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    METHOD OF OPERATING A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    2.
    发明申请
    METHOD OF OPERATING A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
    操作微波投影曝光装置的方法

    公开(公告)号：WO2012123000A1

    公开(公告)日：2012-09-20

    申请号：PCT/EP2011/001264

    申请日：2011-03-15

    Applicant: CARL ZEISS SMT GMBH ,  BITTNER, Boris ,  VON HODENBERG, Martin ,  SCHNEIDER, Sonja

    Inventor： BITTNER, Boris ,  VON HODENBERG, Martin ,  SCHNEIDER, Sonja

    IPC: G03F7/20 ,  H01L21/00

    CPC classification number: G03F7/708 ,  G03F7/70216 ,  G03F7/7025 ,  G03F7/70308 ,  G03F7/70891

    Abstract: A method of operating a microlithographic projection exposure apparatus comprising the steps of : providing an illumination system (12) having an illumination pupil plane (38); providing a projection objective (18) having an objective pupil plane (58), which is optically conjugate to the illumination pupil plane (38); providing a mask (14) containing structures (15); determining a target spatial irradiance distribution of projection light (28) in the illumination pupil plane (38); illuminating a portion of the mask (14) with projection light that produces in the illumination pupil plane (38) a modified spatial irradiance distribution, wherein there is an excess area (70) in the illumination pupil plane which is irradiated in the modified spatial irradiance distribution, but is not irradiated in the target spatial irradiance distribution; and stopping those light rays (36c), which pass the excess area (70) in the illumination pupil plane (38), from reaching a light sensitive surface (20) by using a stop (66; 166; 266) that is arranged in the projection pupil plane (58).

    Abstract translation: 一种操作微光刻投影曝光装置的方法，包括以下步骤：提供具有照明光瞳平面（38）的照明系统（12）; 提供具有与所述照明光瞳平面（38）光学共轭的物镜光瞳平面（58）的投影物镜（18）。 提供包含结构（15）的掩模（14）; 确定所述照明光瞳平面（38）中的投影光（28）的目标空间辐照度分布; 用在照明光瞳平面（38）中产生的改变的空间辐照度分布的投影光照射面罩（14）的一部分，其中在照明光瞳平面中存在以修改的空间辐照度照射的多余面积（70） 分布，但不照射在目标空间辐照度分布中; 并且使通过所述照明光瞳平面（38）中的所述多余区域（70）的那些光线（36c）通过使用布置在所述光阑（66; 166; 266）中的光阑（66; 166; 266）而到达感光表面 投影光瞳平面（58）。

    IMAGING OPTICAL SYSTEM FOR MICROLITHOGRAPHY
    3.
    发明申请
    IMAGING OPTICAL SYSTEM FOR MICROLITHOGRAPHY 审中-公开
    成像光学系统

    公开(公告)号：WO2012041459A2

    公开(公告)日：2012-04-05

    申请号：PCT/EP2011/004744

    申请日：2011-09-22

    Applicant: CARL ZEISS SMT GMBH ,  ROGALSKY, Olaf ,  SCHNEIDER, Sonja ,  BITTNER, Boris ,  KUGLER, Jens ,  GELLRICH, Bernhard ,  FREIMANN, Rolf

    Inventor： ROGALSKY, Olaf ,  SCHNEIDER, Sonja ,  BITTNER, Boris ,  KUGLER, Jens ,  GELLRICH, Bernhard ,  FREIMANN, Rolf

    IPC: G03F7/20

    CPC classification number: G02B17/06 ,  G02B17/0663 ,  G02B27/0012 ,  G03F7/70258 ,  G03F7/70308 ,  G03F7/70891

