SYSTEM AND METHOD FOR MAPPING AND DISPLAYING AUDIO SOURCE LOCATIONS
    1.
    发明申请
    SYSTEM AND METHOD FOR MAPPING AND DISPLAYING AUDIO SOURCE LOCATIONS 审中-公开
    用于映射和显示音频源位置的系统和方法

    公开(公告)号:WO2013134122A1

    公开(公告)日:2013-09-12

    申请号:PCT/US2013/028866

    申请日:2013-03-04

    CPC classification number: H04R29/00 G01H3/00 G01S5/18 H04S7/40

    Abstract: The present invention relates generally to a method and system for defining a reference sound position and producing an indicia proximate thereto in relation to one or more sound characteristics. The present invention, in one or more embodiments, provides for displaying a holographic image at a reference sound location which is determined in relation to the identification of one or more target sounds being associated with one or more identified sound characteristics. In other embodiments, the present invention provides for an indicia to appear to be interactive with a reference sound location and may be used in a variety of environments including but not limited to rock theatrics, homeland security and residential security.

    Abstract translation: 本发明一般涉及一种用于定义参考声音位置并相对于一个或多个声音特征产生靠近其的标记的方法和系统。 在一个或多个实施例中,本发明提供了在参考声音位置处显示全息图像,该参考声音位置相对于与一个或多个识别的声音特征相关联的一个或多个目标声音的识别而确定。 在其他实施例中,本发明提供了与参考声音位置相互交互的标记,并且可以用于各种环境中,包括但不限于摇滚歌剧,国土安全和住宅安全。

    PASSIVE INFRARED FLIR IMAGE SPECTROSCOPIC SENSOR
    2.
    发明申请
    PASSIVE INFRARED FLIR IMAGE SPECTROSCOPIC SENSOR 审中-公开
    被动红外图像光谱传感器

    公开(公告)号:WO2008097262A2

    公开(公告)日:2008-08-14

    申请号:PCT/US2007/016040

    申请日:2007-07-13

    CPC classification number: G01N21/3563

    Abstract: A Passive Infrared FLIR Image Spectroscopic Sensor (πFLIRISS) system for detecting and identifying explosives at >50 m. Photons are continuously radiated from a person's clothing. Superimposed on the blackbody emission curves will be infrared spectral patterns due to clothing fabric, including any telltale spectral patterns of possible explosive traces. Most relevant explosive materials exhibit specific infrared spectra absorption and emission fingerprints which are detected and identified by the πFLIRISS system. An integrated, relatively long range threat detection system which utilizes the πFLIRISS system is also disclosed.

    Abstract translation: 被动红外FLIR图像光谱传感器(pFLIRISS)系统,用于检测和识别> 50 m的爆炸物。 光子从人的衣服上不断地辐射出来。 叠加在黑体发射曲线上将是由于衣服织物引起的红外光谱图,包括可能的爆炸痕迹的任何指示光谱图。 最相关的爆炸性材料表现出由pFLIRISS系统检测和识别的特定的红外光谱吸收和发射指纹。 还公开了一种利用pFLIRISS系统的集成的相对较远的威胁检测系统。

    SYSTEM AND METHOD TO LOCALIZE SOUND AND PROVIDE REAL-TIME WORLD COORDINATES WITH COMMUNICATION
    4.
    发明申请
    SYSTEM AND METHOD TO LOCALIZE SOUND AND PROVIDE REAL-TIME WORLD COORDINATES WITH COMMUNICATION 审中-公开
    将声音本地化并提供实时世界协调的系统和方法与通信

    公开(公告)号:WO2015157426A3

    公开(公告)日:2015-12-10

    申请号:PCT/US2015024934

    申请日:2015-04-08

    Applicant: BEATY JOHN

    Abstract: A system, method and program product for improved techniques for sound management and sound localization is provided. The present invention provides for improving sound localization and detection by inputting a predetermined location's dimensional data and location reference and processing detected sound details, detection device details and the associated location dimensional data as sound localization information for multi-dimensional display. The present invention provides mapping information of sound, people and structural information for use in multiple applications including residential, commercial and emergency situations.

