ,  David Hendrix

发明人： Zhiyong Zhao ,  David Hendrix

IPC分类号： H01J3712

CPC分类号： H01J37/12 ,  H01J37/3171

摘要： An electrostatic lens with glassy graphite electrodes for use in an ion implanter is disclosed. The graphite electrodes have been manufactured to be substantially smooth (glassy) such that irregularities on the surface grain of the graphite, for example peaks or apexes, are no longer present. In an embodiment, employing polished graphite electrostatic lens electrodes does not require the time-consuming conditioning operations under vacuum that are typically needed with conventional graphite electrodes, and thus offers the advantage of increased uptime for an ion implantation system. In addition, because surface irregularities are not present to serve as discharge points for electrostatic buildup, the use of glassy graphite electrodes as disclosed offers the advantage of electrostatic discharge reduction. Reduction of electrostatic discharge results in decreased particulate contamination from discharge events, as well as lessening of the probability of irreparable physical damage to implantation target material.

摘要翻译： 公开了一种用于离子注入机的具有玻璃状石墨电极的静电透镜。 石墨电极已被制造成基本上光滑（玻璃状），使得不再存在石墨表面晶粒上的凹凸，例如峰或顶点。 在一个实施例中，使用抛光的石墨静电透镜电极不需要在常规石墨电极通常需要的真空下的耗时的调节操作，因此提供了离子注入系统的正常运行时间增加的优点。 此外，由于不存在表面不规则性以用作静电积聚的放电点，因此所公开的玻璃状石墨电极的使用提供了静电放电还原的优点。 静电放电的减少导致放电事件引起的颗粒污染减少，以及降低对植入靶材料的不可挽回的物理损伤的可能性。

公开(公告)号：US06566658B1

公开(公告)日：2003-05-20

申请号：US09689782

申请日：2000-10-13

申请人： Yukiharu Okubo

发明人： Yukiharu Okubo

IPC分类号： H01J3712

CPC分类号： H01J37/1477

摘要： An object is to provide a charged particle beam control element that enables connection of voltage-applying wires with electrodes in simple structure while maintaining high accuracy of surfaces of the electrodes formed on an insulator by a surface treatment of plating or the like. A charged particle beam control element 10 according to the present invention is provided with a cylindrical base 11 having electrode portions 21 formed on an internal surface thereof, and insulating portions 15 which are disposed at locations not exposed to a passing area of a charged particle beam surrounded by the internal surface and which separate the electrode portions 21 from each other.

摘要翻译： 目的是提供一种带电粒子束控制元件，其能够以简单的结构连接施加电压的电极与电极，同时通过电镀等的表面处理保持在绝缘体上形成的电极的表面的高精度。 根据本发明的带电粒子束控制元件10设置有具有形成在其内表面上的电极部分21的圆柱形基座11和设置在不暴露于带电粒子束的通过区域的位置处的绝缘部分15 被内表面包围，并使电极部分21彼此分开。

公开(公告)号：US06448556B1

公开(公告)日：2002-09-10

申请号：US09645999

申请日：1999-06-14

申请人： John M. Cowley ,  John C. H. Spence ,  Valery V. Smirnov

发明人： John M. Cowley ,  John C. H. Spence ,  Valery V. Smirnov

IPC分类号： H01J3712

CPC分类号： H01J37/28 ,  H01J37/12

摘要： In electron microscopy, resolution is improved by using an atom or atom-array focuser, with the atom or atom array serving as an electrostatic lens at a focal plane of an electron beam probe having a beam size less than about 0.2 nm at the focal plane. An electrostatic lens can be included in ultra-high resolution microscopes wherein (i) in a linear atom array, the atoms are in alignment with the electron path, (ii) the distance between a sample and the electrostatic lens is adjustable, (iii) a two-dimensional focuser is used, (iv) a sample is at Fourier image distance from a two-dimensionally periodic focuser, (v) a two-dimensional detector or detector array is used, and/or (vi) the electron beam is scanned at the focal plane.

摘要翻译： 在电子显微镜中，通过使用原子或原子阵列聚焦器来提高分辨率，其中原子或原子阵列在焦平面处具有小于约0.2nm的光束尺寸的电子束探针的焦平面处用作静电透镜 。 静电透镜可以包括在超高分辨率显微镜中，其中（i）在线性原子阵列中，原子与电子路径对准，（ii）样品和静电透镜之间的距离是可调节的，（iii） 使用二维聚焦器，（iv）样品与二维周期性聚焦器的傅里叶图像距离，（v）使用二维检测器或检测器阵列，和/或（vi）电子束为 在焦平面扫描。

公开(公告)号：US06194730B1

公开(公告)日：2001-02-27

申请号：US09186865

申请日：1998-11-05

申请人： Alfred Chalupka ,  Gerhard Stengl

发明人： Alfred Chalupka ,  Gerhard Stengl

IPC分类号： H01J3712

CPC分类号： H01J37/12 ,  H01J2237/153 ,  H01J2237/31755

摘要： Electrostatic lens for focussing the beams of charged particles, more particularly of ions, which have electrodes being designed as an electric conductor with a ring-shaped section, the inner edge of which is essentially circular, whereas at least one of the electrodes is composed of sector areas (4) succeeding one another along the periphery of an electrode, whereas each sector area is covering one predetermined angle area of the periphery, the sector areas are electrically connected to one another and the sector areas are linked to the holding device via at least one adjusting element per sector area the position of the sector areas may be adjusted irrespective of the other sector areas by means of the adjusting elements during operation of the electrostatic lens. The sector areas may be mechanically separated or extend from one thickness minimum of an electrode cross-section with periodically varying thickness to the next one.

摘要翻译： 用于聚焦带电粒子束，更特别是离子的静电透镜，其具有设计成具有环形截面的电导体的电极，其内边缘基本上是圆形的，而至少一个电极由 扇形区域（4）沿着电极的周边彼此相继，其中扇区区域覆盖周边的一个预定角度区域，扇区区域彼此电连接，并且扇区区域经由至少一个连接到保持装置 可以在静电透镜的操作期间通过调节元件调节扇区区域的调整元件的位置，而不考虑其它扇区面积。扇区区域可以机械地分离或从电极交叉的一个最小厚度延伸， 具有周期性变化的厚度到下一个。