    Abstract: An imaging optical system (10), in particular a projection objective, for microlithography, comprises optical elements (M1-M6) configured to guide electromagnetic radiation (19) with a wavelength λ in an imaging beam path for imaging an object field (13) into an image plane (14), and a pupil (24), having coordinates (p, q) which, together with the image field (16), having coordinates (x, y), of the optical system (10), spans an extended 4-dimensional pupil space, having coordinates (x, y, p, q) as a function of which a wavefront W(x, y, p, q) of the radiation (19) passing through the optical system is defined. At least a first of the optical elements (M1-M6) has a non-rotationally symmetrical surface (26) having a respective surface deviation in relation to every rotationally symmetrical surface (28), which two-dimensional surface has a difference between its greatest elevation and its deepest valley of at least λ. A sub-aperture ratio of the non- rotationally symmetrical surface deviates at every point (Ο 1 , O 2 ) of the object field (13) by at least 0.01 from the sub-aperture ratio of every other surface of the optical elements, which is located in the imaging beam path, at the respective point (O 1 , O 2 ) of the object field (13). Furthermore, the surface (26) of the first optical element (M4) is configured such that by displacing the first optical element relative to the other optical elements a change to the wavefront of the optical system (10) can be brought about which has a portion with at least 2-fold symmetry, the maximum value of the wavefront change in the extended 4- dimensional pupil space being at least 1 x 10 -5 of the wavelength λ.

    Abstract translation: 用于微光刻的成像光学系统（10），特别是投影物镜，包括被配置为在成像光束路径中引导具有波长λ的电磁辐射（19）的光学元件（M1-M6） 用于将物场（13）成像到图像平面（14）中，以及瞳孔（24），其具有与图像场（16）一起具有坐标（x，y）的坐标（p，q）， 光学系统（10）跨越具有坐标（x，y，p，q）的扩展的4维光瞳空间，其作为辐射（19）的波前W（x，y，p，q） 通过光学系统的定义。 至少第一光学元件（M1-M6）具有相对于每个旋转对称表面（28）具有各自的表面偏差的非旋转对称表面（26），该二维表面具有其最大值 海拔及其最深的谷至少为λ。 非旋转对称表面的子孔径比在物场（13）的每个点（0 1，0 2，0 2）处偏离至少0.01 位于成像光束路径中的光学元件的每个其他表面的子孔径比在物体的各个点（0 1，0 2，2） 字段（13）。 此外，第一光学元件（M4）的表面（26）被配置为使得通过相对于其他光学元件移位第一光学元件，可以实现对光学系统（10）的波前的改变，其具有 部分具有至少2倍对称性，扩展的四维光瞳空间中波前变化的最大值至少为波长λ的1×10-5。

    PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    5.
    发明申请
    PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
    微波投影曝光装置的投影目标

    公开(公告)号：WO2013044936A1

    公开(公告)日：2013-04-04

    申请号：PCT/EP2011/004859

    申请日：2011-09-29

    Applicant: CARL ZEISS SMT GMBH ,  ZELLNER, Johannes ,  BITTNER, Boris ,  WABRA, Norbert ,  HODENBERG, Martin von ,  SCHNEIDER, Sonja ,  SCHNEIDER, Ricarda ,  SCHOB, Arne ,  RUDOLPH, Günter ,  GRATZKE, Alexander ,  MOFFAT, Bryce, Anton

    Inventor： ZELLNER, Johannes ,  BITTNER, Boris ,  WABRA, Norbert ,  HODENBERG, Martin von ,  SCHNEIDER, Sonja ,  SCHNEIDER, Ricarda ,  SCHOB, Arne ,  RUDOLPH, Günter ,  GRATZKE, Alexander ,  MOFFAT, Bryce, Anton

    IPC: G03F7/20 ,  H01S5/00

    CPC classification number: G03F7/70308 ,  G03F7/70891 ,  H01S5/005 ,  H01S5/0064 ,  H01S5/4025

    Abstract: A projection objective of a microlithographic projection exposure apparatus comprises a wavefront correction device (42) comprising a refractive optical element (44; 44a, 44b) that has two opposite optical surfaces (46, 48), through which projection light passes, and a circumferential rim surface (50) extending between the two optical surfaces (46, 48). A first and a second optical system (OS1, OS2) are configured to direct first and second heating light (HL1, HL2) to different portions of the rim surface (50) such that at least a portion of the first and second heating light enters the refractive optical element (44; 44a, 44b). A temperature distribution caused by a partial absorption of the heating light (HL1, HL2) results in a refractive index distribution inside the refractive optical element (44; 44a, 44b) that corrects a wavefront error. At least the first optical system (OS1) comprises a focusing optical element (55) that focuses the first heating light in a focal area (56) such that the first heating light emerging from the focal area (56) impinges on the rim surface (50).

