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    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    2.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    光刻设备和器件制造方法

    公开(公告)号：WO2017032534A2

    公开(公告)日：2017-03-02

    申请号：PCT/EP2016/067867

    申请日：2016-07-27

    Applicant: ASML NETHERLANDS B.V.

    Inventor： TINNEMANS, Patricius, Aloysius, Jacobus

    IPC: G03F9/00 ,  G03F7/20

    CPC classification number: G03F9/7019 ,  G03F7/70633 ,  G03F9/7023 ,  G03F9/7046

    Abstract: An initialization method for a sensor is described, the sensor being configured to perform a plurality of measurements of a property of an object using a respective plurality of different measurement parameters, different ones of the plurality of measurements using different measurement parameters, the method comprising: - estimating a characteristic of the property based on the plurality of measurements, the characteristic comprising a combination of respective outcomes of respective ones of the plurality of measurements weighted by a respective weighting coefficient; - using a plurality of models of the object, each respective one of the models being configured to enable a respective simulation of the performing of the plurality of measurements; - performing, for each of respective one of the plurality of models, a respective simulation, the respective simulation including simulating the plurality of measurements under control of a respective plurality of different simulation parameters to obtain a respective plurality of simulated characteristics of the property, the plurality of different simulation parameters being indicative of the plurality of different measurement parameters; - determining, for each respective one of the plurality of models, a respective bias representative of a respective difference between a respective theoretical characteristic of the property in accordance with the respective model and a respective further combination of the simulated characteristics of the property in the respective model; the respective further combination of the simulated characteristics comprising the plurality of weight coefficients, each particular one of the plurality of weight coefficients being associated with a particular one of the plurality of different simulation parameters; - using a cost function configured to optimize a correspondence between the simulated characteristic of the property and the theoretical characteristic of the property; the cost function being a function of the respective biases of the plurality of models; - optimizing the cost function, thereby deriving the plurality of the weight coefficients from the cost function; - using the weight coefficients and the associated simulation parameters in a controller associated with the sensor.

    Abstract translation: 描述了一种用于传感器的初始化方法，所述传感器被配置为使用相应的多个不同的测量参数来执行对象属性的多个测量，所述多个测量中的不同的测量使用 所述方法包括： - 基于所述多个测量来估计所述特性的特性，所述特性包括由各自的加权系数加权的所述多个测量中的各个测量的各个结果的组合; - 使用所述对象的多个模型，所述模型中的每一个相应模型被配置为实现所述多个测量的执行的相应模拟; - 针对所述多个模型中的各个模型中的每一个执行相应模拟，所述相应模拟包括在相应的多个不同模拟参数的控制下模拟所述多个测量，以获得所述属性的相应多个模拟特性，所述 多个不同的模拟参数指示所述多个不同的测量参数; - 针对所述多个模型中的每个相应模型，确定表示根据相应模型的性质的相应理论特性与相应性质的模拟特性的相应其他组合之间的相应差异的相应偏差 模型; 包括所述多个权重系数的所述模拟特征的各个进一步组合，所述多个权重系数中的每一个特定权重系数与所述多个不同模拟参数中的特定一个相关联; - 使用配置成优化所述性质的所述模拟特性与所述性质的所述理论特性之间的对应关系的成本函数; 该成本函数是多个模型的相应偏差的函数; - 优化成本函数，由此从成本函数导出多个权重系数; - 在与传感器相关的控制器中使用权重系数和相关的模拟参数。

    POLARIZATION INDEPENDENT INTERFEROMETER
    3.
    发明申请
    POLARIZATION INDEPENDENT INTERFEROMETER 审中-公开
    极化独立干扰仪

    公开(公告)号：WO2015051970A1

    公开(公告)日：2015-04-16

    申请号：PCT/EP2014/069412

    申请日：2014-09-11

    Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

    Inventor： TINNEMANS, Patricius, Aloysius, Jacobus ,  DEN BOEF, Arie, Jeffrey ,  KREUZER, Justin , Loyd ,  MATHIJSSEN, Simon, Gijsbert, Josephus

    IPC: G03F9/00

    CPC classification number: G03F9/7069 ,  G01B9/02011 ,  G01B9/02015 ,  G01B11/272 ,  G01B2290/70 ,  G03F9/7049 ,  G03F9/7088

    Abstract: Apparatus, systems, and methods are used for detecting the alignment of a feature on a substrate using a polarization independent interferometer. The apparatus, system, and methods include optical elements that receive light that has diffracted or scattered from a mark on a substrate. The optical elements may split the diffracted light into multiple subbeams of light which are detected by one or more detectors. The diffracted light may be combined optically or during processing after detection. The system may determine alignment and/or overlay based on the received diffracted light having any polarization angle or state.