    Abstract translation: 提供了用于声音管理和声音定位的改进技术的系统,方法和程序产品。 本发明通过输入预定位置的尺寸数据和位置参考并且将检测到的声音细节,检测装置细节和相关联的位置尺寸数据作为多维显示的​​声音定位信息来提高声音定位和检测。 本发明提供用于包括住宅,商业和紧急情况在内的多种应用的声音,人物和结构信息的映射信息。

    PHOTOLITHOGRAPHY MASK REPAIR
    6.
    发明申请
    PHOTOLITHOGRAPHY MASK REPAIR 审中-公开
    光刻胶面膜修复

    公开(公告)号:WO2004027684A2

    公开(公告)日:2004-04-01

    申请号:PCT/US2003/029521

    申请日:2003-09-18

    IPC: G06K

    CPC classification number: G03F1/74 G03F1/72

    Abstract: Masks can be repaired by creating a structure that is different from the original design, but that produces the same aerial image. For example, missing opaque material can be replaced by implanting gallium atoms to reduce transmission and quartz can be etched to an appropriate depth to produce the proper phase. In another aspect, a laser or other means can be used to remove an area of a mask around a defect, and then mask structures, either the intended design structures or alternate structures that produce the same aerial image, can be constructed using charged particle beam deposition and etching. For example, an electron beam can be used to deposit quartz to alter the phase of transmitted light. An electron beam can also be used with a gas to etch quartz to remove a layer including implanted gallium atoms. Gallium staining can also be reduced or eliminated by providing a sacrificial layer that can be removed, along with the implanted gallium atoms, using, for example, a broad ion beam. In another aspect, a charged particle beam can be programmed to etch a defect using three-dimensional information derived from two charged particle beams images of the defect from different angle.

    Abstract translation: 可以通过创建与原始设计不同的结构来修复面具,但是可以产生相同的空间图像。 例如,可以通过注入镓原子来替代缺失的不透明材料以减少透射,并且可以将石英蚀刻到适当的深度以产生适当的相位。 在另一方面,可以使用激光器或其他装置来去除缺陷周围的掩模区域,然后可以使用带电粒子束来构造掩模结构,即产生相同空间图像的预期设计结构或替代结构 沉积和蚀刻。 例如,电子束可用于沉积石英以改变透射光的相位。 电子束也可与气体一起使用以蚀刻石英以除去包括注入的镓原子的层。 通过使用例如宽离子束,通过提供可以与注入的镓原子一起除去的牺牲层也可以减少或消除镓染色。 在另一方面,带电粒子束可被编程为使用从两个带电粒子束导出的来自不同角度的缺陷图像的三维信息来蚀刻缺陷。

    PHOTOLITHOGRAPHY MASK REPAIR
    7.
    发明申请
    PHOTOLITHOGRAPHY MASK REPAIR 审中-公开
    光刻胶修复

    公开(公告)号:WO2004027684B1

    公开(公告)日:2005-01-06

    申请号:PCT/US0329521

    申请日:2003-09-18

    CPC classification number: G03F1/74 G03F1/72

    Abstract: Masks can be repaired by creating a structure that is different from the original design, but that produces the same aerial image. For example, missing opaque material can be replaced by implanting gallium atoms to reduce transmission and quartz can be etched to an appropriate depth to produce the proper phase. In another aspect, a laser or other means can be used to remove an area of a mask around a defect, and then mask structures, either the intended design structures or alternate structures that produce the same aerial image, can be constructed using charged particle beam deposition and etching. For example, an electron beam can be used to deposit quartz to alter the phase of transmitted light. An electron beam can also be used with a gas to etch quartz to remove a layer including implanted gallium atoms. Gallium staining can also be reduced or eliminated by providing a sacrificial layer that can be removed, along with the implanted gallium atoms, using, for example, a broad ion beam. In another aspect, a charged particle beam can be programmed to etch a defect using three-dimensional information derived from two charged particle beams images of the defect from different angle.

