公开(公告)号：WO2013144678A1

公开(公告)日：2013-10-03

申请号：PCT/IB2012/002780

申请日：2012-12-21

Applicant: GIGAPHOTON INC.

Inventor： MIZOGUCHI, Hakaru ,  WAKABAYASHI, Osamu

IPC: H01S3/23 ,  H01S3/00 ,  H01S3/0971 ,  H01S3/223 ,  H01S3/03 ,  H01S3/038 ,  H01S3/041 ,  G02F1/35

CPC classification number: H05G2/008 ,  H01S3/0064 ,  H01S3/0315 ,  H01S3/038 ,  H01S3/041 ,  H01S3/0971 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/2366 ,  H05G2/005

Abstract: A laser apparatus may include a master oscillator (310) configured to output a laser beam, at least one amplifier (320) provided in a beam path of the laser beam, at least one saturable absorber gas cell (330) provided downstream from the at least one amplifier (320) and configured to contain a saturable absorber gas for absorbing a part of the laser beam, the part of the laser beam having a beam intensity equal to or lower than a predetermined beam intensity, a fan (3304) provided in the saturable absorber gas cell and configured to cause the saturable absorber gas to circulate, and a heat exchanger (3305) provided in the saturable absorber gas cell and configured to cool the saturable absorber gas (3307).

Abstract translation: 激光装置可以包括被配置为输出激光束的主振荡器（310），设置在激光束的光束路径中的至少一个放大器（320），设置在激光束的下游的至少一个可饱和吸收器气体单元（330） 至少一个放大器（320），并且被配置为容纳用于吸收激光束的一部分的可饱和吸收器气体，所述激光束的一部分具有等于或小于预定光束强度的光束强度;风扇（3304），其设置在 可饱和吸收器气体池并且构造成使饱和吸收剂气体循环;以及热交换器（3305），设置在可饱和吸收器气体单元中并且构造成冷却可饱和吸收剂气体（3307）。

公开(公告)号：WO2013050842A1

公开(公告)日：2013-04-11

申请号：PCT/IB2012/001717

申请日：2012-09-05

Applicant: GIGAPHOTON INC. ,  NAGANO, Hitoshi ,  WADA, Yasunori ,  YANAGIDA, Tatsuya ,  WAKABAYASHI, Osamu

Inventor： NAGANO, Hitoshi ,  WADA, Yasunori ,  YANAGIDA, Tatsuya ,  WAKABAYASHI, Osamu

IPC: H01S3/23 ,  H05G2/00 ,  G03F7/20 ,  G02F1/03 ,  H01S3/00

CPC classification number: H05G2/008 ,  G03F7/70025 ,  G03F7/70033 ,  G03F7/70041 ,  G21K1/062 ,  H01L21/0275 ,  H01S3/005 ,  H01S3/10038 ,  H01S3/1075 ,  H01S3/115 ,  H01S3/1305 ,  H01S3/1643 ,  H01S3/2316 ,  H01S3/235 ,  H01S3/2375 ,  H01S5/4087 ,  H05G2/005

Abstract: A system (11A) for generating extreme ultraviolet light, in which a target material (27) inside a chamber (2A) is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus (40) configured to output a first laser beam (41), a second laser apparatus (3A) configured to output a second laser beam having a pedestal and a peak portion, and a controller (5A)connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the peak portion having higher energy than the pedestal to be outputted after the pedestal.

Abstract translation: 一种用于产生极紫外光的系统（11A），其中在室（2A）内部的目标材料（27）被照射成等离子体的激光束，包括第一激光装置（40），其被配置为输出第一 激光束（41），被配置为输出具有基座和峰值部分的第二激光束的第二激光装置（3A）和连接到第一和第二激光装置的控制器（5A），并被配置为使第一激光束 首先输出要在第一激光束之后输出的基座，并且峰值部分具有比基座更高的能量以在基座之后输出。

