公开(公告)号：WO2018208912A2

公开(公告)日：2018-11-15

申请号：PCT/US2018/031796

申请日：2018-05-09

Applicant: NIKON CORPORATION ,  SMITH, Daniel, Gene ,  WILLIAMSON, David, M. ,  FLAGELLO, Donis, G. ,  BINNARD, Michael, B.

Inventor： SMITH, Daniel, Gene ,  WILLIAMSON, David, M. ,  FLAGELLO, Donis, G. ,  BINNARD, Michael, B.

IPC: G03F7/20 ,  G02B17/06 ,  G21K1/06

Abstract: A catoptric system having a reference axis and including a reflective pattern-source (carrying a substantially one-dimensional pattern) and a combination of two optical reflectors disposed sequentially to transfer EUV radiation incident onto the first optical component to the pattern-source the substantially one-dimensional pattern of which is disposed in a curved surface. In one case, such combination includes only two optical reflectors (each may contain multiple constituent components). The combination is disposed in a fixed spatial and optical relationship with respect to the pattern-source, and represents an illumination unit (IU) of a ID EUV exposure tool that additionally includes (includes a projection optical sub-system configured to form an optical image of the pattern-source on an image plane with the use of only two beams of radiation. These only two beams of radiation originate at the pattern-source from the EUV radiation transferred onto the pattern-source.

公开(公告)号：WO2013070568A2

公开(公告)日：2013-05-16

申请号：PCT/US2012/063646

申请日：2012-11-06

Applicant: NIKON CORPORATION ,  PHARAND, Michel ,  MAHADESWARASWAMY, Chetan ,  BINNARD, Michael, B.

Inventor： PHARAND, Michel ,  MAHADESWARASWAMY, Chetan ,  BINNARD, Michael, B.

IPC: B01J8/00

CPC classification number: G03F7/70716 ,  B01J19/0093 ,  B01J2219/00783 ,  B01J2219/00873 ,  G03F7/70758 ,  G03F7/70858 ,  G03F7/70875 ,  H01L21/682

Abstract: A stage assembly (10) that includes (i) a stage (14) that retains a device (26); (ii) a reaction assembly (18) that is spaced apart from the stage (14); (iii) a stage mover (16) that moves the stage (14), the stage mover (16) including a magnet array (38) that is coupled to the stage (14) and a conductor array (36) that is coupled to the reaction assembly (18); (iv) a temperature adjuster (20); and (v) a control system (22) that selectively controls the temperature adjuster (20). The conductor array (36) includes a set of first zone conductor units (250), and a set of second zone conductor units (252). The temperature adjuster (20) independently adjusts the temperature of the set of first zone conductor units (250), and the set of second zone conductor units (252).

Abstract translation: 一种舞台组件（10），包括（i）保持装置（26）的舞台（14）; （ii）与所述载物台（14）间隔开的反应组件（18）; （iii）移动所述载物台（14）的载物台移动器（16），所述载物台移动器（16）包括联接到所述载物台（14）的磁体阵列（38）和导体阵列（36），所述导体阵列 反应组件（18）; （iv）温度调节器（20）; 和（v）选择性地控制温度调节器（20）的控制系统（22）。 导体阵列（36）包括一组第一区导体单元（250）和一组第二区导体单元（252）。 温度调节器（20）独立地调节该组第一区导体单元（250）和该组第二区导体单元（252）的温度。

公开(公告)号：WO2012029998A2

公开(公告)日：2012-03-08

申请号：PCT/JP2011070669

申请日：2011-09-05

Applicant: NIPPON KOGAKU KK ,  BINNARD MICHAEL B ,  COAKLEY SCOTT ,  POON ALEX ,  TOTSU MASAHIRO ,  COON DEREK ,  KHO LEONARD ,  KESWANI GAURAV ,  COOPER ALEXANDER ,  PHARAND MICHEL ,  BJORK MATT

Inventor： BINNARD MICHAEL B ,  COAKLEY SCOTT ,  POON ALEX ,  TOTSU MASAHIRO ,  COON DEREK ,  KHO LEONARD ,  KESWANI GAURAV ,  COOPER ALEXANDER ,  PHARAND MICHEL ,  BJORK MATT

IPC: H02K3/24

CPC classification number: H02K9/22 ,  G03F7/70758 ,  G03F7/70875 ,  H02K9/19 ,  H02K41/031 ,  H02K2201/18

