Abstract:
A wafer processing apparatus, including a heater apparatus, is provided. The heater apparatus includes a coating layer; and a seal structure in contact with the coating layer. The seal structure is formed from a seal formable material. The seal formable material includes at least one of a YASB glassy composition, a CGYP glassy composition, or a combination of the YASB glassy composition and the CGYP glassy composition. A method and device are also included.
Abstract:
A processing apparatus for use in a corrosive operating environment is provided. The apparatus includes a base substrate for placing a wafer thereon. The base substrate has a coefficient of thermal expansion. At least one electrode is embedded in or disposed on or under the base substrate. The electrode has a coefficient of thermal expansion in a range of from about 0.70 to about 1.25 times that of the base substrate coefficient of thermal expansion (CTE). At least one coating layer is disposed on the base substrate. The coating layer includes a composition capable of forming a calcium aluminate coating. The calcium aluminate coatingJay.er is doped with one of MgO, CaO, CaF 2 and mixtures thereof to control the CTE of the coating layer to match the CTE of the base substrate. The apparatus is exposed to a corrosive operating environment at a temperature range of from about 25 degrees Celsius to about 1500 degrees Celsius. A coated article and associated method are provided.
Abstract:
In one aspect, the present invention provides a hermetically sealed fiber sensing cable comprising: a core fiber comprising at least one Bragg grating region, an outer surface and a length; a fiber cladding in contact with the core fiber along the entire length of the core fiber, the fiber cladding having an outer surface and a length; a carbon layer disposed upon the outer surface of the fiber cladding along the entire length of the fiber cladding, the carbon layer comprising diamond-like carbon; a hydrogen ion absorption layer in contact with the carbon layer, the hydrogen ion absorption layer being disposed on the outer surface of the carbon layer; and an outer sleeve. Also provided in another aspect of the present invention, is a component for a hermetically sealed fiber sensing cable.
Abstract:
A processing apparatus for use in a corrosive operating environment is provided. The apparatus includes a base substrate for placing a wafer thereon. The base substrate has a coefficient of thermal expansion. At least one electrode is embedded in or disposed on or under the base substrate. The electrode has a coefficient of thermal expansion in a range of from about 0.70 to about 1.25 times that of the base substrate coefficient of thermal expansion (CTE). At least one coating layer is disposed on the base substrate. The coating layer includes a composition capable of forming a calcium aluminate coating. The calcium aluminate coatingJay.er is doped with one of MgO, CaO, CaF 2 and mixtures thereof to control the CTE of the coating layer to match the CTE of the base substrate. The apparatus is exposed to a corrosive operating environment at a temperature range of from about 25 degrees Celsius to about 1500 degrees Celsius. A coated article and associated method are provided.
Abstract:
A processing apparatus for use in a corrosive operating environment at a temperature range of 25 - 1500 0 C is provided. The apparatus has protective coating structure that includes a glassy material. The glassy material includes at least one of yttrium, cerium, or gadolinium; and aluminum and silicon. The coating composition resists etching by a harsh environment.
Abstract:
A processing apparatus for use in a corrosive operating environment at a temperature range of 25 - 1500 0 C is provided. The apparatus has protective coating structure that includes a glassy material. The glassy material includes at least one of yttrium, cerium, or gadolinium; and aluminum and silicon. The coating composition resists etching by a harsh environment.