公开(公告)号：WO2012131452A8

公开(公告)日：2013-02-21

申请号：PCT/IB2012000409

申请日：2012-03-05

Applicant: GIGAPHOTON INC ,  NAKARAI HIROAKI ,  WAKABAYASHI OSAMU ,  HOSHINO HIDEO

Inventor： NAKARAI HIROAKI ,  WAKABAYASHI OSAMU ,  HOSHINO HIDEO

IPC: H01S3/131 ,  H01S3/107 ,  H01S3/13 ,  H01S3/134 ,  H01S3/23 ,  H05G2/00

CPC classification number: H01S3/0057 ,  H01S3/107 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/235 ,  H01S3/2375 ,  H01S3/2391 ,  H05G2/008

Abstract: A laser apparatus may include a seed laser device configured to output a pulse laser beam, a pulse energy adjusting unit configured to vary pulse energy of the pulse laser beam, at least one amplifier for amplifying the pulse laser beam, at least one power source for varying an excitation intensity in the at least one amplifier, and a controller configured to control the pulse energy adjusting unit on a pulse-to-pulse basis for the pulse laser beam passing therethrough and to control the at least one power source for a group of multiple pulses of the pulse laser beam.

Abstract translation: 激光装置可以包括配置为输出脉冲激光束的种子激光装置，被配置为改变脉冲激光束的脉冲能量的脉冲能量调节单元，至少一个用于放大脉冲激光束的放大器，至少一个用于 改变所述至少一个放大器中的激发强度，以及控制器，被配置为基于脉冲对脉冲基准控制所述脉冲能量调节单元，以使所述脉冲激光束通过其中并且控制所述至少一个电源 多脉冲脉冲激光束。

公开(公告)号：WO2012131452A1

公开(公告)日：2012-10-04

申请号：PCT/IB2012/000409

申请日：2012-03-05

Applicant: GIGAPHOTON INC. ,  NAKARAI, Hiroaki ,  WAKABAYASHI, Osamu ,  HOSHINO, Hideo

Inventor： NAKARAI, Hiroaki ,  WAKABAYASHI, Osamu ,  HOSHINO, Hideo

IPC: H01S3/131 ,  H01S3/13 ,  H01S3/23 ,  H05G2/00 ,  H01S3/134 ,  H01S3/107

CPC classification number: H01S3/0057 ,  H01S3/107 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/235 ,  H01S3/2375 ,  H01S3/2391 ,  H05G2/008

Abstract: A laser apparatus may include a seed laser device configured to output a pulse laser beam, a pulse energy adjusting unit configured to vary pulse energy of the pulse laser beam, at least one amplifier for amplifying the pulse laser beam, at least one power source for varying an excitation intensity in the at least one amplifier, and a controller configured to control the pulse energy adjusting unit on a pulse-to-pulse basis for the pulse laser beam passing therethrough and to control the at least one power source for a group of multiple pulses of the pulse laser beam.

Abstract translation: 激光装置可以包括配置成输出脉冲激光束的种子激光装置，被配置为改变脉冲激光束的脉冲能量的脉冲能量调节单元，至少一个用于放大脉冲激光束的放大器，至少一个用于 改变所述至少一个放大器中的激发强度，以及控制器，被配置为基于脉冲至脉冲基准控制所述脉冲能量调节单元，以使所述脉冲激光束通过其中并且控制所述至少一个电源 多脉冲脉冲激光束。

公开(公告)号：WO2012085638A8

公开(公告)日：2012-09-07

申请号：PCT/IB2011003068

申请日：2011-12-15

Applicant: GIGAPHOTON INC ,  NOWAK KRZYSZTOF ,  WAKABAYASHI OSAMU ,  HOSHINO HIDEO

Inventor： NOWAK KRZYSZTOF ,  WAKABAYASHI OSAMU ,  HOSHINO HIDEO

IPC: H01S3/23

CPC classification number: H01S3/0085 ,  H01S3/0064 ,  H01S3/2316 ,  H01S3/235 ,  H01S3/2366 ,  H01S3/2375 ,  H01S2301/02 ,  H05G2/008

Abstract: A laser apparatus may include: a master oscillator configured to output a pulsed laser beam at a repetition rate; at least one amplifier disposed on a beam path of the pulsed laser beam; at least one optical shutter disposed on the beam path of the pulsed laser beam; and a controller configured to switch the at least one optical shutter.

