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    BALL-SPACER METHOD FOR PLANAR OBJECT LEVELING
    1.
    发明申请
    BALL-SPACER METHOD FOR PLANAR OBJECT LEVELING 审中-公开
    用于平面对象平衡的球间距方法

    公开(公告)号：WO2011139337A3

    公开(公告)日：2012-03-08

    申请号：PCT/US2011000727

    申请日：2011-04-26

    Applicant: NANOINK INC ,  BUSSAN JOHN EDWARD ,  HAAHEIM JASON R ,  MOSKAL JOHN ,  SOLHEIM EDWARD R ,  VAL-KHVALABOV VADIM ,  NELSON MICHAEL R ,  AMRO NABIL A ,  VAKIL JAVAD M

    Inventor： BUSSAN JOHN EDWARD ,  HAAHEIM JASON R ,  MOSKAL JOHN ,  SOLHEIM EDWARD R ,  VAL-KHVALABOV VADIM ,  NELSON MICHAEL R ,  AMRO NABIL A ,  VAKIL JAVAD M

    IPC: G03F7/00

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    Abstract: An apparatus for leveling an array of microscopic pens with respect to a substrate surface is provided. The apparatus includes an array of microscopic pens; a substrate having a substrate surface; a controllable arm comprising a spherical ball on an end thereof; a force sensor configured to measure a force exerted on the array or the substrate surface at each of the plurality of positions; one or more actuators configured to drive the array and/or the substrate to vary a relative distance and a relative tilting between the array and the substrate surface; and a controller configured to determine a planar offset of the array with respect to the substrate and initiate a leveling of the array with respect to the substrate based on the planar offset. Methods are also provided.

    Abstract translation: 提供了一种用于使微阵列阵列相对于衬底表面调平的装置。 该装置包括微阵列阵列; 具有基板表面的基板; 一个可控臂，其一端包括一个球形球; 力传感器，其构造成测量在所述多个位置中的每一个处施加在所述阵列或所述基板表面上的力; 一个或多个致动器被配置为驱动阵列和/或基板以改变阵列和基板表面之间的相对距离和相对倾斜; 以及控制器，被配置为确定阵列相对于衬底的平面偏移，并基于平面偏移启动相对于衬底的阵列的调平。 还提供了方法。

    COMPACT NANOFABRICATION APPARATUS
    4.
    发明申请
    COMPACT NANOFABRICATION APPARATUS 审中-公开
    紧凑的纳米装置

    公开(公告)号：WO2008141048A1

    公开(公告)日：2008-11-20

    申请号：PCT/US2008/062959

    申请日：2008-05-07

    Applicant: NANOINK, INC. ,  ROZHOK, Sergey, V. ,  NELSON, Michael ,  AMRO, Nabil, A. ,  FRAGALA, Joseph, S. ,  SHILE, Raymond, Roger ,  VANMERKESTYN, Dirk, N. ,  BUSSAN, John, Edward

    Inventor： ROZHOK, Sergey, V. ,  NELSON, Michael ,  AMRO, Nabil, A. ,  FRAGALA, Joseph, S. ,  SHILE, Raymond, Roger ,  VANMERKESTYN, Dirk, N. ,  BUSSAN, John, Edward

    IPC: G03F7/00 ,  G03F7/20

    CPC classification number: G03F7/0002 ,  G01Q80/00 ,  G03F7/70383 ,  G03F9/00

    Abstract: An apparatus for use in fabricating structures and depositing materials from tips to surfaces for patterning in direct-write mode, providing ability to travel macroscopic distances and yet provide for nanoscale patterning. Useful in small scale fabrication and nanolithography. The instrument can be compact and used on a laboratory bench or desktop. An apparatus comprising: at least one multi-axis assembly comprising a plurality of nanopositioning stages, at least one pen assembly, wherein the pen assembly and the multi-axis assembly are adapted for delivery of material from the pen assembly to a substrate which is positioned by the multi-axis assembly, at least one viewing assembly, at least one controller. Nanopositioning by piezoelectric methods and devices and motors is particularly useful. The apparatus can include integrated environmental chambers and housings, as well as ink reservoirs for materials to be delivered. The viewing assembly can be a microscope with a long working distance. Particularly useful for fabrication of bioarrays or microarrays. The multi-axis assembly can be a five-axis assembly. Software can facilitate efficient usage.

