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公开(公告)号：WO2019028254A1
公开(公告)日：2019-02-07
申请号：PCT/US2018/045010
申请日：2018-08-02
Applicant: APPLIED MATERIALS ISRAEL LTD. , APPLIED MATERIALS, INC.
Inventor： ADAN, Ofer , AVNERI, Israel , UZIEL, Yoram , KRIVTS (KRAYVITZ), Igor , KHASGIWALE, Niranjan Ramchandra
IPC: H01L21/67 , H01L21/68 , H01L21/687 , H01L21/66
Abstract: A method and a system for moving a substrate, the system includes a chamber, a chuck, a movement system that is positioned outside the chamber, a controller, an intermediate element, at least one sealing element that is configured to form a dynamic seal between the intermediate element and the chamber housing. The movement system is configured to repeat, for each region of the substrate out of a plurality of regions of the substrate, the steps of: rotating the chuck to position a given portion of the region of the substrate within a field of view that is related to an opening of the chamber housing; and moving the chuck relation to the opening to position additional portions of the region of the substrate within the field of view that is related to the opening.
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公开(公告)号：WO2015081072A1
公开(公告)日：2015-06-04
申请号：PCT/US2014/067329
申请日：2014-11-25
Applicant: APPLIED MATERIALS ISRAEL, LTD. , APPLIED MATERIALS, INC.
Inventor： RICE, Michael R. , NAFTALI, Ron , SCHLIMOFF, Natan , KRIVTS (KRAYVITZ), Igor , AVNERI, Israel , UZIEL, Yoram , ROZENBERG, Zvika , ADMONI, Erez , MADMON, Yochanan
CPC classification number: H01J37/18 , G01N21/9501 , G01N2201/023 , G02B21/26 , H01J37/20 , H01J2237/022 , H01J2237/182 , H01J2237/202 , H01L21/67126 , H01L21/6719 , H01L21/67196 , H01L21/67242
Abstract: Chamber elements defining an internal chamber to be utilized during a substrate related stage selected from the group consisting of substrate manufacturing stage and substrate inspection stage, the chamber elements comprising: a first element having a first surface; a second element having a second surface about the periphery of the internal chamber; a third element connected to the second element; and a clamping mechanism that is connected to the second and third elements and is arranged to press the second element towards the first element; wherein a first area of the first surface and a second area of the second surface come into proximity with each other at a first interface; wherein the first surface is positioned above the second surface; wherein a gas groove and a vacuum groove are formed in the second area; wherein the second element comprises a gas conduit that is arranged to provide gas to the gas groove and a vacuum conduit that is arranged to provide vacuum to the vacuum groove; wherein a provision of the gas and the vacuum assists in a formation of a gas cushion between the first and second areas; wherein the chamber elements are operable to partially surround a first portion of a movement system and a substrate during the substrate related stage, the movement system is arranged to introduce a movement of the first element in relation to the second element and the third element, wherein the gas cushion maintains predefined conditions in the internal chamber during the movement.
Abstract translation: 腔室元件限定在从由衬底制造阶段和衬底检查阶段组成的组中选择的衬底相关阶段期间被利用的内部室，所述室元件包括：具有第一表面的第一元件; 第二元件，其具有围绕所述内部腔室的周边的第二表面; 连接到第二元件的第三元件; 以及夹紧机构，其连接到所述第二和第三元件并且被布置成朝向所述第一元件按压所述第二元件; 其中所述第一表面的第一区域和所述第二表面的第二区域在第一界面处彼此接近; 其中所述第一表面位于所述第二表面上方; 其中在所述第二区域中形成气体槽和真空槽; 其中所述第二元件包括气体管道，所述气体管道被布置成向所述气体槽提供气体;以及真空管道，其布置成向所述真空槽提供真空; 其中所述气体和所述真空的提供有助于在所述第一和第二区域之间形成气垫; 其中所述室元件可操作以在所述基板相关级期间部分地包围运动系统和基板的第一部分，所述运动系统布置成引入所述第一元件相对于所述第二元件和所述第三元件的运动，其中 气垫在运动过程中保持内腔中的预定条件。
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公开(公告)号：WO2015023603A1
公开(公告)日：2015-02-19
申请号：PCT/US2014/050593
申请日：2014-08-11
Applicant: APPLIED MATERIALS ISRAEL, LTD. , APPLIED MATERIALS, INC.
Inventor： RICE, Michael R. , REUTER, Paul , WEAVER, William (Ty) , MOREY, Travis , SCHLIMOFF, Natan , KRIVTS (KRAYVITZ), Igor , AVNERI, Israel , UZIEL, Yoram , ADMONI, Erez
IPC: H01L21/66
CPC classification number: H01L21/67126 , H01L21/67748 , H01L21/67751 , H01L21/68714
Abstract: According to an embodiment of the invention, there is provided a system, comprising: a first chamber; a second chamber; a chuck; a movement system; wherein the first chamber comprises: a first element that has a first surface; a first chamber housing that comprises a second surface; wherein the first surface and the second surface come into proximity with each other at a first interface; a supporting element for supporting the chuck when the chuck is positioned within the first chamber; and a first dynamic seal formed at the first interface and is arranged to seal the first chamber from the movement system; wherein the second chamber comprises: a second chamber housing; a movement system that is arranged to introduce movement between (a) the first chamber housing and (b) the first element and the chuck; and a movement control element for mechanically coupling the first element to the movement system.
