公开(公告)号：WO2021170482A1

公开(公告)日：2021-09-02

申请号：PCT/EP2021/054008

申请日：2021-02-18

Applicant: ASML NETHERLANDS B.V.

Inventor： DEL TIN, Laura ,  STEGEMANN, Almut, Johanna ,  AKSENOV, German ,  MARTINEZ NEGRETE GASQUE, Diego ,  BRANDT, Pieter, Lucas

IPC: H01J37/10 ,  H01J37/12

Abstract: Disclosed herein is a manipulator lensing device for focusing a beam of charged particles, wherein the manipulator lensing device comprises a first structure (401) through which is formed an opening, wherein the path of the beam is substantially along a longitudinal axis of the opening, a second structure (402) with a surface (406) surrounding the opening, a support (403) that connects the second structure to the first structure and surrounds the second structure, and an electrode arrangement (407) provided on the surface (406) of the second structure, wherein a first surface (404) of the first structure (401) surrounds the opening, a second surface (405) of the first structure (401) surrounds the opening, the surface (406) of the second structure (402) being arranged along the longitudinal axis between the first and second surfaces of the first structure, the electrode arrangement (407) and each of the first (404) and second (405) surfaces of the first structure (401) are separated from each other by a respective gap in a direction parallel to the longitudinal axis, wherein, along the longitudinal axis, the extent of the support (403) is less than the extent of the surface (406) of the second structure and/or electrode arrangement (407). Further disclosed is a multi-array lens configured focus a plurality of beamlets of charged particles along a multi-beam path, wherein each lens in the array comprises said manipulator lensing device.

公开(公告)号：WO2021249872A1

公开(公告)日：2021-12-16

申请号：PCT/EP2021/064949

申请日：2021-06-03

Applicant: ASML NETHERLANDS B.V.

Inventor： OTTEN, Christiaan ,  CRANS, Peter-Paul ,  SMITS, Marc ,  DEL TIN, Laura ,  TEUNISSEN, Christan ,  HUANG, Yang-Shan ,  STEENBRINK, Stijn, Wilem, Herman, Karel ,  HU, Xuerang ,  XI, Qingpo ,  LUO, Xinan ,  LIU, Xuedong

IPC: H01J37/02 ,  H01J37/18 ,  H01J2237/184 ,  H01J2237/2006 ,  H01J2237/20214 ,  H01J2237/2817 ,  H01J37/023 ,  H01J37/14 ,  H01J37/1477 ,  H01J37/15 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28

Abstract: 2019P00380WO 68 ABSTRACT Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the 5 support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus. [FIG. 7]