公开(公告)号：WO2005119359A2

公开(公告)日：2005-12-15

申请号：PCT/US2005018656

申请日：2005-05-27

Applicant: NANOPHASE TECH CORP

Inventor： CAYTON ROGER H ,  MURRAY PATRICK ,  LENZ PETRA ,  SCHULTE KLAUS ,  GRUNDKEMEYER MARTIN ,  SAWITOWSKI THOMAS

IPC: B05D3/02 ,  B05D3/06 ,  B05D5/00 ,  B05D7/06 ,  B05D7/14 ,  C03C17/00 ,  G03C1/76

CPC classification number: B05D5/00 ,  B05D3/0254 ,  B05D3/067 ,  B05D7/06 ,  B05D7/14 ,  B05D2203/35 ,  B05D2601/20 ,  B05D2601/24 ,  B05D2601/26 ,  B82Y30/00 ,  C03C17/007 ,  C03C2217/445 ,  C03C2217/475 ,  C08J3/2053 ,  C08K3/22 ,  C09D5/00 ,  C09D7/61 ,  C09D7/70 ,  C09D175/16 ,  C08L2666/54

Abstract: A film forming composition comprises a resin, a plurality of nanoparticles, a surface active material and a polymeric dispersant. The film forming composition is substantially transparent and is adapted to be combined with a substrate to enhance abrasion resistance. The film forming composition may be used with wood objects including furniture, doors, floors, for architectural surfaces, for automotive articles and finishes, for metal coatings and coil coatings, for plastic articles, and for wipe-on protective treatments.

Abstract translation: 成膜组合物包含树脂，多种纳米颗粒，表面活性材料和聚合物分散剂。 成膜组合物基本上是透明的，并且适于与基底组合以增强耐磨性。 成膜组合物可以与包括家具，门，地板，建筑用表面，汽车制品和表面处理用的金属涂层和卷材涂层，用于塑料制品以及擦拭保护处理的木制物体一起使用。

公开(公告)号：WO2005088397A2

公开(公告)日：2005-09-22

申请号：PCT/IB2005000627

申请日：2005-03-08

Applicant: AZ ELECTRONIC MATERIALS USA

Inventor： HOULIHAN FRANCIS M ,  DAMMEL RALPH R ,  ROMANO ANDREW R ,  SAKAMURI RAJ

IPC: G03C1/76 ,  G03F7/09 ,  G03F7/11 ,  G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/091 ,  G03F7/11

Abstract: The present invention relates to a process for imaging , preferably deep ultraviolet (uv), photoresists with a topcoat using, preferably deep uv, immersion lithography. The invention further relates to a barrier coating composition comprising a polymer with at least one ionizable group having a pKa ranging from about -9 to about 11. The invention also relates to a process for imaging a photoresist with a (top) barrier coat to prevent contamination of the photoresist from environmental contaminants.

Abstract translation: 本发明涉及一种用于使用优选深紫外浸没光刻术的具有顶涂层的成像（优选深紫外（UV））光刻胶的方法。 本发明还涉及包含聚合物的阻隔涂料组合物，所述聚合物具有至少一个具有约-9至约11的pKa的可离子化基团。本发明还涉及用（顶部）阻挡涂层对光致抗蚀剂进行成像以防止 污染环境污染物的光致抗蚀剂。

公开(公告)号：WO2005067567A2

公开(公告)日：2005-07-28

申请号：PCT/US2005/000156

申请日：2005-01-05

Applicant: MICROCHEM CORP. ,  NIPPON KAYAKU CO., LTD

Inventor： WEBER, William ,  MORI, Satoshi ,  HONDA, Nao

IPC: G03C1/76 ,  G03F7/038 ,  G03F7/40

CPC classification number: G03F7/40 ,  G03F7/038

Abstract: Photoresist compositions that demonstrate superior photolithographic performance and hardened resist films that show superior resistance to solvents, have excellent resistance to under plating during the electrodeposition of metals, and show excellent resist stripping characteristics. These photoresist compositions according to the invention are well-suited as for applications in the manufacture of MEMS and micromachine devices. These photoresist compositions according to the invention comprise one or more epoxide-substituted, polycarboxylic acid Resin Component (A), one or more photoacid generator compounds (B), and one or more solvent (C).

Abstract translation: 显示优异的光刻性能的光刻胶组合物和显示出优异的耐溶剂性的硬化抗蚀剂膜，在金属电沉积期间具有优异的耐电镀性，并且显示出优异的抗剥离特性。 根据本发明的这些光致抗蚀剂组合物非常适用于制造MEMS和微机械装置的应用。 根据本发明的这些光致抗蚀剂组合物包含一种或多种环氧化物取代的多元羧酸树脂组分（A），一种或多种光酸产生剂化合物（B）和一种或多种溶剂（C）。

公开(公告)号：WO2004034435A3

公开(公告)日：2005-07-28

申请号：PCT/US0332091

申请日：2003-10-07

Applicant: BREWER SCIENCE INC

Inventor： NEEF CHARLES J ,  BHAVE MANDAR ,  FOWLER MICHELLE ,  WINDSOR MICHELLE

IPC: C09B69/00 ,  G03F7/09 ,  G03C1/76 ,  G03F7/00

CPC classification number: G03F7/091 ,  C09B69/00 ,  Y10S430/111 ,  Y10T428/31511 ,  Y10T428/31515