Abstract translation: 根据本发明的实施例，提供了一种系统，包括：第一室; 第二个房间 一个卡盘 运动系统; 其中所述第一室包括：具有第一表面的第一元件; 包括第二表面的第一腔室; 其中所述第一表面和所述第二表面在第一界面处彼此靠近; 用于当所述卡盘位于所述第一腔室内时支撑所述卡盘的支撑元件; 以及第一动态密封件，其形成在所述第一界面处并且被布置成将所述第一腔室与所述移动系统密封; 其中所述第二腔室包括：第二腔室壳体; 运动系统，被布置成引入（a）第一室壳体和（b）第一元件和卡盘之间的运动; 以及用于将第一元件机械地联接到移动系统的移动控制元件。
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公开(公告)号：WO2015191543A1
公开(公告)日：2015-12-17
申请号：PCT/US2015/034848
申请日：2015-06-09
Applicant: APPLIED MATERIALS ISRAEL, LTD. , APPLIED MATERIALS, INC.
Inventor： UZIEL, Yoram , SENDER, Benzion , ASPIR, Doron , MADMON, Yahanan , NAFTALI, Ron , BELENKI, Yuri
IPC: H01L21/66
CPC classification number: H01J37/28 , G06T7/0004 , G06T2207/30148 , H01J37/20 , H01J2237/20228 , H01J2237/2817
Abstract: A method for scanning an object, the method may include moving an object by a first mechanical stage that follows a first scan pattern; introducing multiple movements, by a second mechanical stage, between the object and the first mechanical stage while the first mechanical stage follows the first scan pattern; and obtaining, by optics, images of multiple suspected defects while the first mechanical stage follows the first scan pattern; wherein a weight of the first mechanical stage exceeds a weight of the second mechanical stage.
Abstract translation: 一种用于扫描物体的方法，所述方法可以包括通过遵循第一扫描图案的第一机械台移动物体; 在所述第一机械台跟随所述第一扫描图案时，通过第二机械台引导所述物体与所述第一机械台之间的多个运动; 并且通过光学获得多个可疑缺陷的图像，同时第一机械阶段遵循第一扫描模式; 其中所述第一机械级的重量超过所述第二机械级的重量。
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Patent Agency Ranking
公开(公告)号：WO2014188379A1
公开(公告)日：2014-11-27
申请号：PCT/IB2014/061637
申请日：2014-05-22
Applicant: APPLIED MATERIALS ISRAEL, LTD.
Inventor： UZIEL, Yoram , NAFTALI, Ron , ADAN, Ofer , FELDMAN, Haim , SHNEYOUR, Ofer , BAR-OR, Ron , KORNGUT, Doron
Abstract: There may be provided an evaluation system that may include spatial sensors that include atomic force microscopes (AFMs) and a solid immersion lens. The AFMs are arranged to generate spatial relationship information that is indicative of a spatial relationship between the solid immersion lens and a substrate. The controller is arranged to receive the spatial relationship information and to send correction signals to the at least one location correction element for introducing a desired spatial relationship between the solid immersion lens and the substrate.
Abstract translation: 可以提供可以包括包括原子力显微镜（AFM）和固体浸没透镜的空间传感器的评估系统。 AFM布置成产生表示固体浸没透镜和基底之间的空间关系的空间关系信息。 所述控制器被布置为接收所述空间关系信息，并且向所述至少一个位置校正元件发送校正信号，以在所述固体浸没透镜和所述基板之间引入期望的空间关系。
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公开(公告)号：WO2004065027A1
公开(公告)日：2004-08-05
申请号：PCT/US2004/001648
申请日：2004-01-21
Applicant: APPLIED MATERIALS ISRAEL LTD. , APPLIED MATERIALS INC. , WIDMANN, Amir , YOGEV, David , UZIEL, Yoram
Inventor： WIDMANN, Amir , YOGEV, David , UZIEL, Yoram
IPC: B08B7/00
CPC classification number: H01L21/67028 , B08B7/0014 , B08B7/0042 , B08B7/0064 , H05K3/26 , H05K2203/0746 , H05K2203/107 , H05K2203/1121
Abstract: Apparatus for cleaning a surface of a substrate (105) includes a cooling device (130), which is adapted to cool a region of the substrate in a vicinity of a particle on the surface, so as to cause a fluid in contact with the surface to form a frozen film (140) in the vicinity of the particle. A radiation source (150) is adapted to direct a beam of energy (155) toward the surface so as to cause vaporization of the film due to absorption of the beam in the film, thereby facilitating removal of the particle from the surface.