Abstract: Linear and planar motors, as exemplary electromagnetic actuators, are disclosed that have at least one actively cooled coil assembly. An exemplary assembly includes a coil having first and second main surfaces. Also included is a respective thermally conductive cooling plate in thermal contact with at least one main surface of the coil. A coolant passageway is defined in or on each cooling plate, and a liquid coolant passes through the coolant passageway. The coolant passageway has a primary pattern that is coextensive with at least part of the main surface of the coil. The primary pattern can include a secondary pattern producing coolant flow through the coolant passageway in a manner that reduces eddy-current losses in the cooling plate. The coolant passageway desirably includes. An exemplary secondary pattern is serpentine. An exemplary primary pattern is radial or has a radial aspect, such as an X-shaped pattern. The devices provide more effective cooling, with better reliability and ease of maintenance, and reduced eddy-current drag than conventional actuators.

Abstract translation: 作为示例性电磁致动器，公开了线性和平面电机，其具有至少一个主动冷却的线圈组件。 示例性组件包括具有第一和第二主表面的线圈。 还包括与线圈的至少一个主表面热接触的相应导热冷却板。 冷却剂通路限定在每个冷却板中或上，并且液体冷却剂穿过冷却剂通路。 冷却剂通道具有与线圈的主表面的至少一部分共同延伸的主要图案。 主要模式可以包括次要模式，以减少冷却板中的涡流损失的方式产生通过冷却剂通道的冷却剂流。 冷却剂通道理想地包括。 示例性的次级模式是蛇形。 示例性主要图案是径向或具有径向方面，诸如X形图案。 该设备提供更有效的冷却，具有更好的可靠性和易于维护，并且比传统执行器减少了涡流阻力。

公开(公告)号：WO2017222919A1

公开(公告)日：2017-12-28

申请号：PCT/US2017/037786

申请日：2017-06-15

Applicant: NIKON CORPORATION ,  BINNARD, Michael, B.

Inventor： BINNARD, Michael, B.

IPC: G03F9/00

Abstract: An extreme ultraviolet lithography system (10) that creates a new pattern (330) having a plurality of densely packed parallel lines (332) on a workpiece (22), the system (10) includes a patterning element (16); an EUV illumination system (12) that directs an extreme ultraviolet beam (13B) at the patterning element (16); a projection optical assembly (18) that directs the extreme ultraviolet beam diffracted off of the patterning element (16) at the workpiece (22) to create a first stripe (364) of generally parallel lines (332) during a first scan (365); and a control system (24). The workpiece (22) includes an existing pattern (233) that is distorted. The control system (24) selectively adjusts a control parameter during the first scan (365) so that the first stripe (364) is distorted to more accurately overlay the portion of existing pattern (233) positioned under the first stripe (364).

Abstract translation: 一种在工件（22）上形成具有多条密集平行线（332）的新图案（330）的极紫外光刻系统（10），所述系统（10）包括图案化 元件（16）; 在图案化元件（16）处引导极紫外光束（13B）的EUV照明系统（12）; 投影光学组件（18），其在第一扫描（365）期间引导在工件（22）处衍射离开图案形成元件（16）的远紫外光束以形成大致平行线（332）的第一条带（364） ; 和控制系统（24）。 工件（22）包括扭曲的现有图案（233）。 控制系统（24）在第一扫描（365）期间选择性地调节控制参数，使得第一条纹（364）变形以更精确地覆盖位于第一条纹（364）下方的现有图案（233）的部分。 / p>

公开(公告)号：WO2013070568A3

公开(公告)日：2015-06-11

申请号：PCT/US2012063646

申请日：2012-11-06

Applicant: NIPPON KOGAKU KK ,  PHARAND MICHEL ,  MAHADESWARASWAMY CHETAN ,  BINNARD MICHAEL B

Inventor： PHARAND MICHEL ,  MAHADESWARASWAMY CHETAN ,  BINNARD MICHAEL B

IPC: G05D23/275

CPC classification number: G03F7/70716 ,  B01J19/0093 ,  B01J2219/00783 ,  B01J2219/00873 ,  G03F7/70758 ,  G03F7/70858 ,  G03F7/70875 ,  H01L21/682

Abstract: A stage assembly (10) that includes (i) a stage (14) that retains a device (26); (ii) a reaction assembly (18) that is spaced apart from the stage (14); (iii) a stage mover (16) that moves the stage (14), the stage mover (16) including a magnet array (38) that is coupled to the stage (14) and a conductor array (36) that is coupled to the reaction assembly (18); (iv) a temperature adjuster (20); and (v) a control system (22) that selectively controls the temperature adjuster (20). The conductor array (36) includes a set of first zone conductor units (250), and a set of second zone conductor units (252). The temperature adjuster (20) independently adjusts the temperature of the set of first zone conductor units (250), and the set of second zone conductor units (252).

