Abstract:
In a first embodiment, a method comprises: patterning a source substrate; forming a weak interface in the source substrate; bonding the source substrate to a handle substrate; and exfoliating a thin layer from the source substrate such that the thin layer remains bonded to the handle substrate; wherein the thin layer comprises a pattern corresponding to the patterning of the source substrate. In a second embodiment, a method comprises : forming a weak interface in a source substrate; bonding the source substrate to the handle substrate; exfoliating a thin layer from the source substrate such that the thin layer remains bonded to the handle substrate; capping the thin layer bonded to the handle substrate; and after capping the thin layer, annealing the thin layer.
Abstract:
An intermediate substrate includes a handle substrate bonded to a thin layer suitable for epitaxial growth of a compound semiconductor layer, such as a Ill-nitride semiconductor layer. The handle substrate may be a metal or metal alloy substrate, such as a molybdenum or molybdenum alloy substrate, while the thin layer may be a sapphire layer. A method of making the intermediate substrate includes forming a weak interface in the source substrate, bonding the source substrate to the handle substrate, and exfoliating the thin layer from the source substrate such that the thin layer remains bonded to the handle substrate.
Abstract:
A method of making a semiconductor thin film bonded to a handle substrate includes implanting a semiconductor substrate with a light ion species while cooling the semiconductor substrate, bonding the implanted semiconductor substrate to the handle substrate to form a bonded structure, and annealing the bonded structure, such that the semiconductor thin film is transferred from the semiconductor substrate to the handle substrate.
Abstract:
An intermediate substrate includes a handle substrate bonded to a thin layer suitable for epitaxial growth of a compound semiconductor layer, such as a Ill-nitride semiconductor layer. The handle substrate may be a metal or metal alloy substrate, such as a molybdenum or molybdenum alloy substrate, while the thin layer may be a sapphire layer. A method of making the intermediate substrate includes forming a weak interface in the source substrate, bonding the source substrate to the handle substrate, and exfoliating the thin layer from the source substrate such that the thin layer remains bonded to the handle substrate.
Abstract:
A method includes growing a first epitaxial layer of Ill-nitride material, forming a damaged region by implanting ions into an exposed surface of the first epitaxial layer, and growing a second epitaxial layer of Ill-nitride material on the exposed surface of the first epitaxial layer. A level of defects present in the second epitaxial layer is less than a level of defects present in the first epitaxial layer.
Abstract:
We disclose a method for making an optically transparent, electrically conductive nanostructure film, comprising coating a dispersion or a solution comprising a nanostructure selected from the group consisting of carbon nanotubes, fullerenes, graphene flakes/sheets, nanowires, and two or more thereof on a substrate. The film may also comprise a dopant in the dispersion or solution, as well as an encapsulant or topcoat.
Abstract:
A method of making a semiconductor thin film bonded to a handle substrate includes implanting a semiconductor substrate with a light ion species while cooling the semiconductor substrate, bonding the implanted semiconductor substrate to the handle substrate to form a bonded structure, and annealing the bonded structure, such that the semiconductor thin film is transferred from the semiconductor substrate to the handle substrate.