公开(公告)号：WO2009078014A2

公开(公告)日：2009-06-25

申请号：PCT/IL2008001627

申请日：2008-12-16

Applicant: NOVA MEASURING INSTR LTD ,  BRILL BOAZ ,  SANDIK SHIMON

Inventor： BRILL BOAZ ,  SANDIK SHIMON

IPC: G06T7/40

CPC classification number: G01B21/047 ,  H01L21/67745 ,  H01L21/67769

Abstract: A multi-station measurement system concept is presented, particularly based on an X-Y stage and plurality of horizontal load/unload units. The system allows loading/unloading of wafers from several load/unload units by the direct action of the X-Y stage, thus creating a buffer for wafers without actually requiring an additional buffer mechanism.

Abstract translation: 提出了一种多站测量系统概念，特别是基于X-Y平台和多个水平加载/卸载单元。 该系统允许通过X-Y平台的直接作用从多个加载/卸载单元加载/卸载晶片，从而为晶片创建缓冲器，而不需要额外的缓冲机构。

公开(公告)号：WO2005060351A3

公开(公告)日：2005-11-17

申请号：PCT/IL2004001159

申请日：2004-12-23

Applicant: NOVA MEASURING INSTR LTD ,  RING SVEN

Inventor： RING SVEN

IPC: B01D59/44 ,  G01N20060101 ,  G01N15/00 ,  G01N15/10

CPC classification number: G01N15/1031 ,  G01N2015/0046

Abstract: A method for use to identify particles in a medium comprising inputting the medium (22) into an evacuable chamber (12); and irradiating the medium in the chamber by focused radiation (14) of a predetermined power density to cause substantially total fragmentation and ionization of at least small particles in the medium. It causes creation of ionized species including multiply charged ions in case when particles exist in the medium.

Abstract translation: 一种用于识别介质中的颗粒的方法，包括将介质（22）输入到可抽空室（12）中; 以及通过预定功率密度的聚焦辐射（14）照射所述腔室中的介质，以使所述介质中的至少小颗粒基本上完全碎裂和电离。 在介质中存在颗粒的情况下，会导致电离物质的产生，包括多重带电离子。

公开(公告)号：WO03075099A2

公开(公告)日：2003-09-12

申请号：PCT/IL0300176

申请日：2003-03-06

Applicant: NOVA MEASURING INSTR LTD ,  FINAROV MOSHE ,  SCHEINER DAVID

Inventor： FINAROV MOSHE ,  SCHEINER DAVID

IPC: G01B11/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F7/70633

Abstract: An optical measurement method and system are presented for imaging two target structures T1, T2 in two parallel layers L1, L2, respectively, of a sample W, to enable determination of a registration between the two target structures along two mutually perpendicular axes of the layer L1. The sample is illuminated with incident radiation to produce a radiation response of the sample. The radiation response is collected by an objective lens arrangement 14, and the collected radiation response is split into two spatially separated radiation components B1res, B2res. The split radiation components are directed towards at least one imaging plane 24 or 26 along different optical channels characterized by optical paths of different lengths S1, S2, respectively. The two split radiation components are detected in said at least one imaging plane, and two image parts are thereby acquired, each image part containing images of the two target structures.

Abstract translation: 提出了一种光学测量方法和系统，用于分别对样本W的两个平行层L1，L2中的两个目标结构T1，T2进行成像，以便能够沿着层的两个相互垂直的轴确定两个目标结构之间的配准 L1。 用入射辐射照射样品以产生样品的辐射响应。 辐射响应由物镜装置14收集，并且收集的辐射响应被分成两个空间上分离的辐射分量B1res，B2res。 分离的辐射分量被引导到沿着不同的光通道的至少一个成像平面24或26，其特征在于分别具有不同长度S1，S2的光路。 在所述至少一个成像平面中检测到两个分离的辐射分量，从而获得两个图像部分，每个图像部分包含两个目标结构的图像。

公开(公告)号：WO2012093400A1

公开(公告)日：2012-07-12

申请号：PCT/IL2012050003

申请日：2012-01-03

Applicant: NOVA MEASURING INSTR LTD ,  BRILL BOAZ ,  SHERMAN BORIS

Inventor： BRILL BOAZ ,  SHERMAN BORIS

IPC: G01B11/24 ,  G01N21/47

CPC classification number: G06F17/50 ,  G01B11/24 ,  G01N21/4788

Abstract: A method and system are presented for use in measuring in complex patterned structures. A full model and at least one approximate model are provided for the same measurement site in a structure, said at least one approximate model satisfying a condition that a relation between the full model and the approximate model is defined by a predetermined function. A library is created for simulated data calculated by the approximate model for the entire parametric space of the approximate model. Also provided is data corresponding to simulated data calculated by the full model in selected points of said parametric space. The library for the approximate model data and said data of the full model are utilized for creating a library of values of a correction term for said parametric space, the correction term being determined as said predetermined function of the relation between the full model and the approximate model. This enable to process measured data by fitting said measured data to the simulated data calculated by the approximate model corrected by a corresponding value of the correction term.

