公开(公告)号：WO2022167179A1

公开(公告)日：2022-08-11

申请号：PCT/EP2022/050489

申请日：2022-01-12

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： ALSAQQA, Ali ,  UEBEL, Patrick, Sebastian ,  TEUNISSEN, Paulus, Antonius, Andreas

IPC: G02B26/08 ,  G01N21/00 ,  G03F7/20

Abstract: An optical filter apparatus comprising an optical divergence device, operable to receive optical pulses and spatially distribute the optical pulses over an optical plane in dependence with a pulse energy of each of the optical pulses; and a spatial filter, located at said optical plane, operable to apply spatial filtering to the optical pulses based on a location of each of the optical pulses at the optical plane resulting from the spatial distributing.

公开(公告)号：WO2022048843A1

公开(公告)日：2022-03-10

申请号：PCT/EP2021/071634

申请日：2021-08-03

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： ALSAQQA, Ali ,  PATEL, Aabid ,  UEBEL, Patrick, Sebastian ,  ABDOLVAND, Amir ,  TEUNISSEN, Paulus Paulus, Antonius, Andreas ,  KADHIM, Wisam F.

IPC: G03F7/20 ,  G02F1/35

Abstract: Disclosed is a radiation source arrangement comprising; a radiation source operable to generate source radiation comprising source energy pulses; and at least one non-linear energy-filter being operable to filter said source radiation to obtain filtered radiation comprising filtered energy pulses. The at least one non-linear energy-filter is operable to mitigate variation in energy in said filtered radiation by reducing the energy level of said source energy pulses which have an energy level corresponding to one of both extremities of an energy distribution of said source energy pulses by a greater amount than said source energy pulses which have an energy level corresponding to a peak of said energy distribution.

公开(公告)号：WO2021083649A1

公开(公告)日：2021-05-06

申请号：PCT/EP2020/078615

申请日：2020-10-12

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： ALSAQQA, Ali ,  EL-GHUSSEIN, Fadi ,  KESSELS, Lambertus, Gerardus, Maria ,  REZVANI NARAGHI, Roxana ,  SHOME, Krishanu ,  BRUNNER, Timothy, Allan ,  SOKOLOV, Sergei

IPC: G03F9/00

Abstract: A calibration system includes a plate, a fixed alignment mark, and a variable diffraction grating. The plate is adjacent to a wafer alignment mark disposed on a wafer. The fixed alignment mark is disposed on the plate and is configured to act as a reference mark for an initial calibration of the calibration system. The variable diffraction grating is disposed on the plate and includes a plurality of unit cells configured to form a plurality of variable alignment marks. The variable diffraction grating is configured to calibrate a shift-between-orders of one of the variable alignment marks and the fixed alignment mark.

公开(公告)号：WO2021063663A1

公开(公告)日：2021-04-08

申请号：PCT/EP2020/075658

申请日：2020-09-14

Applicant: ASML HOLDING N.V.

Inventor： ALSAQQA, Ali ,  ADAMS, Joshua ,  LI, Bin

IPC: G03F9/00

Abstract: An apparatus for and a method of determining alignment of a substrate in which the intensity of a radiation source illuminating an alignment mark is varied in accordance with whether an element in the system for converting an analog signal into a digital signal is in a mode in which it is sampling the signal or in a mode in which it is converting the signal and so not sensitive changes in the signal, thus to reduce the amount of exposure of the substrate or system optical components to the illuminating radiation.