公开(公告)号：WO2018086697A1

公开(公告)日：2018-05-17

申请号：PCT/EP2016/077324

申请日：2016-11-10

Applicant: APPLIED MATERIALS, INC. ,  WHITE, John M. ,  SCHNAPPENBERGER, Frank ,  BUSCH, John D.

Inventor： WHITE, John M. ,  SCHNAPPENBERGER, Frank ,  BUSCH, John D.

IPC: C23C14/34 ,  H01J37/34 ,  C23C16/44 ,  C23C16/455 ,  H01J37/32

CPC classification number: C23C14/34 ,  C23C16/4412 ,  C23C16/45502 ,  H01J37/32449 ,  H01J37/32752 ,  H01J37/32816 ,  H01J37/32834 ,  H01J37/3417 ,  H01J37/3488

Abstract: According to one aspect of the present disclosure, an apparatus for vacuum deposition on a substrate is provided. The apparatus comprises: a vacuum chamber (110) comprising a first side wall (112) with a first pump opening (113) and a second side wall (114) with a second pump opening (115), a first deposition area (121) configured for housing a first deposition source (120) for depositing a layer on a substrate, a first substrate transportation path (T1) along which a substrate is to be transported which extends in the vacuum chamber (110) past the first deposition area, and a first pumping channel (142) arranged adjacent to the first deposition area (121) and extending from the first pump opening (113) to the second pump opening (115), wherein the first pumping channel (142) comprises one or more lateral openings (145) defining a first gas flow path (P1) from a main volume of the vacuum chamber into the first pumping channel. Further, a deposition module as well as a method of depositing a layer on a substrate are described.

Abstract translation: 根据本公开的一个方面，提供了一种用于在衬底上进行真空沉积的设备。 该装置包括：真空室（110），包括具有第一泵开口（113）的第一侧壁（112）和具有第二泵开口（115）的第二侧壁（114），第一沉积区域（121） ，其被配置为容纳用于在衬底上沉积层的第一沉积源（120），第一衬底传送路径（T1），沿着该第一衬底传送路径在所述真空室（110）中延伸经过所述第一沉积区域的衬底将被传送，以及 所述第一泵送通道（142）邻近所述第一沉积区域（121）布置并且从所述第一泵开口（113）延伸到所述第二泵开口（115），其中所述第一泵送通道（142）包括一个或多个侧向开口 （145）限定从真空室的主体积到第一泵送通道中的第一气体流动路径（P1）。 此外，描述了沉积模块以及在基底上沉积层的方法。

公开(公告)号：WO2018095514A1

公开(公告)日：2018-05-31

申请号：PCT/EP2016/078440

申请日：2016-11-22

Applicant: APPLIED MATERIALS, INC. ,  BUSCH, John D. ,  SCHNAPPENBERGER, Frank

Inventor： BUSCH, John D. ,  SCHNAPPENBERGER, Frank

IPC: C23C14/35 ,  C23C14/56 ,  H01J37/34

CPC classification number: C23C14/56 ,  C23C14/35 ,  C23C14/352 ,  H01J37/3405 ,  H01J37/3417 ,  H01J37/3455

Abstract: The present disclosure provides an apparatus (100) for layer deposition on a substrate (10). The apparatus (100) includes a vacuum chamber (101), at least one sputter source (110) in the vacuum chamber (101), wherein the at least one sputter source (110) includes a rotatable cylindrical cathode (112) and a magnet assembly (114) in the rotatable cylindrical cathode (112), and wherein the magnet assembly (114) is rotatable around a first rotational axis (115), a controller (120) configured to adjust an angle of the magnet assembly (114) with respect to a plane perpendicular to the substrate (10) by a rotation of the magnet assembly (114) around the first rotational axis (115), and a drive arrangement (130) configured for an essentially continuous linear movement of at least one of the substrate (10) and the at least one sputter source (110) during a layer deposition process.

