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    METHOD FOR LPP DRIVE LASER OUTPUT DURING EUV NON-OUTPUT PERIODS
    1.
    发明申请
    METHOD FOR LPP DRIVE LASER OUTPUT DURING EUV NON-OUTPUT PERIODS 审中-公开
    在EUV非输出期间的LPP驱动激光输出的方法

    公开(公告)号：WO2012050685A1

    公开(公告)日：2012-04-19

    申请号：PCT/US2011/050565

    申请日：2011-09-06

    Applicant: CYMER, INC. ,  PARTLO, William, N. ,  SANDSTROM, Richard, L. ,  BROWN, Daniel, J.w. ,  FOMENKOV, Igor, V.

    Inventor： PARTLO, William, N. ,  SANDSTROM, Richard, L. ,  BROWN, Daniel, J.w. ,  FOMENKOV, Igor, V.

    IPC: A61N5/06

    CPC classification number: G21K5/00 ,  G03F7/70033 ,  H01S3/117 ,  H01S3/2232 ,  H01S3/2308 ,  H05G2/008

    Abstract: A device is disclosed, herein which may comprise a droplet generator producing droplets of target material; a sensor providing an. intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the. intercept time signal; a. laser source responsive to a trigger signal to produce a laser pulse-; and a system controlling said delay circuit to provide a. trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light -pulse which is not focused on a droplet.

    Abstract translation: 本文公开了一种装置，其可以包括产生目标材料的液滴的液滴发生器; 传感器提供。 当液滴到达预选位置时截获时间信号; 与所述传感器耦合的延迟电路，所述延迟电路产生从所述传感器延迟的触发信号。 拦截时间信号; 一个。 激光源响应于触发信号以产生激光脉冲; 以及控制所述延迟电路以提供a的系统。 触发信号从截取时间延迟第一延迟时间，以产生聚焦在液滴上的光脉冲和从截取时间延迟第二延迟时间的触发信号，以产生不聚焦在液滴上的光脉冲 。

    BANDWIDTH CONTROL DEVICE
    3.
    发明申请
    BANDWIDTH CONTROL DEVICE 审中-公开
    带宽控制装置

    公开(公告)号：WO2007149282A3

    公开(公告)日：2008-11-06

    申请号：PCT/US2007013875

    申请日：2007-06-11

    Applicant: CYMER INC ,  FOMENKOV IGOR V ,  PARTLO WILLIAM N ,  REILEY DANIEL J ,  HOWEY JAMES K ,  AGULIAR STANLEY C

    Inventor： FOMENKOV IGOR V ,  PARTLO WILLIAM N ,  REILEY DANIEL J ,  HOWEY JAMES K ,  AGULIAR STANLEY C

    IPC: H01S3/22

    CPC classification number: H01S3/225 ,  H01S3/03 ,  H01S3/034 ,  H01S3/08009 ,  H01S3/137 ,  H01S3/2256

    Abstract: A method and apparatus is disclosed for operating a laser output light beam pulse line narrowing mechanism that may comprise a nominal center wavelength and bandwidth selection optic; a static wavefront compensation mechanism shaping the curvature of the selection optic; an active wavefront compensation mechanism shaping the curvature of the selection optic and operating independently of the static wavefront compensation mechanism. The method and apparatus may comprise the nominal center wavelength and bandwidth selection optic comprises a grating; the static wavefront compensation mechanism applies a pre-selected bending moment to the grating; the active wavefront compensation mechanism applies a separate selected bending moment to the grating responsive to the control of a bending moment controller based on bandwidth feedback from a bandwidth monitor monitoring the bandwidth of the laser output light beam pulses. The active wavefront compensation mechanism may comprise a pneumatic drive mechanism.

