中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

61 records (took 0.017 seconds)

    LASER APPARATUS
    31.
    发明申请
    LASER APPARATUS 审中-公开
    激光装置

    公开(公告)号：WO1997011810A1

    公开(公告)日：1997-04-03

    申请号：PCT/JP1996002820

    申请日：1996-09-27

    Applicant: KOMATSU LTD. ,  MIZOGUCHI, Hakaru ,  WAKABAYASHI, Osamu ,  KOBAYASHI, Yukio ,  AMADA, Yoshiho ,  MIMURA, Tatsuo

    Inventor： KOMATSU LTD.

    IPC: B23K26/00

    CPC classification number: G03F7/70041 ,  B23K26/03 ,  B23K26/06 ,  B23K26/702 ,  G03F7/70025 ,  H01S3/134 ,  H01S3/225

    Abstract: A laser apparatus comprises storage means for storing the power supply voltage of each pulse at the time of continuous pulse oscillation for one cycle, with each voltage correlated with an identifier which specifies the respective pulse, and output control means for, when a pulse is generated, reading from said storage means the supply voltage of a pulse having the same identifier, and performing pulse oscillation on the basis of the supply voltage. Thus the influence of the spiking phenomenon in the operation in a burst mode is removed as much as possible, and thereby the accurracy of laser beam machining is still more improved.

    Abstract translation: 激光装置包括存储装置，用于将连续脉冲振荡时的每个脉冲的电源电压存储一个周期，每个电压与指定相应脉冲的标识符相关，并且当产生脉冲时输出控制装置 从所述存储器读取表示具有相同标识符的脉冲的电源电压，并且基于电源电压执行脉冲振荡。 因此，尽可能地去除突发模式中的尖峰现象在操作中的影响，从而进一步提高激光束加工的准确性。

    WAVELENGTH DETECTOR
    32.
    发明申请
    WAVELENGTH DETECTOR 审中-公开
    波长检测器

    公开(公告)号：WO1991012499A1

    公开(公告)日：1991-08-22

    申请号：PCT/JP1991000185

    申请日：1991-02-15

    Applicant: KABUSHIKI KAISHA KOMATSU SEISAKUSHO ,  WAKABAYASHI, Osamu; ,  KOWAKA, Masahiko; ,  KOBAYASHI, Yukio;

    Inventor： KABUSHIKI KAISHA KOMATSU SEISAKUSHO

    IPC: G01J03/10

    CPC classification number: G01J9/0246

    Abstract: A wavelength detector capable of accurately detecting the wavelengths of a laser (1) or the like, wherein the vapor of a particular element such as mercury including a plurality of isotopes is heated above a predetermined temperature to separate an oscillation ray of a particular isotope, and the wavelength of the light (La) to be detected is detected using the above separated oscillation ray as a reference light (Lb). Further, a particular isotope is selected from a particular element such as mercury, and the light to be detected is detected using the oscillation ray of the vapor of the above particular isotope as a reference light. Here, the above isolated oscillation ray or the oscillation ray from the vapor of the particular isotope has a narrow wavelength width. Therefore, as the oscillation ray falls on the detection surface of the light detector (8), it is allowed to precisely detect the position of the interference fringe (8a). The wavelength of the light to be detected is accurately detected based upon the difference between the above detected position and the detected position of interference fringe (8b) of when the light to be detected falls on the detection surface of the light detector. The wavelength detector of the invention is used for detecting the wavelength of a narrow-band oscillation excimer laser beam, and the wavelength of the excimer laser beam is controlled based on the detected wavelength to stably narrow the band and to accurately fix the wavelength to a setpoint value.

    LASER APPARATUS AND EXTREME-ULTRAVIOLET LIGHT GENERATION SYSTEM USING THE SAME
    33.
    发明申请
    LASER APPARATUS AND EXTREME-ULTRAVIOLET LIGHT GENERATION SYSTEM USING THE SAME 审中-公开
    激光装置和极光 - 超紫外光发光系统

    公开(公告)号：WO2013144691A3

    公开(公告)日：2014-02-06

    申请号：PCT/IB2013000181

    申请日：2013-02-13

    Applicant: GIGAPHOTON INC ,  WAKABAYASHI OSAMU ,  NOWAK KRZYSZTOF

    Inventor： WAKABAYASHI OSAMU ,  NOWAK KRZYSZTOF

    IPC: H01S3/23 ,  G02B26/08 ,  G02B27/09 ,  H01S3/00 ,  H01S3/034 ,  H01S3/083 ,  H01S3/223

    CPC classification number: H01S3/2316 ,  G02B17/023 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/034 ,  H01S3/2232

    Abstract: An amplifier PAkappa including a plurality of discharge tubes and a MOPA laser apparatus including a master oscillator as a seed laser configured to output a pulsed laser beam, at least one of said amplifier PAkappa comprising a plurality of discharge tubes provided on a designated path of the pulsed laser beam, and an optical system comprising mirrors arranged between said discharge tubes and/or said at least one amplifiers when more than one, to steer the seed laser beam so that it travels along the designed path.