Abstract translation: 一种舞台组件（10），包括（i）保持装置（26）的舞台（14）; （ii）与所述载物台（14）间隔开的反应组件（18）; （iii）移动所述载物台（14）的载物台移动器（16），所述载物台移动器（16）包括联接到所述载物台（14）的磁体阵列（38）和导体阵列（36），所述导体阵列 反应组件（18）; （iv）温度调节器（20）; 和（v）选择性地控制温度调节器（20）的控制系统（22）。 导体阵列（36）包括一组第一区导体单元（250）和一组第二区导体单元（252）。 温度调节器（20）独立地调节该组第一区导体单元（250）和该组第二区导体单元（252）的温度。

公开(公告)号：WO2010041771A3

公开(公告)日：2010-08-12

申请号：PCT/JP2009067952

申请日：2009-10-09

Applicant: NIPPON KOGAKU KK ,  BINNARD MICHAEL B ,  GERY JEAN-MARC

Inventor： BINNARD MICHAEL B ,  GERY JEAN-MARC

IPC: H02K41/03 ,  H02K1/17

CPC classification number: H02K1/17 ,  H02K1/278 ,  H02K41/031 ,  H02K2201/18

Abstract: A planar motor (32) for positioning a stage (44) along a first axis, and along a second axis that is perpendicular to the first axis includes a conductor array (52) and a magnet array (34). The conductor array (52) includes at least one conductor (256). The magnet array (34) is positioned near the conductor array (52) and is spaced apart from the conductor array (52) along a third axis that is perpendicular to the first axis and the second axis. The magnet array (34) includes a first magnet unit (264) having a first diagonal magnet (Dl) with a diagonal magnetization direction (268) that is diagonal to the first axis, the second axis and the third axis. This leads to strong magnetic fields above the magnet array (34) and strong force generation capability. Further, the planar motor (32) provided herein has less stray magnetic fields that extend beyond the magnet array (34) than a comparable prior art planar motor. Moreover, the first magnet unit (264) can include a second diagonal magnet (D2), a third diagonal magnet (D3), and a fourth diagonal magnet (D4) that cooperate to provide a first combined magnetic flux (276) that is somewhat aligned along the third axis in a first flux direction. In this embodiment, each diagonal magnet (Dl) (D2) (D3) (D4) has the diagonal magnetization direction (268) that is diagonal to the first axis, the second axis and the third axis. Moreover, each diagonal magnet (Dl) (D2) (D3) (D4) can be generally triangular wedge shaped and the diagonal magnets (Dl) (D2) (D3) (D4) are arranged together into the shape of a parallelepiped.

Abstract translation: 用于沿着第一轴线并且沿着垂直于第一轴线的第二轴线定位工作台（44）的平面马达（32）包括导体阵列（52）和磁体阵列（34）。 导体阵列（52）包括至少一个导体（256）。 磁体阵列（34）位于导体阵列（52）附近并且沿着垂直于第一轴线和第二轴线的第三轴线与导体阵列（52）间隔开。 磁体阵列（34）包括具有第一对角磁体（D1）的第一磁体单元（264），第一对角磁体具有与第一轴线，第二轴线和第三轴线对角的对角磁化方向（268）。 这导致磁体阵列（34）上方的强磁场和强大的力生成能力。 此外，本文提供的平面电机（32）具有比可比较的现有技术平面电机更少的超出磁体阵列（34）的杂散磁场。 此外，第一磁体单元（264）可以包括第二对角线磁体（D2），第三对角线磁体（D3）和第四对角线磁体（D4），它们协作以提供一定的第一组合磁通量（276） 沿着第三轴线在第一通量方向上对齐。 在该实施例中，每个对角线磁体（D1）（D2）（D3）（D4）具有与第一轴线，第二轴线和第三轴线对角的对角线磁化方向（268）。 此外，每个对角线磁体（D1）（D2）（D3）（D4）可以是大致三角形楔形形状，并且对角线磁体（D1）（D2）（D3）（D4）一起布置为平行六面体形状。

公开(公告)号：WO2018156702A1

公开(公告)日：2018-08-30

申请号：PCT/US2018/019137

申请日：2018-02-22

Applicant: NIKON CORPORATION ,  BINNARD, Michael B.

