公开(公告)号：WO2009007981A1

公开(公告)日：2009-01-15

申请号：PCT/IL2008/000966

申请日：2008-07-13

Applicant: NOVA MEASURING INSTRUMENTS LTD. ,  COHEN, Yoel ,  BRILL, Boaz

Inventor： COHEN, Yoel ,  BRILL, Boaz

IPC: G01N21/21 ,  G01B11/06

CPC classification number: G01N21/9501 ,  G01B11/0625 ,  G01B11/24 ,  G06F15/00

Abstract: A method and system are presented for use in characterizing properties of an article having a structure comprising a multiplicity of sites comprising different periodic patterns. The method comprises: providing a theoretical model of prediction indicative of optical properties of different stacks defined by geometrical and material parameters of corresponding sites, said sites being common in at least one of geometrical parameter and material parameter; performing optical measurements on at least two different stacks of the article and generating optical measured data indicative of the geometrical parameters and material composition parameters for each of the measured stacks; processing the optical measured data, said processing comprising simultaneously fitting said optical measured data for the multiple measured stacks with said theoretical model and extracting said at least one common parameter, thereby enabling to characterize the properties of the multi-layer structure within the single article.

Abstract translation: 本发明提供了一种方法和系统，用于表征具有包括多个不同周期图案位置的结构的制品的性质。 该方法包括：提供指示由对应位点的几何和材料参数限定的不同堆叠的光学性质的预测理论模型，所述位置在几何参数和材料参数中的至少一个中是共同的; 对物品的至少两个不同堆叠执行光学测量，并产生指示每个所测量的叠层的几何参数和材料组成参数的光学测量数据; 处理所述光学测量数据，所述处理包括同时将所述多个测量堆叠的所述光学测量数据与所述理论模型拟合并提取所述至少一个公共参数，从而能够表征单个物品内的多层结构的属性。

公开(公告)号：WO2004003470A1

公开(公告)日：2004-01-08

申请号：PCT/IL2003/000539

申请日：2003-06-26

Applicant: NOVA MEASURING INSTRUMENTS LTD. ,  COHEN, Yoel ,  FINAROV, Moshe ,  VINOKUR, Klara

Inventor： COHEN, Yoel ,  FINAROV, Moshe ,  VINOKUR, Klara

IPC: G01B11/06

CPC classification number: G01B11/0625 ,  G01B11/0683 ,  H01L22/12

Abstract: A method and system are presented for use in controlling the processing of a structure. First measured data is provided being indicative of at least one of the following: a thickness (d 2 ) of at least one layer (L 2 ) of the structure W in at least selected sites of the structure prior to the processing of the structure, and a surface profile of the structure prior to said processing. An optical measurement is applied to at least the selected sites of the structure after said processing and second measured data is generated being indicative of at least one of the following: a thickness of the processed structure (d') and a surface profile of the processed structure, The second measured data is analyzed by interpreting it using the first measured data to thereby determine a thickness (d' 1 or d' 2 ) of at least one layer of the processed structure. This determined thickness is thus indicative of the quality of said processing.

Abstract translation: 提出了一种用于控制结构处理的方法和系统。 第一测量数据被提供指示以下中的至少一个：在结构处理之前的结构的至少一些选定位置中的结构W的至少一个层（L2）的厚度（d2），以及 所述处理之前的结构的表面轮廓。 在所述处理之后，对至少所述结构的所选位置进行光学测量，并且生成第二测量数据，以指示以下至少之一：处理结构（d'）的厚度和所处理的结构的表面轮廓 结构，通过使用第一测量数据解释第二测量数据，从而确定至少一层处理结构的厚度（d'1或d'2）。 因此，所确定的厚度表示所述处理的质量。

公开(公告)号：WO2008096364A3

公开(公告)日：2008-09-25

申请号：PCT/IL2008000172

申请日：2008-02-07

Applicant: NOVA MEASURING INSTR LTD ,  COHEN YOEL

Inventor： COHEN YOEL

IPC: G03F7/20 ,  G03F1/00 ,  G03F1/44

CPC classification number: G03F7/70433 ,  G01B11/303 ,  G03F1/44 ,  G03F7/70516 ,  G03F7/70625 ,  G03F7/70683

Abstract: A sample having a patterned area and a method for use in controlling a pattern parameter is presented. The sample comprises at least one test structure having a patterned region similar to a pattern in the patterned area, the patterns in the patterned area and in the at least test structure being produced by the same patterning process. The at least one test structure comprises at least one pattern parameter of a predetermined value intentionally increased above a natural value of said certain parameter induced by a patterning process. By this, the natural value of the parameter induced by the patterning process can be determined.

Abstract translation: 呈现具有图案化区域的样本和用于控制图案参数的方法。 所述样本包括至少一个测试结构，所述测试结构具有与所述图案化区域中的图案类似的图案化区域，所述图案化区域中和所述至少测试结构中的图案通过相同的图案化工艺产生。 所述至少一个测试结构包括预定值的至少一个图案参数，该图案参数有意地增加到高于由图案化过程引起的所述特定参数的自然值。 由此，可以确定由图案化过程引起的参数的自然值。

公开(公告)号：WO2008096364A2

公开(公告)日：2008-08-14

申请号：PCT/IL2008/000172

申请日：2008-02-07

Applicant: NOVA MEASURING INSTRUMENT LTD. ,  COHEN, Yoel

Inventor： COHEN, Yoel

IPC: G03F7/20

CPC classification number: G03F7/70433 ,  G01B11/303 ,  G03F1/44 ,  G03F7/70516 ,  G03F7/70625 ,  G03F7/70683

Abstract: A sample having a patterned area and a method for use in controlling a pattern parameter is presented. The sample comprises at least one test structure having a patterned region similar to a pattern in the patterned area, the patterns in the patterned area and in the at least test structure being produced by the same patterning process. The at least one test structure comprises at least one pattern parameter of a predetermined value intentionally increased above a natural value of said certain parameter induced by a patterning process. By this, the natural value of the parameter induced by the patterning process can be determined.

Abstract translation: 提出具有图案区域的样本和用于控制图案参数的方法。 样品包括至少一个具有与图案化区域中的图案类似的图案化区域的测试结构，图案化区域中的图案和至少测试结构中的图案通过相同的图案化工艺生产。 所述至少一个测试结构包括预定值的至少一个模式参数，所述预定值有意地增加到由图案化过程所诱发的所述特定参数的自然值之上。 由此，可以确定由图案化工艺引起的参数的自然值。