    Abstract translation: 微光刻投影曝光装置的投影物镜包括波阵面校正装置（42），其包括折射光学元件（44; 44a，44b），该折射光学元件具有两个相对的光学表面（46,48），投射光通过该光学表面 轮缘表面（50）在两个光学表面（46,48）之间延伸。 第一和第二光学系统（OS1，OS2）被配置为将第一和第二加热光（HL1，HL2）引导到边缘表面（50）的不同部分，使得第一和第二加热光的至少一部分进入 折射光学元件（44; 44a，44b）。 由加热光（HL1，HL2）的部分吸收引起的温度分布导致折射光学元件（44; 44a，44b）内的折射率分布，其校正波前误差。 至少第一光学系统（OS1）包括聚焦光学元件（55），其将第一加热光聚焦在聚焦区域（56）中，使得从聚焦区域（56）出射的第一加热光照射在边缘表面上 50）。

    IMAGING OPTICAL SYSTEM FOR MICROLITHOGRAPHY
    6.
    发明申请
    IMAGING OPTICAL SYSTEM FOR MICROLITHOGRAPHY 审中-公开
    成像光学系统的微观算法

    公开(公告)号：WO2012041459A3

    公开(公告)日：2012-08-30

    申请号：PCT/EP2011004744

    申请日：2011-09-22

    Applicant: ZEISS CARL SMT GMBH ,  ROGALSKY OLAF ,  SCHNEIDER SONJA ,  BITTNER BORIS ,  KUGLER JENS ,  GELLRICH BERNHARD ,  FREIMANN ROLF

    Inventor： ROGALSKY OLAF ,  SCHNEIDER SONJA ,  BITTNER BORIS ,  KUGLER JENS ,  GELLRICH BERNHARD ,  FREIMANN ROLF

    IPC: G03F7/20 ,  G02B27/00

    CPC classification number: G02B17/06 ,  G02B17/0663 ,  G02B27/0012 ,  G03F7/70258 ,  G03F7/70308 ,  G03F7/70891

    Abstract: An imaging optical system (10), in particular a projection objective, for microlithography, comprises optical elements (M1-M6) configured to guide electromagnetic radiation (19) with a wavelength ? in an imaging beam path for imaging an object field (13) into an image plane (14), and a pupil (24), having coordinates (p, q) which, together with the image field (16), having coordinates (x, y), of the optical system (10), spans an extended 4-dimensional pupil space, having coordinates (x, y, p, q) as a function of which a wavefront W(x, y, p, q) of the radiation (19) passing through the optical system is defined. At least a first of the optical elements (M1-M6) has a non-rotationally symmetrical surface (26) having a respective surface deviation in relation to every rotationally symmetrical surface (28), which two-dimensional surface has a difference between its greatest elevation and its deepest valley of at least ?. A sub-aperture ratio of the non- rotationally symmetrical surface deviates at every point (?1, O2) of the object field (13) by at least 0.01 from the sub-aperture ratio of every other surface of the optical elements, which is located in the imaging beam path, at the respective point (O1, O2) of the object field (13). Furthermore, the surface (26) of the first optical element (M4) is configured such that by displacing the first optical element relative to the other optical elements a change to the wavefront of the optical system (10) can be brought about which has a portion with at least 2-fold symmetry, the maximum value of the wavefront change in the extended 4- dimensional pupil space being at least 1 x 10-5 of the wavelength ?.