Abstract: Novel anti-reflective coatings comprising small molecules (e.g., less than about 5,000 g/mole) in lieu of high molecular weight polymers and methods of using those coatings are provided. In one embodiment, aromatic carboxylic acids are used as the chromophores, and the resulting compounds are blended with a crosslinking agent and an acid. Anti-reflective coating films prepared according to the invention exhibit improved properties compared to high molecular weight polymeric anti-reflective coating films. The small molecule anti-reflective coatings have high etch rates and good via fill properties. Photolithographic processes carried out with the inventive material result in freestanding, 110-nm profiles.

Abstract translation: 提供了包含小分子（例如小于约5,000g / mol）代替高分子量聚合物的新型抗反射涂层以及使用这些涂层的方法。 在一个实施方案中，使用芳族羧酸作为发色团，并将所得化合物与交联剂和酸共混。 与高分子量聚合物抗反射涂膜相比，根据本发明制备的抗反射涂膜显示出改进的性能。 小分子抗反射涂层具有高蚀刻速率和良好的通孔填充性能。 使用本发明材料进行的光刻工艺产生独立的110nm轮廓。

公开(公告)号：WO2005062123A1

公开(公告)日：2005-07-07

申请号：PCT/GB2004/004967

申请日：2004-11-25

Applicant: EASTMAN KODAK COMPANY ,  SLATER, Sean, D.

Inventor： SLATER, Sean, D.

IPC: G03C1/76

CPC classification number: B41M5/44 ,  B41M5/443 ,  G03C1/7614 ,  G03C2001/7635 ,  G03C2200/35 ,  Y10S430/162

Abstract: The invention provides an imaging element comprising a support having thereon, in order, at least one imaging layer, at least one interlayer containing a lubricant which provides scratch-resistance and at least one outermost layer containing a different lubricant which provides abrasion-resistance and a method of processing the element. The element has increased durability, especially with regard to scratch- and abrasion- (especially photoabrasion-) resistance, whilst retaining performance and ease of manufacture. Preferably the element is for use in the manufacture of printed circuit boards or the production of printing plates, wherein abrasion and scratches are particularly acute.

Abstract translation: 本发明提供了一种成像元件，其包括依次具有至少一个成像层，至少一个含有提供耐刮擦性的润滑剂的中间层和至少一个包含提供耐磨性的不同润滑剂的最外层的支撑体， 处理元素的方法。 该元件具有增加的耐久性，特别是在耐划伤和耐磨损（特别是耐光腐蚀）的同时，同时保持性能和易于制造。 优选地，该元件用于印刷电路板的制造或印刷版的制造，其中磨损和划痕特别尖锐。

公开(公告)号：WO2005016656A3

公开(公告)日：2005-05-26

申请号：PCT/US2004023538

申请日：2004-07-21

Applicant: EASTMAN KODAK CO ,  RAO YUANQIAO ,  SEDITA JOSEPH SALVATORE

Inventor： RAO YUANQIAO ,  SEDITA JOSEPH SALVATORE

IPC: G03C1/76 ,  G03C1/775 ,  G03C1/79 ,  G03C1/795 ,  B41M5/00

CPC classification number: G03C1/7614 ,  G03C1/775 ,  G03C1/79 ,  G03C1/795 ,  G03C1/7954 ,  G03C2001/7628 ,  G03C2001/7635 ,  Y10S430/162

Abstract: The present invention relates to an imaging element comprising a support, an imaging layer, and at least one layer comprising a clay nanocomposite wherein said nanocomposite comprises a splayant and at least one natural clay particle having an aspect ratio of from 20:1 to 500:1.

Abstract translation: 本发明涉及一种成像元件，其包括支撑体，成像层和至少一层包含粘土纳米复合材料的成像元件，其中所述纳米复合材料包括斜面和至少一种纵横比为20:1至500:1的天然粘土颗粒。 1。

公开(公告)号：WO2005005346A3

公开(公告)日：2005-03-31

申请号：PCT/JP2004008856

申请日：2004-06-17

Applicant: DAICEL CHEM ,  KOYAMA HIROSHI ,  TSUTSUMI KIYOHARU

Inventor： KOYAMA HIROSHI ,  TSUTSUMI KIYOHARU

IPC: C07C69/533 ,  C07C20060101 ,  C07C67/08 ,  C07C67/14 ,  C07C69/00 ,  C08F20/16 ,  C08F20/18 ,  G03C1/76

CPC classification number: C07C67/14 ,  C07C69/653 ,  C07C2603/74 ,  C08F220/18

Abstract: A polymerizable adamantane derivative represented by the following formula (1): (1) wherein R represents fluorine or fluoroalkyl and the adamantane ring may be substituted. Examples of the fluoroalkyl include trifluoromethyl, pentafluoroethyl, 2,2,2-trifluoroethyl, 2,2,2-trifluoro-1-(trifluoromethyl)ethyl, and heptafluoropropyl.