    Abstract translation: 公开了用于操作可以包括标称中心波长和带宽选择光学器件的激光输出光束脉冲线窄化机构的方法和装置; 静态波前补偿机构整形选择光学元件的曲率; 主动波前补偿机构整形选择光学元件的曲率并独立于静态波前补偿机制工作。 该方法和装置可以包括标称中心波长和带宽选择光学器件包括光栅; 静态波前补偿机构将预选的弯矩应用于光栅; 主动波前补偿机构响应于基于来自监视激光输出光束脉冲的带宽的带宽监视器的带宽反馈的弯矩控制器的控制，向光栅施加单独的选定弯矩。 主动波前补偿机构可以包括气动驱动机构。

    ALTERNATIVE FUELS FOR EUV LIGHT SOURCE
    4.
    发明申请
    ALTERNATIVE FUELS FOR EUV LIGHT SOURCE 审中-公开
    EUV光源替代燃料

    公开(公告)号：WO2007005414A3

    公开(公告)日：2008-10-02

    申请号：PCT/US2006024959

    申请日：2006-06-27

    Applicant: CYMER INC ,  BOWERING NORBERT R ,  KHODYKIN OLEH ,  BYKANOV ALEXANDER N ,  FOMENKOV IGOR V

    Inventor： BOWERING NORBERT R ,  KHODYKIN OLEH ,  BYKANOV ALEXANDER N ,  FOMENKOV IGOR V

    IPC: G01J3/10 ,  H05G2/00

    CPC classification number: H05G2/006 ,  B82Y10/00 ,  G21K2201/061 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

    Abstract: An EUV light source is disclosed which may comprise at least one optical element having a surface, such as a multi-layer collector mirror; a laser source generating a laser beam; and a source material irradiated by the laser beam to form a plasma and emit EUV light. In one aspect, the source material may consist essentially of a tin compound and may generate tin debris by plasma formation which deposits on the optical element and, in addition, the tin compound may include an element that is effective in etching deposited tin from the optical element surface. Tin compounds may include SnBr4, SnBr2 and SnH4. In another aspect, an EUV light source may comprise a molten source material irradiated by a laser beam to form a plasma and emit EUV light, the source material comprising tin and at least one other metal, for example tin with Gallium and / or Indium.

    Abstract translation: 公开了一种EUV光源，其可以包括至少一个具有表面的光学元件，例如多层收集镜; 产生激光束的激光源; 以及由激光束照射以形成等离子体并发射EUV光的源材料。 在一个方面，源材料可以基本上由锡化合物组成，并且可以通过沉积在光学元件上的等离子体形成而产生锡屑，此外，锡化合物可以包括有效蚀刻沉积在光学上的锡的元素 元素表面。 锡化合物可以包括SnBr 4，SnBr 2和SnH 4。 在另一方面，EUV光源可以包括由激光束照射以形成等离子体并发射EUV光的熔融源材料，源材料包含锡和至少一种其它金属，例如具有镓和/或铟的锡。

    LASER SYSTEM
    5.
    发明申请
    LASER SYSTEM 审中-公开
    激光系统

    公开(公告)号：WO2007053335A3

    公开(公告)日：2008-04-24

    申请号：PCT/US2006041107

    申请日：2006-10-20

    Applicant: CYMER INC ,  ERSHOV ALEXANDER I ,  PARTLO WILLIAM N ,  BROWN DANIEL J W ,  FOMENKOV IGOR V ,  BERGSTEDT ROBERT A ,  SANDSTROM RICHARD L ,  LALOVIC IVAN

    Inventor： ERSHOV ALEXANDER I ,  PARTLO WILLIAM N ,  BROWN DANIEL J W ,  FOMENKOV IGOR V ,  BERGSTEDT ROBERT A ,  SANDSTROM RICHARD L ,  LALOVIC IVAN

    IPC: H01S3/22

    CPC classification number: H01S3/225 ,  G03F7/70583 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/03 ,  H01S3/034 ,  H01S3/08036 ,  H01S3/08059 ,  H01S3/10092 ,  H01S3/105 ,  H01S3/2251 ,  H01S3/2333

    Abstract: A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage wherein the output of the seed laser oscillator passes through the amplifying gain medium of the ring power amplification stage at least two times per loop.