Inventor： BINNARD, Michael B. ,  SMITH, Daniel G.

IPC: G02B27/44 ,  G02B27/50

Abstract: A method for measuring a spatial distortion of a target surface (110) of a workpiece (110A). Light is transmitted twice through a reference pattern-generator (104) and impinged upon a workpiece pattern-generator (108). Then, with an optical detector (116), first and second beams formed by the light as a result of interaction with two pattern-generators (104) (106) is acquired to produce a signal characterizing geometry of interference fringes formed at the detector (116) by the first and second beams. Indicia representing at least one of a type and a value of spatial distortion of the target surface (110) is generated and recorded. A system embodying the implementation of the method.

公开(公告)号：WO2013090123A1

公开(公告)日：2013-06-20

申请号：PCT/US2012/068294

申请日：2012-12-06

Applicant: NIKON CORPORATION ,  BINNARD, Michael B. ,  PHARAND, Michel ,  MORIMOTO, Shigeru ,  POON, Alex Ka Tim ,  COON, Derek ,  KHO, Leonard Wai Fung ,  KESWANI, Gaurav

Inventor： BINNARD, Michael B. ,  PHARAND, Michel ,  MORIMOTO, Shigeru ,  POON, Alex Ka Tim ,  COON, Derek ,  KHO, Leonard Wai Fung ,  KESWANI, Gaurav

IPC: H02K9/22

CPC classification number: H02K9/22 ,  G03F7/70758 ,  G03F7/70858 ,  H02K41/031

Abstract: A lithography tool having a stage for supporting and positioning a substrate, an array configured to move the stage, and a cover plate positioned between the stage and the array. In various embodiments, the array may be either a magnet or coil array. The cover plate acts as a thermal insulator that helps even out temperature variations across the array. Consequently, thermal disturbances to the array or other parts of the lithography tool are reduced, resulting in a minimization of positioning errors. In addition, the cover plate also protects the array and provides a smooth surface in the event of a "crash" of the substrate stage.

Abstract translation: 一种光刻工具，具有用于支撑和定位基板的台架，配置成移动台架的阵列以及位于台架和阵列之间的盖板。 在各种实施例中，阵列可以是磁体或线圈阵列。 盖板用作有助于均匀排列阵列温度变化的绝热材料。 因此，光刻工具的阵列或其他部分的热干扰减少，导致定位误差的最小化。 此外，盖板还保护阵列，并且在衬底台的“碰撞”的情况下提供光滑的表面。

公开(公告)号：WO2010041771A2

公开(公告)日：2010-04-15

申请号：PCT/JP2009/067952

申请日：2009-10-09

Applicant: NIKON CORPORATION ,  BINNARD, Michael, B. ,  GERY, Jean-Marc

Inventor： BINNARD, Michael, B. ,  GERY, Jean-Marc

IPC: H02K41/03 ,  H02K1/17

CPC classification number: H02K1/17 ,  H02K1/278 ,  H02K41/031 ,  H02K2201/18

Abstract: A planar motor (32) for positioning a stage (44) along a first axis, and along a second axis that is perpendicular to the first axis includes a conductor array (52) and a magnet array (34). The conductor array (52) includes at least one conductor (256). The magnet array (34) is positioned near the conductor array (52) and is spaced apart from the conductor array (52) along a third axis that is perpendicular to the first axis and the second axis. The magnet array (34) includes a first magnet unit (264) having a first diagonal magnet (Dl) with a diagonal magnetization direction (268) that is diagonal to the first axis, the second axis and the third axis. This leads to strong magnetic fields above the magnet array (34) and strong force generation capability. Further, the planar motor (32) provided herein has less stray magnetic fields that extend beyond the magnet array (34) than a comparable prior art planar motor. Moreover, the first magnet unit (264) can include a second diagonal magnet (D2), a third diagonal magnet (D3), and a fourth diagonal magnet (D4) that cooperate to provide a first combined magnetic flux (276) that is somewhat aligned along the third axis in a first flux direction. In this embodiment, each diagonal magnet (Dl) (D2) (D3) (D4) has the diagonal magnetization direction (268) that is diagonal to the first axis, the second axis and the third axis. Moreover, each diagonal magnet (Dl) (D2) (D3) (D4) can be generally triangular wedge shaped and the diagonal magnets (Dl) (D2) (D3) (D4) are arranged together into the shape of a parallelepiped.

