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    ENHANCED VIRTUAL ANODE
    11.
    发明申请
    ENHANCED VIRTUAL ANODE 审中-公开
    增强虚拟阳极

    公开(公告)号：WO2008033724A2

    公开(公告)日：2008-03-20

    申请号：PCT/US2007/077863

    申请日：2007-09-07

    Applicant: CARDINAL CG COMPANY ,  GERMAN, John

    Inventor： GERMAN, John

    IPC: H01J37/32 ,  H01J37/34

    CPC classification number: H01J37/3438 ,  H01J37/3244 ,  H01J37/34 ,  H01J37/3405

    Abstract: The apparatus and method involve using a gas manifold for introducing gas into a deposition chamber. Certain embodiments involve using a binary manifold for uniform distribution of the gas with good response time. During sputtering operations, provision of an anode using the gas manifold enables such anode to be entirely protected from sputtered dielectric material during the deposition process. As such, conduction paths are initially established and maintained between electrons within the chamber and the anode. This results in improved maintenance of stable plasma and consistent coating in the deposition chamber. The conduction paths are enhanced in comparison to conventional systems due to increased collisions between the electrons and gas flowing out of the manifold outlets. Also, ionization of the gas flowing from the manifold outlets is enhanced, resulting in enhanced deposition output from the system. A magnet can also be located within the manifold so as to further increase collisions between the electrons and gas flowing out of the manifold outputs.

    Abstract translation: 该装置和方法包括使用气体歧管将气体引入沉积室。 某些实施例涉及使用二元歧管来均匀分布气体，具有良好的响应时间。 在溅射操作期间，使用气体歧管提供阳极使得在沉积过程中能够使阳极完全被保护而不被溅射介电材料保护。 因此，传导路径最初建立并保持在室内的电子和阳极之间。 这样可以改善沉积室中稳定的等离子体和一致涂层的维护。 与常规系统相比，由于电流和流出歧管出口的气体之间的碰撞增加，传导路径得到增强。 此外，从歧管出口流出的气体的电离增强，导致来自系统的增强的沉积输出。 磁体还可以位于歧管内，以便进一步增加从歧管输出流出的电子和气体之间的碰撞。

    SPUTTERING APPARATUS INCLUDING NOVEL TARGET MOUNTING AND/OR CONTROL
    12.
    发明申请
    SPUTTERING APPARATUS INCLUDING NOVEL TARGET MOUNTING AND/OR CONTROL 审中-公开
    包括新型目标安装和/或控制的喷射装置

    公开(公告)号：WO2008008717A2

    公开(公告)日：2008-01-17

    申请号：PCT/US2007/073010

    申请日：2007-07-09

    Applicant: CARDINAL CG COMPANY ,  BRABENDER, Dennis, M. ,  KOKOSCHKE, Jeffrey, L.

    Inventor： BRABENDER, Dennis, M. ,  KOKOSCHKE, Jeffrey, L.

    CPC classification number: C23C14/352 ,  C23C14/3414 ,  C23C14/3464 ,  C23C14/56 ,  H01J37/32458 ,  H01J37/32752 ,  H01J37/3417 ,  H01J37/342 ,  H01J37/3447

    Abstract: A sputtering chamber includes at least two sputtering targets, one of the at least two targets disposed on a first side a substrate conveyor extending within the chamber, and another of the at least two targets disposed on a second side of the conveyor. The at least two targets may be independently operable, and at least one of the targets, if inactivated, may be protected by a shielding apparatus. Both of the at least two targets may be mounted to a first wall of a plurality of walls enclosing the sputtering chamber.

    Abstract translation: 溅射室包括至少两个溅射靶，所述至少两个靶中的一个设置在第一侧上，所述基底传送器在腔室内延伸，并且所述至少两个靶中的另一个设置在所述传送器的第二侧上。 所述至少两个靶可以是可独立操作的，并且如果失活，则所述靶中的至少一个可被屏蔽装置保护。 所述至少两个靶中的至少两个可以被安装到围绕所述溅射室的多个壁的第一壁。

