公开(公告)号：WO2015139964A1

公开(公告)日：2015-09-24

申请号：PCT/EP2015/054588

申请日：2015-03-05

Applicant: ASML NETHERLANDS B.V.

Inventor： ERSHOV, Alexander, I.

IPC: G03F7/20

CPC classification number: B08B7/0035 ,  B08B7/0057 ,  G02B27/0006 ,  G03F7/70033 ,  G03F7/70883 ,  G03F7/70925 ,  H01J37/32091 ,  H01J37/32174 ,  H01J37/32339 ,  H01J37/32651 ,  H01J37/32715 ,  H01J2237/327 ,  H01J2237/335 ,  H05G2/003 ,  H05G2/008

Abstract: Apparatus for and method of cleaning an electrically conductive surface of an optical element (30) in a system for generating extreme ultraviolet radiation in which electrically conductive surface is used as an electrode for generating a plasma which cleans the surface.

Abstract translation: 用于在用于产生极紫外辐射的系统中清洁光学元件（30）的导电表面的设备和方法，其中导电表面用作用于产生清洁表面的等离子体的电极。

公开(公告)号：WO2015082997A4

公开(公告)日：2015-06-11

申请号：PCT/IB2014/002998

申请日：2014-11-06

Applicant: ASML NETHERLANDS B.V.

Inventor： EVANS, Daniel, R. ,  GRAHAM, Matthew, R. ,  ERSHOV, Alexander, I.

IPC: H05G2/00

Abstract: A device and method are disclosed in which gas is caused to flow parallel to a flow of source material to form a gas shroud. The gas shroud may protect flow of source material from being disrupted by a cross flow of gas. The gas shroud may also limit heating of a physical shroud through which the source material passes and limit accumulation of source material on the physical shroud by deforming a plasma bubble formed during irradiation of the source, material so that the plasma bubble does not come too near the physical shroud. A device and method, are also disclosed for establishing m additional transverse flow of gas so that the gas shroud does not cause source material contamination of an optic used to collect light generated during irradiation of the source material.

公开(公告)号：WO2015034687A1

公开(公告)日：2015-03-12

申请号：PCT/US2014/052177

申请日：2014-08-21

Applicant: ASML NETHERLANDS B.V.

Inventor： DE DEA, Silvia ,  ERSHOV, Alexander, I. ,  VERHOFF, Brandon, W. ,  WILSON, Gregory, J. ,  LAFONTAINE, Bruno

IPC: H01L21/3065

CPC classification number: H05G2/008 ,  G03F7/70033 ,  G03F7/70925 ,  H05G2/005

Abstract: Free radicals that combine with debris that is created by converting a target mixture to plasma that emits EUV light are received at a first opening defined by a first end of a conduit, the conduit including a material that passes the free radicals and the conduit including a sidewall that extends away from the first opening and defines at least one other opening, the at least one other positioned to release the free radicals toward an element that accumulates the debris on a surface. The free radicals in the conduit are directed toward the at least one other opening. The free radicals are passed through the at least one other opening and to the surface of the element to remove the debris from the surface of the element without removing the element from the EUV light source.

Abstract translation: 与通过将目标混合物转化为发射EUV光的等离子体产生的碎屑结合的自由基在由导管的第一端限定的第一开口处容纳，导管包括使自由基和导管通过的材料，其包括 侧壁，其远离第一开口延伸并且限定至少一个其它开口，所述至少一个其它开口定位成将自由基朝向将碎屑积聚在表面上的元件释放。 导管中的自由基指向至少另一个开口。 自由基通过至少一个其它开口并且到达元件的表面以从元件的表面去除碎屑而不从EUV光源移除元件。

公开(公告)号：WO2015034686A1

公开(公告)日：2015-03-12

申请号：PCT/US2014/052173

申请日：2014-08-21

Applicant: ASML NETHERLANDS B.V.

Inventor： ERSHOV, Alexander, I.

IPC: H01S3/139

CPC classification number: G03F7/70008 ,  G03F7/70033 ,  G03F7/70041 ,  G03F7/70341 ,  G03F7/70875

Abstract: Apparatus for and method of temperature compensating a focusing system In which the focusing system has at least one transmissive optical element having a thermal lens. A reflective optical element is added to the system that has a thermal lens that is complementary to the thermal lens of the transmissive optical element so that the optical characteristics of the two optical elements combined are substantially temperature independent The respective thermal lenses of the two optical elements are balanced by selecting materials for the reflective optical element that have the correct optical absorption based on the absorption of the transmissive optical element and the relative strengths of the thermal lenses.

Abstract translation: 聚焦系统的温度补偿装置和方法其中聚焦系统具有至少一个具有热透镜的透射光学元件。 反射型光学元件被添加到具有与透射光学元件的热透镜互补的热透镜的系统中，使得组合的两个光学元件的光学特性基本上是温度独立的。两个光学元件的各个热透镜 通过根据透射光学元件的吸收和热透镜的相对强度选择具有正确光吸收的反射光学元件的材料进行平衡。

公开(公告)号：WO2015034685A1

公开(公告)日：2015-03-12

申请号：PCT/US2014/052169

申请日：2014-08-21

Applicant: ASML NETHERLANDS B.V.

Inventor： ERSHOV, Alexander, I. ,  BURKE, Jeremy

IPC: G03F7/00

CPC classification number: G02B27/0006 ,  H01J37/32477

Abstract: Apparatus having a chamber with an interior wall and a region within the chamber from which a contaminating material emanates when the apparatus is in operation. A plurality of vanes is positioned on a portion of the interior wail, each of the vanes having a first surface which is oriented along a direction between the vane and the region and a second surface adjacent the first surface which is oriented to deflect the contaminating material striking the second surface away from the region, the second surfaces being dimensioned and juxtaposed with respect to one another such that the second surfaces substantially prevent the contaminating material from striking the portion of the interior wall.

Abstract translation: 具有腔室的设备具有内壁和腔室内的区域，当设备运行时污染物质从该腔室发出。 多个叶片位于内部壁部的一部分上，每个叶片具有沿着叶片和区域之间的方向定向的第一表面和邻近第一表面的第二表面，该第二表面被定向成偏转污染物质 将第二表面撞击远离区域，第二表面的尺寸和尺寸相对于彼此并置，使得第二表面基本上防止污染材料撞击内壁的部分。