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公开(公告)号:WO2004016672A2
公开(公告)日:2004-02-26
申请号:PCT/US0325912
申请日:2003-08-19
Applicant: RENSSELAER POLYTECH INST , SENKEVICH JOHN JOSEPH , YANG GUANGRONG , LU TOH-MING
Inventor: SENKEVICH JOHN JOSEPH , YANG GUANGRONG , LU TOH-MING
IPC: B05D7/24 , B32B1/00 , C09D165/00 , C09D165/04 , H01L21/312 , H01L21/768 , C08G61/02 , C23C16/30 , C23C16/56
CPC classification number: B05D1/60 , C08G61/025 , C08G2261/3424 , C09D165/00 , C09D165/04 , H01L21/312 , H01L21/76828 , H01L21/76829 , Y10T428/24959 , Y10T428/26 , Y10T428/265 , Y10T428/31678
Abstract: The present invention relates to a method for forming a conformal coating having a reactive surface. In the method, an ultrathin layer composed of a polymer having repeating units derived from unsubstituted p-xylylene, substituted p-xylylene, phenylene vinylene, phenylene ethynylene, 1,4-methylene naphthalene, 2,6-methylene naphthalene, 1,4-vinylene naphthalene, 2,6-vinylene naphthalene, 1,4-ethynylene naphthalene, 2,6-ethynylene naphthalene, combinations thereof, precursors therefor or combinations of precursors therefor, is deposited on a substrate by a thermal CVD process. The surface may be readily modified.
Abstract translation: 本发明涉及形成具有反应性表面的保形涂层的方法。 在该方法中,由具有衍生自未取代的对二甲苯,取代的对二甲苯,亚苯基亚乙烯基,亚苯基亚乙炔基,1,4-亚甲基萘,2,6-亚甲基萘, 亚乙烯基萘,2,6-亚乙烯基萘,1,4-亚乙炔基萘,2,6-亚乙炔基萘,其组合,其前体或其前体的组合通过热CVD工艺沉积在基底上。 表面可能容易修改。
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公开(公告)号:WO2004016672A3
公开(公告)日:2004-02-26
申请号:PCT/US2003/025912
申请日:2003-08-19
Applicant: RENSSELAER POLYTECHNIC INSTITUTE , SENKEVICH, John, Joseph , YANG, Guangrong , LU, Toh-Ming
Inventor: SENKEVICH, John, Joseph , YANG, Guangrong , LU, Toh-Ming
IPC: C08G61/02
Abstract: The present invention relates to a method for forming a conformal coating having a reactive surface. In the method, an ultrathin layer composed of a polymer having repeating units derived from unsubstituted p-xylylene, substituted p-xylylene, phenylene vinylene, phenylene ethynylene, 1,4-methylene naphthalene, 2,6-methylene naphthalene, 1,4-vinylene naphthalene, 2,6-vinylene naphthalene, 1,4-ethynylene naphthalene, 2,6-ethynylene naphthalene, combinations thereof, precursors therefor or combinations of precursors therefor, is deposited on a substrate by a thermal CVD process. The surface may be readily modified.
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