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    POLYSILAZANES AND RELATED COMPOSITIONS, PROCESSES AND USES
    3.
    发明申请
    POLYSILAZANES AND RELATED COMPOSITIONS, PROCESSES AND USES 审中-公开
    多晶硅和相关组合物，工艺和用途

    公开(公告)号：WO1987005298A1

    公开(公告)日：1987-09-11

    申请号：PCT/US1986002266

    申请日：1986-10-24

    Applicant: SRI INTERNATIONAL ,  BLUM, Yigal, D. ,  LAINE, Richard, M. ,  SCHWARTZ, Kenneth, B. ,  PLATZ, Robert, M. ,  ROWCLIFFE, David, J. ,  DODGE, Allen, L. ,  McLEOD, Jonathan, M. ,  ROBERTS, Daryl, L.

    Inventor： SRI INTERNATIONAL

    IPC: C07F07/08

    CPC classification number: C04B35/185 ,  C04B35/16 ,  C04B35/571 ,  C04B35/589 ,  C04B35/6316 ,  C04B41/4554 ,  C07F7/10 ,  C07F7/21 ,  C08G77/38 ,  C08G77/398 ,  C08G77/54 ,  C08G77/62 ,  C08G79/00

    Abstract: Silazanes and related compounds are prepared by (a) providing a precursor containing at least one Si-N bond, cleaving an Si-N bond in the precursor in the presence of hydrogen or a hydrogen donor, and reacting the cleavage product with a second cleavage product or with a compound containing an Si-H bond, an N-H bond, or both, to produce an initial silazane product having at least one newly formed Si-N bond or (b) providing one or more reactants which contain an Si-H bond and an N-H bond, and causing reaction to occur between the two bonds in the presence of a transition metal catalyst to form an initial silazane product having newly formed Si-N bonds. Further products may result from additional reaction of either type. Novel compounds, including siloxazanes and high molecular weight polysilazanes, are provided. The compounds may be pyrolyzed to yield ceramic materials such as silicon nitride, silicon carbide and silicon oxynitride. In a preferred embodiment, substantially pure silicon nitride and articles prepared therefrom are provided. Fibers, coatings, binders, and the like may be prepared from the novel materials.

    Abstract translation: 硅烷和相关化合物通过（a）提供含有至少一个Si-N键的前体，在氢或氢供体存在下在前体中切割Si-N键，并使裂解产物与第二次裂解 产物或含有Si-H键，NH键或两者的化合物，以产生具有至少一个新形成的Si-N键的初始硅氮烷产物或（b）提供一种或多种含有Si-H键的反应物 键和NH键，并且在过渡金属催化剂存在下引起两键之间的反应，以形成具有新形成的Si-N键的初始硅氮烷产物。 其他产品可能由任一类型的额外反应引起。 提供新型化合物，包括硅氧烷和高分子量聚硅氮烷。 可以将这些化合物热解以产生诸如氮化硅，碳化硅和氮氧化硅的陶瓷材料。 在优选的实施方案中，提供基本上纯的氮化硅和由其制备的制品。 纤维，涂料，粘合剂等可以由新型材料制备。

    PROPERTIES TAILORING IN SILSESQUIOXANES
    5.
    发明申请
    PROPERTIES TAILORING IN SILSESQUIOXANES 审中-公开
    SILESQUIOXANES的特性定制

    公开(公告)号：WO2010062695A3

    公开(公告)日：2010-07-22

    申请号：PCT/US2009062815

    申请日：2009-10-30

    Applicant: UNIV MICHIGAN ,  LAINE RICHARD M ,  SULAIMAN SANTY

    Inventor： LAINE RICHARD M ,  SULAIMAN SANTY

    IPC: C08G77/38 ,  C08G77/08

    CPC classification number: C08G77/045

    Abstract: Fluoride catalyzed rearrangement reactions of polymeric silsesquioxanes [RSiO1.5]n involve reacting at least one silsesquioxane material with a catalytic amount of an organic fluoride at a temperature ranging from about -50C to about 120C thereby forming a reaction mixture for a period ranging from 60 minutes to 48 hours. To the reaction mixture, a quenching agent is added to remove fluoride from the reaction mixture. A silsesquioxane cage compound can be isolated from the reaction mixture using a precipitation or other extraction process.

