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    METHODS AND SYSTEMS FOR PATTERN GENERATION BASED ON MULTIPLE FORMS OF DESIGN DATA
    2.
    发明申请
    METHODS AND SYSTEMS FOR PATTERN GENERATION BASED ON MULTIPLE FORMS OF DESIGN DATA 审中-公开
    基于多设计数据形式的图形生成方法与系统

    公开(公告)号：WO2007035166A3

    公开(公告)日：2007-06-14

    申请号：PCT/SE2006001094

    申请日：2006-09-26

    Applicant: MICRONIC LASER SYSTEMS AB ,  IVANSEN LARS

    Inventor： IVANSEN LARS

    IPC: G03F7/20 ,  G03F1/78

    CPC classification number: G03F1/68 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/78 ,  H01J37/3174

    Abstract: In a pattern generation method, properties of designs are extracted in a mask data preparation system, and the properties are propagated to a lithography write system. A pattern is generated based on fractured design data and the extracted properties. By preserving the design intent to the lithography write system, the fidelity of the pattern replication may improve.

    Abstract translation: 在图案生成方法中，在掩模数据准备系统中提取设计的属性，并且将性质传播到光刻写入系统。 基于断裂设计数据和提取的属性生成模式。 通过保留光刻写入系统的设计意图，可以提高图案复制的保真度。

    METHOD AND APPARATUS FOR IMAGE FORMATION
    4.
    发明申请
    METHOD AND APPARATUS FOR IMAGE FORMATION 审中-公开
    图像形成的方法和装置

    公开(公告)号：WO2003054632A1

    公开(公告)日：2003-07-03

    申请号：PCT/SE2002/002267

    申请日：2002-12-10

    Applicant: MICRONIC LASER SYSTEMS AB ,  BJUGGREN, Måns ,  IVANSEN, Lars ,  STIBLERT, Lars

    Inventor： BJUGGREN, Måns ,  IVANSEN, Lars ,  STIBLERT, Lars

    IPC: G03F7/20

    CPC classification number: G03F7/70441 ,  G03F1/36 ,  G03F1/76 ,  G03F7/70291 ,  G03F7/70433

    Abstract: The present invention relates to a method for adjusting a pattern to be imaged onto a workpiece. The pattern representing an image is divided ina plurality of regions. A pattern density in said plurality of region is computed. At least one feature in at least one of said plurality of regions is adjusted based on the pattern density in at least one other region. An adjusted pattern is fed to a modulator. The image is created on said workpiece by using said corrected pattern. The invention also relates to an apparatus for imaging adjusted pattern on a workpiece, a semiconducting wafer to be imaged with an adjusted pattern and a mask or a reticle to be imaged woth an adjusted pattern.

    Abstract translation: 本发明涉及一种用于调整要成像到工件上的图案的方法。 表示图像的图案被划分成多个区域。 计算所述多个区域中的图案密度。 基于至少一个其他区域中的图案密度来调整所述多个区域中的至少一个区域中的至少一个特征。 将调整后的图案馈送到调制器。 通过使用所述校正图案在所述工件上创建图像。 本发明还涉及一种用于对工件上的调整图案进行成像的成像装置，用被调整的图案成像的半导体晶片和要被调整图案成像的掩模或掩模版。

    HEALING ALGORITHM
    6.
    发明申请
    HEALING ALGORITHM 审中-公开
    愈合算法

    公开(公告)号：WO2006027246A3

    公开(公告)日：2006-08-31

    申请号：PCT/EP2005009663

    申请日：2005-09-08

    Applicant: MICRONIC LASER SYSTEMS AB ,  IVANSEN LARS

    Inventor： IVANSEN LARS

    IPC: G03F7/20

    CPC classification number: G03F7/70508 ,  G03F7/70291 ,  G03F7/70383 ,  G03F7/70433

    Abstract: An aspect of the present invention includes a method for reshaping sub-objects in at least one object in pattern design data to be presented to a mask writer or a direct writer for producing a pattern onto a workpiece, where said object comprises a plurality of slivers in a first direction, comprising the actions of: a) generating a list of slivers, repeating the actions of: b) comparing a dynamic object in an object list with the slivers in said list of slivers to look for adjacent slivers, c) removing adjacent slivers from said list of slivers to said object list, d) merging adjacent slivers with said dynamic object, e) terminating the repetition when no slivers in said list of slivers are adjacent to said dynamic object in said object list. Other aspects of the present invention are reflected in the detailed description, figures and claims.

