Abstract:
Embodiments of the invention include a semiconductor structure comprising a Ill-nitride light emitting layer (24) disposed between an n-type region (22) and a p-type region (26). A contact disposed on the p-type region includes a transparent conductive material (28) in direct contact with the p-type region (26), a reflective metal layer (34), and a transparent insulating material (30) disposed between the transparent conductive layer (28) and the reflective metal layer (34). In a plurality of openings (32) in the transparent insulating material (30), the transparent conductive material (28) is in direct contact with the reflective metal layer.
Abstract:
A device includes a semiconductor structure comprising a light emitting layer (24) disposed between an n-type region (22) and a p-type region (26). The semiconductor structure includes an n-contact region (23) and a p-contact region (25). A cross section of the n-contact region (23) comprises a plurality of first regions (28) wherein portions of the light emitting layer (24) and p-type region (26) are removed to expose the n-type region (22). The plurality of first regions (28) are separated by a plurality of second regions (27) wherein the light emitting layer (24) and p-type region (26) remain in the device. The device further includes a first metal contact (40) formed over the semiconductor structure in the p-contact region (25) and a second metal contact (38) formed over the semiconductor structure in the n-contact region (23). The second metal contact (38) is in electrical contact with at least one of the second regions (27) in the n-contact region (23).
Abstract:
Embodiments of the invention include a semiconductor structure comprising a III-nitride light emitting layer disposed between an n-type region and a p-type region. A contact disposed on the p-type region includes a transparent conductive material in direct contact with the p-type region, a reflective metal layer, and a transparent insulating material disposed between the transparent conductive layer and the reflective metal layer. In a plurality of openings in the transparent insulating material, the transparent conductive material is in direct contact with the reflective metal layer.
Abstract:
A compliant bonding structure is disposed between a semiconductor light emitting device and a mount (40). When the semiconductor light emitting device is attached to the mount, for example by providing pressure, heat, and/or ultrasonic energy to the semiconductor light emitting device, the compliant bonding structure collapses to partially fill a space between the semiconductor light emitting device and the mount. In some embodiments, the compliant bonding structure is plurality of metal bumps (32) that undergo plastic deformation during bonding. In some embodiments, the compliant bonding structure is a porous metal layer (46).
Abstract:
A compliant bonding structure is disposed between a semiconductor light emitting device and a mount (40). When the semiconductor light emitting device is attached to the mount, for example by providing pressure, heat, and/or ultrasonic energy to the semiconductor light emitting device, the compliant bonding structure collapses to partially fill a space between the semiconductor light emitting device and the mount. In some embodiments, the compliant bonding structure is plurality of metal bumps (32) that undergo plastic deformation during bonding. In some embodiments, the compliant bonding structure is a porous metal layer (46).
Abstract:
A compliant bonding structure is disposed between a semiconductor device and a mount (40). In some embodiments, the device is a light emitting device. When the semiconductor light emitting device is attached to the mount, for example by providing ultrasonic energy to the semiconductor light emitting device, the compliant bonding structure collapses to partially fill a space between the semiconductor light emitting device and the mount. In some embodiments, the compliant bonding structure is plurality of metal bumps (32) that undergo plastic deformation during bonding. In some embodiments, the compliant bonding structure is a porous metal layer (46).
Abstract:
LED layers (18-22) are grown over a sapphire substrate. Individual flip chip LEDs are formed by trenching or masked ion implantation. Modules containing a plurality of LEDs are diced and mounted on a submount wafer (44). A submount metal pattern or a metal pattern formed on the LEDs connects the LEDs in a module in series. The growth substrate is then removed, such as by laser lift-off. A semi-insulating layer is formed, prior to or after mounting, that mechanically connects the LEDs together. The semi-insulating layer may be formed by ion implantation of a layer between the substrate and the LED layers. PEC etching of the semi-insulating layer, exposed after substrate removal, may be performed by biasing the semi-insulating layer. The submount is then diced to create LED modules containing series-connected LEDs.
Abstract:
A light-emitting diode (LED) is fabricated by forming the LED segments (100-1,100-2) with bond pads (114,116) covering greater than 85% of a mounting surface of the LED segments and isolation trenches (118) that electrically isolate the LED segments (100-1,100-2), mounting the LED segments on a submount (120) with a bond pad (124) that couples two or more bond pads (114,116) from the LED segments, and applying a laser lift-off to remove the growth substrate (102) from the LED layer.
Abstract:
Light emitting diode (LED) structures are fabricated in wafer scale by mounting singulated LED dies on a carrier wafer or a stretch film, separating the LED dies to create spaces between the LED dies, applying a reflective coating over the LED dies and in the spaces between the LED dies, and separating or breaking the reflective coating in the spaces between the LED dies such that some reflective coating remains on the lateral sides of the LED die. Portions of the reflective coating on the lateral sides of the LED dies may help to control edge emission.
Abstract:
A device includes a semiconductor structure comprising a Ill-nitride light emitting layer disposed between an n-type region and a p-type region. A transparent, conductive non-III-nitride material is disposed in direct contact with the n-type region. A total thickness of semiconductor material between the light emitting layer and the transparent, conductive non-III-nitride material is less than one micron.