    Abstract translation: 聚合倍半硅氧烷[RSiO 1.5] n的氟化物催化的重排反应包括使至少一种倍半硅氧烷材料与催化量的有机氟化物在约-50℃至约120℃的温度范围内反应，由此形成反应混合物持续60 分钟到48小时。 向反应混合物中加入猝灭剂以从反应混合物中除去氟化物。 可以使用沉淀或其他提取方法从反应混合物中分离出倍半硅氧烷笼化合物。

    PLASMA PROCESSES FOR PRODUCING SILANES AND DERIVATIVES THEREOF
    7.
    发明申请
    PLASMA PROCESSES FOR PRODUCING SILANES AND DERIVATIVES THEREOF 审中-公开
    用于生产硅烷及其衍生物的等离子体方法

    公开(公告)号：WO2010017373A2

    公开(公告)日：2010-02-11

    申请号：PCT/US2009/052981

    申请日：2009-08-06

    Applicant: ELECTRODYNAMIC APPLICATIONS, INC. ,  LAINE, Richard, M. ,  MASSEY, Dean, Richard ,  PETERSON, Peter, Young

    Inventor： LAINE, Richard, M. ,  MASSEY, Dean, Richard ,  PETERSON, Peter, Young

    IPC: C01B33/04 ,  B01J19/08 ,  H05H1/00 ,  H01L31/20

    CPC classification number: C22B7/001 ,  C01B33/023 ,  C01B33/025 ,  C01B33/037 ,  C22B1/02 ,  C22B1/244 ,  C22B5/10 ,  C22B61/00 ,  Y02P10/122 ,  Y02P10/214

    Abstract: The invention is generally related to process for generating one or more molecules having the formula Si x H y , where x and y are integers ≥1, such as silane, comprising the steps of: providing a silicon containing material, wherein the silicon containing material includes at least 20 weight percent silicon atoms based on the total weight of the silicon containing material; generating a plasma capable of vaporizing a silicon atom, sputtering a silicon atom, or both using a plasma generating device; and contacting the plasma to the silicon containing material in a chamber having an atmosphere that includes at least about 0.5 mole percent hydrogen atoms based on the total moles of atoms in the atmosphere; so that a molecule having the formula Si x H y; (e.g., silane) is generated. The process preferably includes a step of removing one or more impurities from the Si x H y (e.g., the silane) to form a clean Si x H y (e.g., silane). The process may also include a step of reacting the Si x H y (e.g., the silane) to produce a high purity silicon containing material such as electronic grade metallic silicon, photovoltaic grade metallic silicon, or both.

    Abstract translation: 本发明通常涉及用于产生具有式SixHy的一种或多种分子的方法，其中x和y是整数= 1，例如硅烷，包括以下步骤：提供含硅材料，其中含硅材料至少包括 基于含硅材料的总重量的20重量％的硅原子; 产生能够蒸发硅原子的等离子体，使用等离子体发生装置溅射硅原子或二者; 并且基于气氛中的原子总摩尔数，在具有包括至少约0.5摩尔百分比的氢原子的气氛的室中将等离子体接触到含硅材料; 使得具有式SixHy的分子; （例如硅烷）。 该方法优选包括从SixHy（例如硅烷）中除去一种或多种杂质以形成干净的SixHy（例如硅烷）的步骤。 该方法还可以包括使SixHy（例如，硅烷）反应以产生高纯度含硅材料如电子级金属硅，光伏级金属硅或两者的步骤。

    UV-ABSORBING COATINGS AND METHODS OF MAKING THE SAME
    8.
    发明申请
    UV-ABSORBING COATINGS AND METHODS OF MAKING THE SAME 审中-公开
    紫外线吸收涂料及其制备方法

    公开(公告)号：WO2006023299A1

    公开(公告)日：2006-03-02

    申请号：PCT/US2005/027985

    申请日：2005-08-04

    Applicant: GUARDIAN INDUSTRIES CORP. ,  WANG, Yei-ping ,  LAINE, Richard, M.

    Inventor： WANG, Yei-ping ,  LAINE, Richard, M.

