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    COATED RETAINING RING
    1.
    发明申请
    COATED RETAINING RING 审中-公开
    涂层保持环

    公开(公告)号：WO2015051134A1

    公开(公告)日：2015-04-09

    申请号：PCT/US2014/058849

    申请日：2014-10-02

    Applicant: APPLIED MATERIALS, INC.

    Inventor： MARTIN, Daniel L. ,  OH, Jeonghoon ,  YAVELBERG, Simon

    IPC: H01L21/304 ,  B24B37/04

    CPC classification number: B24B37/32 ,  B05D1/08 ,  B05D1/60 ,  B05D7/52 ,  C09D127/18 ,  C09D165/04

    Abstract: A retaining ring for a polishing system is disclosed. The retaining ring has a process-resistant coating over a portion thereof. The process-resistant coating is a thin, smooth, conformal layer that is resistant to wear and chemical attack. The process-resistant coating is formed by a method that includes vapor deposition from a precursor gas mixture, which may deposit polyparaxyxylene from a gas mixture comprising paracyclophane. Adhesion of the process-resistant coating to the retaining ring may be enhanced by treating the surface of the ring prior to forming the coating. Resistance of the coating to the process may be further enhanced by treating the surface of the coating with an etching or deposition gas to impart texture.

    Abstract translation: 公开了一种用于抛光系统的保持环。 保持环在其一部分上具有耐加工涂层。 耐加工涂层是一种薄而光滑的共形层，耐磨损和化学侵蚀。 耐加工涂层通过包括从前体气体混合物的气相沉积的方法形成，前体气体混合物可以从包含对环磷烷的气体混合物中沉积聚对二甲苯。 可以通过在形成涂层之前处理环的表面来增强耐保护涂层对保持环的粘合性。 通过用蚀刻或沉积气体处理涂层的表面以赋予纹理，可以进一步提高涂层对该方法的电阻。

    CORROSION RESISTANT RETAINING RINGS
    2.
    发明申请
    CORROSION RESISTANT RETAINING RINGS 审中-公开
    耐腐蚀保持环

    公开(公告)号：WO2017065951A1

    公开(公告)日：2017-04-20

    申请号：PCT/US2016/053180

    申请日：2016-09-22

    Applicant: APPLIED MATERIALS, INC.

    Inventor： SHEELAVANT, Gangadhar ,  YAVELBERG, Simon ,  HU, Yongqi

    IPC: B24B37/32 ,  H01L21/304

    CPC classification number: B24B37/32

    Abstract: Implementations described herein protect a retaining ring for a polishing system from corrosive polishing chemistries. In one embodiment, a retaining ring has a ring-shaped body having a top surface, an inside diameter sidewall, an outer diameter sidewall and a bottom surface. The inside diameter side wall is configured to circumscribe a substrate. The ring shaped body has a rigid ring-shaped portion, a polymeric ring-shaped portion stacked on the rigid ring-shaped portion and covering at least three sides of the rigid ring-shaped portion, a plurality of grooves formed in the bottom surface, and a plurality of wash ports formed through the polymeric ring-shaped portion, wherein the wash ports are isolated from the rigid ring-shaped portion.

    Abstract translation: 本文描述的实施方式保护用于抛光系统的保持环免受腐蚀性抛光化学品的影响。 在一个实施例中，保持环具有环形主体，该主体具有顶表面，内径侧壁，外径侧壁和底表面。 内径侧壁被配置为外接基板。 所述环形体具有刚性环形部分，聚合物环形部分，所述聚合物环形部分堆叠在所述刚性环形部分上并且覆盖所述刚性环形部分的至少三个侧面，多个凹槽形成在所述底表面中， 以及通过聚合物环形部分形成的多个洗涤端口，其中洗涤端口与刚性环形部分隔离。

    EDGE RING FOR A SUBSTRATE PROCESSING CHAMBER
    4.
    发明申请
    EDGE RING FOR A SUBSTRATE PROCESSING CHAMBER 审中-公开
    用于基板加工室的边缘环

    公开(公告)号：WO2016099826A1

    公开(公告)日：2016-06-23

    申请号：PCT/US2015/062410

    申请日：2015-11-24

    Applicant: APPLIED MATERIALS, INC.

