公开(公告)号：WO2019060031A1

公开(公告)日：2019-03-28

申请号：PCT/US2018/043032

申请日：2018-07-20

Applicant: APPLIED MATERIALS, INC.

Inventor： KOH, Travis Lee ,  WANG, Haitao ,  KRAUS, Philip Allan ,  PARKHE, Vijay D. ,  DISTASO, Daniel ,  ROWLAND, Christopher A. ,  MARKOVSKY, Mark ,  CASANOVA, Robert

IPC: H01L21/683 ,  H02N13/00 ,  B23Q3/15 ,  H01L21/02

Abstract: Embodiments described herein generally relate to plasma assisted or plasma enhanced processing chambers. More specifically, embodiments herein relate to electrostatic chucking (ESC) substrate supports configured to provide pulsed DC voltage, and methods of applying a pulsed DC voltage, to a substrate during plasma assisted or plasma enhanced semiconductor manufacturing processes.

公开(公告)号：WO2020190428A1

公开(公告)日：2020-09-24

申请号：PCT/US2020/017866

申请日：2020-02-12

Applicant: APPLIED MATERIALS, INC.

Inventor： KOO, Bon-Woong ,  RADOVANOV, Svetlana ,  SINCLAIR, Frank ,  LI, You Chia ,  EWING, Peter ,  SARAJLIC, Ajdin ,  ROWLAND, Christopher A. ,  CARBONE, Nunzio

IPC: H01J37/08 ,  H01J37/16

Abstract: Provided herein are approaches for increasing efficiency of ion sources. In some embodiments, an apparatus, such as an ion source, may include a chamber housing having a first end wall and a second end wall, and an extraction plate coupled to at least one of the first end wall and the second end wall. The extraction plate may include an extraction aperture. The apparatus may further include a tubular cathode extending between the first end wall and the second end wall.

公开(公告)号：WO2020131403A1

公开(公告)日：2020-06-25

申请号：PCT/US2019/064684

申请日：2019-12-05

Applicant: APPLIED MATERIALS, INC.

Inventor： KURUNCZI, Peter F. ,  EVANS, Morgan ,  OLSON, Joseph ,  ROWLAND, Christopher A. ,  BUONODONO, James

IPC: H01L21/687 ,  H01L21/306

Abstract: A system may include a substrate stage, configured to support a substrate, where a main surface of the substrate defines a substrate plane. The system may include an ion source, including an extraction assembly that is oriented to direct an ion beam to the substrate along a trajectory defining a non-zero angle of incidence with respect to a perpendicular to the substrate plane. The system may include a radical source oriented to direct a radical beam to the substrate along a trajectory defining the non-zero angle of incidence with respect to a perpendicular to the substrate plane. The substrate stage may be further configured to scan the substrate along a first direction, lying with the substrate plane, while the main surface of the substrate is oriented within the substrate plane.

公开(公告)号：WO2016011294A2

公开(公告)日：2016-01-21

申请号：PCT/US2015/040808

申请日：2015-07-16

Applicant: APPLIED MATERIALS, INC.

Inventor： RAMASWAMY, Kartik ,  SUBRAMANI, Anantha K. ,  KRISHNAN, Kasiraman ,  SUN, Jennifer Y. ,  BREZOCZKY, Thomas B. ,  ROWLAND, Christopher A. ,  NEMANI, Srinivas D. ,  SRINIVASAN, Swaminathan ,  YAVELBERG, Simon ,  YIEH, Ellie Y. ,  NG, Hou T.

CPC classification number: B22F3/1055 ,  B22F1/0088 ,  B22F2003/1056 ,  B22F2003/1057 ,  B23K26/1464 ,  B23K26/342 ,  B23K26/702 ,  B28B1/001 ,  B28B17/0081 ,  B29C64/153 ,  B29C64/20 ,  B29C64/386 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y40/00 ,  B33Y50/02 ,  Y02P10/295

Abstract: An additive manufacturing system includes a platen, a feed material dispenser apparatus configured to deliver a feed material onto the platen, a laser source configured to produce a laser beam during use of the additive manufacturing system, a controller configured to direct the laser beam to locations on the platen specified by a computer aided design program to cause the feed material to fuse, a gas source configured to supply gas, and a nozzle configured to accelerate and direct the gas to substantially the same location on the platen as the laser beam.

