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1.发明申请A METHOD OF MANUFACTURING A MEMBRANE ASSEMBLY FOR EUV LITHOGRAPHY, A MEMBRANE ASSEMBLY, A LITHOGRAPHIC APPARATUS, AND A DEVICE MANUFACTURING METHOD 审中-公开一种用于EUV光刻的膜组件的制造方法，膜组件，光刻设备和设备制造方法
公开(公告)号：WO2017102383A1
公开(公告)日：2017-06-22
申请号：PCT/EP2016/079606
申请日：2016-12-02
Applicant: ASML NETHERLANDS B.V.
Inventor： JANSSEN, Paul , KLOOTWIJK, Johan, Hendrik , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , ZDRAVKOV, Alexandar, Nikolov
CPC classification number: G03F7/70983 , G03F1/62 , G03F1/64 , G03F7/70033 , G03F7/70916
Abstract: Methods of manufacturing a membrane assembly are disclosed. In one arrangement, a stack comprises a planar substrate and at least one membrane layer. The planar substrate comprises an inner region, a border region around the inner region, a bridge region around the border region and an edge region around the bridge region. The inner region and a first portion of the bridge region are selectively removed. The membrane assembly after removal comprises: a membrane formed from the at least one membrane layer, a border holding the membrane, the border formed from the border region of the planar substrate, an edge section around the border, the edge section formed from the edge region of the planar substrate, a bridge between the border and the edge section, the bridge formed from the at least one membrane layer and a second portion of the bridge region of the planar substrate. The method further comprises separating the edge section from the border by cutting or breaking the bridge.
Abstract translation: 公开了制造膜组件的方法。 在一种布置中，堆叠包括平面基底和至少一个膜层。 平面衬底包括内部区域，围绕内部区域的边界区域，围绕边界区域的桥接区域和围绕桥接区域的边缘区域。 桥区的内部区域和第一部分被选择性地去除。 去除之后的膜组件包括：由至少一个膜层形成的膜，保持膜的边界，由平面基底的边界区域形成的边界，围绕边界的边缘部分，边缘部分由边缘形成 平面衬底的区域，边界和边缘部分之间的桥，桥由至少一个膜层和平面衬底的桥区的第二部分形成。 该方法还包括通过切割或打破桥来将边缘部分与边界分开。
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Patent Agency Ranking
公开(公告)号：WO2017186486A1
公开(公告)日：2017-11-02
申请号：PCT/EP2017/058721
申请日：2017-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： NASALEVICH, Maxim, Aleksandrovich , ABEGG, Erik, Achilles , BANERJEE, Nirupam , BLAUW, Michiel, Alexander , BROUNS, Derk, Servatius, Gertruda , JANSSEN, Paul , KRUIZINGA, Matthias , LENDERINK, Egbert , MAXIM, Nicolae , NIKIPELOV, Andrey , NOTENBOOM, Arnoud, Willem , PILIEGO, Claudia , PÉTER, Mária , RISPENS, Gijsbert , SCHUH, Nadja , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERBURG, Antonius, Willem , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter , ZDRAVKOV, Alexandar, Nikolov
Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane comprises a stack having layers in the following order: a first capping layer comprising an oxide of a first metal; a base layer comprising a compound comprising a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer comprising an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
Abstract translation: 公开了用于EUV光刻的膜。 在一种布置中，膜包括具有以下顺序的层的堆叠体：包含第一金属的氧化物的第一封盖层; 基层，其包含含有第二金属和选自Si，B，C和N的附加元素的化合物; 以及包含第三金属的氧化物的第二覆盖层，其中第一金属不同于第二金属，第三金属与第一金属相同或不同。
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3.发明申请
公开(公告)号：WO2021063722A1
公开(公告)日：2021-04-08
申请号：PCT/EP2020/076283
申请日：2020-09-21
Applicant: ASML NETHERLANDS B.V.
Abstract: A cleaning device (10) for a lithography apparatus, the cleaning device comprising: a radiation source (2) configured to supply decontamination radiation (8) capable of removing water or other contaminant from the surface of an optical component (IL; PS) or other component of the lithography system; wherein the cleaning device is configured to be clamped by a clamp (7) that clamps a patterning device during exposure processes performed by the lithography apparatus.
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公开(公告)号：WO2019015905A1
公开(公告)日：2019-01-24
申请号：PCT/EP2018/066321
申请日：2018-06-20
Applicant: ASML NETHERLANDS B.V.
Inventor： MOHAMMADI, Vahid , JANSSEN, Paul , NIHTIANOV, Stoyan , VAN DE KERKHOF, Marcus, Adrianus , VAN ZWOL, Pieter-Jan , ZDRAVKOV, Alexandar, Nikolov
Abstract: An optical membrane (16) for use in or with a lithographic apparatus, the membrane comprising a first layer (18) comprising a first material, and a second layer (20) comprising a second material, the first layer being arranged on the second layer, wherein the first and second materials are selected such that a space charge region (22) or depletion region is formed in the membrane, the space charge region or depletion region inducing an electric field (E) in the membrane.
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公开(公告)号：WO2018228933A3
公开(公告)日：2018-12-20
申请号：PCT/EP2018/065127
申请日：2018-06-08
Applicant: ASML NETHERLANDS B.V.
Inventor： VLES, David, Ferdinand , ANDE, Chaitanya Krishna , DE GROOT, Antonius, Franciscus, Johannes , GIESBERS, Adrianus, Johannes, Maria , JANSSEN, Johannes, Joseph , JANSSEN, Paul , KLOOTWIJK, Johan, Hendrik , KNAPEN, Peter, Simon, Antonius , KURGANOVA, Evgenia , MEIJER, Marcel, Peter , MEIJERINK, Wouter, Rogier , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , OLSMAN, Raymond , PATEL, Hrishikesh , PÉTER, Mária , VAN DEN BOSCH, Gerrit , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VOORTHUIJZEN, Willem-Pieter , WONDERGEM, Hendrikus, Jan , ZDRAVKOV, Alexandar, Nikolov
Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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公开(公告)号：WO2018228933A2
公开(公告)日：2018-12-20
申请号：PCT/EP2018/065127
申请日：2018-06-08
Applicant: ASML NETHERLANDS B.V.
Inventor： VLES, David, Ferdinand , ANDE, Chaitanya Krishna , DE GROOT, Antonius, Franciscus, Johannes , GIESBERS, Adrianus, Johannes, Maria , JANSSEN, Johannes, Joseph , JANSSEN, Paul , KLOOTWIJK, Johan, Hendrik , KNAPEN, Peter, Simon, Antonius , KURGANOVA, Evgenia , MEIJER, Marcel, Peter , MEIJERINK, Wouter, Rogier , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , OLSMAN, Raymond , PATEL, Hrishikesh , PÉTER, Mária , VAN DEN BOSCH, Gerrit , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VOORTHUIJZEN, Willem-Pieter , WONDERGEM, Hendrikus, Jan , ZDRAVKOV, Alexandar, Nikolov
Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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