公开(公告)号：WO2020007588A1

公开(公告)日：2020-01-09

申请号：PCT/EP2019/065592

申请日：2019-06-13

Applicant: ASML NETHERLANDS B.V.

Inventor： HUISMAN, Simon, Reinald ,  POLO, Alessandro

IPC: G03F9/00 ,  G03F7/20 ,  G01J9/00

Abstract: A sensor apparatus (300) for determining a position of a target (330) of a substrate (W) comprising, projection optics (315;321) configured to project a radiation beam (310) onto the substrate, collection optics (321) configured to collect measurement radiation (325) that has scattered from the target, a wavefront sensing system (335) configured to determine a pupil function variation of at least a portion (355) of the measurement radiation and output a signal (340) indicative thereof, and a measurement system (350) configured to receive the signal and to determine the position of the target in at least partial dependence on the collected measurement radiation and the determined pupil function variation of at least a portion of the measurement radiation.

公开(公告)号：WO2019243009A1

公开(公告)日：2019-12-26

申请号：PCT/EP2019/063895

申请日：2019-05-29

Applicant: ASML NETHERLANDS B.V.

Inventor： NASALEVICH, Maxim, Aleksandrovich ,  KLEIN, Alexander, Ludwig ,  KURGANOVA, Evgenia ,  NOTENBOOM, Arnoud, Willem ,  VAN ZWOL, Pieter-Jan ,  VLES, David, Ferdinand

IPC: G03F1/62 ,  G03F1/22 ,  G03F7/20

Abstract: A pellicle comprising a core comprising a material other than silicon carbide, a silicon carbide adhesion layer, and a ruthenium capping layer, the ruthenium capping layer being in contact with the silicon carbide adhesion layer. Also described is a method of preparing a pellicle comprising the steps of: (i) providing a pellicle core; (ii) providing a silicon carbide adhesion layer on the pellicle core; and (iii) providing a ruthenium capping layer in contact with the silicon carbide adhesion layer. Also provided is the use of silicon carbide as an adhesion layer in an EUV pellicle as well as an assembly.

公开(公告)号：WO2019233991A1

公开(公告)日：2019-12-12

申请号：PCT/EP2019/064445

申请日：2019-06-04

Applicant: ASML NETHERLANDS B.V.

Inventor： WANG, Yongxin ,  DONG, Zhonghua ,  LAI, Rui-Ling ,  KANAI, Kenichi

IPC: H01J37/244

Abstract: A detector may be provided with an array of sensing elements. The detector may include a semiconductor substrate including the array, and a circuit configured to count a number of charged particles incident on the detector. The circuit of the detector may be configured to process outputs from the plurality of sensing elements and increment a counter in response to a charged particle arrival event on a sensing element of the array. Various counting modes may be used. Counting may be based on energy ranges. Numbers of charged particles may be counted at a certain energy range and an overflow flag may be set when overflow is encountered in a sensing element. The circuit may be configured to determine a time stamp of respective charged particle arrival events occurring at each sensing element. Size of the sensing element may be determined based on criteria for enabling charged particle counting.

公开(公告)号：WO2019228922A1

公开(公告)日：2019-12-05

申请号：PCT/EP2019/063460

申请日：2019-05-24

Applicant: ASML NETHERLANDS B.V.

Inventor： SMAKMAN, Erwin, Paul ,  MANGNUS, Albertus, Victor, Gerardus ,  GOOSEN, Maikel, Robert

IPC: H01J37/317 ,  H01J37/28 ,  H01J37/12 ,  H01J37/147 ,  H01J37/073

Abstract: An electron beam apparatus is described, the apparatus comprising: - an electron beam source configured to generate an electron beam; - a beam conversion unit comprising: - an aperture array configured to generate a plurality of beamlets from the electron beam; - a deflector unit configured to deflect one or more groups of the plurality of beamlets; - a projection system configured to project the plurality of beamlets onto an object, wherein the deflector unit is configured to deflect the one or more groups of the plurality of beamlets to impinge on the object at different angles of incidence, each beamlet in a group having substantially the same angle of incidence on the object.

公开(公告)号：WO2019228710A1

公开(公告)日：2019-12-05

申请号：PCT/EP2019/060224

申请日：2019-04-19

Applicant: ASML NETHERLANDS B.V.

