公开(公告)号：WO2017186486A1

公开(公告)日：2017-11-02

申请号：PCT/EP2017/058721

申请日：2017-04-12

Applicant: ASML NETHERLANDS B.V.

Inventor： NASALEVICH, Maxim, Aleksandrovich ,  ABEGG, Erik, Achilles ,  BANERJEE, Nirupam ,  BLAUW, Michiel, Alexander ,  BROUNS, Derk, Servatius, Gertruda ,  JANSSEN, Paul ,  KRUIZINGA, Matthias ,  LENDERINK, Egbert ,  MAXIM, Nicolae ,  NIKIPELOV, Andrey ,  NOTENBOOM, Arnoud, Willem ,  PILIEGO, Claudia ,  PÉTER, Mária ,  RISPENS, Gijsbert ,  SCHUH, Nadja ,  VAN DE KERKHOF, Marcus, Adrianus ,  VAN DER ZANDE, Willem, Joan ,  VAN ZWOL, Pieter-Jan ,  VERBURG, Antonius, Willem ,  VERMEULEN, Johannes, Petrus, Martinus, Bernardus ,  VLES, David, Ferdinand ,  VOORTHUIJZEN, Willem-Pieter ,  ZDRAVKOV, Alexandar, Nikolov

IPC: G03F1/24 ,  G03F1/62 ,  G03F7/20

Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane comprises a stack having layers in the following order: a first capping layer comprising an oxide of a first metal; a base layer comprising a compound comprising a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer comprising an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.

Abstract translation: 公开了用于EUV光刻的膜。 在一种布置中，膜包括具有以下顺序的层的堆叠体：包含第一金属的氧化物的第一封盖层; 基层，其包含含有第二金属和选自Si，B，C和N的附加元素的化合物; 以及包含第三金属的氧化物的第二覆盖层，其中第一金属不同于第二金属，第三金属与第一金属相同或不同。