Abstract translation: 激光装置可以包括：主振荡器，被配置为以重复频率输出脉冲激光束; 设置在所述脉冲激光束的光束路径上的至少一个放大器; 设置在脉冲激光束的光束路径上的至少一个光学快门; 以及控制器，被配置为切换所述至少一个光学快门。

公开(公告)号：WO2012114178A2

公开(公告)日：2012-08-30

申请号：PCT/IB2012/000295

申请日：2012-02-17

Applicant: GIGAPHOTON INC. ,  MIZOGUCHI, Hakaru ,  SUGANUMA, Takashi ,  HOSHINO, Hideo

Inventor： MIZOGUCHI, Hakaru ,  SUGANUMA, Takashi ,  HOSHINO, Hideo

IPC: H05G2/00

CPC classification number: H01S3/0071 ,  H01S3/0014 ,  H01S3/10061 ,  H01S3/1305 ,  H05G2/008

Abstract: An optical device may include: an optical module disposed in a beam delivery path of a laser beam; a beam adjusting unit disposed in the beam delivery path for adjusting the beam delivery path of the laser beam; a measuring unit disposed in the beam delivery path for detecting the beam delivery path; and a control unit for controlling the beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the measuring unit.

Abstract translation: 光学装置可以包括：设置在激光束的光束输送路径中的光学模块; 设置在所述光束传送路径中用于调节所述激光束的光束传送路径的光束调节单元; 设置在所述光束传送路径中用于检测所述光束传送路径的测量单元; 以及控制单元，用于基于由测量单元检测到的激光束的光束传递路径的检测结果来控制光束调节单元。

公开(公告)号：WO2011122689A1

公开(公告)日：2011-10-06

申请号：PCT/JP2011/058468

申请日：2011-03-25

Applicant: GIGAPHOTON INC. ,  YANAGIDA, Tatsuya ,  WAKABAYASHI, Osamu

Inventor： YANAGIDA, Tatsuya ,  WAKABAYASHI, Osamu

IPC: H05G2/00

CPC classification number: H01S3/10061 ,  H01S3/08054 ,  H01S3/08059 ,  H01S3/2308 ,  H01S3/2383 ,  H01S2301/20 ,  H05G2/003 ,  H05G2/008

Abstract: An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.

Abstract translation: 可以提供与激光装置一起使用的极紫外光发生系统，并且极紫外光发生系统可以包括：包括至少一个用于至少一个激光束的窗口的室，以及用于将目标材料供应到 室; 以及设置在激光束路径上的至少一个偏振控制单元，用于控制至少一个激光束的偏振状态。

公开(公告)号：WO2011115025A1

公开(公告)日：2011-09-22

申请号：PCT/JP2011/055861

申请日：2011-03-07

Applicant: GIGAPHOTON INC. ,  SUGANUMA, Takashi ,  NOWAK, Krzysztof ,  WAKABAYASHI, Osamu

Inventor： SUGANUMA, Takashi ,  NOWAK, Krzysztof ,  WAKABAYASHI, Osamu

IPC: H01S3/23 ,  H01S3/03 ,  H05G2/00

CPC classification number: H01S3/05 ,  B82Y20/00 ,  H01S3/0315 ,  H01S3/08031 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2232 ,  H01S3/2325 ,  H01S3/235 ,  H01S3/2366 ,  H01S3/2375 ,  H01S5/042 ,  H01S5/06 ,  H01S5/14 ,  H01S5/3401

Abstract: A regenerative amplifier (20) according to one aspect of this disclosure is used in combination with a laser device, and the regenerative amplifier may include: a pair of resonator mirrors (21a, 21b) constituting an optical resonator; a C02 slab amplifier (25) provided between the pair of the resonator mirrors for amplifying a laser beam with a predetermined wavelength outputted from the laser device; and an optical system (26, 27) disposed to configure a multipass optical path (C2) along which the laser beam is reciprocated inside the slab amplifier, the optical system transferring an optical image of the laser beam at a first position (la) as an optical image of the laser beam at a second position (lb).

