公开(公告)号：WO2021025934A1

公开(公告)日：2021-02-11

申请号：PCT/US2020/044168

申请日：2020-07-30

Applicant: LAM RESEARCH CORPORATION

Inventor： HAN, Hui Ling ,  HUANG, Xinwei ,  PATERSON, Alexander Miller ,  SRIRAMAN, Saravanapriyan ,  ERICKSON, Ann ,  WU, Joanna ,  RAMACHANDRAN, Seetharaman ,  KIMBALL, Christopher ,  PEREZ, Aris

IPC: H01J37/32 ,  H01L21/67 ,  H01L21/683

Abstract: An edge ring system for a substrate processing system includes a top edge ring including an annular body having an inner diameter and an outer diameter. The outer diameter of the top edge ring is smaller than a horizontal opening of a substrate port of the substrate processing system. A first edge ring is arranged below the top edge ring including an annular body having an inner diameter and an outer diameter. The outer diameter of the first edge ring is larger than the substrate port of the substrate processing system. The inner diameter of the first edge ring is smaller than the inner diameter of the top edge ring.

公开(公告)号：WO2020036803A1

公开(公告)日：2020-02-20

申请号：PCT/US2019/045681

申请日：2019-08-08

Applicant: LAM RESEARCH CORPORATION

Inventor： WANG, Yuhou ,  LONG, Maolin ,  WU, Ying ,  PATERSON, Alexander Miller

IPC: H01J37/32 ,  H03H7/40 ,  H02M3/337

Abstract: A drive circuit for providing RF power to a component of a substrate processing system includes a plasma source operating at a first frequency. A load includes the component of the substrate processing system. An impedance network connects the plasma source to the load. A current sensor senses current at an output of the plasma source. A voltage sensor senses voltage at the output of the plasma source. A controller includes a tuned frequency calculator configured to calculate a tuned frequency for the plasma source based on the voltage, the current, and a configuration of the impedance network and to adjust the first frequency based on the tuned frequency.

公开(公告)号：WO2018089776A1

公开(公告)日：2018-05-17

申请号：PCT/US2017/061080

申请日：2017-11-10

Applicant: LAM RESEARCH CORPORATION

Inventor： TAN, Ali Sucipto ,  YAN, Haoquan ,  ESTOQUE, Marc ,  GENETTI, Damon Tyrone ,  MCCHESNEY, Jon ,  PATERSON, Alexander Miller

IPC: H01L21/687 ,  H01L21/68 ,  H01L21/677 ,  H01L21/683

CPC classification number: H01L21/68 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/67248 ,  H01L21/68721 ,  H01L21/68735 ,  H01L21/68742

Abstract: A system for determining an alignment of an edge ring on a substrate support includes a robot control module configured to control a robot to place the edge ring onto the substrate support and retrieve the edge ring from the substrate support. An alignment module is configured to determine a plurality of first positions of the edge ring on the robot prior to being placed onto the substrate support and determine a plurality of second positions of the edge ring on the robot subsequent to being retrieved from the substrate support. An edge ring position module configured to determine a centered position of the edge ring relative to the substrate support based on offsets between the plurality of first positions and the plurality of second positions.

Abstract translation: 用于确定衬底支撑件上的边缘环的对齐的系统包括机器人控制模块，该机器人控制模块被配置为控制机器人以将边缘环放置到衬底支撑件上并从衬底支撑件取回边缘环 。 对准模块被配置成在放置到基板支撑件上之前确定机器人上的边缘环的多个第一位置并且在从基板支撑件取回之后确定边缘环在机器人上的多个第二位置。 边缘环位置模块，其被配置为基于所述多个第一位置和所述多个第二位置之间的偏移来确定所述边缘环相对于所述衬底支撑件的居中位置。