    Abstract translation: 包括多个放电管的放大器PAkappa和MOPA激光装置，其包括配置成输出脉冲激光束的种子激光器的主振荡器，所述放大器PAkappa中的至少一个包括多个放电管， 脉冲激光束，以及包括在多于一个放电管和/或所述至少一个放大器之间布置的反射镜的光学系统，以引导种子激光束使其沿着设计的路径行进。

    SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT
    34.
    发明申请
    SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT 审中-公开
    用于产生极光紫外线灯的系统和方法

    公开(公告)号：WO2012173166A2

    公开(公告)日：2012-12-20

    申请号：PCT/JP2012/065179

    申请日：2012-06-07

    Applicant: Gigaphoton Inc. ,  HORI, Tsukasa ,  KAKIZAKI, Kouji ,  YANAGIDA, Tatsuya ,  WAKABAYASHI, Osamu

    Inventor： HORI, Tsukasa ,  KAKIZAKI, Kouji ,  YANAGIDA, Tatsuya ,  WAKABAYASHI, Osamu

    IPC: H05G2/00

    CPC classification number: H05G2/008 ,  F21K2/00

    Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

    Abstract translation: 一种系统，包括：室，激光束装置，被配置为产生要被引入到所述腔室中的激光束;激光控制器，用于激光束装置至少控制激光束的束强度和输出定时;以及靶 供给单元，被配置为将目标材料供应到所述室中，所述目标材料被所述激光束照射以产生极紫外光。

    APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT
    36.
    发明申请
    APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT 审中-公开
    用于产生极度超紫外线灯的装置和方法

    公开(公告)号：WO2012127290A1

    公开(公告)日：2012-09-27

    申请号：PCT/IB2012/000319

    申请日：2012-02-21

    Applicant: GIGAPHOTON INC. ,  YANAGIDA, Tatsuya ,  FUJIMOTO, Junichi ,  WAKABAYASHI, Osamu

    Inventor： YANAGIDA, Tatsuya ,  FUJIMOTO, Junichi ,  WAKABAYASHI, Osamu

    IPC: H05G2/00

    CPC classification number: H05G2/003 ,  H05G2/005 ,  H05G2/008

    Abstract: A method for generating extreme ultraviolet (EUV) light that includes the steps of supplying a droplet of a target material into a chamber, diffusing the droplet by irradiating the droplet by a pre-pulse laser beam to form a diffused target, and generating a plasma by irradiating the diffused target by a main pulse laser beam wherein the plasma emits extreme ultraviolet light. The main pulse laser beam has a cross-sectional shape that is substantially coincident with a shape of the diffused target at the irradiation point.

    Abstract translation: 一种用于产生极紫外（EUV）光的方法，包括以下步骤：将目标材料的液滴供应到室中，通过用预脉冲激光束照射液滴来扩散液滴，以形成扩散的靶，并产生等离子体 通过用等离子体发射极紫外光的主脉冲激光束照射漫射靶。 主脉冲激光束具有与照射点处的扩散靶的形状大致一致的截面形状。

    LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM INCLUDING THE LASER APPARATUS
    37.
    发明申请
    LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM INCLUDING THE LASER APPARATUS 审中-公开

    公开(公告)号：WO2012085638A3

    公开(公告)日：2012-06-28

    申请号：PCT/IB2011/003068

    申请日：2011-12-15

    Applicant: GIGAPHOTON INC. ,  NOWAK, Krzysztof ,  WAKABAYASHI, Osamu ,  HOSHINO, Hideo

    Inventor： NOWAK, Krzysztof ,  WAKABAYASHI, Osamu ,  HOSHINO, Hideo

    IPC: H01S3/23 ,  H01S3/00 ,  H05G2/00

    Abstract: A laser apparatus includes: a master oscillator (11) configured to output a pulsed laser beam at a repetition rate; at least one amplifier (30 1,...30 N) disposed on a beam path of the pulsed laser beam; at least one optical shutter (20 1,...20 N) disposed on the beam path of the pulsed laser beam; and a controller (110) configured to switch the at least one optical shutter. Electro - optic, magneto - optic or acousto - optic devices may be used in the shutter. Quantum cascade lasers may be used in the master oscillator. An EUV laser produced plasma source including the laser apparatus is also disclosed, as well as etails relating to the synchornization of the laser apparatus and a target supply unit (26) for supplying droplets (27) of a target material to the plasma generation region (25).

    LASER BEAM MACHINING DEVICE AND LASER
    40.
    发明申请
    LASER BEAM MACHINING DEVICE AND LASER 审中-公开
    激光加工设备和激光

    公开(公告)号：WO1997007926A1

    公开(公告)日：1997-03-06

    申请号：PCT/JP1996002467

    申请日：1996-09-02

    Applicant: KOMATSU LTD. ,  WAKABAYASHI, Osamu ,  SHAKUSHI, Tetsuo

    Inventor： KOMATSU LTD.

    IPC: B23K26/00

    CPC classification number: H01S3/134

    Abstract: A burst-on/off signal transmitting means which generates a burst-on signal for starting continuous-wave oscillation of a laser and a burst-off signal for starting stopping the continuous-wave oscillation and transmits the signals to the laser is provided on the machining device side. A control means which receives the burst-on/off signals and controls burst operation by using the signal is provided on the laser side. The charging control is not needed while the laser does not oscillate. Therefore the safety of the laser is ensured. The output of the laser is controlled to a fixed level with high accuracy, and the responsivenesses of the other controls and the control speed are improved.

    Abstract translation: 产生用于开始激光的连续波振荡的突发接通信号和用于开始停止连续波振荡并将信号发送到激光器的突发关闭信号的突发/关闭信号发送装置提供在 加工装置侧。 在激光侧设置控制装置，该控制装置通过使用该信号接收脉冲串/断开信号并控制脉冲串操作。 激光不振荡时，不需要充电控制。 因此，确保了激光的安全性。 激光器的输出以高精度被控制到一个固定的水平，并且提高了其他控制器的响应性和控制速度。

Patent Agency Ranking