    Abstract translation: 装置，系统和方法用于使用偏振无关干涉仪来检测基板上特征的对准。 该装置，系统和方法包括从基板上的标记衍射或散射的光的光学元件。 光学元件可以将衍射光分成由一个或多个检测器检测的多个子光束。 衍射光可以在光学上或在检测后的处理期间组合。 该系统可以基于接收到的具有任何偏振角或状态的衍射光来确定对准和/或覆盖。

    ALIGNMENT SENSOR FOR LITHOGRAPHIC APPARATUS
    4.
    发明申请
    ALIGNMENT SENSOR FOR LITHOGRAPHIC APPARATUS 审中-公开
    对准装置的对准传感器

    公开(公告)号：WO2017045874A1

    公开(公告)日：2017-03-23

    申请号：PCT/EP2016/069876

    申请日：2016-08-23

    Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

    Inventor： POLO, Alessandro ,  MATHIJSSEN, Simon, Gijsbert, Josephus ,  TINNEMANS, Patricius, Aloysius, Jacobus ,  COSTON, Scott, Douglas ,  HAVELIN, Ronan, James

    IPC: G03F9/00 ,  G02B6/293 ,  H04J14/00

    CPC classification number: G03F9/7065 ,  G02B6/2938

    Abstract: A lithographic apparatus includes an alignment sensor configured to determine the position of an alignment target comprising a periodic structure. The alignment sensor includes a demultiplexer (700) to demultiplex a number of intensity channels (one of them shown to be output at fiber 702). The demultiplexer includes a number of stages arranged in series and a number of demultiplexing components (706, 708a,b, 710a-d,712a-h), each demultiplexing component being operable to divide an input radiation beam into two radiation beam portions. The first stage has a first demultiplexing component (706) that is arranged to receive as an input radiation beam an incident radiation beam. Each successive stage is arranged such that it has twice the number of demultiplexing components as a preceding stage, each demultiplexing component of each stage after the first stage receiving as an input one of the radiation beam portions output from a demultiplexing component of the preceding stage.

    Abstract translation: 光刻设备包括配置成确定包括周期性结构的对准目标位置的对准传感器。 对准传感器包括解复用器（700），以解复用多个强度通道（其中一个示出为在光纤702处输出）。 解复用器包括串联布置的多个级和多个解复用组件（706,708a，b，710a-d，712a-h），每个解复用组件可操作以将输入辐射束分成两个辐射束部分。 第一级具有布置成作为输入辐射束接收入射辐射束的第一解复用部件（706）。 每个连续级被布置为使得其具有前一级的解复用分量的两倍，在第一级接收之后的每级的每个解复用分量作为从前一级的解复用分量输出的辐射束部分中的输入一个。

    LITHOGRAPHIC METHOD AND APPARATUS
    5.
    发明申请
    LITHOGRAPHIC METHOD AND APPARATUS 审中-公开
    光刻方法和装置

    公开(公告)号：WO2016206916A1

    公开(公告)日：2016-12-29

    申请号：PCT/EP2016/062131

    申请日：2016-05-30

    Applicant: ASML NETHERLANDS B.V.

    Inventor： SWAENEN, Lense, Hendrik-Jan, Maria ,  BASELMANS, Johannes, Jacobus, Matheus ,  REDDY, Bogathi, Vishnu, Vardhana ,  TINNEMANS, Patricius, Aloysius, Jacobus ,  NATIV, Beeri

    IPC: G03F7/20

    CPC classification number: G03F7/7055 ,  G03F7/20 ,  G03F7/70258 ,  G03F7/705 ,  G03F7/70525

    Abstract: A method of determining a configuration of a projection system for a lithographic apparatus, wherein manipulators of the projection system manipulate optical elements so as to adjust its optical properties, the method comprising: receiving dependencies of the optical properties of the projection system on a configuration of the manipulators, receiving a plurality of constraints of the manipulators, formulating a cost function, wherein the cost function represents a difference between the optical properties of the projection system for a given configuration of the manipulators and desired optical properties, wherein the cost function is formulated using the dependency of the optical properties on the configuration of the manipulators, scaling the cost function into a scaled variable space, wherein the scaling is performed by using the plurality of constraints and finding a solution configuration of the manipulators which substantially minimises the scaled cost function subject to satisfying the plurality of constraints.