Abstract translation: 提出了一种用于复杂图案结构测量的方法和系统。 所述至少一个近似模型满足完全模型和近似模型之间的关系由预定功能定义的条件，为整个模型和至少一个近似模型提供了结构中的相同测量点。 为近似模型的整个参数空间的近似模型计算的模拟数据创建库。 还提供了对应于在所述参数空间的选定点中由完整模型计算的模拟数据的数据。 用于近似模型数据的库和所述完整模型的所述数据用于创建用于所述参数空间的校正项的值的库，所述校正项被确定为所述完整模型和所述近似模型之间的关系的所述预定函数 模型。 这使得能够通过将所测量的数据拟合到由校正项的对应值校正的近似模型计算的模拟数据来处理测量数据。

公开(公告)号：WO2006054292A3

公开(公告)日：2007-05-31

申请号：PCT/IL2005001211

申请日：2005-11-16

Applicant: NOVA MEASURING INSTR LTD ,  FINAROV MOSHE

Inventor： FINAROV MOSHE

IPC: G01J3/28 ,  G01J3/02 ,  G01J3/10 ,  G01J3/42 ,  G02B20060101

CPC classification number: G01J3/10 ,  G01J3/02 ,  G01J3/0218 ,  G01J3/28 ,  G01J3/2803 ,  G01J3/42 ,  G01J2003/2866

Abstract: A system and method for use in spectrometric measurements of an article using selecting an optimal integration time range of the light detection system during which the measurement is to be applied, the optimal integration time being that at which a required value of signal to noise ratio (SNR) of the measurements is obtainable.

Abstract translation: 一种用于在使用测量的光检测系统的最佳积分时间范围内使用物品的光谱测量的系统和方法，最佳积分时间是所需的信噪比值（ SNR）。

公开(公告)号：WO2006059330A3

公开(公告)日：2006-08-03

申请号：PCT/IL2005001287

申请日：2005-12-01

Applicant: NOVA MEASURING INSTR LTD ,  LYUBCHIK YAKOV ,  SCHEINER DAVID ,  WINIK MICHAEL

Inventor： LYUBCHIK YAKOV ,  SCHEINER DAVID ,  WINIK MICHAEL

IPC: G02B17/06 ,  G01B11/02 ,  G01N21/21 ,  G01N21/956 ,  G02B17/02 ,  H01L21/66

CPC classification number: G02B21/16 ,  G01J1/04 ,  G01J1/0411 ,  G01J1/0414 ,  G01J1/0429 ,  G01J1/044 ,  G01J1/0455 ,  G01J1/0462 ,  G01N21/956 ,  G02B17/06 ,  G02B17/061 ,  G02B21/04

Abstract: A catoptric arrangement (10) is presented. The catoptric arrangement comprises a first element (12) having a concave reflective surface and an optical axis (OA) and a second substantially flat and at least partially reflective element (14) spaced-apart from the first element along the optical axis. The second element is configured to allow light passage therethrough and is oriented with respect to the optical axis and the first element such that at a predetermined angle of incidence of an input light beam onto the second element, the input light beam is reflected onto the reflective surface of the first element and reflected therefrom to pass through the second element.

Abstract translation: 提出了一个反射排列（10）。 反射装置包括具有凹形反射表面和光轴（OA）的第一元件（12）和沿着光轴与第一元件间隔开的第二基本上平坦且至少部分反射的元件（14）。 第二元件构造成允许光通过其并且相对于光轴和第一元件取向，使得在入射光束到第二元件上的预定入射角时，输入光束被反射到反射 第一元件的表面并从其反射以穿过第二元件。

公开(公告)号：WO2006077598A2

公开(公告)日：2006-07-27

申请号：PCT/IL2006000093

申请日：2006-01-23

Applicant: NOVA MEASURING INSTR LTD ,  ASCHKENASY JACQUES ,  LYUBCHIK YAKOV

Inventor： ASCHKENASY JACQUES ,  LYUBCHIK YAKOV

IPC: B32B27/30

CPC classification number: G01M11/0285 ,  G03F7/706

Abstract: Disclosed is a method of measuring an optical system artifact that includes introduction into an optical path of a measurement target having at least one edge. Illuminating a section of the edge by a first illumination and illuminating another section of the edge by a second illumination. The difference of the edge images generated by the optical system when illuminated by the first illumination and the second illumination measured in a predefined plane represents the optical artifact.

