公开(公告)号：WO02082185B1

公开(公告)日：2002-12-27

申请号：PCT/US0210800

申请日：2002-04-05

Applicant: ARCH SPEC CHEM INC

Inventor： FERREIRA LAWRENCE ,  BLAKENEY ANDREW J ,  SPAZIANO GREGORY DOMINIC ,  DIMOV OGNIAN ,  KOCAB THOMAS J ,  HATFIELD JOHN P

IPC: C07C309/10 ,  C07C321/28 ,  C07C323/20 ,  C07C381/12 ,  C07D207/40 ,  C07D209/94 ,  C07D333/46 ,  G03F7/004 ,  G03F7/039 ,  C07C303/00 ,  C07C309/01 ,  C07C309/02 ,  C07C309/06 ,  C07C309/63

CPC classification number: C07C381/12 ,  C07C309/10 ,  G03F7/0045 ,  G03F7/0395 ,  Y10S430/114 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/123

Abstract: A photoacid compound having general structure: R-O(CF2)nSO3X wherein n is an integer between about 1 to 4; R is selected from the group consisting of: substituted or unsubstituted C1-C12 linear or branched alkyl or alkenyl, substituted or unsubstituted araalkyl, substituted or unsubstituted aryl, substituted or unsubstituted bicycloalkyl, substituted or unsubstituted tricycloalkyl, hydrogen, alkyl sulfonic acid, substituted or unsubstituted perfluoroalkyl, the general structure F((CF2)pO)m(CF2)q- wherein p is between about 1 to 4, m is between about 0 to 3 and q is between about 1 to 4, and substituted or unsubstituted partially fluorinated alkyl, halofluoroalkyl, perfluoroalkylsulfonic, or glycidyl; and X is selected from the group consisting of: organic cations and covalently bonded organic radicals.

Abstract translation: 具有通式结构的光酸化合物：R-O（CF 2）n SO 3 X其中n是约1至4的整数; R选自取代或未取代的C 1 -C 12直链或支链烷基或链烯基，取代或未取代的芳烷基，取代或未取代的芳基，取代或未取代的双环烷基，取代或未取代的三环烷基，氢，烷基磺酸， 未取代的全氟烷基，通式结构F（（CF 2）p O）m（CF 2）q - ，其中p为约1至4，m为约0至3且q为约1至4，并且取代或未取代的部分氟化 烷基，卤代氟烷基，全氟烷基磺酸或缩水甘油基; X选自有机阳离子和共价键合的有机基团。

公开(公告)号：WO02073307A3

公开(公告)日：2002-11-21

申请号：PCT/US0207136

申请日：2002-03-07

Applicant: ARCH SPEC CHEM INC

Inventor： BINOD B DE ,  MALIK SANJAY ,  SPAZIANO GREGORY DOMINIC ,  BIAFORE JOHN JOSEPH ,  FOSTER PATRICK ,  SLATER SIDNEY GEORGE ,  STEINHAUSLER THOMAS ,  BLAKENEY ANDREW J

IPC: G03F7/11 ,  C08F220/10 ,  G03F7/09 ,  H01L21/027 ,  C08F8/32 ,  B32B27/06 ,  C08F36/20 ,  C08F236/20 ,  C08L45/00 ,  G03C1/93

CPC classification number: G03F7/094 ,  G03F7/091

Abstract: Thermally cured undercoat for use in lithography of a thermally cured composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator, wherein the hydroxyl containing polymer is a polymer comprising units m, n and o of the formula (I) wherein R is H or methyl; R is a substituted or unsubstituted C6-C14 aryl acrylate or C6-C14 aryl methacrylate group wherein the substituted groups may be phenyl, Cl-4 alkyl or C1-4 alkoxy; R is a hydroxyl functionalized Cl-C8 alkyl acrylate, methacrylate or C6-C14 aryl group, R is a C1-C10 linear or branched alkylene; p is an integer of from 1 to 5 with the proviso that there are no more than thirty carbon atoms in the [-R O-]p ; R is a Cl-C10 linear, branched or cyclic alkyl, substituted or unsubstituted C6-Cl4 aryl, or substituted or unsubstituted C7-Cl5 alicyclic hydrocarbon; and m is about 40 to 70, n is about 15 to 35 and o is about 15 to 25.

Abstract translation: 用于平版印刷的热固化的底涂层，所述热固化的组合物包含含羟基的聚合物，氨基交联剂和热酸产生剂，其中所述含羟基的聚合物是包含式（m）的单元m，n和o的聚合物 I）其中R 1是H或甲基; R 2是取代或未取代的C 6 -C 14芳基丙烯酸酯或C 6 -C 14芳基甲基丙烯酸酯基团，其中取代基团可以是苯基，C 1-4烷基或C 1-4烷氧基; R 3是羟基官能化的C 1 -C 8烷基丙烯酸酯，甲基丙烯酸酯或C 6 -C 14芳基，R 4是C 1 -C 10直链或支链亚烷基; p为1至5的整数，条件是[-R 4 O-] p中不超过30个碳原子; R 5为C 1 -C 10直链，支链或环状烷基，取代或未取代的C 6 -C 14芳基或取代或未取代的C 7 -C 15脂环烃; m约为40-70，n约为15-35，o约为15-25。