Abstract translation: 由下式（1）表示的可聚合金刚烷衍生物：（1）其中R 1表示氟或氟代烷基并且金刚烷环可以被取代。 氟代烷基的实例包括三氟甲基，五氟乙基，2,2,2-三氟乙基，2,2,2-三氟-1-（三氟甲基）乙基和七氟丙基。

公开(公告)号：WO2004095065A2

公开(公告)日：2004-11-04

申请号：PCT/US2004007273

申请日：2004-03-10

Applicant: ISP INVESTMENTS INC

Inventor： ANYUMBA JANETTE ,  LEWIS DAVID F ,  SHIH HSIAO-YI ,  YU XIANG

IPC: G01J20060101 ,  G01N21/00 ,  G01T20060101 ,  G03C1/76 ,  G03F7/025 ,  G03F7/029 ,  G01T

CPC classification number: G03F7/025 ,  G03F7/029

Abstract: This invention relates to photochromic filaments composed of the lithium salt of a conjugated, polymerizable polyacetylene having a carboxylic acid or carboxylate terminal group wherein the length to width ratio of said filaments is between about 5000:1 and about 5:1 and the average length of the filament is up to about 5cm. The invention also pertains to the use of said salts in maximized radiation sensitivity for imaging, radiation dose measurement or mapping and detection of radiation fields.

Abstract translation: 本发明涉及由具有羧酸或羧酸酯端基的共轭可聚合聚乙炔的锂盐组成的光致变色长丝，其中所述长丝的长宽比为约5000:1至约5:1，平均长度为 灯丝长达约5厘米。 本发明还涉及使用所述盐以最大的辐射敏感度进行成像，辐射剂量测量或辐射场的映射和检测。

公开(公告)号：WO0236652A3

公开(公告)日：2002-07-04

申请号：PCT/US0145173

申请日：2001-10-31

Applicant: BATTELLE MEMORIAL INSTITUTE

Inventor： GRATE JAY W ,  NELSON DAVID A

IPC: C08F2/46 ,  C09D183/04 ,  G03F7/004 ,  G03F7/027 ,  G03F7/038 ,  G03F7/075 ,  G03C1/73 ,  C08J3/28 ,  C08J7/04 ,  G03C1/76 ,  G03C5/16 ,  G03C5/56

CPC classification number: G03F7/0757 ,  C09D183/04 ,  G03F7/0755 ,  C08L83/00

Abstract: A composition containing a polymer, a crosslinker and a photo-activatable catalyst is placed on a substrate. The composition is exposed to a predetermined pattern of light, leaving an unexposed region. The light causes the polymer to become crosslinked by hydrosilylation. A solvent is used to remove the unexposed composition from the substrate, leaving the exposed pattern to become a sorbent polymer film that will absorb a predetermined chemical species when exposed to such chemical species.

Abstract translation: 将含有聚合物，交联剂和可光活化催化剂的组合物置于基底上。 将该组合物暴露于预定图案的光下，留下未暴露的区域。 光使聚合物通过氢化硅烷化交联。 使用溶剂将未暴露的组合物从基材上除去，使暴露的图案成为吸收性聚合物膜，当暴露于这样的化学物质时将吸收预定的化学物质。

公开(公告)号：WO01027696A1

公开(公告)日：2001-04-19

申请号：PCT/US2000/025536

申请日：2000-09-18

IPC: G03F7/004 ,  G03F1/00 ,  G03F7/00 ,  G03F7/029 ,  G03F7/09 ,  G03F7/095 ,  G03F7/11 ,  G03F7/36 ,  G03F7/38 ,  G03C1/76

CPC classification number: G03F7/091 ,  G03F7/029 ,  G03F7/202

Abstract: The present invention provides a method for producing direct-imaged flexographic printing elements such that both the front and back exposure times are economically efficient for the manufacturer. In one embodiment, the method comprises providing at least one solid photocurable element. The solid photocurable element comprises a solid photocurable material comprising an oxygen scavenger, a support layer having an actinic radiation absorbing compound integrated uniformly throughout such that is absorbs at least some actinic radiation during exposure, and a photoablative mask layer. The methods of the invention involve creating a floor in the solid photocurable material by back exposure through the support layer having the actinic radiation absorbing compound, transferring a negative image directly onto the solid photocurable material by photoablating the photoablatable mask layer, followed by front exposure effective to cure the solid photocurable material.

Abstract translation: 本发明提供了一种用于生产直接成像的柔版印刷元件的方法，使得正面和背面曝光时间对于制造商来说是经济有效的。 在一个实施方案中，该方法包括提供至少一种固体可光固化元件。 固体光固化元件包括固体光固化材料，其包含除氧剂，具有均匀整合的光化辐射吸收化合物的支撑层，以便在曝光期间吸收至少一些光化辐射，以及光蚀刻掩模层。 本发明的方法包括通过背光曝光通过具有光化辐射吸收化合物的支撑层来形成固体光固化材料中的底板，通过照相可光化掩模层将负像直接转印到固体可光固化材料上，然后进行正面曝光 固化固体光固化材料。