公开(公告)号：WO2013103609A1

公开(公告)日：2013-07-11

申请号：PCT/US2012/072272

申请日：2012-12-31

Applicant: APPLIED MATERIALS, INC. ,  PONNEKANTI, Hari K. ,  POLYAK, Alexander S. ,  L'HEUREUX, James ,  COX, Michael S. ,  LANE, Christopher T. ,  HAMMOND, Edward P., IV ,  MUNGEKAR, Hemant P. ,  SCHLAEFER, Susanne ,  BUSCHBECK, Wolfgang ,  HENRICH, Juergen ,  LOPP, Andreas

Inventor： PONNEKANTI, Hari K. ,  POLYAK, Alexander S. ,  L'HEUREUX, James ,  COX, Michael S. ,  LANE, Christopher T. ,  HAMMOND, Edward P., IV ,  MUNGEKAR, Hemant P. ,  SCHLAEFER, Susanne ,  BUSCHBECK, Wolfgang ,  HENRICH, Juergen ,  LOPP, Andreas

IPC: H01L31/18 ,  H01L31/042 ,  H01L31/0216

CPC classification number: H01L31/18 ,  C23C14/568 ,  C23C16/54 ,  H01L21/67115 ,  H01L21/67173 ,  H01L21/6776

Abstract: The present invention generally provides a high throughput substrate processing system that is used to form one or more regions of a solar cell device. In one configuration of a processing system, one or more solar cell passivating or dielectric layers are deposited and further processed within one or more processing chambers contained within the high throughput substrate processing system. The processing chambers may be, for example, plasma enhanced chemical vapor deposition (PECVD) chambers, low pressure chemical vapor deposition (LPCVD) chambers, atomic layer deposition (ALD) chambers, physical vapor deposition (PVD) or sputtering chambers, thermal processing chambers (e.g., RTA or RTO chambers), substrate reorientation chambers (e.g., flipping chambers) and/or other similar processing chambers.

Abstract translation: 本发明通常提供用于形成太阳能电池器件的一个或多个区域的高通量衬底处理系统。 在处理系统的一种配置中，一个或多个太阳能电池钝化或电介质层被沉积并在包含在高通量衬底处理系统内的一个或多个处理室内进一步处理。 处理室可以是例如等离子体增强化学气相沉积（PECVD）室，低压化学气相沉积（LPCVD）室，原子层沉积（ALD）室，物理气相沉积（PVD）或溅射室，热处理室 （例如，RTA或RTO室），基板重新定向室（例如，翻转室）和/或其它类似的处理室。