    Abstract translation: 一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，该激光系统输出包括：激光输出光束 脉冲，其可以包括环形功率放大级，其中种子激光振荡器的输出通过环形功率放大级的放大增益介质至少每循环两次。

    LASER SYSTEM
    6.
    发明申请
    LASER SYSTEM 审中-公开
    激光系统

    公开(公告)号：WO2007053335A2

    公开(公告)日：2007-05-10

    申请号：PCT/US2006/041107

    申请日：2006-10-20

    Applicant: CYMER, INC. ,  ERSHOV, Alexander, I. ,  PARTLO, William, N. ,  BROWN, Daniel, J.W. ,  FOMENKOV, Igor, V. ,  BERGSTEDT, Robert, A. ,  SANDSTROM, Richard, L. ,  LALOVIC, Ivan

    Inventor： ERSHOV, Alexander, I. ,  PARTLO, William, N. ,  BROWN, Daniel, J.W. ,  FOMENKOV, Igor, V. ,  BERGSTEDT, Robert, A. ,  SANDSTROM, Richard, L. ,  LALOVIC, Ivan

    IPC: G11C8/00

    CPC classification number: H01S3/225 ,  G03F7/70583 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/03 ,  H01S3/034 ,  H01S3/08036 ,  H01S3/08059 ,  H01S3/10092 ,  H01S3/105 ,  H01S3/2251 ,  H01S3/2333

    Abstract: A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage wherein the output of the seed laser oscillator passes through the amplifying gain medium of the ring power amplification stage at least two times per loop.

    Abstract translation: 一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，该激光系统输出包括：激光输出光束 脉冲，其可以包括环形功率放大级，其中种子激光振荡器的输出通过环形功率放大级的放大增益介质至少每循环两次。

    EUV LIGHT SOURCE
    8.
    发明申请
    EUV LIGHT SOURCE 审中-公开
    EUV光源

    公开(公告)号：WO2005091879A2

    公开(公告)日：2005-10-06

    申请号：PCT/US2005005935

    申请日：2005-02-24

    Applicant: CYMER INC ,  PARTLO WILLIAM N ,  BOWERING NORBERT R ,  ERSHOV ALEXANDER I ,  FOMENKOV IGOR V ,  OLIVER I ROGER ,  VIATELLA JOHN ,  JACQUES ROBERT N

    Inventor： PARTLO WILLIAM N ,  BOWERING NORBERT R ,  ERSHOV ALEXANDER I ,  FOMENKOV IGOR V ,  OLIVER I ROGER ,  VIATELLA JOHN ,  JACQUES ROBERT N

    IPC: G03F7/20 ,  G21K1/06 ,  H01J35/20 ,  H05G2/00

    CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    Abstract: An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma ("LPP") extreme ultraviolet ("EUV") light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.

    Abstract translation: 公开了一种用于EUV光产生的装置和方法，其可以包括激光产生的等离子体（“LPP”）极紫外（“EUV”）光源控制系统，其包括适于递送移动等离子体引发靶的目标传送系统和EUV光收集 光学元件具有限定期望的等离子体起始位置的焦点，包括：目标跟踪和反馈系统，包括：至少一个成像装置，其提供目标流轨迹的图像作为输出，其中，所述目标流轨迹来自所述目标流轨迹的成像速度 摄像机太慢，不能成像形成被作为目标流轨迹成像的目标流的各个等离子体形成目标; 流轨迹误差检测器，从与期望的等离子体起始位置相交的期望的流轨道检测在大致垂直于目标流轨迹的至少一个轴上的目标流轨迹位置的误差。 至少一个目标交叉检测器可以瞄准目标轨道并且检测等离子体形成目标通过目标轨道中的选定点的通过。 驱动激光触发机构利用目标交叉检测器的输出来确定驱动激光触发的定时，以便驱动激光输出脉冲在等离子体引发目标处沿着目标轨道在一般最接近的等离子体起始位置处相交 接近所需的等离子体引发位点。 等离子体起始检测器可以瞄准目标轨道并且检测针对相应目标的等离子体起始位置沿着目标轨迹的位置。 中间焦点照明器可以照亮形成在中间焦点处的孔，以对至少一个成像装置中的孔进行成像。 所述至少一个成像装置可以是至少两个成像装置，每个成像装置基于对所述中间焦点的图像的图像的分析，提供与所述目标轨道与所述中间焦点的图像的垂直中心线轴线分离相关的误差信号 所述至少两个成像装置。 目标传送反馈和控制系统可以包括目标传送单元; 目标传送位移控制机构至少在对应于从第一成像装置中的图像的分析导出的第一位移误差信号的轴上移动目标传送机构，并且至少在与由第二位移误差信号 对第二成像装置中的图像进行分析。