    IPC: C09D183/06

    CPC classification number: C09D183/04 ,  C08G77/16 ,  C08G77/52 ,  Y10T428/31511 ,  Y10T428/31663

    Abstract: Methods of forming UV-absorbent transparent coatings and transparent substrates coated with the same allow for a relatively lower temperature cross-linkage reaction between a UV-absorbent compound and an epoxy-alkoxysilane. More specifically, UV-absorbent coatings on transparent substrates are formed by prepolymerizing a mixture consisting essentially of a benzophenone, an epoxy alkoxysilane and an organic catalyst at a temperature of between about 40°C to about 130°C and for a time sufficient such that between about 30% to about 70% of the epoxy alkoxysilane has been converted to a ring-opened oligomer or polymer. Such prepolymerized mixture may then be hydrolyzed and coated onto the surface of a transparent substrate, and thereafter cured at a temperature of less than about 200°C for a time sufficient to cross-link the hydrolyzed alkoxysilane with itself and the glass surface. Most preferably , the prepolymerized mixture is hydrolyzed prior to being coated onto the substrate in an acidic alcoholic solution. Preferred for use in the present invention as a UV-absorbent compound is tetrahydroxybenzophenone. The preferred epoxy alkoxysilane is 3-glycidoxypropyl trimethoxysilane. It is especially preferred that prepolymerization be effected in the presence of an organic catalyst, such as triethylamine (TEA).

    Abstract translation: 形成紫外线吸收透明涂层的方法和用其涂覆的透明基材允许紫外线吸收剂化合物和环氧烷氧基硅烷之间的相对较低的温度交联反应。 更具体地说，在约40℃至约130℃的温度下，通过将基本上由二苯甲酮，环氧烷氧基硅烷和有机催化剂组成的混合物预聚合，形成透明基材上的紫外线吸收涂层，时间足够长， 约30％至约70％的环氧烷氧基硅烷已经转化成开环的低聚物或聚合物。 然后将这样的预聚合的混合物水解并涂覆在透明基材的表面上，然后在小于约200℃的温度下固化足够的时间以使水解的烷氧基硅烷与其自身和玻璃表面交联。 最优选地，将预聚合的混合物在用酸性醇溶液涂覆在基材上之前水解。 作为UV吸收剂化合物优选用于本发明的是四羟基二苯甲酮。 优选的环氧烷氧基硅烷是3-缩水甘油氧基丙基三甲氧基硅烷。 特别优选的是，在有机催化剂如三乙胺（TEA）的存在下进行预聚合。

    WELL-DEFINED NANOSIZED BUILDING BLOCKS FOR ORGANIC/INORGANIC NANOCOMPOSITES
    10.
    发明申请
    WELL-DEFINED NANOSIZED BUILDING BLOCKS FOR ORGANIC/INORGANIC NANOCOMPOSITES 审中-公开
    用于有机/无机纳米复合材料的定义明确的纳米结构块

    公开(公告)号：WO2002100867A1

    公开(公告)日：2002-12-19

    申请号：PCT/US2001/048451

    申请日：2001-10-29

    Applicant: THE REGENTS OF THE UNIVERSITY OF MICHIGAN ,  LAINE, Richard, M. ,  TAMAKI, Ryo ,  CHOI, Jiwon

    Inventor： LAINE, Richard, M. ,  TAMAKI, Ryo ,  CHOI, Jiwon

    IPC: C07F7/21

    CPC classification number: C07F7/21

    Abstract: Functionalized silsesquioxanes containing from 6 to 24 silicon atoms and minimally about 67 mol percent RSiO 3/2 moieties where R is a phenyl group bearing a chemically reactive functional group are highly suitable for use as nanoparticles in producing highly ordered nanocomposites of many types, containing a high proportion of interphase. The nanocomposites have unusual physicochemical properties due to the use of uniform, highly functionalized nanoparticles.

    Abstract translation: 含有6至24个硅原子的官能化倍半硅氧烷和最低约67mol％的RSiO 3/2部分，其中R是具有化学反应性官能团的苯基，其高度适用于制备许多类型的高度有序纳米复合材料的纳米粒子，其含有高 相间比例。 由于使用均匀的高官能化纳米粒子，纳米复合材料具有不寻常的物理化学性质。

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