公开(公告)号：WO2016192865A1

公开(公告)日：2016-12-08

申请号：PCT/EP2016/055388

申请日：2016-03-14

Applicant: ASML NETHERLANDS B.V.

Inventor： MATHIJSSEN, Simon, Gijsbert, Josephus ,  DEN BOEF, Arie, Jeffrey ,  POLO, Alessandro ,  TINNEMANS, Patricius, Aloysius, Jacobus ,  SCHELLEKENS, Adrianus, Johannes, Hendrikus ,  YEGANEGI DASTGERDI, Elahe ,  COENE, Willem, Marie, Julia, Marcel ,  BOGAART, Erik, Willem ,  HUISMAN, Simon, Reinald

IPC: G03F9/00

CPC classification number: G03F9/7088 ,  G03F7/70141

Abstract: An alignment system, method and lithographic apparatus are provided for determining the position of an alignment mark, the alignment system comprising a first system configured to produce two overlapping images of the alignment mark that are rotated by around 180 degrees with respect to one another, and a second system configured to determine the position of the alignment mark from a spatial distribution of an intensity of the two overlapping images.

Abstract translation: 提供了一种用于确定对准标记的位置的对准系统，方法和光刻设备，所述对准系统包括被配置为产生相对于彼此旋转大约180度的对准标记的两个重叠图像的第一系统，以及 第二系统，被配置为根据两个重叠图像的强度的空间分布来确定对准标记的位置。