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1.发明申请METHOD OF APPLYING AN ANTI-CORROSION AND/OR ADHESION PROMOTING COATING TO A METAL AND RESULTING COATED METAL 审中-公开将抗腐蚀和/或粘合剂涂覆在金属和结晶涂层金属上的方法
公开(公告)号：WO2008133916A2
公开(公告)日：2008-11-06
申请号：PCT/US2008005244
申请日：2008-04-23
Applicant: MOMENTIVE PERFORMANCE MAT INC , BOROVIK ALEXANDER S , SU SHIU-CHIN H
Inventor： BOROVIK ALEXANDER S , SU SHIU-CHIN H
IPC: C08G77/26 , C09D5/08 , C09D183/08
CPC classification number: B05D7/14 , B05D5/00 , C09D4/00 , C09D5/08 , C23C2222/20 , Y10T428/265 , Y10T428/2938 , Y10T428/2955 , Y10T428/2962 , Y10T428/31511 , Y10T428/31598 , Y10T428/31605 , Y10T428/31663 , C08G77/26
Abstract: A method of coating at least a portion of the exposed surface of a metal comprises: a) applying to said surface a curable coating composition comprising an aqueous solution of at least one partially or substantially completely hydrolyzed, and optionally partially condensed, silane possessing one or more hydroxyl groups and, optionally, one or more organonitrogen groups, said hydroxyl group(s) and optional organonitrogen group(s) being bonded to different carbon atoms of a bridging group linking such group(s) to the silicon atom of the partially or substantially completely hydrolyzed and optionally partially condensed silane; and, b) curing the curable coating composition on the surface of the metal to provide an anti-corrosion and/or adhesion promoting coating thereon.
Abstract translation: 涂覆金属的暴露表面的至少一部分的方法包括：a）向所述表面涂覆可固化涂料组合物，所述可固化涂料组合物包含至少一种部分或基本上完全水解和任选地部分缩合的硅烷的水溶液，所述硅烷具有一个或 更多的羟基和任选的一个或多个有机氮基团，所述羟基和任选的有机基团键合到桥接基团的不同碳原子上，所述桥连基团将这些基团与部分或者部分的硅原子连接 基本上完全水解和任选地部分缩合的硅烷; 和b）固化金属表面上的可固化涂料组合物以在其上提供防腐和/或粘附促进涂层。
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Patent Agency Ranking2.发明申请HYDROXYL-FUNCTIONAL CARBAMOYL ORGANOSILICON COMPOUNDS OF LOW VOC AND HAP GENERATING POTENTIAL, ANTI-CORROSION AND/OR ADHESION PROMOTING COATING COMPOSITIONS CONTAINING SAME, ENVIRONMENTALLY BENIGN METHOD OF COATING METAL THEREWITH AND RESULTING COATED METAL 审中-公开低VOC和HAP产生潜在的羟基官能化碳酰基有机硅氧烷化合物，抗腐蚀和/或粘合促进含有它们的涂料组合物，环境涂料金属和结晶材料的方法
公开(公告)号：WO2008133907A1
公开(公告)日：2008-11-06
申请号：PCT/US2008/005234
申请日：2008-04-23
Applicant: MOMENTIVE PERFORMANCE MATERIALS INC. , SU, Shiu-Chin, H. , RAJARAMAN, Suresh, K. , BOROVIK, Alexander, S. , GUYER, Kendall, L. , POHL, Eric, R.
Inventor： SU, Shiu-Chin, H. , RAJARAMAN, Suresh, K. , BOROVIK, Alexander, S. , GUYER, Kendall, L. , POHL, Eric, R.
CPC classification number: C23C22/50 , C07F7/1836 , C09D4/00 , C09D5/086 , Y10T428/31663 , C08G77/26
Abstract: There is provided a hydroxyl-functional carbamoyl organosilicon compound, an anti-corrosion and/or adhesion promoting coating composition based thereon, a method for coating a metal surface employing the coating composition and the resulting coated metal article.
Abstract translation: 提供了一种羟基官能氨基甲酰基有机硅化合物，一种基于此的抗腐蚀和/或粘附促进涂料组合物，一种使用该涂料组合物涂覆金属表面的方法和所得到的涂覆金属制品。
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3.发明申请EPOXYSILANES, PROCESSES FOR THEIR MANUFACTURE AND CURABLE COMPOSITIONS CONTAINING SAME 审中-公开环氧树脂，其制造方法和含有其的可固化组合物
公开(公告)号：WO2008112150A1
公开(公告)日：2008-09-18
申请号：PCT/US2008/003049
申请日：2008-03-06
Applicant: MOMENTIVE PERFORMANCE MATERIALS INC. , SU, Shiu-Chin, H. , GUYER, Kendall, L. , POHL, Eric, R. , BOROVIK, Alexander, S.
Inventor： SU, Shiu-Chin, H. , GUYER, Kendall, L. , POHL, Eric, R. , BOROVIK, Alexander, S.