    Abstract translation: 一种用于制造结构并从尖端到表面沉积材料的装置，用于以直写式模式进行图案化，提供行进宏观距离并提供纳米尺度图案化的能力。 适用于小规模制造和纳米光刻。 该仪器可以紧凑，并在实验台或台式机上使用。 一种装置，包括：至少一个多轴组件，其包括多个纳米定位阶段，至少一个笔组件，其中所述笔组件和所述多轴组件适于将材料从所述笔组件传送到定位的衬底 通过多轴组件，至少一个观察组件，至少一个控制器。 通过压电方法和装置和电动机的定位是特别有用的。 该设备可以包括集成的环境室和壳体，以及用于要输送的材料的油墨储存器。 观察组件可以是具有长工作距离的显微镜。 特别适用于制造生物芯片或微阵列。 多轴组件可以是五轴组件。 软件可以促进有效的使用。

    LARGE AREA, HOMOGENEOUS ARRAY FABRICATION INCLUDING SUBSTRATE TEMPERATURE CONTROL
    5.
    发明申请
    LARGE AREA, HOMOGENEOUS ARRAY FABRICATION INCLUDING SUBSTRATE TEMPERATURE CONTROL 审中-公开
    大面积，均匀的阵列制造，包括基板温度控制

    公开(公告)号：WO2010085770A1

    公开(公告)日：2010-07-29

    申请号：PCT/US2010/022016

    申请日：2010-01-25

    Applicant: NANOINK, INC. ,  AMRO, Nabil, A. ,  SANEDRIN, Raymond ,  RENDLEN, Jeffrey, R. ,  NELSON, Michael, R.

    Inventor： AMRO, Nabil, A. ,  SANEDRIN, Raymond ,  RENDLEN, Jeffrey, R. ,  NELSON, Michael, R.

    IPC: G03F7/00

    CPC classification number: G03F7/0002

    Abstract: Improved patterning at small scale including nanoscale. A method comprising: providing at least one cantilever comprising at least one tip thereon, and a material deposited on the tip, contacting the cantilever with a substrate so that the material is deposited from the tip onto the substrate to form a material deposit, wherein the temperature of the substrate is adapted to control a size of the material deposit. A device comprising: at least one heat sink, at least one heating or cooling stage, at least one vacuum system, wherein the device is adapted to function with a substrate to be subjected to a material deposition and to keep the substrate temperature substantially constant during deposition.

    Abstract translation: 改进了小尺寸的图案，包括纳米级。 一种方法，包括：提供包括至少一个尖端的至少一个悬臂和沉积在所述尖端上的材料，使所述悬臂与基底接触，使得所述材料从所述尖端沉积到​​所述基底上以形成材料沉积物，其中 衬底的温度适于控制材料沉积物的尺寸。 一种装置，包括：至少一个散热器，至少一个加热或冷却台，至少一个真空系统，其中所述装置适于与要进行材料沉积的基板起作用，并且使基板温度在 沉积。

    STABILIZATION OF SELF-ASSEMBLED MONOLAYERS
    6.
    发明申请
    STABILIZATION OF SELF-ASSEMBLED MONOLAYERS 审中-公开
    自组装单体的稳定性