    Abstract translation: 用于微光刻的成像光学系统（10），特别是投影物镜包括光学元件（M1-M6），其被配置为引导具有波长λ的电磁辐射（19） 在用于将物场（13）成像到图像平面（14）的成像光束路径中，以及具有坐标（p，q）的光瞳（24），其与图像场（16）一起具有坐标（x， （x，y，p，q）的波前W（x，y，p，q）的函数，跨越具有坐标（x，y，p，q）的扩展的4维瞳孔空间， 定义通过光学系统的辐射（19）。 至少第一光学元件（M1-M6）具有相对于每个旋转对称表面（28）具有相应表面偏差的非旋转对称表面（26），该二维表面具有最大的 海拔及其最深的山谷至少？ 非旋转对称表面的子孔径比从物体场（13）的每个点（θ1，O 2）偏离光学元件的每个其他表面的子孔径比至少0.01，这是 位于成像光束路径中，位于物场（13）的相应点（O1，O2）处。 此外，第一光学元件（M4）的表面（26）被配置为使得通过相对于其它光学元件移位第一光学元件，可以使光学系统（10）的波前的改变具有 具有至少2倍对称性的部分，扩展的四维光瞳空间中的波前变化的最大值为波长λ的至少1×10 -5。

    PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY, PROJECTION EXPOSURE APPARATUS, PROJECTION EXPOSURE METHOD AND OPTICAL CORRECTION PLATE
    7.
    发明申请
    PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY, PROJECTION EXPOSURE APPARATUS, PROJECTION EXPOSURE METHOD AND OPTICAL CORRECTION PLATE 审中-公开
    投影曝光法，投影曝光法和光学校正板投影目标

    公开(公告)号：WO2009018911A1

    公开(公告)日：2009-02-12

    申请号：PCT/EP2008/005898

    申请日：2008-07-18

    Applicant: CARL ZEISS SMT AG ,  LÖRING, Ulrich ,  REISINGER, Gerd ,  STICKEL, Franz-Josef ,  SCHNEIDER, Sonja ,  TRENKLER, Johann ,  KRAUS, Stefan ,  DÖRING, Gordon ,  GÖHNERMEIER, Aksel

    Inventor： LÖRING, Ulrich ,  REISINGER, Gerd ,  STICKEL, Franz-Josef ,  SCHNEIDER, Sonja ,  TRENKLER, Johann ,  KRAUS, Stefan ,  DÖRING, Gordon ,  GÖHNERMEIER, Aksel

    IPC: G03F7/20 ,  G03F1/14

    CPC classification number: G03F7/70983 ,  G03F1/62 ,  G03F7/70308 ,  Y10T428/24612

    Abstract: A projection objective comprising a plurality of optical elements arranged to image a pattern from an object field in an object surface of the projection objective to an image field in an image surface of the projection objective with electromagnetic operating radiation from a wavelength band around an operating wavelength λ includes an optical correction plate. The optical correction plate has a body made from a material transparent to the operating radiation, the body having a first optical surface, a second optical surface, a plate normal substantially perpendicular to the first and second optical surface, and a thickness profile. The first surface profile and the second surface profile are similar in that the first optical surface has a non-rotationally symmetric aspheric first surface profile with a first peak-to-valley value PV1>λ; the second optical surface has a non-rotationally symmetric aspheric second surface profile with a second peak-to-valley value PV2>λ; and the plate thickness varies by less than 0.1 * (PV1+PV2V2 across the optica! correction piate. The first and second optical surface in combination may induce or correct for a dominant field aberration if the optical correction plate is installed at a position far from the object plane of the projection objective.

    Abstract translation: 一种投影物镜，包括多个光学元件，所述多个光学元件被布置成将来自所述投影物镜的物体表面中的物体的图案成像到所述投影物镜的图像表面中的图像场，所述投影物镜具有围绕工作波长的波长带的电磁操作辐射 ？ 包括光学校正板。 光学校正板具有由对工作辐射透明的材料制成的主体，该主体具有第一光学表面，第二光学表面，基本上垂直于第一和第二光学表面的板法线以及厚度轮廓。 第一表面轮廓和第二表面轮廓类似于第一光学表面具有第一峰谷值PV1>β的非旋转对称非球面第一表面轮廓; 第二光学表面具有非旋转对称的非球面第二表面轮廓，具有第二峰谷值PV2>θ; 并且板厚度变化小于0.1 *（PV1 + PV2V2跨越光学校正片）。如果光学校正板安装在远离的位置，则组合的第一和第二光学表面可以诱导或校正主要的像差 投影物镜的物平面。

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