Abstract translation: 增材制造系统包括台板，构造成将进给材料传送到台板上的进给材料分配器设备，构造成在使用增材制造系统期间产生激光束的激光源，控制器 ，其被配置为将激光束引导至由计算机辅助设计程序指定的台板上的位置以引起供给材料熔合;配置成供给气体的气体源;以及配置成加速并引导气体到基本上相同位置的喷嘴 作为激光束的台板。

公开(公告)号：WO2016011290A1

公开(公告)日：2016-01-21

申请号：PCT/US2015/040803

申请日：2015-07-16

Applicant: APPLIED MATERIALS, INC.

Inventor： RAMASWAMY, Kartik ,  SUBRAMANI, Anantha K. ,  KRISHNAN, Kasiraman ,  SUN, Jennifer Y. ,  NEMANI, Srinivas D. ,  BREZOCZKY, Thomas B. ,  ROWLAND, Christopher A. ,  YAVELBERG, Simon ,  SRINIVASAN, Swaminathan ,  PATIBANDLA, Nag B. ,  YIEH, Ellie Y. ,  NG, Hou T.

IPC: B29C67/00 ,  B33Y30/00 ,  B33Y50/02

CPC classification number: B22F3/1055 ,  B22F1/0003 ,  B22F2003/1051 ,  B22F2003/1057 ,  B22F2202/13 ,  B22F2301/205 ,  B22F2998/10 ,  B23K10/006 ,  B23K10/027 ,  B23K26/0006 ,  B23K26/342 ,  B23K26/702 ,  B23K2203/14 ,  B28B1/001 ,  B29C64/153 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02

Abstract: An additive manufacturing system includes a platen, a feed material dispenser apparatus configured to deliver a feed material over the platen, a laser configured to produce a laser beam, a controller configured to direct the laser beam to locations specified by data stored in a computer-readable medium to cause the feed material to fuse, and a plasma source configured to produce ions that are directed to substantially the same location on the platen as the laser beam.

Abstract translation: 添加剂制造系统包括压板，配置成将进给材料输送到压板上的进料分配器装置，配置成产生激光束的激光器，被配置为将激光束引导到存储在计算机可读介质中的数据指定的位置的控制器， 可引导进料材料熔化的等离子体源，以及被配置为产生离子的等离子体源，该离子被引导到与激光束基本相同的压板上的位置。

公开(公告)号：WO2016007672A1

公开(公告)日：2016-01-14

申请号：PCT/US2015/039609

申请日：2015-07-08

Applicant: APPLIED MATERIALS, INC.

Inventor： ROWLAND, Christopher A. ,  SUBRAMANI, Anantha K. ,  KRISHNAN, Kasiraman ,  RAMASWAMY, Kartik ,  BREZOCZKY, Thomas B. ,  SRINIVASAN, Swaminathan ,  SUN, Jennifer Y. ,  YAVELBERG, Simon ,  NEMANI, Srinivas D. ,  PATIBANDLA, Nag B. ,  NG, Hou T.

IPC: B29C67/00 ,  B33Y30/00 ,  B33Y50/02

CPC classification number: B22F3/008 ,  B22F2003/1051 ,  B22F2003/1057 ,  B22F2998/10 ,  B23K10/006 ,  B23K10/027 ,  B28B1/001 ,  B29C64/153 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  H05B3/0061

Abstract: An additive manufacturing system that includes a platen, a feed material delivery system configured to deliver feed material to a location on the platen specified by a computer aided design program and a heat source configured to raise a temperature of the feed material simultaneously across all of the layer or across a region that extends across a width of the platen and scans the region across a length of the platen. The heat source can be an array of heat lamps, or a plasma source.

Abstract translation: 一种添加剂制造系统，包括压板，进料输送系统，其被配置为将进料输送到由计算机辅助设计程序指定的压板上的位置;以及热源，该热源被配置为将所述进料的温度同时跨越所有 层或跨越压板的宽度延伸的区域，并跨越压板的长度扫描该区域。 热源可以是加热灯阵列或等离子体源。