Abstract translation: 根据本公开的一个方面的再生放大器（20）与激光装置组合使用，再生放大器可以包括：构成光谐振器的一对谐振器镜（21a，21b） 设置在该对谐振镜之间用于放大从激光装置输出的预定波长的激光束的CO 2板放大器（25） 以及光学系统（26,27），被配置为配置激光束沿着平板放大器往复运动的多通道光路（C2），所述光学系统将第一位置（1a）处的激光束的光学图像作为 在第二位置（lb）处的激光束的光学图像。

公开(公告)号：WO2013144677A8

公开(公告)日：2013-11-21

申请号：PCT/IB2012002758

申请日：2012-12-19

Applicant: GIGAPHOTON INC

Inventor： NOWAK KRZYSZTOF ,  WAKABAYASHI OSAMU

IPC: H01S3/23 ,  G02F1/35 ,  H01S3/00 ,  H01S3/03 ,  H01S3/038 ,  H01S3/041 ,  H01S3/0971 ,  H01S3/223

CPC classification number: H01S3/005 ,  H01S3/0064 ,  H01S3/0315 ,  H01S3/038 ,  H01S3/041 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/2366 ,  H05G2/005 ,  H05G2/008

Abstract: A laser apparatus may include a master oscillator (310) configured to output a laser beam, at least one amplifier (320) provided in a beam path of the laser beam, at least one saturable absorber gas cell (330) provided downstream from the at least one amplifier (321) and configured to contain a saturable absorber gas for absorbing a part of the laser beam, the part having a beam intensity equal to or lower than a predetermined beam intensity, and a cooling unit (3304,3305) for cooling the saturable absorber gas. The saturable absorber gas cell (330) includes a chamber (3301) filled with saturable absorber gas (3308) and delimited by input/output windows (3302,3303). Furthermore, the chamber comprises a pair of cooling plates (3304,3305). The cooling plates have flow channels (3306,3307) for water cooling.

Abstract translation: 激光装置可以包括被配置为输出激光束的主振荡器（310），设置在激光束的光束路径中的至少一个放大器（320），设置在激光束的下游的至少一个可饱和吸收器气体单元（330） 至少一个放大器（321），并且被配置为包含用于吸收激光束的一部分的可饱和吸收剂气体，所述部件具有等于或低于预定光束强度的光束强度，以及用于冷却的冷却单元（3304,3305） 可饱和吸收气体。 可饱和吸收器气体池（330）包括填充有可饱和吸收气体（3308）并由输入/输出窗口（3302,3303）限定的室（3301）。 此外，腔室包括一对冷却板（3304,3305）。 冷却板具有用于水冷却的流动通道（3306,3307）。

公开(公告)号：WO2013110968A1

公开(公告)日：2013-08-01

申请号：PCT/IB2012/002714

申请日：2012-12-13

Applicant: GIGAPHOTON INC.

Inventor： IGARASHI, Miwa ,  WATANABE, Yukio ,  ASHIKAWA, Kouji ,  IWAI, Norio ,  WAKABAYASHI, Osamu

IPC: H05G2/00

CPC classification number: H05G2/008 ,  G21K5/10 ,  H05G2/003

Abstract: An apparatus for generating extreme ultraviolet light may include a reference member (9), a chamber (2) fixed to the reference member, the chamber including at least one window (38), a laser beam introduction optical system (50) configured to introduce an externally supplied laser beam into the chamber through the at least one window, and a positioning mechanism (10) configured to position the laser beam introduction optical system to the reference member.

Abstract translation: 用于产生极紫外光的装置可以包括参考构件（9），固定到参考构件的腔室（2），所述腔室包括至少一个窗口（38），激光束引入光学系统（50） 外部提供的激光束通过所述至少一个窗口进入所述腔室;以及定位机构（10），其配置成将所述激光束引入光学系统定位到所述参考构件。