IPC: C07F7/18
CPC classification number: C07F7/1836
Abstract: Epoxysilanes are provided which contain at least one epoxy group, at least one hydrolyzable silyl group and one or more linkages containing a carbonyl group bonded to heteroatoms selected from the group consisting of oxygen, sulfur and nitrogen with at least one such heteroatom being nitrogen, there being no such linkage in which both an epoxy group and hydrolyzable silyl group are directly or indirectly bonded to the same nitrogen heteroatom in the linkage.
Abstract translation: 提供了含有至少一个环氧基团，至少一个可水解甲硅烷基和一个或多个含有与选自氧，硫和氮的杂原子结合的羰基的键的环氧基硅烷，其中至少一个这样的杂原子是氮， 没有这样的连接，其中环氧基和可水解甲硅烷基都直接或间接地键合到连接中的相同氮杂原子。
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4.发明申请ETHYLENEOXIDE-SILANE AND BRIDGED SILANE PRECURSORS FOR FORMING LOW K FILMS 审中-公开用于形成低K膜的乙烯氧化物 - 硅烷和桥接硅烷前体
公开(公告)号：WO2005010941A3
公开(公告)日：2006-04-20
申请号：PCT/US2004022721
申请日：2004-07-01
Applicant: ADVANCED TECH MATERIALS , BOROVIK ALEXANDER S , XU CHONGYING , BAUM THOMAS H , BILODEAU STEVEN , ROEDER JEFFREY R , EBBING ABIGAIL , VESTYCK DANIEL
Inventor： BOROVIK ALEXANDER S , XU CHONGYING , BAUM THOMAS H , BILODEAU STEVEN , ROEDER JEFFREY R , EBBING ABIGAIL , VESTYCK DANIEL
CPC classification number: C23C16/401 , C07F7/0814 , C07F7/1836 , C07F7/184 , C07F7/1844 , C09D4/00 , C08G77/04
Abstract: An organosilicon precursor for vapor deposition, e.g., low pressure (
Abstract translation: 一种用于气相沉积的有机硅前体，例如低k（高于100托）的低k高强度电介质膜的等离子体增强化学气相沉积（PECVD），其中所述前体包括以下中的至少一种：（i） 侧链环氧乙烷基官能团; 和（ii）下式的二甲硅烷基部分，其中x是0至4的整数，包括端值在内。 这些前体可用于形成绝缘膜的介电常数约为3以下，硬度超过1吉比帕斯卡。
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5.发明申请
公开(公告)号：WO2008133916A3
公开(公告)日：2008-11-06
申请号：PCT/US2008/005244
申请日：2008-04-23
Inventor： BOROVIK, Alexander, S. , SU, Shiu-chin, H.
IPC: C08G77/26 , C09D183/08 , C09D5/08
Abstract: A method of coating at least a portion of the exposed surface of a metal comprises: a) applying to said surface a curable coating composition comprising an aqueous solution of at least one partially or substantially completely hydrolyzed, and optionally partially condensed, silane possessing one or more hydroxyl groups and, optionally, one or more organonitrogen groups, said hydroxyl group(s) and optional organonitrogen group(s) being bonded to different carbon atoms of a bridging group linking such group(s) to the silicon atom of the partially or substantially completely hydrolyzed and optionally partially condensed silane; and, b) curing the curable coating composition on the surface of the metal to provide an anti-corrosion and/or adhesion promoting coating thereon.
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6.发明申请ETHYLENEOXIDE-SILANE AND BRIDGED SILANE PRECURSORS FOR FORMING LOW K FILMS 审中-公开用于形成低K膜的乙烯氧化物 - 硅烷和桥接硅烷前体
公开(公告)号：WO2005010941A2
公开(公告)日：2005-02-03
申请号：PCT/US2004/022721
申请日：2004-07-01
Applicant: ADVANCED TECHNOLOGY MATERIALS, INC. , BOROVIK, Alexander, S. , XU, Chongying , BAUM, Thomas, H. , BILODEAU, Steven , ROEDER, Jeffrey, R. , EBBING, Abigail , VESTYCK, Daniel
Inventor： BOROVIK, Alexander, S. , XU, Chongying , BAUM, Thomas, H. , BILODEAU, Steven , ROEDER, Jeffrey, R. , EBBING, Abigail , VESTYCK, Daniel
IPC: H01L
CPC classification number: C23C16/401 , C07F7/0814 , C07F7/1836 , C07F7/184 , C07F7/1844 , C09D4/00 , C08G77/04
Abstract: An organosilicon precursor for vapor deposition, e.g., low pressure (
Abstract translation: 一种用于气相沉积的有机硅前体，例如低k（高于100托）的低k高强度电介质膜的等离子体增强化学气相沉积（PECVD），其中所述前体包括以下中的至少一种：（i） 侧链环氧乙烷基官能团; 和（ii）下式的二甲硅烷基部分，其中x是0至4的整数，包括端值在内。 这些前体可用于形成绝缘膜的介电常数约为3以下，硬度超过1吉比帕斯卡。
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