公开(公告)号：US06693282B1

公开(公告)日：2004-02-17

申请号：US09596217

申请日：2000-06-19

Applicant: Peter Christiaan Tiemeijer

Inventor： Peter Christiaan Tiemeijer

IPC: H01J3773

CPC classification number: H01J37/063 ,  H01J2237/28

Abstract: An electron source for, for example, an electron microscope cannot exhibit a high brightness and a large beam current at the same time, because the virtual emitter dimension is enlarged by Coulomb repulsion in the electron beam in the case of a large beam current, thus reducing the brightness. In a conventional electron source switching-over could take place from a high brightness to a large beam current by varying the dimension of a beam-limiting diaphragm; however, this is objectionable because the location of such a diaphragm is not readily accessible. In accordance with the invention said switching-over can take place by arranging two lenses 26, 28 in the source, which lenses parallelize In the described circumstances the beam either directly behind the emitter 4 (large current) or directly in front of the diaphragm aperture 32 (high brightness).

Abstract translation: 因为例如电子显微镜的电子源不能同时呈现高亮度和大的电子束电流，因为在大束流电流的情况下，通过电子束中的库仑排斥使虚拟发射极尺寸增大，因此 降低亮度。 在传统的电子源中，通过改变光束限制膜的尺寸，可以从高亮度到大的光束电流进行切换; 然而，这是令人反感的，因为这种隔膜的位置不容易接近。 根据本发明，可以通过在源中布置两个透镜26,28来实现切换，这些透镜是并行的。在所述的情况下，光束直接位于发射器4的后面（大电流）或者直接在光阑孔的前面 32（高亮度）。

公开(公告)号：US06812461B1

公开(公告)日：2004-11-02

申请号：US10290014

申请日：2002-11-07

Applicant: David L. Adler ,  Marian Mankos

Inventor： David L. Adler ,  Marian Mankos

IPC: H01J3773

CPC classification number: H01J37/29 ,  G01N23/203 ,  H01J1/34 ,  H01J3/021 ,  H01J37/073 ,  H01J37/244 ,  H01J2237/06316 ,  H01J2237/2817

Abstract: One embodiment disclosed is an electron beam apparatus for examination of a specimen. The apparatus includes a photocathode source, an objective lens, a beam separator, and a projection lens. The photocathode source generates a primary electron beam with reduced energy spread. The low energy spread beam is focused onto the specimen by the objective lens. The beam separator separates a scattered electron beam from the primary electron beam, and the projection lens images the scattered electron beam. Software routines may analyze the image data for purposes of automated inspection or review.

Abstract translation: 公开的一个实施例是用于检查样本的电子束装置。 该装置包括光电阴极源，物镜，光束分离器和投影透镜。 光电阴极源产生具有降低的能量传播的一次电子束。 低能量扩散光束通过物镜聚焦在样品上。 光束分离器将分散的电子束与一次电子束分离，并且投影透镜对散射的电子束进行成像。 软件程序可以分析图像数据，以便进行自动检查或检查。

公开(公告)号：US06771012B2

公开(公告)日：2004-08-03

申请号：US09802975

申请日：2001-03-12

Applicant: Haroon Ahmed ,  David Hasko ,  Alex Driskill-Smith ,  David Arfon Williams

Inventor： Haroon Ahmed ,  David Hasko ,  Alex Driskill-Smith ,  David Arfon Williams

IPC: H01J3773

CPC classification number: B82Y15/00 ,  H01J37/073 ,  H01J2237/3175

Abstract: Apparatus for producing a flux of charge carriers that may be used in many applications including imaging and lithography comprises an electron source which includes an emitter with a tip radius of about one nanometer and a closely configured extractor, together with a specimen for receiving an electron beam from the source. The apparatus may operate in air under atmospheric conditions and at a much reduced operating voltage.

Abstract translation: 用于生产可用于包括成像和光刻在内的许多应用中的电荷载流子的装置包括电子源，其包括尖端半径约一纳米的发射极和紧密配置的提取器，以及用于接收电子束的样本 从源头。 该装置可在大气条件下和大大降低的工作电压下在空气中运行。