    LPP EUV LIGHT SOURCE
    9.
    发明申请
    LPP EUV LIGHT SOURCE 审中-公开
    LPP EUV光源

    公开(公告)号：WO2005089131A2

    公开(公告)日：2005-09-29

    申请号：PCT/US2005/007063

    申请日：2005-03-03

    Applicant: CYMER, INC. ,  PARTLO, William, N. ,  BROWN, Daniel, J., W. ,  FOMENKOV, Igor, V. ,  BOWERING, Norbert, R. ,  RETTIG, Curtis, L. ,  MACFARLANE, Joseph, J. ,  ERSHOV, Alexander, I. ,  HANSSON, Bjorn, A., M.

    Inventor： PARTLO, William, N. ,  BROWN, Daniel, J., W. ,  FOMENKOV, Igor, V. ,  BOWERING, Norbert, R. ,  RETTIG, Curtis, L. ,  MACFARLANE, Joseph, J. ,  ERSHOV, Alexander, I. ,  HANSSON, Bjorn, A., M.

    IPC: G03F7/20 ,  H05G2/00

    CPC classification number: H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  H01S3/0085 ,  H01S3/0092 ,  H01S3/1611 ,  H01S3/1653 ,  H01S3/2255 ,  H01S3/2325 ,  H01S3/2375 ,  H01S3/2383 ,  H05G2/005 ,  H05G2/008

    Abstract: An apparatus and method is described for effectively and efficiently providing plasma irradiation laser light pulses in an LPP EUV light source which may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with an initial target irradiation pulse to form an EUV generating plasma having an emission region emitting in-band EUV light; a laser plasma irradiation pulse generating mechanism irradiating the plasma with a plasma irradiation pulse after the initial target irradiation pulse so as to compress emission material in the plasma toward the emission region of the plasma. The plasma irradiation pulse may comprise a laser pulse having a wavelength that is sufficiently longer than a wavelength of the initial target irradiation .pulse to have an associated lower critical density resulting in absorption occurring within the plasma in a region of the plasma defined by the wavelength of the plasma irradiation pulse sufficiently separated from an initial target irradiation site to achieve compression of the emission material, and the may compress the emission region. The laser plasma irradiation pulse may produce an aerial mass density in the ablating cloud of the plasma sufficient to confine the favorably emitting plasma for increased conversion efficiency. The deposition region for the plasma irradiation pulse may be is removed enough from the initial target surface so as to insure compression of the favorably emitting plasma. A high conversion efficiency laser produced plasma extreme ultraviolet (“EUV”) light source may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with a target irradiation pulse to form an EUV generating plasma emitting in-band EUV light; a plasma tamper substantially surrounding the plasma to constrain the expansion of the plasma.

    Abstract translation: 描述了一种用于在LPP EUV光源中有效且有效地提供等离子体照射激光脉冲的装置和方法，其可以包括用初始目标照射脉冲照射等离子体引发目标的激光初始靶照射脉冲发生机构以形成产生EUV的等离子体 具有发射带内EUV光的发射区域; 激光等离子体照射脉冲发生机构在初始目标照射脉冲之后用等离子体照射脉冲照射等离子体，以将等离子体中的发射材料压缩到等离子体的发射区域。 等离子体照射脉冲可以包括具有足够长于初始靶照射脉冲的波长的波长的激光脉冲，以具有相关联的较低临界密度，从而在由波长限定的等离子体区域内的等离子体内发生吸收 的等离子体照射脉冲与初始靶照射部位充分分离，以实现发射材料的压缩，并且可以压缩发射区域。 激光等离子体照射脉冲可以在等离子体的消融云中产生足够的空气质量密度以限制有利的发射等离子体以提高转换效率。 可以从初始目标表面去除等离子体照射脉冲的沉积区域，以确保有利地发射等离子体的压缩。 高转换效率的激光产生的等离子体极紫外（“EUV”）光源可以包括激光初始靶照射脉冲发生机构，用目标照射脉冲照射等离子体引发目标，以形成产生EUV的发射等离子体的带内EUV光; 等离子体篡改基本上围绕等离子体以约束等离子体的膨胀。

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