Inventor： MERKX, Maarten, Anton, Gertruda ,  GOOSSENS, Andrew, Petrus, Fransiscus, Arnoldus, Maria ,  VAN DER GRAAF, Sandra ,  VAN DER WIEL, Daan, Willem, Jan

IPC: G03F7/20 ,  G02B27/00

Abstract: A gas flow control system for providing oxygen (O 2 ) to an EUV lithographic apparatus, the gas flow control system comprising: a first inlet configured to be connected to a first gas source, the first gas comprising oxygen (O 2 ) gas; a second inlet configured to be connected to a second gas source, the second gas not containing any (O 2 ) gas; the gas flow control system being configured to mix the first and second gas to obtain a mixed gas comprising diluted oxygen (O 2 ) gas; the gas flow control system further comprising: a first outlet configured to output a first amount of the mixed gas to an interior of the EUV lithographic apparatus and a second outlet configured to output a second amount of the mixed gas to a dump, exterior to the EUV lithographic apparatus.

公开(公告)号：WO2019223976A1

公开(公告)日：2019-11-28

申请号：PCT/EP2019/061174

申请日：2019-05-02

Applicant: ASML NETHERLANDS B.V.

Inventor： WANG, Jia ,  KLINKHAMER, Jacob, Fredrik, Friso ,  LI, Hua

IPC: G03F9/00

Abstract: Disclosed is a bandwidth calculation system for determining a desired wavelength bandwidth for a measurement beam in a mark detection system, the bandwidth calculation system comprising a processing unit configured to determine the desired wavelength bandwidth based on mark geometry information, e.g. comprising mark depth information representing a depth of a mark. In an embodiment the desired wavelength bandwidth is based on a period and/or a variance parameter of a mark detection error function. The invention further relates to a mark detection system, a position measurement system and a lithographic apparatus comprising the bandwidth calculation system, as well as a method for determining a desired wavelength bandwidth.

公开(公告)号：WO2019214909A1

公开(公告)日：2019-11-14

申请号：PCT/EP2019/059741

申请日：2019-04-16

Applicant: ASML NETHERLANDS B.V.

Inventor： PENG, Xingyue ,  LIU, Jingjing

IPC: G03F7/20

Abstract: Described herein is a method for determining electromagnetic fields associated with a mask model of a patterning process. The method comprises obtaining a mask stack region of interest and an interaction order corresponding to the mask stack region of interest. The mask stack region of interest is divided into sub regions. The mask stack region of interest has one or more characteristics associated with propagation of electromagnetic waves through the mask stack region of interest. The method comprises generating one or more electromagnetic field determination expressions based on the Maxwell Equations and the Quantum Schrodinger Equation. The method comprises determining an electromagnetic field associated with the mask stack region of interest based on the sub regions of the mask stack region of interest and the characteristics associated with the propagation of electromagnetic waves through the mask stack region of interest, using the one or more electromagnetic field determination expressions.

公开(公告)号：WO2019206498A1

公开(公告)日：2019-10-31

申请号：PCT/EP2019/055262

申请日：2019-03-04

Applicant: ASML NETHERLANDS B.V.

Inventor： BASTANI, Vahid ,  YPMA, Alexander

IPC: G03F7/20 ,  G05B19/418

Abstract: A method of grouping data associated with substrates undergoing a process step of a manufacturing process is disclosed. The method comprises obtaining first data associated with substrates before being subject to the process step and obtaining a plurality of sets of second data associated with substrates after being subject to the process step, each set of second data being associated with a different value of a characteristic of the first data. A distance metric is determined which describes a measure of distance between the sets of second data; and the second data is grouped based on a property of the distance metric.

公开(公告)号：WO2019201516A1

公开(公告)日：2019-10-24

申请号：PCT/EP2019/056224

申请日：2019-03-13

Applicant: ASML NETHERLANDS B.V.

Inventor： YU, Miao ,  ARTS, Petrus, Martinus, Gerardus, Johannes ,  EUMMELEN, Erik, Henricus, Egidius, Catharina ,  GATTOBIGIO, Giovanni, Luca ,  HOLTRUST, Maarten ,  LEMPENS, Han, Henricus, Aldegonda ,  MIGCHELBRINK, Ferdy ,  POLET, Theodorus, Wilhelmus ,  TANASA, Gheorghe

IPC: G03F7/20

Abstract: A cleaning device for an apparatus for processing production substrates, the cleaning device comprising: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.

公开(公告)号：WO2019197128A3

公开(公告)日：2019-10-17

申请号：PCT/EP2019/057050

申请日：2019-03-21

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DE KERKHOF, Marcus, Adrianus ,  CLOIN, Christian, Gerardus, Norbertus, Hendricus, Marie ,  YAKUNIN, Andrei, Mikhailovich ,  NIKIPELOV, Andrey ,  VAN DUIVENBODE, Jeroen

IPC: G03F7/20 ,  H01L21/683

Abstract: An apparatus comprising an electrostatic clamp for clamping a component, and a mechanism for generating free charges adjacent to the electrostatic clamp. The mechanism for generating free charges is configured to generate free charges adjacent to the electrostatic clamp during a transition from a first energisation state of the electrostatic clamp to a second energisation state of the electrostatic clamp.