公开(公告)号：WO2020078660A1

公开(公告)日：2020-04-23

申请号：PCT/EP2019/075316

申请日：2019-09-20

Applicant: ASML NETHERLANDS B.V.

Inventor： HU, Xuerang ,  LUO, Xinan ,  XI, Qingpo ,  LIU, Xuedong ,  REN, Weiming

IPC: H01J37/28 ,  H01J37/317

Abstract: An improved charged particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved alignment mechanism is disclosed. An improved charged particle beam inspection apparatus may include a second electron detection device to generate one or more images of one or more beam spots of the plurality of secondary electron beams during the alignment mode. The beam spot image may be used to determine the alignment characteristics of one or more of the plurality of secondary electron beams and adjust a configuration of a secondary electron projection system.

公开(公告)号：WO2019020396A1

公开(公告)日：2019-01-31

申请号：PCT/EP2018/068980

申请日：2018-07-12

Applicant: ASML NETHERLANDS B.V. ,  HERMES MICROVISION, INC.

Inventor： REN, Weiming ,  LIU, Xuedong ,  HU, Xuerang ,  LUO, Xinan ,  CHEN, Zhongwei

IPC: H01J37/05 ,  H01J37/147 ,  H01J37/28 ,  H01J37/244

Abstract: Systems and methods are provided for compensating dispersion of a beam separator in a single-beam or multi-beam apparatus. Embodiments of the present disclosure provide a dispersion device comprising an electrostatic deflector and a magnetic deflector configured to induce a beam dispersion set to cancel the dispersion generated by the beam separator. The combination of the electrostatic deflector and the magnetic deflector can be used to keep the deflection angle due to the dispersion device unchanged when the induced beam dispersion is changed to compensate for a change in the dispersion generated by the beam separator. In some embodiments, the deflection angle due to the dispersion device can be controlled to be zero and there is no change in primary beam axis due to the dispersion device.

公开(公告)号：WO2021249872A1

公开(公告)日：2021-12-16

申请号：PCT/EP2021/064949

申请日：2021-06-03

Applicant: ASML NETHERLANDS B.V.

Inventor： OTTEN, Christiaan ,  CRANS, Peter-Paul ,  SMITS, Marc ,  DEL TIN, Laura ,  TEUNISSEN, Christan ,  HUANG, Yang-Shan ,  STEENBRINK, Stijn, Wilem, Herman, Karel ,  HU, Xuerang ,  XI, Qingpo ,  LUO, Xinan ,  LIU, Xuedong

IPC: H01J37/02 ,  H01J37/18 ,  H01J2237/184 ,  H01J2237/2006 ,  H01J2237/20214 ,  H01J2237/2817 ,  H01J37/023 ,  H01J37/14 ,  H01J37/1477 ,  H01J37/15 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28

Abstract: 2019P00380WO 68 ABSTRACT Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the 5 support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus. [FIG. 7]