    公开(公告)号：WO2005089415A3

    公开(公告)日：2009-04-23

    申请号：PCT/US2005008850

    申请日：2005-03-17

    Applicant: UNIV CALIFORNIA ,  UNIV WAYNE STATE ,  LIU GANG-YU ,  AMRO NABIL A ,  YANG GUOHUA

    Inventor： LIU GANG-YU ,  AMRO NABIL A ,  YANG GUOHUA

    IPC: B32B15/04 ,  B05D1/00 ,  B05D1/18 ,  B05D1/36 ,  B05D3/10 ,  G01N33/543

    CPC classification number: G01N33/54393 ,  B05D1/185 ,  B05D3/107 ,  B82Y30/00 ,  G01N2610/00 ,  Y10T428/268 ,  Y10T428/31536 ,  Y10T428/31678

    Abstract: Self-assembled monolayers and other solid support/surface-layer systems are widely used as resists for nanofabrication because of its closely packed structure, low defect density, and uniform thickness. However these resists suffer the drawback of low stability in liquid due to desorption and/or oxidation induced desorption. Stabilized solid support/surface-layer systems and methods of preserving the integrity and structure of self-assembled monolayers on solid surfaces are provided. The method involves adding small amount of amphiphilic molecules, such as DMF and DMSO, into aqueous solutions as preserving media. These molecules adhere favorably to defect sites within monolayers and inhibit the initiation of both known degradation pathways: oxidation and desorption. Also provided are stabilized systems including the solid support/surface-layer system and stabilizing solution, as well as kits of stabilizing solutions for use with various systems.

    Abstract translation: 自组装单层和其他固体支撑/表面层系统由于其紧密堆积的结构，低缺陷密度和均匀的厚度被广泛用作纳米加工的抗蚀剂。 然而，这些抗蚀剂具有由于解吸和/或氧化诱导解吸而在液体中的低稳定性的缺点。 提供了稳定的固体支持体/表面层系统以及在固体表面上保持自组装单层的完整性和结构的方法。 该方法包括将少量两亲分子如DMF和DMSO加入到水溶液中作为保存介质。 这些分子有利地粘附在单层内的缺陷部位，并且抑制已知的降解途径的引发：氧化和解吸。 还提供了稳定的系统，包括固体支持体/表面层系统和稳定化溶液，以及用于各种系统的稳定化溶液试剂盒。

    STABILIZATION OF SELF-ASSEMBLED MONOLAYERS
    7.
    发明申请
    STABILIZATION OF SELF-ASSEMBLED MONOLAYERS 审中-公开
    自组装单体的稳定性

    公开(公告)号：WO2005089415A2

    公开(公告)日：2005-09-29

    申请号：PCT/US2005/008850

    申请日：2005-03-17

    Applicant: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA ,  WAYNE STATE UNIVERSITY ,  LIU, Gang-Yu ,  AMRO, Nabil, A. ,  YANG, Guohua

    Inventor： LIU, Gang-Yu ,  AMRO, Nabil, A. ,  YANG, Guohua

    IPC: B05D1/18 ,  B05D3/10 ,  B32B15/04 ,  G01N33/543

    CPC classification number: G01N33/54393 ,  B05D1/185 ,  B05D3/107 ,  B82Y30/00 ,  G01N2610/00 ,  Y10T428/268 ,  Y10T428/31536 ,  Y10T428/31678

    Abstract: Self-assembled monolayers and other solid support/surface-layer systems are widely used as resists for nanofabrication because of its closely packed structure, low defect density, and uniform thickness. However these resists suffer the drawback of low stability in liquid due to desorption and/or oxidation induced desorption. Stabilized solid support/surface-layer systems and methods of preserving the integrity and structure of self-assembled monolayers on solid surfaces are provided. The method involves adding small amount of amphiphilic molecules, such as DMF and DMSO, into aqueous solutions as preserving media. These molecules adhere favorably to defect sites within monolayers and inhibit the initiation of both known degradation pathways: oxidation and desorption. Also provided are stabilized systems including the solid support/surface-layer system and stabilizing solution, as well as kits of stabilizing solutions for use with various systems.

