PROCESSING APPARATUS, COATED ARTICLE AND METHOD
    2.
    发明申请
    PROCESSING APPARATUS, COATED ARTICLE AND METHOD 审中-公开
    加工设备,涂层物品和方法

    公开(公告)号:WO2008076320A2

    公开(公告)日:2008-06-26

    申请号:PCT/US2007/025529

    申请日:2007-12-13

    Abstract: A processing apparatus for use in a corrosive operating environment is provided. The apparatus includes a base substrate for placing a wafer thereon. The base substrate has a coefficient of thermal expansion. At least one electrode is embedded in or disposed on or under the base substrate. The electrode has a coefficient of thermal expansion in a range of from about 0.70 to about 1.25 times that of the base substrate coefficient of thermal expansion (CTE). At least one coating layer is disposed on the base substrate. The coating layer includes a composition capable of forming a calcium aluminate coating. The calcium aluminate coatingJay.er is doped with one of MgO, CaO, CaF 2 and mixtures thereof to control the CTE of the coating layer to match the CTE of the base substrate. The apparatus is exposed to a corrosive operating environment at a temperature range of from about 25 degrees Celsius to about 1500 degrees Celsius. A coated article and associated method are provided.

    Abstract translation: 提供一种用于腐蚀性操作环境的处理装置。 该装置包括用于在其上放置晶片的基底基板。 基底具有热膨胀系数。 至少一个电极嵌入或设置在基底基板上或下方。 电极的热膨胀系数在基底热膨胀系数(CTE)的约0.70至约1.25倍的范围内。 在基底基板上设置至少一层涂层。 涂层包括能够形成铝酸钙涂层的组合物。 将铝酸钙涂料掺入MgO,CaO,CaF 2 O 2中的一种及其混合物,以控制涂层的CTE以匹配基底基材的CTE。 该装置暴露在约25摄氏度至约1500摄氏度的温度范围内的腐蚀性操作环境中。 提供涂覆制品和相关方法。

    PROCESSING APPARATUS, COATED ARTICLE AND ASSOCIATED METHOD
    4.
    发明申请
    PROCESSING APPARATUS, COATED ARTICLE AND ASSOCIATED METHOD 审中-公开
    加工设备,涂层物品及相关​​方法

    公开(公告)号:WO2008076320A3

    公开(公告)日:2008-11-13

    申请号:PCT/US2007025529

    申请日:2007-12-13

    Abstract: A processing apparatus for use in a corrosive operating environment is provided. The apparatus includes a base substrate for placing a wafer thereon. The base substrate has a coefficient of thermal expansion. At least one electrode is embedded in or disposed on or under the base substrate. The electrode has a coefficient of thermal expansion in a range of from about 0.70 to about 1.25 times that of the base substrate coefficient of thermal expansion (CTE). At least one coating layer is disposed on the base substrate. The coating layer includes a composition capable of forming a calcium aluminate coating. The calcium aluminate coatingJay.er is doped with one of MgO, CaO, CaF 2 and mixtures thereof to control the CTE of the coating layer to match the CTE of the base substrate. The apparatus is exposed to a corrosive operating environment at a temperature range of from about 25 degrees Celsius to about 1500 degrees Celsius. A coated article and associated method are provided.

    Abstract translation: 提供一种用于腐蚀性操作环境的处理装置。 该装置包括用于在其上放置晶片的基底基板。 基底具有热膨胀系数。 至少一个电极嵌入或设置在基底基板上或下方。 电极的热膨胀系数在基底热膨胀系数(CTE)的约0.70至约1.25倍的范围内。 在基底基板上设置至少一层涂层。 涂层包括能够形成铝酸钙涂层的组合物。 将铝酸钙涂料掺入MgO,CaO,CaF 2 O 2中的一种及其混合物,以控制涂层的CTE以匹配基底基材的CTE。 该装置暴露在约25摄氏度至约1500摄氏度的温度范围内的腐蚀性操作环境中。 提供涂覆制品和相关方法。

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