公开(公告)号：WO2012033639A1

公开(公告)日：2012-03-15

申请号：PCT/US2011/048996

申请日：2011-08-24

Applicant: VEECO PROCESS EQUIPMENT, INC. ,  QUINN, William E. ,  GURARY, Alexander ,  PARANJPE, Ajit ,  FERREIRA, Maria D. ,  FREMGEN, Roger P. ,  ARMOUR, Eric A.

Inventor： QUINN, William E. ,  GURARY, Alexander ,  PARANJPE, Ajit ,  FERREIRA, Maria D. ,  FREMGEN, Roger P. ,  ARMOUR, Eric A.

IPC: H01L21/67 ,  C23C16/52 ,  C23C16/455 ,  C23C16/54 ,  C30B35/00 ,  C23C16/44

CPC classification number: C30B25/025 ,  C23C16/4412 ,  C23C16/45561 ,  C23C16/52 ,  C23C16/54 ,  C30B25/02 ,  C30B25/08 ,  C30B25/10 ,  C30B25/12 ,  C30B25/14 ,  C30B29/40 ,  C30B35/005 ,  G03G15/751 ,  H01L21/0262 ,  H01L21/67017 ,  H01L21/67173 ,  H01L21/6719 ,  H01L21/67727 ,  H01L21/67748 ,  H01L21/67751

Abstract: A linear cluster deposition system includes a plurality of reaction chambers positioned in a linear horizontal arrangement. First and second reactant gas manifolds are coupled to respective process gas input port of each of the reaction chambers. An exhaust gas manifold having a plurality of exhaust gas inputs is coupled to the exhaust gas output port of each of the plurality of reaction chambers. A substrate transport vehicle transports at least one of a substrate and a substrate carrier that supports at least one substrate into and out of substrate transfer ports of each of the reaction chambers. At least one of a flow rate of process gas into the process gas input port of each of the reaction chambers and a pressure in each of the reaction chambers being chosen so that process conditions are substantially the same in at least two of the reaction chambers.

Abstract translation: 线性簇沉积系统包括以线性水平布置定位的多个反应室。 第一和第二反应物气体歧管连接到每个反应室的相应工艺气体输入端口。 具有多个排气输入的废气歧管与多个反应室中的每一个的废气输出端口相连。 基板输送车辆将基板和基板载体中的至少一个输送到每个反应室的基板输送口中的至少一个基板。 选择每个反应室的工艺气体进入工艺气体输入口的流量和每个反应室中的压力中的至少一个，使得工艺条件在至少两个反应室中基本相同。