    Abstract translation: 自组装单层和其他固体支撑/表面层系统由于其紧密堆积的结构，低缺陷密度和均匀的厚度被广泛用作纳米加工的抗蚀剂。 然而，这些抗蚀剂具有由于解吸和/或氧化诱导解吸而在液体中的低稳定性的缺点。 提供了稳定的固体支持体/表面层系统以及在固体表面上保持自组装单层的完整性和结构的方法。 该方法包括将少量两亲分子如DMF和DMSO加入到水溶液中作为保存介质。 这些分子有利地粘附在单层内的缺陷部位，并且抑制已知的降解途径的引发：氧化和解吸。 还提供了稳定的系统，包括固体支持体/表面层系统和稳定化溶液，以及用于各种系统的稳定化溶液试剂盒。

    LARGE AREA, HOMOGENEOUS ARRAY FABBRICATION INCLUDING LEVELING WITH USE OF BRIGHT SPOTS
    9.
    发明申请
    LARGE AREA, HOMOGENEOUS ARRAY FABBRICATION INCLUDING LEVELING WITH USE OF BRIGHT SPOTS 审中-公开
    大面积，均匀的阵列包括使用亮点的水平

    公开(公告)号：WO2010085768A1

    公开(公告)日：2010-07-29

    申请号：PCT/US2010/022014

    申请日：2010-01-25

    Applicant: NANOINK,INC. ,  AMRO, Nabil, A. ,  SANEDRIN, Raymond

    Inventor： AMRO, Nabil, A. ,  SANEDRIN, Raymond

    IPC: G03F7/00 ,  G01Q70/06

    CPC classification number: G03F7/0002 ,  G01Q80/00 ,  G03F9/7034

    Abstract: Better leveling procedures for patterning at the small scale including the nanoscale. A method comprising: providing at least one array of cantilevers comprising tips thereon, wherein the cantilevers comprise at least one relatively bright spot, or at least two relatively bright spots, near the tip upon viewing, providing a substrate, leveling the array and the substrate with respect to each other, wherein the relatively bright spot near the tip is viewed to determine a contact of the tip and substrate.

    Abstract translation: 更好的平整程序，在小规模的图案化，包括纳米尺度。 一种方法，包括：提供包括其上的尖端的悬臂的至少一个阵列，其中所述悬臂包括在观察时在所述尖端附近的至少一个相对亮点或至少两个相对较亮的点，提供衬底，使所述阵列和所述衬底 相对于彼此，其中观察到靠近尖端的相对亮点以确定尖端和基底的接触。

    LARGE AREA, HOMOGENEOUS ARRAY FABRICATION INCLUDING CONTROLLED TIP LOADING VAPOR DEPOSITION
    10.
    发明申请
    LARGE AREA, HOMOGENEOUS ARRAY FABRICATION INCLUDING CONTROLLED TIP LOADING VAPOR DEPOSITION 审中-公开
    大面积，均匀的阵列制造，包括控制尾料加载蒸气沉积

    公开(公告)号：WO2010085767A1

    公开(公告)日：2010-07-29

    申请号：PCT/US2010/022013

    申请日：2010-01-25

    Applicant: NANOINK. INC. ,  AMRO, Nabil, A. ,  SANEDRIN, Raymond

    Inventor： AMRO, Nabil, A. ,  SANEDRIN, Raymond

    IPC: G03F7/00 ,  G01Q60/00

    CPC classification number: G03F7/0002 ,  G01Q80/00

    Abstract: Improved methods for loading arrays of tips with a material for subsequent deposition of the material from the tip to the substrate. Tip loading can be done by controlled vapor deposition which reduces the amount of non-specific material deposition onto a substrate. Improved nanoscale and microscale engineering and lithography can be achieved. Applications include better cellular studies including stem cell studies and stem cell differentiation control.

    Abstract translation: 改进的用于将材料阵列​​装载到材料的方法，用于将材料从尖端沉积到​​衬底。 尖端加载可以通过控制气相沉积来进行，这减少了非特异性材料沉积到基底上的量。 可以实现改进的纳米尺度和微尺度工程和光刻。 应用包括更好的细胞研究，包括干细胞研究和干细胞分化控制。

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