Abstract translation: 用于沿着第一轴定位台（44）并且沿着垂直于第一轴的第二轴定位的平面马达（32）包括导体阵列（52）和磁体阵列（34）。 导体阵列（52）包括至少一个导体（256）。 磁体阵列（34）位于导体阵列（52）附近，并且沿着垂直于第一轴线和第二轴线的第三轴线与导体阵列（52）间隔开。 磁体阵列（34）包括第一磁体单元（264），第一磁体单元（264）具有与第一轴线，第二轴线和第三轴线对角的具有对角线磁化方向（268）的第一对角磁体（D1）。 这导致磁体阵列（34）上方的强磁场和强力产生能力。 此外，本文提供的平面电动机（32）具有比可比现有技术的平面电动机更少的超过磁体阵列（34）的杂散磁场。 此外，第一磁体单元（264）可以包括第二对角磁体（D2），第三对角线磁体（D3）和第四对角线磁体（D4），其协作以提供稍微有点的第一组合磁通（276） 沿着第三轴在第一磁通方向对准。 在该实施例中，每个对角线磁体（D1）（D2）（D3）（D4）具有与第一轴线，第二轴线和第三轴线对角的对角线磁化方向（268）。 此外，每个对角磁体（D1）（D2）（D3）（D4）可以是大致三角形的楔形，并且对角磁体（D1）（D2）（D3）（D4）被布置成平行六面体形状。

公开(公告)号：WO2017199096A1

公开(公告)日：2017-11-23

申请号：PCT/IB2017/000696

申请日：2017-05-19

Applicant: NIKON CORPORATION ,  FLAGELLO, Donis, G. ,  WILLIAMSON, David, M. ,  RENWICK, Stephen, P. ,  SMITH, Daniel, Gene ,  BINNARD, Michael, B.

Inventor： FLAGELLO, Donis, G. ,  WILLIAMSON, David, M. ,  RENWICK, Stephen, P. ,  SMITH, Daniel, Gene ,  BINNARD, Michael, B.

IPC: G03F7/20 ,  G02B5/18

Abstract: Extreme ultra-violet (EUV) lithography ruling engine specifically configured to print one-dimensional lines on a target workpiece (156) includes source of EUV radiation (114) : a pattern-source (144) defining ID pattern : an illumination unit (IU) configured to irradiate the pattern-source (144) : and projection optics (PO) configured to optically image, with a reduction factor N>1, the ID pattern on image surface that is optically-conjugate to the ID pattern. Irradiation of the pattern-source (144) can be on-axis or off-axis. While ID pattern has first spatial frequency, its optical image has second spatial frequency that is at least twice the first spatial frequency. The pattern-source (144) can be flat or curved. The IU may include a relay reflector (126). A PO' s reflector may include multiple spatially-distinct reflecting elements (130, 134) aggregately forming such reflector. The engine is configured to not allow formation of optical image of any 2D pattern that has spatial resolution substantially equal to a pitch of the ID pattern of the pattern-source (144).

Abstract translation: 专门配置成在目标工件（156）上印刷一维线的极紫外（EUV）刻蚀引擎包括EUV辐射源（114）：图案源（144） ID图案;配置为照射图案源（144）的照明单元（IU）;以及被配置为以缩减因子N> 1光学地成像光学共轭的图像表面上的ID图案的投影光学器件（PO） 到ID模式。 图案源（144）的照射可以是同轴的或离轴的。 当ID图案具有第一空间频率时，其光学图像具有第二空间频率，其至少是第一空间频率的两倍。 图案源（144）可以是平坦的或弯曲的。 IU可以包括中继反射器（126）。 PO的反射器可以包括聚集地形成这种反射器的多个空间不同的反射元件（130,134）。 该引擎被配置为不允许形成空间分辨率基本上等于图案源（144）的ID图案的节距的任何2D图案的光学图像。