IMPROVED MULTI-AXIS DIFFRACTION GRATING
    1.
    发明申请
    IMPROVED MULTI-AXIS DIFFRACTION GRATING 审中-公开
    改进的多轴衍射光栅

    公开(公告)号:WO2010054329A1

    公开(公告)日:2010-05-14

    申请号:PCT/US2009/063749

    申请日:2009-11-09

    Abstract: An enhanced optical interference pattern, such as a diffraction grating, is incorporated into a photodefinable surface by shining three or more beams of coherent light from a single source at a photodefinable surface, such as a photosensitive emulsion/photoresist covered glass or an ablatable substrate and mapping the diffraction grating pattern to the photodefinable surface. Mapping of the optical interference pattern is created by interference of three or more light beams, such as laser light or other light sources producing a suitable spectrum of light. The mapped photodefinable surface can be used to create embossing shims. The embossing shim can then be used to emboss film or paper. The embossed film/paper can be metalized and laminated onto a substrate to create a product that has shifting patterns at a variety of viewing angles when exposed to white light.

    Abstract translation: 增强的光学干涉图案,例如衍射光栅,通过在可光限定的表面例如感光乳剂/光致抗蚀剂覆盖的玻璃或可烧蚀的基底上照射来自单个源的三个或更多个相干光束而被并入可光限定的表面,以及 将衍射光栅图案映射到可光限定表面。 光学干涉图案的映射是由三个或更多个光束的干涉产生的,例如产生合适光谱的激光或其他光源。 映射的光可定义表面可用于创建压花垫片。 然后可以将压花垫片用于压花膜或纸。 压花膜/纸可以被金属化并层压到基底上以产生当暴露于白光时具有各种视角的移动图案的产品。

    IMAGING OF DEEP STRUCTURES OR RELIEFS FOR SHALLOW RELIEF EMBOSSING
    2.
    发明申请
    IMAGING OF DEEP STRUCTURES OR RELIEFS FOR SHALLOW RELIEF EMBOSSING 审中-公开
    深层结构的成像或放松以减轻紧张的影响

    公开(公告)号:WO2010006108A1

    公开(公告)日:2010-01-14

    申请号:PCT/US2009/050022

    申请日:2009-07-09

    Abstract: A variety of deep structured decorative patterns originate with mechanical relief or etching A deeply patterned or textured etching or relief is incorporated into a thin film embossing shim to simulate the look of the deep pattern or texture when used to emboss thin film or mateπal A transparent mold of the relief surface (such as brushed metal, engine-turned patterns, and textured glass) is formed using UV curable liquid and a transparent substrate The relief copy in the transparent mold or overlay is mapped onto a photoresist surface or plate by shining or expanding one or more laser beams through the transparent mold The thin film embossing shim is then used with conventional embossing equipment to form thin film embossings The embossed thin films can then be metalized and laminated onto substrate to create shifting patterns that reflect at a variety of viewing angles when exposed to white light.

    Abstract translation: 各种深层结构的装饰图案起源于机械浮雕或蚀刻将深刻图案或纹理化的蚀刻或浮雕结合到薄膜压花垫片中,以模拟当用于压印薄膜或材料的深色图案或纹理的外观A透明模具 (例如拉丝金属,发动机转向图案和纹理化玻璃)使用UV可固化液体和透明基底形成。透明模具或覆盖物中的凸版被映射到光致抗蚀剂表面或板上,通过发光或膨胀 通过透明模具的一个或多个激光束然后将薄膜压花垫片与常规压花设备一起使用以形成薄膜压花。然后可以将压花薄膜金属化并层压到基板上以产生以各种视角反射的移动图案 暴露在白光下。

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