    Abstract translation: 本发明的一个方面包括一种方法，用于在图案设计数据中对至少一个对象中的子对象进行整形以呈现给用于在工件上产生图案的掩模写入器或直接写入器，其中所述对象包括多个条片 在第一方向上，包括以下动作：a）生成细长条列表，重复以下动作：b）将对象列表中的动态对象与所述细长条列表中的细长条进行比较以寻找相邻细长条，c）去除 d）将相邻的细长条与所述动态物体合并，e）当所述细长表中没有细长条与所述物体列表中的所述动态物体相邻时，终止重复。 本发明的其它方面反映在具体实施方式，附图和权利要求中。

    HEALING ALGORITHM
    7.
    发明申请
    HEALING ALGORITHM 审中-公开
    健康算法

    公开(公告)号：WO2006027246A2

    公开(公告)日：2006-03-16

    申请号：PCT/EP2005/009663

    申请日：2005-09-08

    Applicant: MICRONIC LASER SYSTEMS AB ,  IVANSEN, Lars

    Inventor： IVANSEN, Lars

    IPC: G03F7/20

    CPC classification number: G03F7/70508 ,  G03F7/70291 ,  G03F7/70383 ,  G03F7/70433

    Abstract: An aspect of the present invention includes a method for reshaping sub-objects in at least one object in pattern design data to be presented to a mask writer or a direct writer for producing a pattern onto a workpiece, where said object comprises a plurality of slivers in a first direction, comprising the actions of: a) generating a list of slivers, repeating the actions of: b) comparing a dynamic object in an object list with the slivers in said list of slivers to look for adjacent slivers, c) removing adjacent slivers from said list of slivers to said object list, d) merging adjacent slivers with said dynamic object, e) terminating the repetition when no slivers in said list of slivers are adjacent to said dynamic object in said object list. Other aspects of the present invention are reflected in the detailed description, figures and claims.

    Abstract translation: 本发明的一个方面包括一种用于在图案设计数据中的至少一个对象中的子对象重新形成以呈现给掩模写入器或直接写入器以在工件上产生图案的方法，其中所述对象包括多个条子 在第一方向上，包括以下动作：a）生成条子列表，重复以下动作：b）将对象列表中的动态对象与所述条子列表中的条子进行比较以查找相邻条带，c）去除 相邻条子从所述条子列表到所述对象列表，d）将相邻条子与所述动态对象合并，e）当所述条子列表中的条子与所述对象列表中的所述动态对象相邻时，终止所述重复。 本发明的其它方面在详细描述，附图和权利要求中被体现。

    METHOD FOR MERGING MULTIPLE GEOMETRICAL PIXEL IMAGES AND GENERATING A SINGLE MODULATOR PIXEL IMAGE
    8.
    发明申请
    METHOD FOR MERGING MULTIPLE GEOMETRICAL PIXEL IMAGES AND GENERATING A SINGLE MODULATOR PIXEL IMAGE 审中-公开
    用于合并多个几何像素图像并生成单个调制器像素图像的方法

    公开(公告)号：WO2011107603A1

    公开(公告)日：2011-09-09

    申请号：PCT/EP2011/053337

    申请日：2011-03-04

    Applicant: MICRONIC MYDATA AB ,  IVANSEN, Lars ,  ÖSTERBERG, Anders

    Inventor： IVANSEN, Lars ,  ÖSTERBERG, Anders

    IPC: G03F7/20

    CPC classification number: G03F7/2051 ,  G03F7/70291 ,  G03F7/70508 ,  G03F7/70541 ,  G06F17/50

    Abstract: The present invention relates to customizing individual workpieces, such as chip, flat panels or other electronic devices produced on substrates, by direct writing a custom pattern. Customization can be per device, per substrate, per batch or at some other small volume that makes it impractical to use a custom mask or mask set. In particular, it relates to customizing a latent image formed in a radiation sensitive layer over a substrate, merging standard and custom pattern data to form a custom pattern used to produce the customized latent image. A wide variety of substrates can benefit from the technology disclosed.

    Abstract translation: 本发明涉及通过直接写入定制图案来定制单个工件，例如芯片，平板或在基板上制造的其它电子设备。 定制可以是每个设备，每个基板，每个批处理或一些其他小的体积，这使得使用自定义掩码或掩码集不切实际。 特别地，它涉及定制在基底上的辐射敏感层中形成的潜像，合并标准和定制图案数据以形成用于产生定制潜像的定制图案。 各种基板可以从所公开的技术中受益。

    METHODS AND SYSTEMS FOR PATTERN GENERATION BASED ON MULTIPLE FORMS OF DESIGN DATA
    10.
    发明申请
    METHODS AND SYSTEMS FOR PATTERN GENERATION BASED ON MULTIPLE FORMS OF DESIGN DATA 审中-公开
    基于多种设计数据形式的图案生成方法和系统

    公开(公告)号：WO2007035166A2

    公开(公告)日：2007-03-29

    申请号：PCT/SE2006/001094

    申请日：2006-09-26

    Applicant: MICRONIC LASER SYSTEMS AB ,  IVANSEN, Lars

    Inventor： IVANSEN, Lars

    IPC: G03F7/20

    CPC classification number: G03F1/68 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/78 ,  H01J37/3174

    Abstract: In a pattern generation method, properties of designs are extracted in a mask data preparation system, and the properties are propagated to a lithography write system. A pattern is generated based on fractured design data and the extracted properties. By preserving the design intent to the lithography write system, the fidelity of the pattern replication may improve.

    Abstract translation: 在图案生成方法中，在掩模数据准备系统中提取设计的属性，并且将属性传播到光刻写入系统。 根据分解的设计数据和提取的属性生成模式。 通过保留光刻写入系统的设计意图，模式复制的保真度可能会提高。

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