Abstract translation: 公开了一种测量光学系统伪影的方法，其包括将具有至少一个边缘的测量目标的光路引入。 通过第一照明照亮边缘的一部分并通过第二照明照亮边缘的另一部分。 由第一照明照射时由光学系统产生的边缘图像和在预定平面中测量的第二照度的差异代表光学伪影。

公开(公告)号：WO03075042A2

公开(公告)日：2003-09-12

申请号：PCT/IL0300168

申请日：2003-03-04

Applicant: NOVA MEASURING INSTR LTD ,  BRILL BOAZ ,  GOV SHAHAR

Inventor： BRILL BOAZ ,  GOV SHAHAR

IPC: G01B11/30 ,  G03F7/20 ,  G02B

CPC classification number: G03F7/70625 ,  G01B11/306

Abstract: A method and a system for optical measuring in a structure having a pattern in the form of spaced-apart parallel elongated regions of optical properties different from that of spaces between said regions. The system comprises a broadband illuminator (8) for generating incident radiation, a spectrophotometer arrangement (30) for detecting a spectral response of the structure to the incident radiation, and an optical arrangement (2) for directing the incident light to the structure and collecting the response of the structure, said optical arrangement (2) comprising a numerical aperture (32) selectively limiting the range of at least one of light incidence or collecting angles in direction substantially perpendicular to longitudinal axes of said elongated regions of the pattern.

Abstract translation: 一种在结构中进行光学测量的方法和系统，其具有与所述区域之间的空间不同的光学性质的间隔开的平行细长区域形式的图案。 该系统包括用于产生入射辐射的宽带照明器（8），用于检测结构对入射辐射的光谱响应的分光光度计装置（30），以及用于将入射光引导到结构并收集 所述结构的响应，所述光学装置（2）包括数值孔径（32），其选择性地限制在基本上垂直于所述图案的所述细长区域的纵向轴线的方向上的入射光或收集角中的至少一个的范围。

公开(公告)号：WO0161746A9

公开(公告)日：2001-11-08

申请号：PCT/IL0100159

申请日：2001-02-20

Applicant: NOVA MEASURING INSTR LTD ,  RAVID AVI ,  MACHAVARIANI VLADIMIR ,  WEINGARTEN AMIT ,  SCHEINER DAVID

Inventor： RAVID AVI ,  MACHAVARIANI VLADIMIR ,  WEINGARTEN AMIT ,  SCHEINER DAVID

IPC: B24B37/04 ,  B24B49/12 ,  B24B49/14 ,  H01L21/321 ,  H01L23/544 ,  H01L21/66

CPC classification number: B24B37/013 ,  B24B37/042 ,  B24B49/12 ,  B24B49/14 ,  H01L21/3212 ,  H01L22/34

Abstract: A test structure is presented to be formed on a patterned structure and to be used for controlling a CMP process applied to the patterned structure, which has a pattern area formed by spaced-apart metal-containing regions representative of real features of the patterned structure. The test structure thus undergoes the same CMP processing as the pattern area. The test structure comprises at least one pattern zone in the form of a metal area with at least one region included in the metal area and made of a material relatively transparent with respect to incident light, as compared to that of the metal.

Abstract translation: 呈现测试结构以在图案化结构上形成并且用于控制施加到图案化结构的CMP工艺，其具有由代表图案化结构的真实特征的间隔开的含金属区域形成的图案区域。 测试结构因此经历与图案区域相同的CMP处理。 与金属相比，测试结构包括金属区域形式的至少一个图案区域，其中金属区域包括至少一个区域并且由相对于入射光相对透明的材料制成。

公开(公告)号：WO2009074984A3

公开(公告)日：2010-03-11

申请号：PCT/IL2008001599

申请日：2008-12-10

Applicant: NOVA MEASURING INSTR LTD ,  SCHEINER DAVID

Inventor： SCHEINER DAVID

IPC: G01B5/02

CPC classification number: G01B11/00 ,  G01B11/02 ,  G01B11/08 ,  G01B11/12 ,  G01B11/22 ,  G01B11/24 ,  G01B2210/56 ,  G01R31/2853 ,  G01R31/311 ,  G06T7/0004 ,  G06T2207/30148 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: The present invention provides a novel system and method for obtaining at least one of a cross-section profile, depth, width, slope, undercut and other parameters of via-holes by non-destructive technique. The optical system comprises an illumination system for producing at least one light beam and directing it on a sample in a region of the structure containing at least one via-hole; a detection system configured and operable to collect a pattern of light reflected from the illuminated region, the light pattern being indicative of one or more parameters of said via-hole; and, a control system connected to the detection system, the control system comprising a memory utility for storing a predetermined theoretical model comprising data representative of a set of parameters describing via-holes reflected pattern, and a data processing and analyzing utility configured and operable to receive and analyze image data indicative of the detected light pattern and determine one or more parameters of said via-hole.

Abstract translation: 本发明提供了一种用于通过非破坏性技术获得通孔的横截面轮廓，深度，宽度，斜率，底切和其它参数中的至少一个的新颖系统和方法。 光学系统包括用于产生至少一个光束并将其引导到包含至少一个通孔的结构的区域中的样品的照明系统; 检测系统，被配置和可操作以收集从所述被照射区域反射的光的图案，所述光图案指示所述通孔的一个或多个参数; 以及连接到所述检测系统的控制系统，所述控制系统包括用于存储预定理论模型的存储器实用程序，所述预定理论模型包括表示描述通孔反射模式的一组参数的数据，以及数据处理和分析实用程序， 接收和分析指示检测到的光图案的图像数据，并确定所述通孔的一个或多个参数。