    Abstract translation: 可以通过创建与原始设计不同的结构来修复面具,但产生相同的空间图像。 例如,可以通过注入镓原子来代替缺少的不透明材料以减少透射,并且可以将石英蚀刻到适当的深度以产生适当的相位。 在另一方面,可以使用激光器或其他装置去除缺陷周围的掩模区域,然后可以使用带电粒子束来构造掩模结构,或者产生相同空间图像的预期设计结构或替代结构 沉积和蚀刻。 例如,电子束可用于沉积石英以改变透射光的相位。 电子束也可与气体一起使用以蚀刻石英以除去包括注入的镓原子的层。 也可以通过提供可以使用例如宽离子束与注入的镓原子一起除去的牺牲层来还原或消除镓染色。 在另一方面,带电粒子束可被编程为使用从两个带电粒子束导出的来自不同角度的缺陷图像的三维信息来蚀刻缺陷。

    SYSTEM AND METHOD TO LOCALIZE SOUND AND PROVIDE REAL-TIME WORLD COORDINATES WITH COMMUNICATION
    8.
    发明申请
    SYSTEM AND METHOD TO LOCALIZE SOUND AND PROVIDE REAL-TIME WORLD COORDINATES WITH COMMUNICATION 审中-公开
    用于定位声音并通过通信提供实时世界坐标的系统和方法

    公开(公告)号:WO2015157426A2

    公开(公告)日:2015-10-15

    申请号:PCT/US2015/024934

    申请日:2015-04-08

    Applicant: BEATY, John

    Abstract: A system, method and program product for improved techniques for sound management and sound localization is provided. The present invention provides for improving sound localization and detection by inputting a predetermined location's dimensional data and location reference and processing detected sound details, detection device details and the associated location dimensional data as sound localization information for multi-dimensional display. The present invention provides mapping information of sound, people and structural information for use in multiple applications including residential, commercial and emergency situations.

    Abstract translation: 提供了一种用于声音管理和声音定位的改进技术的系统,方法和程序产品。 本发明通过输入预定位置的尺寸数据和位置参考并处理检测到的声音细节,检测装置细节和相关联的位置尺寸数据作为用于多维显示的​​声音定位信息,来改善声音定位和检测。 本发明提供声音,人物和结构信息的映射信息,用于包括住宅,商业和紧急情况的多种应用。

    PHOTOLITHOGRAPHY MASK REPAIR
    9.
    发明申请
    PHOTOLITHOGRAPHY MASK REPAIR 审中-公开
    光刻胶面膜修复

    公开(公告)号:WO2004027684A3

    公开(公告)日:2004-11-04

    申请号:PCT/US0329521

    申请日:2003-09-18

    CPC classification number: G03F1/74 G03F1/72

    Abstract: Masks can be repaired by creating a structure that is different from the original design, but that produces the same aerial image. For example, missing opaque material can be replaced by implanting gallium atoms to reduce transmission and quartz can be etched to an appropriate depth to produce the proper phase. In another aspect, a laser or other means can be used to remove an area of a mask around a defect, and then mask structures, either the intended design structures or alternate structures that produce the same aerial image, can be constructed using charged particle beam deposition and etching. For example, an electron beam can be used to deposit quartz to alter the phase of transmitted light. An electron beam can also be used with a gas to etch quartz to remove a layer including implanted gallium atoms. Gallium staining can also be reduced or eliminated by providing a sacrificial layer that can be removed, along with the implanted gallium atoms, using, for example, a broad ion beam. In another aspect, a charged particle beam can be programmed to etch a defect using three-dimensional information derived from two charged particle beams images of the defect from different angle.

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