    Abstract translation: 一种确定用于光刻设备的投影系统的配置的方法，其中所述投影系统的操纵器操纵光学元件以调整其光学特性，所述方法包括：接收所述投影系统的光学特性的相关性， 所述操纵器接收所述操纵器的多个约束，制定成本函数，其中所述成本函数表示对于所述操纵器的给定构造的所述投影系统的光学特性与期望的光学性质之间的差异，其中所述成本函数被配制 使用光学性质对机械手的配置的依赖性，将成本函数缩放成缩放的可变空间，其中通过使用多个约束来执行缩放，并且找到基本上最小化缩放成本函数的操纵器的解决方案配置 受到满足 有多个约束。

    ALIGNMENT SENSOR AND LITHOGRAPHIC APPARATUS BACKGROUND
    6.
    发明申请
    ALIGNMENT SENSOR AND LITHOGRAPHIC APPARATUS BACKGROUND 审中-公开
    对准传感器和平面设备背景

    公开(公告)号：WO2016015955A1

    公开(公告)日：2016-02-04

    申请号：PCT/EP2015/065412

    申请日：2015-07-07

    Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

    Inventor： MATHIJSSEN, Simon, Gijsbert, Josephus ,  DEN BOEF, Arie, Jeffrey ,  KREUZER, Justin, Lloyd ,  TINNEMANS, Patricius, Aloysius, Jacobus

    IPC: G03F9/00

    CPC classification number: G03F9/7088 ,  G03F9/7065 ,  G03F9/7069

    Abstract: An alignment sensor for a lithographic apparatus is arranged and constructed to measure an alignment of a movable part of the lithographic apparatus in respect of a stationary part of the lithographic apparatus. The alignment sensor comprises a light source configured to generate a pulse train at a optical wavelength and a pulse repetition frequency, a non-linear optical element, arranged in an optical propagation path of the pulse train, the non-linear optical element configured to transform the pulse train at the optical wavelength into a transformed pulse train in an optical wavelength range, an optical imaging system configured to project the transformed pulse train onto an alignment mark comprising a diffraction grating; a detector to detect a diffraction pattern as diffracted by the diffraction grating, and a data processing device configured to derive alignment data from the detected diffraction pattern as detected by the detector.

    Abstract translation: 用于光刻设备的对准传感器被布置和构造成测量相对于光刻设备的静止部分的光刻设备的可移动部分的对准。 对准传感器包括被配置为产生光波长的脉冲串和脉冲重复频率的光源，布置在脉冲串的光传播路径中的非线性光学元件，非线性光学元件被配置为转换 将光波长的脉冲序列转换为光波长范围内的变换脉冲序列;配置成将经变换的脉冲串投影到包括衍射光栅的对准标记上的光学成像系统; 检测器，用于检测由衍射光栅衍射的衍射图案;以及数据处理装置，被配置为从检测器检测到的检测到的衍射图案中导出对准数据。

    LITHOGRAPHIC APPARATUS ALIGNMENT SENSOR AND METHOD
    10.
    发明申请
    LITHOGRAPHIC APPARATUS ALIGNMENT SENSOR AND METHOD 审中-公开
    LITHOGRAPHIC APPARATUS对准传感器和方法

    公开(公告)号：WO2017036833A1

    公开(公告)日：2017-03-09

    申请号：PCT/EP2016/069776

    申请日：2016-08-22

    Applicant: STICHTING VU ,  UNIVERSITEIT VAN AMSTERDAM ,  STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIE ,  ASML NETHERLANDS B.V.

    Inventor： MATHIJSSEN, Simon, Gijsbert, Josephus ,  DEN BOEF, Arie, Jeffrey ,  PANDEY, Nitesh ,  TINNEMANS, Patricius, Aloysius, Jacobus ,  WITTE, Stefan, Michiel ,  EIKEMA, Kjeld, Sijbrand, Eduard

    IPC: G03F9/00

    CPC classification number: G03F9/7088 ,  G03F9/7046 ,  G03F9/7092

    Abstract: A lithographic apparatus comprises comprise a substrate table constructed to hold a substrate; and a sensor configured to sense a position of an alignment mark provided onto the substrate held by the substrate table. The sensor comprises a source of radiation configured to illuminate the alignment mark with a radiation beam, a detector configured to detect the radiation beam, having interacted with the alignment mark, as an out of focus optical pattern, and a data processing system. The data processing system is configured to receive image data representing the out of focus optical pattern, and process the image data for determining alignment information, comprising applying a lensless imaging algorithm to the out of focus optical pattern.

    Abstract translation: 光刻设备包括：衬底台，用于保持衬底; 以及传感器，其被配置为感测设置在由所述基板台保持的所述基板上的对准标记的位置。 传感器包括被配置为用辐射束照射对准标记的辐射源，检测器被配置为检测与对准标记相互作用的辐射束，作为失焦光学图案，以及数据处理系统。 数据处理系统被配置为接收表示失焦光学图案的图像数据，并处理用于确定对准信息的图像数据，包括将无镜头成像算法应用于失焦光学图案。

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