    REDUCED MAINTENANCE SPUTTERING CHAMBERS
    16.
    发明申请
    REDUCED MAINTENANCE SPUTTERING CHAMBERS 审中-公开
    减少维护喷雾器

    公开(公告)号：WO2006076345A2

    公开(公告)日：2006-07-20

    申请号：PCT/US2006/000795

    申请日：2006-01-11

    Applicant: CARDINAL CG COMPANY ,  HARTIG, Klaus

    Inventor： HARTIG, Klaus

    IPC: H01J37/34

    CPC classification number: H01J37/32871 ,  C23C14/352 ,  C23C14/564 ,  H01J37/32477 ,  H01J37/3405 ,  H01J37/3455

    Abstract: Improved sputtering chambers for sputtering thin coatings onto substrates. One sputtering chamber includes spall shields which are disposed inwardly and upwardly toward the chamber interior and toward the sputtering targets, and which can aid in the retention of overcoated sputtering material which may otherwise fall onto substrates to be coated. Another sputtering chamber includes targets having magnets which are turned inwardly relative to vertical and toward each other. The inward rotation of the magnets can serve to deposit more material toward the open bottom center of the chamber, and less toward the side walls of the chamber. Yet another sputtering chamber includes a third target disposed between and upward of the lower two targets so as to shield a portion of the sputtering chamber interior from material sputtered from the first and second targets. Some chambers have the three targets forming a triangle, for example, an isosceles or equilateral triangle, hi one chamber having such a triangular configuration of sputtering targets, the first and second targets form the base of an isosceles triangle and have their magnets oriented inwardly relative to vertical and towards each other. The sputtering chambers provided can either reduce the amount of overcoat sputtering material deposited onto the interior of the chamber and/or aid in retention of overcoat sputtering material which would otherwise fall onto substrates to be coated.

    Abstract translation: 改进的溅射室，用于将薄涂层溅射到基板上。 一个溅射室包括防护罩，其被设置成向内并向上朝向室内部并且朝向溅射靶，并且其可以有助于保留外涂的溅射材料，否则其可能落在待涂覆的基板上。 另一个溅射室包括具有相对于垂直和彼此向内转动的磁体的靶。 磁体的向内旋转可用于将更多的材料沉积到腔室的敞开的底部中心，并且朝向腔室的侧壁较少。 又一个溅射室包括设置在下两个靶之间和之上的第三靶，以便将溅射室内的一部分与第一和第二靶溅射的材料进行屏蔽。 一些室具有形成三角形的三个目标，例如等腰或等边三角形。在具有这种溅射靶的三角形构造的一个室中，第一和第二靶形成等腰三角形的基部并使其磁体向内相对 朝向彼此。 所提供的溅射室可以减少沉积在室内部的外涂层溅射材料的量和/或有助于保留外涂层溅射材料，否则这些溅射材料会落在待涂覆的基板上。

    COATER HAVING SUBSTRATE CLEANING DEVICE AND COATING DEPOSITION METHODS EMPLOYING SUCH COATER
    17.
    发明申请
    COATER HAVING SUBSTRATE CLEANING DEVICE AND COATING DEPOSITION METHODS EMPLOYING SUCH COATER 审中-公开
    具有衬底清洁装置的涂层和使用这种涂层的涂布沉积方法

    公开(公告)号：WO2004061151A1

    公开(公告)日：2004-07-22

    申请号：PCT/US2003/041511

    申请日：2003-12-31

    Applicant: CARDINAL CG COMPANY ,  HARTIG, Klaus

    Inventor： HARTIG, Klaus

    IPC: C23C14/10

    CPC classification number: C23C14/562 ,  C03C17/002 ,  C03C23/0075 ,  C03C2218/31 ,  C23C14/022 ,  C23C14/568

    Abstract: A coater having a substrate cleaning device is disclosed. Also disclosed are methods of processing substrates in a coater equipped with a substrate cleaning device. The substrate cleaning device comprises an ion gun (i.e., an ion source) that is positioned beneath a path of substrate travel (e.g., beneath a substrate support) extending through the coater and that is adapted for treating a bottom major surface of a substrate. Certain embodiments involve an upward coating apparatus that is further along the path of substrate travel than the substrate cleaning device. In some embodiments of this nature, the upward coating apparatus is configured for depositing a photocatalytic coating upwardly onto the bottom major surface of the substrate. Certain embodiments of the invention involve a downward coating apparatus, wherein the substrate cleaning device is further along the path of substrate travel than the downward coating apparatus. Some embodiments of this nature also involve an upward coating apparatus that is further along the path of substrate travel than the substrate cleaning device.