    Inventor： RAJ, Govinda ,  NARENDRNATH, Kadthala R. ,  VASANTHA, Bopanna Ichettira ,  YAVELBERG, Simon

    IPC: H01L21/683

    CPC classification number: H01L21/68735 ,  B33Y10/00 ,  B33Y80/00

    Abstract: An edge ring and process for fabricating an edge ring are disclosed herein. In one embodiment, an edge ring includes an annular body and a plurality of thermal breaks disposed within the annular body. The thermal breaks are disposed perpendicular to a center line of the annular body of the edge ring.

    Abstract translation: 本文公开了一种边缘环和用于制造边缘环的工艺。 在一个实施例中，边缘环包括环形体和设置在环形体内的多个热断裂。 热断裂垂直于边缘环的环形体的中心线设置。

    CHEMICAL MECHANICAL POLISHING RETAINING RING WITH INTEGRATED SENSOR
    5.
    发明申请
    CHEMICAL MECHANICAL POLISHING RETAINING RING WITH INTEGRATED SENSOR 审中-公开
    具有集成传感器的化学机械抛光保持环

    公开(公告)号：WO2015195284A1

    公开(公告)日：2015-12-23

    申请号：PCT/US2015/032818

    申请日：2015-05-28

    Applicant: APPLIED MATERIALS, INC.

    Inventor： YAVELBERG, Simon

    IPC: H01L21/304

    CPC classification number: B24B37/32 ,  B24B37/005 ,  B24B49/003 ,  B24B49/16

    Abstract: A retaining ring for a chemical mechanical polishing carrier head having a mounting surface for a substrate is provided herein. In some embodiments, the retaining ring may include an annular body have a central opening, a channel formed in the body, wherein a first end of the channel is proximate the central opening, and a sensor disposed within the channel and proximate the first end, wherein the sensor is configured to detect acoustic and/or vibration emissions from processes performed on the substrate.

    Abstract translation: 本发明提供了一种用于具有用于基底的安装表面的化学机械抛光载体头的保持环。 在一些实施例中，保持环可以包括具有中心开口的环形主体，形成在主体中的通道，其中通道的第一端靠近中心开口，以及设置在通道内并且靠近第一端的传感器， 其中所述传感器被配置为检测在所述衬底上执行的过程的声学和/或振动发射。

    CHEMICAL MECHANICAL POLISHING SMART RING
    6.
    发明申请
    CHEMICAL MECHANICAL POLISHING SMART RING 审中-公开
    化学机械抛光SMART RING

    公开(公告)号：WO2018052816A1

    公开(公告)日：2018-03-22

    申请号：PCT/US2017/050822

    申请日：2017-09-08

    Applicant: APPLIED MATERIALS, INC.

    Inventor： HUANG, Zubin ,  WELLS, Stephen A. ,  GOPALAN, Ramesh ,  SHEELAVANT, Gangadhar ,  YAVELBERG, Simon

    IPC: B24B37/32 ,  B24B37/005 ,  B24B49/00 ,  B24B57/02 ,  H01L21/306

    Abstract: Embodiments of the present disclosure generally relate to chemical mechanical polishing (CMP) of substrates. In one embodiment, a carrier head for a CMP apparatus is disclosed herein. The carrier head includes a body, a retaining ring, and a sensor assembly. The retaining ring is coupled to the body. The sensor assembly is positioned at least partially in the body. The sensor assembly includes a transmitter, an antenna, and a vibrational sensor. The transmitter has a first end and a second end. The antenna is coupled to the first end of the transmitter. The vibrational sensor is coupled to the second end. The vibrational sensor is configured to detect vibration during chemical mechanical processes with respect to radial, azimuthal, and angular axes of the carrier head.

    Abstract translation: 本公开的实施例总体上涉及衬底的化学机械抛光（CMP）。 在一个实施例中，本文公开了用于CMP设备的载体头。 承载头包括主体，保持环和传感器组件。 保持环连接到主体。 传感器组件至少部分地定位在主体中。 传感器组件包括发射器，天线和振动传感器。 发射器具有第一端和第二端。 天线耦合到发射机的第一端。 振动传感器连接到第二端。 振动传感器被配置为检测化学机械过程期间相对于承载头的径向，方位角和角轴的振动。

    3D PRINTED MAGNETRON HAVING ENHANCED COOLING CHARACTERISTICS
    8.
    发明申请
    3D PRINTED MAGNETRON HAVING ENHANCED COOLING CHARACTERISTICS 审中-公开
    具有增强冷却特性的3D印刷磁铁

    公开(公告)号：WO2017053042A1

    公开(公告)日：2017-03-30

    申请号：PCT/US2016/049993

    申请日：2016-09-01

    Applicant: APPLIED MATERIALS, INC.