公开(公告)号：WO2010122030A2

公开(公告)日：2010-10-28

申请号：PCT/EP2010055212

申请日：2010-04-20

Applicant: APPLIED MATERIALS INC ,  HEIN STEFAN ,  HERZOG ANDRE ,  SKUK PETER ,  BUSCH JOHN D

Inventor： HEIN STEFAN ,  HERZOG ANDRE ,  SKUK PETER ,  BUSCH JOHN D

IPC: B65H23/32 ,  B65H23/24 ,  B65H27/00

CPC classification number: B65H23/24 ,  B65H23/32 ,  B65H2406/14 ,  B65H2406/15 ,  B65H2406/423

Abstract: According to embodiments described herein, a guiding device for contactless guiding of a web in a web coating process application under vacuum conditions is provided. The guiding device includes a curved surface for facing the web, and a group of gas outlets disposed in the curved surface and adapted for giving off a gas flow to form a hover cushion between the curved surface and the web. The guiding device further includes a gas distribution system for selectively providing the gas flow to a first subgroup of the gas outlets and for preventing the gas from flowing to a second subgroup of the gas outlets. The curved surface comprises a web guiding region. The first subgroup of the gas outlets consists of at least one gas outlet in the web guiding region. The second subgroup of gas outlets consists of at least one gas outlet outside of the web guiding region in the web guiding direction.

Abstract translation: 根据本文所述的实施例，提供了一种用于在真空条件下在卷筒纸涂布过程应用中非织造导纤维网的引导装置。 引导装置包括用于面对腹板的弯曲表面和设置在弯曲表面中的一组气体出口，适于产生气流以在弯曲表面和腹板之间形成悬浮垫。 引导装置还包括气体分配系统，用于选择性地将气流提供给气体出口的第一子组，并用于防止气体流到气体出口的第二子组。 弯曲表面包括幅材引导区域。 气体出口的第一子组由幅材引导区域中的至少一个气体出口组成。 气体出口的第二子组由幅材引导方向上的幅材引导区域外部的至少一个气体出口组成。

公开(公告)号：WO2017071831A1

公开(公告)日：2017-05-04

申请号：PCT/EP2016/059536

申请日：2016-04-28

Applicant: APPLIED MATERIALS, INC. ,  WHITE, John M. ,  BUSCH, John D. ,  KIM, Kyung Bong ,  LINDENBERG, Ralph

Inventor： WHITE, John M. ,  BUSCH, John D. ,  KIM, Kyung Bong ,  LINDENBERG, Ralph

IPC: C23C14/04 ,  C23C16/04 ,  C23C14/02 ,  C23C14/50 ,  C23C14/56 ,  H01L21/02 ,  H01L21/67

CPC classification number: C23C14/566 ,  C23C14/352 ,  C23C14/568 ,  C23C16/54

Abstract: The present disclosure provides an apparatus (100) configured for treatment of a substrate (10) for a vacuum deposition process in a vacuum processing module. The apparatus (100) includes a substrate holder (110) configured to hold the substrate (10), a gas supply (130) configured to direct a stream of gas along a substrate surface of the substrate (10), and one or more conditioning devices configured for adjusting at least one physical and/or chemical property of the gas directed along the substrate surface, wherein the physical and/or chemical property of the gas is selected for a treatment of the substrate (10).

Abstract translation: 本公开提供了一种设备（100），其被配置用于在真空处理模块中处理用于真空沉积工艺的衬底（10）。 该设备（100）包括被配置成保持衬底（10）的衬底保持器（110），被配置为引导气体流沿着衬底（10）的衬底表面的气体供应（130），以及一个或多个调节 被配置用于调节沿着衬底表面引导的气体的至少一种物理和/或化学性质的装置，其中选择气体的物理和/或化学性质用于衬底（10）的处理。

公开(公告)号：WO2010122030A3

公开(公告)日：2010-10-28

申请号：PCT/EP2010/055212

申请日：2010-04-20

Applicant: APPLIED MATERIALS, INC. ,  HEIN, Stefan ,  HERZOG, Andre ,  SKUK, Peter ,  BUSCH, John D.

Inventor： HEIN, Stefan ,  HERZOG, Andre ,  SKUK, Peter ,  BUSCH, John D.

IPC: B65H23/32 ,  B65H23/24 ,  B65H27/00

Abstract: According to embodiments described herein, a guiding device for contactless guiding of a web (1) in a web coating process application under vacuum conditions is provided. The guiding device (111) includes a curved surface (110) for facing the web, and a group of gas outlets (112) disposed in the curved surface and adapted for giving off a gas flow to form a hover cushion between the curved surface and the web. The guiding device further includes a gas distribution system for selectively providing the gas flow to a first subgroup of the gas outlets (240, 242, 244) and for preventing the gas from flowing to a second subgroup (114) of the gas outlets. The curved surface comprises a web guiding region. The first subgroup of the gas outlets consists of at least one gas outlet in the web guiding region. The second subgroup of gas outlets consists of at least one gas outlet outside of the web guiding region in the web guiding direction.