    Abstract translation: 公开了一种具有基板清洁装置的涂布机。 还公开了在装有基板清洁装置的涂布机中处理基板的方法。 衬底清洁装置包括位于衬底行进路径（例如，衬底支撑件下方）下方的离子枪（即离子源），其延伸穿过涂布机，并适于处理衬底的底部主表面。 某些实施例涉及一种向上涂层装置，其进一步沿着衬底移动的路径而不是衬底清洗装置。 在这种性质的一些实施例中，向上涂覆装置被配置用于将光催化涂层向上沉积到基底的底部主表面上。 本发明的某些实施例涉及一种向下涂覆装置，其中基底清洗装置进一步沿着基底行程的路径而不是向下涂覆装置。 这种性质的一些实施方案还涉及向上涂覆装置，其进一步沿衬底移动的路径比衬底清洗装置。

    FOLDABLE TRANSPORT RACK AND METHODS OF USE THEREOF
    18.
    发明申请
    FOLDABLE TRANSPORT RACK AND METHODS OF USE THEREOF 审中-公开
    可折叠运输机架及其使用方法

    公开(公告)号：WO2003089345A1

    公开(公告)日：2003-10-30

    申请号：PCT/US2003/011513

    申请日：2003-04-14

    Applicant: CARDINAL CG COMPANY ,  JESKEY, Marion, M. ,  WADE, Michael, Jeffrey

    Inventor： JESKEY, Marion, M. ,  WADE, Michael, Jeffrey

    IPC: B65G49/06

    CPC classification number: B65G49/062

    Abstract: A stackable, folding transport rack (10) generally including a base, (12) a plurality of supports, (14) at least one foldable A-frame (16) hingedly secured to the base (12) and an optional securing assembly (18). The base (12) of the transport rack is supported by a plurality of legs (22) bearing supports which are adapted to support the lower edges of objects, such as glass sheets or other sheet materials to be carried by the transport rack. The supports (14) are configured to be as low as possible to the resting surface of the transport rack (10) so as to provide for a minimal lift height for loading and unloading. The low arrangement of the supports also maximizes the size of glass sheets that can be carried and maintains the lowest possible center of gravity. The top of the sheet supports may be cushioned with appropriate resilient material.

    Abstract translation: 一种通常包括底座的可折叠的折叠运输架（10），（12）多个支撑件，（14）至少一个铰接地固定到所述基座（12）的可折叠的A形框架（16）和可选的固定组件 ）。 运输架的基座（12）由多个支撑支撑件（22）支撑，该支撑支撑件适于支撑物品的下边缘，例如玻璃板或由运输架承载的其它片材。 支撑件（14）构造成尽可能地低到运输架（10）的搁置表面，以便提供用于装载和卸载的最小提升高度。 支架的低排列也使可承载的玻璃板的尺寸最大化并保持最低可能的重心。 片材支撑件的顶部可以用适当的弹性材料缓冲。

    THIN FILM COATING HAVING TRANSPARENT BASE LAYER
    19.
    发明申请
    THIN FILM COATING HAVING TRANSPARENT BASE LAYER 审中-公开
    具有透明基层的薄膜涂层

    公开(公告)号：WO2003074442A1

    公开(公告)日：2003-09-12

    申请号：PCT/US2003/006168

    申请日：2003-02-28

    Applicant: CARDINAL CG COMPANY ,  HARTIG, Klaus ,  KRISKO, Annette, J.

    Inventor： HARTIG, Klaus ,  KRISKO, Annette, J.

    IPC: C03C17/36

    CPC classification number: C03C17/36 ,  C03C17/3618 ,  C03C17/3626 ,  C03C17/3639 ,  C03C17/3644 ,  C03C17/3652 ,  C03C17/366 ,  C03C2217/78

    Abstract: The invention provides thin film coatings that have a transparent base layer. For example, the invention provides low-emissivity coatings with a transparent base layer. In certain embodiments, a silicon dioxide base layer is used. Methods of producing thin film coatings having a transparent base layer are provided as well. In one embodiment, sputter deposition is utilized to produce these coatings.

    Abstract translation: 本发明提供具有透明基底层的薄膜涂层。 例如，本发明提供具有透明基底层的低发射率涂层。 在某些实施方案中，使用二氧化硅基底层。 还提供了具有透明基底层的薄膜涂层的制造方法。 在一个实施例中，利用溅射沉积来生产这些涂层。

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