    Inventor： RAJ, Govinda ,  YAVELBERG, Simon ,  SANKARAKRISHNAN, Ramprakash

    IPC: H01J23/10 ,  H01J37/34

    CPC classification number: H01J23/005 ,  B22F3/1055 ,  B22F5/10 ,  B33Y80/00 ,  H01J25/50 ,  Y02P10/295

    Abstract: Embodiments of the present disclosure generally provide magnetron configurations that provide more efficient and/or more uniform cooling characteristics and methods for forming the magnetrons. The magnetron includes one or more flow directing structures disposed between parallel cooling fins. The flow directing structures direct air flow across various surfaces of the cooling fins and prevent that otherwise would be obstructed by magnetron components, reducing the incidence and/or magnitude of hot spots on the cooling fins and/or on other magnetron components. The flow directing structures also adjust flow rates to improve cooling efficiency.

    Abstract translation: 本公开的实施例通常提供磁控管配置，其提供更有效和/或更均匀的冷却特性和用于形成磁控管的方法。 磁控管包括设置在平行冷却翅片之间的一个或多个流动引导结构。 流动引导结构使空气流过冷却翅片的各个表面，并且防止否则将被磁控管部件阻塞，减少冷却翅片和/或其它磁控管部件上的热点的入射和/或大小。 流动导向结构还调节流速以提高冷却效率。

    RECORDING MEASUREMENTS BY SENSORS FOR A CARRIER HEAD
    9.
    发明申请
    RECORDING MEASUREMENTS BY SENSORS FOR A CARRIER HEAD 审中-公开
    记录传感器用于载体头的测量

    公开(公告)号：WO2014078151A1

    公开(公告)日：2014-05-22

    申请号：PCT/US2013/068817

    申请日：2013-11-06

    Applicant: APPLIED MATERIALS, INC.

    Inventor： YAVELBERG, Simon

    IPC: H01L21/304

    CPC classification number: B24B37/005 ,  B24B7/228 ,  B24B37/30

    Abstract: A pressure control assembly for a carrier head of a polishing apparatus includes a pressure supply line configured to fluidically connect to a chamber of a carrier head, a sensor to responsive to pressure in the chamber and configured to generate a signal representative of the pressure, and a pneumatic control unit configured to receive the signal, to control a pressure applied to the pressure supply line, and to record the signal in a non-transitory storage media of a storage device removably attached to the pneumatic control unit.

    Abstract translation: 用于抛光装置的承载头的压力控制组件包括压力供应管线，其构造成流体连接到承载头的腔室，传感器响应于腔室中的压力并被配置为产生代表压力的信号，以及 气动控制单元，被配置为接收信号，以控制施加到压力供应管线的压力，并将信号记录在可移除地附接到气动控制单元的存储装置的非暂时性存储介质中。

    EXTERNAL CLAMP RING FOR A CHEMICAL MECHANICAL POLISHING CARRIER HEAD
    10.
    发明申请
    EXTERNAL CLAMP RING FOR A CHEMICAL MECHANICAL POLISHING CARRIER HEAD 审中-公开
    用于化学机械抛光载体头的外部夹环

    公开(公告)号：WO2017065861A1

    公开(公告)日：2017-04-20

    申请号：PCT/US2016/045626

    申请日：2016-08-04

    Applicant: APPLIED MATERIALS, INC.

    Inventor： ALA, Patrick ,  DING, Bo B. ,  HU, Yongqi ,  YAVELBERG, Simon ,  LARSSON, Mats

    IPC: H01L21/304 ,  H01L21/306 ,  H01L21/687

    CPC classification number: B24B37/32

    Abstract: An external clamp ring for a chemical mechanical polishing (CMP) carrier head having a hydrophobic coating, and a carrier head having the same are described herein. In one embodiment, an external clamp ring is provided that includes a cylindrical body having an outer cylindrical wall and an inner cylindrical wall. A hydrophobic layer disposed is on the outer cylindrical wall.

    Abstract translation: 本文描述了一种用于具有疏水涂层的化学机械抛光（CMP）载体头的外部夹环以及具有该夹具的载体头。 在一个实施例中，提供了一种外部夹紧环，其包括具有外部圆柱形壁和内部圆柱形壁的圆柱形主体。 设置的疏水层位于圆柱形外壁上。

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