Abstract translation: 用于清洁衬底（105）的表面的设备包括冷却装置（130），其适于冷却表面上的颗粒附近的衬底的区域，以使流体与表面接触 以在颗粒附近形成冷冻薄膜（140）。 辐射源（150）适于将能量束（155）引向表面，以便由于光束在膜中的吸收而引起膜的蒸发，从而有助于从表面去除颗粒。
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公开(公告)号：WO2015023606A1
公开(公告)日：2015-02-19
申请号：PCT/US2014/050596
申请日：2014-08-11
Applicant: APPLIED MATERIALS ISRAEL, LTD. , APPLIED MATERIALS, INC.
Inventor： AVNERI, Israel , KRIVTS (KRAYVITZ), Igor , UZIEL, Yoram , DODZIN, Nir Ben-David , HOLCMAN, Ido
CPC classification number: G03F9/7096 , G03F7/0002 , H01L21/67359 , H01L21/67775 , H01L21/67778
Abstract: A system for coupling a mask to a mask holder. The system includes a base, an aperture; mask holder cover supporting elements arranged to move between a first position and a third position while supporting the mask holder cover; mask supporting elements arranged to move between a fourth position and a sixth position while supporting the mask; mask holder base supporting elements arranged to support the mask holder base. When the mask holder cover supporting elements are at the first position and the mask supporting elements are at the third position the mask holder cover, the mask and the base are spaced apart from each other. When the mask holder cover supporting elements are at the third position and the mask supporting elements are at the sixth position the mask holder cover, the mask and the base are connected to each other.
Abstract translation: 一种用于将掩模与掩模支架结合的系统。 该系统包括基座，孔径; 掩模保持器盖支撑元件，布置成在支撑掩模保持器盖的同时在第一位置和第三位置之间移动; 掩模支撑元件，布置成在支撑所述掩模的同时在第四位置和第六位置之间移动; 布置用于支撑掩模支架基座的掩模支架基座支撑元件。 当掩模支架覆盖支撑元件处于第一位置并且掩模支撑元件处于第三位置时，掩模保持器盖，掩模和基座彼此间隔开。 当掩模保持器覆盖支撑元件处于第三位置并且掩模支撑元件处于第六位置时，掩模保持器盖，掩模和基座彼此连接。
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8.发明申请
公开(公告)号：WO2012099579A1
公开(公告)日：2012-07-26
申请号：PCT/US2011/021588
申请日：2011-01-18
Applicant: APPLIED MATERIALS ISRAEL LTD. , KRAYVITZ (KRIVTS), Igor , AVNERI, Israel , UZIEL, Yoram , SCHLIMOFF, Natan , SCHWARTZ, Gilad , MADMON, Yochanan , APPLIED MATERIALS, INC.
Inventor： KRAYVITZ (KRIVTS), Igor , AVNERI, Israel , UZIEL, Yoram , SCHLIMOFF, Natan , SCHWARTZ, Gilad , MADMON, Yochanan
IPC: H01L21/00
CPC classification number: H01L21/6719 , H01L21/67126
Abstract: Chamber elements defining a chamber include a first element having a first surface, a second element, a first dynamic seal and load mechanism. The second element includes an outer floating element that includes a second surface about the periphery of the chamber, and an inner floating element. The second surface and the first surface are maintained proximate to each other when the chamber is in a load position and when the chamber is closed. The load mechanism may move the inner floating element from the outer floating element until a gap between the inner floating element and the second element to facilitate loading of the device to the chamber. A movement system may generate relative movement between the first element and the second element.
Abstract translation: 限定腔室的室元件包括具有第一表面的第一元件，第二元件，第一动态密封件和负载机构。 第二元件包括外部浮动元件，其包括围绕室的周边的第二表面和内部浮动元件。 当腔室处于加载位置和腔室关闭时，第二表面和第一表面保持彼此靠近。 负载机构可以将内部浮动元件从外部浮动元件移动到内部浮动元件和第二元件之间的间隙，以便于将装置加载到腔室。 移动系统可以在第一元件和第二元件之间产生相对移动。
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公开(公告)号：WO2003060958A3
公开(公告)日：2003-07-24
申请号：PCT/US2003/000771
申请日：2003-01-09
Applicant: APPLIED MATERIALS ISRAEL, LTD. , APPLIED MATERIALS, INC. , UZIEL, Yoram
Inventor： UZIEL, Yoram
IPC: F26B19/00
Abstract: Apparatus (20) for processing a surface (21) of a substrate (22) includes a chamber (26) containing a cavity (33) that has one side that is open, the chamber (26) wall including a lip (31) surrounding the open side of the cavity (33). Gas ports, disposed within the chamber (26) wall and opening through the lip (31), emit a pressurized gas so as to create a gas cushion between the lip (31) and the surface (21) when the open side of the cavity (33) is placed adjacent to the surface (21), thus creating a seal between the cavity (33) and an environment external to the chamber (26).
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